• Title/Summary/Keyword: Ni plating

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Theoretical Study of Boric Acid Determination In Nickel Plating Solution (니켈 도금액의 붕산분석에 관한 연구)

  • 염희택
    • Journal of the Korean institute of surface engineering
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    • v.4 no.1
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    • pp.5-15
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    • 1971
  • "Rapid Determination of Boric Acid in Nickel Plating Solution" by the addition of Na$_2$C$_2$O$_4$ and thus preventing the precipitation of i(OH)$_2$ during titiration , has previously been reported. In this paper, the exact amount of glycerine and the complexing possibility of oxalate with nickel has been determined by measn of conductivity titrations. This experimental work has been supported by the mathematical application of the Debye-Huckel and mass action equitions as well as statistical analysis. The results were ; (1) Fro determining boric acid in nickel plating solution, 20 ml of 400ml/ι glycerine was sufficient, since 97% of the H$_3$BO$_3$ was dissoicated by this addition. (2) In the absence of Na$_2$C$_2$O$_4$ the continious precipitation of Ni(OH)$_2$ during titration with NaOH even past end -point for boric acid determination resulted in considerable anlaytical error. (3) In the presence of Na$_2$C$_2$O$_4$ during titration , Ni++ combined with C$_2$O$_4$-to form NiC$_2$O$_4$. The solution with this precititate of very fine, colloidal , trantsparent particles, remained quite clear for approximately 2 hours. Therefore it was shown that the presence of Na$_2$C$_2$O$_4$ prevents the formation of gross Ni(OH)$_2$ precititation by forming NiC$_2$O$_4$ instead of a complex salt with Ni++ , which did not interfere with the visible determination of the end point for boric acid with NaOH titation. This observous may be interpreted in the light of the previously published solubility ratio for NiC$_2$O$_4$ and Ni(OH)$_2$, 0.3mg/100g H$_2$O(25$^{\circ}C$), respectively. Precipitation of the less soluble , albeit transparent salt, NiC$_2$O$_4$ precluded therefore the precipitation of the Ni(OH)$_2$ salt.

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Studies on the Chemical Plating of Nickel and Chromium on Steel (화학도금법에 의한 강의 니켈 및 크롬도금)

  • Kim, Man;Kim, Dai-Ryong;Yoon, Byung-Ha
    • Journal of the Korean institute of surface engineering
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    • v.15 no.3
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    • pp.127-137
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    • 1982
  • In chemical plating of nickel and chromium on steel, studies on various factors affect-ing the plating operations were carried out. The optimum bath compositions and operat-ing conditions were obtained. The structure and properties of the as deposits or deposits after heat treatment were investigated. (1) The most optimum conditions for the chemical nickel and chromium plating were; 〔Ni2+〕/〔H2PO2-〕; 0.5∼0.8, 〔Cr3+〕/〔H2PO2-〕; 0.6∼0.9 PH;5.0∼5.5, temperature; 90∼95$^{\circ}C$ (2) In the case of nickel deposition, the hardness of deposits increased with increasing phosphorous contents. Heat-treating at the temperature range 200$^{\circ}C$ to 600$^{\circ}C$, the maximum hardness of deposits was obtained at 400$^{\circ}C$ and decreased at temperature above 400$^{\circ}C$ due to growth of Ni3P. (3) Corrosion resistance of chemical nickel deposits was improved with increasing of p-hosphorous contents and heat treating temperature.

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Plating Process of Micro-needle for MEMS Probe Card (MEMS Probe Card용 Micro Needle 공정 연구)

  • Han, Myung-Soo;Ahn, Su-Chang;Nam, An-Sik;Kim, Jang-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.152-152
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    • 2008
  • Micro probe with Ni-Co tip was designed. Unit processes for fabricating the micro probe were developed. We are investigated the micro probe tip using by Ni-Co alloy. One-step and three-step needle was fabricated by plating process, CMP, and photolithography process. The plating thickness was varied by current density and time. Futher data will be extract by different process conditions.

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Sintering of Ni-Based Amorphous Alloy Powders by Plasma Activated Sintering Process (PAS법을 이용한 Ni기 비정질 분말의 소결)

  • Koo, Ja-Min;Shin, Kee-Sam;Kim, Yoon-Bae;Bae, Jong-Soo;Hur, Sung-Kang
    • Korean Journal of Materials Research
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    • v.15 no.12
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    • pp.765-772
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    • 2005
  • PAS(Plasma Activated Sintering) process was tried to apply for the fabrication of BMG(Bulk Metallic Glasses) of $Ni_{57}Zr_{20}Ti_{18}Si_5}\;and\;Ni_{57}Zr_{20}Ti_{18}Si_3Sn_2$ from the as-atomized amorphous powder. Compressive strength for the BMG(bulk Metallic Glasses) of $Ni_{57}Zr_{20}Ti_{18}Si_5$ were lower than those of BMG rods produced by warm extrusion ,or copper mold casting method. Microstructural examination by optical microcope, SEM ana EDS showed that oxidation had occurred during PASintering. In order to prevent the powder from the oxidation during PASintering, Ni coating for $Ni_{57}Zr_{20}Ti_{18}Si_5$ amorphous powder by electroless-plating method was performed. Microstructural examination for Ni coated layers after PASintering indicated that the Ni coating had been so effective to prevent powder from oxidation during PASintering. Sintering behaviors of $Ni_{57}Zr_{20}Ti_{18}Si_3Sn_2$ represent the same as those of $Ni_{57}Zr_{20}Ti_{18}Si_5$.

