• 제목/요약/키워드: Ni film

검색결과 866건 처리시간 0.028초

NiO 증착시의 Ar 압력 변화에 따른 Ni-Fe/NiO 이층막의 자기적특성과 미세구조에 대한 연구 (A Study on the Magnetic Properties and Microstructures of Ni-Fe/NiO Bilayers with Various Ar Presure in NiO Deposition)

  • 노재철;이두현;김용성;서수정;박경수
    • 한국자기학회지
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    • 제8권6호
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    • pp.369-373
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    • 1998
  • 본 연구에서는 마그네트론 스퍼터링 법으로 제작한 Ni-Fe/NiO 이층 박에서, NiO 증착 중 Ar 압력에 따른 교환이 방성의 변화를 고찰하엿으며 이를 미세조작과 관련시켜 해석하고자 하였다. 낮은 Ar 압력에서 증착한 Ni-Fe/NiO 이층막은 우수한 교환이방성 특성을 나타내었으나 Ar 압력이 증가함에 따라 교환이방성은 급격하게 감소하였다. 낮은 Ar 압력에서 증착한 시편은 NiO와 Ni-Fe 계면에서 epitaxy 경향을 나타내었으며 그 계면은 평범하고 그 경계는 두렷하게 구분하였다. 그러나 높은 Ar 압력에서 증착한 시편은 NiO와 Ni-Fe의 경계가 뚜렷하게 구분되지 않고 그 계면 또한 평활하지 않았다. 한편 NiO의 조성은 Ar압력의 증가에 따라 산소의 조성이 점점 증가하였다.

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Direct Growth of Graphene on Insulating Substrate by Laminated (Au/Ni) Catalyst Layer

  • Ko, Yong Hun;Kim, Yooseok;Jung, Daesung;Park, Seung Ho;Kim, Ji Sun;Shim, Jini;Yun, Hyeju;Song, Wooseok;Park, Chong-Yun
    • Applied Science and Convergence Technology
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    • 제24권4호
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    • pp.117-124
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    • 2015
  • A direct growth method of graphene on insulating substrate without catalyst etching and transfer process was developed using Au/Ni/a-C catalyst system. During the growth process, behavior of the Au/Ni catalyst was investigated using EDX, XPS, SEM, and Raman spectroscopy. The Au/Ni catalyst layer was evaporated during growth process of graphene. The graphene film was composed mono-layer flakes. The transmittance of the graphene film was ~80.6%.

Cu-Ni계 박막 스트레인 게이지의 개발 (Development of Cu-Ni Thin Film Strain Gages)

  • 민남기;이성래;김정완
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1544-1546
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    • 1996
  • Thin films of Cu-Ni alloys of various compositions were prepared by RF sputtering onto glass and stainless steel substrates. The effect of composition, substrate temperature, Ar partial pressure, aging time on the electrical properties of Cu-Ni film strain gages in the thickness range $500{\sim}2000{\AA}$ was studied. The maximum resistivity is obtained from 53wt%Cu-47wt%Ni films, while their TCR becomes minimum. This tendency is very desirable for thin film strain gages.

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비귀금속 박막이 치과용합금과 치과용도재와의 화학적결합에 미치는 영향 (EFFECTS OF SPUTTERED NON-PRECIOUS METALLIC THIN FILMS ON THE CHEMICAL BONING BETWEEN DENTAL ALLOY AND PORCELAIN)

  • 조성암
    • 대한치과보철학회지
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    • 제30권4호
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    • pp.481-492
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    • 1992
  • Author measured the bonding strength between Dental Porcelain and Nonprecious Dental Alloy and analyzed diffusion Phenomena at the interfaceby by Auger electron spectroscopy and also Electron spectroscopy for Chemical Analysis. The each specimen was sputtered with Al, Cr, In and Sn. 1. Ni whic is the main element of the matris of dental nonprecious alloy diffuse more than the other element and the Ni diffusion rate of each specimen was well coordinated with the bonding strength of each. 2. The Sn thin film suppress the diffusion rate of Ni of matrix into the Dental Porcelain than the In or Cr thin films. 3. The Al thin film suppress the diffusion rate of Ni than the Sn thin film. 4. The main coponent of dental porcelain : Al, Si, Mo diffused into the matrix of alloy. It means that the each element of dental alloy and dental porelain diffused into the each other part.

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비시안 무전해 Au 도금의 석출거동에 미치는 하지층 무전해 Ni-P 도금 조건의 영향 (Effect of underlayer electroless Ni-P plating on deposition behavior of cyanide-free electroless Au plating)

  • 김동현;한재호
    • 한국표면공학회지
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    • 제55권5호
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    • pp.299-307
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    • 2022
  • Gold plating is used as a coating of connector in printed circuit boards, ceramic integrated circuit packages, semiconductor devices and so on, because the film has excellent electric conductivity, solderability and chemical properties such as durability to acid and other chemicals. In most cases, internal connection between device and package and external terminals for connecting packaging and printed circuit board are electroless Ni-P plating followed by immersion Au plating (ENIG) to ensure connection reliability. The deposition behavior and film properties of electroless Au plating are affected by P content, grain size and mixed impurity components in the electroless Ni-P alloy film used as the underlayer plating. In this study, the correlation between electroless nickel plating used as a underlayer layer and cyanide-free electroless Au plating using thiomalic acid as a complexing agent and aminoethanethiol as a reducing agent was investigated.

원자력 폐수의 양이온 처리를 위한 전기화학적 이온교환체의 특성 (Characteristics of the Electrochemical Ion Exchanger for the Treatment of Cations in Nuclear Wastewater)

  • 황영기
    • 한국산업융합학회 논문집
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    • 제19권4호
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    • pp.176-184
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    • 2016
  • Electrochemical ion exchange method is expected to be one of the most acceptable techniques for the separation of radioactive cations from nuclear wastewater. In this study a thin film of hexacyanoferrate on nickel surface was derivatized chemically in an aqueous potassium-ferricyanide solution. Electrochemical redox behavior of the nickel hexacyanoferrate(NiHCNFe) film electrode was investigated with the use of cyclic voltammetry potentiostated from -100 to 800 mV versus SCE. The electro-reduction characteristics of the NiHCNFe film were examined in the cobalt solutions. The NiHCNFe ion exchanger was more useful at lower concentration, lower temperature, and pH7 of the cobalt solution. The capacity loss of NiHCNFe was 0.018%/cycle that was less than the average loss of 2~3%/cycle of the convective organic exchanger. The 45~55% of the initial cobalt ions was electro-deposited on the NiHCNFe by using continuous recirculating reactor system. As a result, it was found that the electroactive NiHCNFe films showed better performance than the organic resins for the separation of cobalt ion from the aqueous solutions.

AAO를 이용한 Ni 나노구조체의 자기적 특징 (Magnetic Properties of Ni Nanostructures Made by using Nanoporous Anodic Alumina)

  • 이성구;신상원;이재용;이종한;김태곤;송종한
    • 한국자기학회지
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    • 제14권3호
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    • pp.105-108
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    • 2004
  • 나노크기의 기공을 갖는 AAO(Anodic Aluminum Oxide)를 이용하여 Si 기판 위에 열 증착 방식으로 Ni 나노구조체를 제작하였다. 제작된 나노구조체는 직경과 높이가 80nm정도로 거의 비슷한 원기둥 형태를 보였다. Ni 나노구조체의 자기적 특성은 광자기효과(Magneto-Optic Kerr effect)를 이용하여 측정하였고, 함께 성장시킨 박막(continuous film)과 비교하였다. 종횡비(aspect ratio)가 1 : 1 정도인 나노구조체의 자화용이축은 평면방향으로 자화용이축을 보이는 박막과는 달리 수직자기이방성을 보여주었으며, 수직 및 수평방향으로 자기장을 가하면서 얻은 자기이력곡선(hysteresis loop)으로부터 나노구조체의 포화자기장(saturation field)과 보자력(coercivity)이 박막과는 많은 차이를 보였다. 박막에서 거의 무시할 만한 값을 갖는 수직방향의 자기이력곡선에서 측정된 잔류자화(remanent magnetization) 나노구조체에서는 0.3으로 크게 증가했다.