Development of constant current device for using in the water treatment controller with Ni-Tl-P alloy deposits (Ni-Tl-P합금피막을 이용한 수처리장치용 정전류소자의 개발)

  • Ryu, Il-Kwang
    • Journal of environmental and Sanitary engineering
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    • v.18 no.3 s.49
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    • pp.35-42
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    • 2003
  • The electric resistance and constant current were investigated on the nickel-thallium-phosphorus alloy deposits by electroless-plating. The Ni-Tl-P alloy deposits were achieved with a bath using sodium hypophosphit as the reducing agent and sodium citrate as the comlexing agent. The basic plating solution is composed of 0.1M NiSO$_4$, 0.005${\sim}$0.0IM Tl$_2$S0$_4$, 0.1${\sim}$O.2M sodium hypophosphite and 0.02${\sim}$O.IM sodium citrate and the plating condition were pH 5${\sim}$6, temperrature 80$_4$90${\circ}$C. The results obtained are summarized as follows: 1) The crystal structure of deposit was amorphous structure as deposited state, became microcrystallized centering on Ni(111) plane by heat treatment at 200${\circ}$C, and grew as polycrystalline Ni, Ni$_3$P, Ni$_5$p$_2$,Tl, etc. by heat treatment higher than 350${\circ}$C. The grain size of plated deposits was grown up to 28.3~42.0nm by heat treatment for 1hour at 500${\circ}$C. 2) The electrical resistivity showed a comparatively high value of 192.5$_4$208.3 ${\mu}$${\Omega}$Cm and its thermal stability was great with resistivity value less than 0.22% in the thermal surroundings of 200${\circ}$C. 3) Ni-Tl-P alloy deposit showed such good constant current-making-effect in the variation of electric voltage, heat treatment temperature, and the composition of the deposit that it can be put to practical use as the matter of constant current device.

Formation of Ni-W-P/Cu Electrodes for Silicon Solar Cells by Electroless Deposition (무전해 도금을 이용한 Si 태양전지 Ni-W-P/Cu 전극 형성)

  • Kim, Eun Ju;Kim, Kwang-Ho;Lee, Duk Haeng;Jung, Woon Suk;Lim, Jae-Hong
    • Journal of the Korean institute of surface engineering
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    • v.49 no.1
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    • pp.54-61
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    • 2016
  • Screen printing of commercially available Ag paste is the most widely used method for the front side metallization of Si solar cells. However, the metallization using Ag paste is expensive and needs high temperature annealing for reliable contact. Among many metallization schemes, Ni/Cu/Sn plating is one of the most promising methods due to low contact resistance and mass production, resulting in high efficiency and low production cost. Ni layer serves as a barrier which would prevent copper atoms from diffusion into the silicon substrate. However, Ni based schemes by electroless deposition usually have low thermal stability, and require high annealing process due to phosphorus content in the Ni based films. These problems can be resolved by adding W element in Ni-based film. In this study, Ni-W-P alloys were formed by electroless plating and properties of it such as sheet resistance, resistivity, specific contact resistivity, crystallinity, and morphology were investigated before and after annealing process by means of transmission line method (TLM), 4-point probe, X-ray diffraction (XRD), and Scanning Electron Microscopy (SEM).

Influence of MWCNTs on Fracture Toughness of MWCNTs/Nickel-Pitch Fiber/Epoxy Composites

  • Yim, Yoon-Ji;Park, Soo-Jin
    • Composites Research
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    • v.28 no.6
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    • pp.361-365
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    • 2015
  • The influence of MWCNTs on fracture toughness properties of MWCNTs/Nickel-Pitch Fibers/epoxy composites (MWCNTs/Ni-PFs/epoxy) was investigated according to MWCNTs content. Nickel-Pitch-based carbon fibers (Ni-PFs) were prepared by electroless nickel-plating. The surface properties of Ni-PFs were determined by scanning electron microscopy (SEM) and X-ray photoelectron spectrometry (XPS). The fracture toughness of MWCNTs/Ni-PFs/epoxy was assessed by critical stress intensity factor ($K_{IC}$) and critical strain energy release rate ($G_{IC}$). From the results, it was found that the fracture toughness properties of MWCNTs/Ni-PFs/epoxy were enhanced with increasing MWCNTs content, whereas the value decreased above 5 wt.%. MWCNTs content. This was probably considered that the MWCNTs entangled with each other in epoxy due to an excess of MWCNTs.