박막공정의 융합화를 통한 초소형 고체산화물 연료전지의 제작: I. Spray Pyrolysis법으로 증착된 Ni 기반 음극과 스퍼터링으로 증착된 YSZ 전해질의 다층구조 (Fabrication of Micro Solid Oxide Fuel Cell by Thin Film Processing Hybridization: I. Multilayer Structure of Sputtered YSZ Thin Film Electrolyte and Ni-Based Anodes deposited by Spray Pyrolysis)

  • 손지원;김형철;김혜령;이종호;이해원
    • 한국세라믹학회지
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    • 제44권10호
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    • pp.589-595
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    • 2007
  • Physical properties of sputtered YSZ thin film electrolytes on anode thin film by spray pyrolisis has been investigated to realize the porous electrode and dense electrolyte multilayer structure for micro solid oxide fuel cells. It is shown that for better crystallinity and density, YSZ need to be deposited at an elevated temperature. However, if pure NiO anode was used for high temperature deposition, massive defects such as spalling and delamination were induced due to high thermal expansion mismatch. By changing anode to NiOCGO composite, defects were significantly reduced even at high deposition temperature. Further research on realization of full cells by processing hybridization and cell performance characterization will be performed in near future.

Effects of Film Formation Conditions on the Chemical Composition and the Semiconducting Properties of the Passive Film on Alloy 690

  • Jang, HeeJin;Kwon, HyukSang
    • Corrosion Science and Technology
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    • 제5권4호
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    • pp.141-148
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    • 2006
  • The chemical composition and the semiconducting properties of the passive films formed on Alloy 690 in various film formation conditions were investigated by XPS, photocurrent measurement, and Mott-Schottky analysis. The XPS and photocurrent spectra showed that the passive films formed on Alloy 690 in pH 8.5 buffer solution at ambient temperature, in air at $400^{\circ}C$, and in PWR condition comprise $Cr_2O_3$, $Cr(OH)_3$, ${\gamma}-Fe_2O_3$, NiO, and $Ni(OH)_2$. The thermally grown oxide in air and the passive film formed at high potential (0.3 $V_{SCE}$) in pH 8.5 buffer solution were highly Cr-enriched, whereas the films formed in PWR condition and that formed at low potential (-0.3 $V_{SCE}$) in pH 8.5 buffer solution showed relatively high Ni content and low Cr content. The Mott-Schottky plots exhibited n-type semiconductivity, inferring that the semiconducting properties of the passive films formed on Alloy 690 in various film formation conditions are dominated by Cr-substituted ${\gamma}-Fe_2O_3$. The donor density, i.e., concentration of oxygen vacancy, was measured to be $1.2{\times}10^{21}{\sim}4.6{\times}10^{21}cm^{-3}$ and lowered with increase in the Cr content in the passive film.

니켈금속 박막에서 수산화 니켈 박막의 전기변색속도 개선 (Enhanced Electrochromic Switching Performance in Nickel Hydroxide Thin Film by Ultra-Thin Ni Metal)

  • 김우성;성정섭
    • 한국안광학회지
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    • 제7권2호
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    • pp.163-167
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    • 2002
  • $Ni(OH)_2/Ni$ Glass 박막에서 전기변색 속도 개선에 대한 연구를 수행하였다. 이는 선글라스의 변색속도가 수분 이상 소요되는 단점을 해결하고자 e-beam evaporator를 이용하여 니켈 금속 박막을 증착시킨 후, 전기화학적 산화-환원 반응으로 $Ni(OH)_2$에 대한 전기변색 특성을 연구하였다. 전기전도성을 갖는 ITO 에서보다 Glass 위에서의 $Ni(OH)_2$의 변색 속도가 오히려 빠르다. 이는 전위와 투과율을 측정함으로서 알 수 있다. XPS를 이용하여 Glass와 $Ni(OH)_2$ 사이의 초박막(${\sim}10{\AA}$) Ni 금속의 존재를 확인하였고, 이 나노 박막은 전기변색 장치의 응답 속도에 영향을 마쳤다. 기존의 선글라스가 5분 정도 소요되는 반면 니켈 나노 박막을 이용한 변색소자에서는 1~2초 정도 소요된다. 이론적으로는 수 ms 이내이지만 전기적 저항으로 인해 초 단위의 응답속도를 보이고 있다.

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