• Title/Summary/Keyword: Next-generation Non-volatile Memory

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Technology of the next generation low power memory system

  • Cho, Doosan
    • International Journal of Internet, Broadcasting and Communication
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    • v.10 no.4
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    • pp.6-11
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    • 2018
  • As embedded memory technology evolves, the traditional Static Random Access Memory (SRAM) technology has reached the end of development. For deepening the manufacturing process technology, the next generation memory technology is highly required because of the exponentially increasing leakage current of SRAM. Non-volatile memories such as STT-MRAM (Spin Torque Transfer Magnetic Random Access Memory), PCM (Phase Change Memory) are good candidates for replacing SRAM technology in embedded memory systems. They have many advanced characteristics in the perspective of power consumption, leakage power, size (density) and latency. Nonetheless, nonvolatile memories have two major problems that hinder their use it the next-generation memory. First, the lifetime of the nonvolatile memory cell is limited by the number of write operations. Next, the write operation consumes more latency and power than the same size of the read operation.These disadvantages can be solved using the compiler. The disadvantage of non-volatile memory is in write operations. Therefore, when the compiler decides the layout of the data, it is solved by optimizing the write operation to allocate a lot of data to the SRAM. This study provides insights into how these compiler and architectural designs can be developed.

Non volatile memory device using mobile proton in gate insulator by hydrogen neutral beam treatment

  • Yun, Jang-Won;Jang, Jin-Nyeong;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.192.1-192.1
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    • 2015
  • We demonstrated the nonvolatile memory functionality of nano-crystalline silicon (nc-Si) and InGaZnOxide (IGZO) thin film transistors (TFTs) using mobile protons that are generated by very short time hydrogen neutral beam (H-NB) treatment in gate insulator (SiO2). The whole memory fabrication process kept under $50^{\circ}C$ (except SiO2 deposition process; $300^{\circ}C$). These devices exhibited reproducible hysteresis, reversible switching, and nonvolatile memory behaviors in comparison with those of the conventional FET devices. We also executed hydrogen treatment in order to figure out the difference of mobile proton generation between PECVD and H-NB CVD that we modified. Our study will further provide a vision of creating memory functionality and incorporating proton-based storage elements onto a probability of next generation flexible memorable electronics such as low power consumption flexible display panel.

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A Study on Energy Efficiency in Servers Adopting AFA(All-Flash Array) (AFA(All-Flash Array) 탑재 서버의 에너지 효율성에 대한 연구)

  • Kim, Young Man;Han, Jaeil
    • Journal of Information Technology Services
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    • v.18 no.1
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    • pp.79-90
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    • 2019
  • Maximizing energy efficiency minimizes the energy consumption of computation, storage and communications required for IT services, resulting in economic and environmental benefits. Recent advancement of flash and next generation non-volatile memory technology and price decrease of those memories have led to the rise of so-called AFA (All-Flash Array) storage devices made of flash or next generation non-volatile memory. Currently, the AFA devices are rapidly replacing traditional storages in the high-performance servers due to their fast input/output characteristics. However, it is not well known how effective the energy efficiency of the AFA devices in the real world. This paper shows input/output performance and power consumption of the AFA devices measured on the Linux XFS file system via experiments and discusses energy efficiency of the AFA devices in the real world.

Way-set Associative Management for Low Power Hybrid L2 Cache Memory (고성능 저전력 하이브리드 L2 캐시 메모리를 위한 연관사상 집합 관리)

  • Jung, Bo-Sung;Lee, Jung-Hoon
    • IEMEK Journal of Embedded Systems and Applications
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    • v.13 no.3
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    • pp.125-131
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    • 2018
  • STT-RAM is attracting as a next generation Non-volatile memory for replacing cache memory with low leakage energy, high integration and memory access performance similar to SRAM. However, there is problem of write operations as the other Non_volatile memory. Hybrid cache memory using SRAM and STT-RAM is attracting attention as a cache memory structure with lowe power consumption. Despite this, reducing the leakage energy consumption by the STT-RAM is still lacking access to the Dynamic energy. In this paper, we proposed as energy management method such as a way-selection approach for hybrid L2 cache fo SRAM and STT-RAM and memory selection method of write/read operation. According to the simulation results, the proposed hybrid cache memory reduced the average energy consumption by 40% on SPEC CPU 2006, compared with SRAM cache memory.

Hybrid Memory Adaptor for OpenStack Swift Object Storage (OpenStack Swift 객체 스토리지를 위한 하이브리드 메모리 어댑터 설계)

  • Yoon, Su-Kyung;Nah, Jeong Eun
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.3
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    • pp.61-67
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    • 2020
  • This paper is to propose a hybrid memory adaptor using next-generation nonvolatile memory devices such as phase-change memory to improve the performance limitations of OpenStack-based object storage systems. The proposed system aims to improve the performance of the account and container servers for object metadata management. For this, the proposed system consists of locality-based dynamic page buffer, write buffer, and nonvolatile memory modules. Experimental results show that the proposed system improves the hit rate by 5.5% compared to the conventional system.

The Electrical and Thermal Properties of Phase Change Memory Cell with Bottom Electrode (하부전극에 따른 상변화 메모리 셀의 전기 및 발열 특성)

  • Jang, Nak-Won;Kim, Hong-Seung;Lee, June-Key;Kim, Do-Heyoung;Mah, Suk-Bum
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.103-104
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    • 2006
  • PRAM (Phase change Random Access Memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change material has been researched in the field of optical data storage media. However, the characteristics required in solid state memory are quite different from optical ones. In this study, the reset current and temperature profile of PRAM cells with bottom electrode were calculated by the numerical method.

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Hybrid Main Memory Systems Using Next Generation Memories Based on their Access Characteristics (차세대 메모리의 접근 특성에 기반한 하이브리드 메인 메모리 시스템)

  • Kim, Hyojeen;Noh, Sam H.
    • Journal of KIISE
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    • v.42 no.2
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    • pp.183-189
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    • 2015
  • Recently, computer systems have encountered difficulties in making further progress due to the technical limitations of DRAM based main memory technologies. This has motivated the development of next generation memory technologies that have high density and non-volatility. However, these new memory technologies also have their own intrinsic limitations, making it difficult for them to currently be used as main memory. In order to overcome these problems, we propose a hybrid main memory system, namely HyMN, which utilizes the merits of next generation memory technologies by combining two types of memory: Write-Affable RAM(WAM) and Read-Affable RAM(ReAM). In so doing, we analyze the appropriate WAM size for HyMN, at which we can avoid the performance degradation. Further, we show that the execution time performance of HyMN, which provides an additional benefit of durability against unexpected blackouts, is almost comparable to legacy DRAM systems under normal operations.

Enhancing Dependability of Systems by Exploiting Storage Class Memory (스토리지 클래스 메모리를 활용한 시스템의 신뢰성 향상)

  • Kim, Hyo-Jeen;Noh, Sam-H.
    • Journal of KIISE:Computer Systems and Theory
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    • v.37 no.1
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    • pp.19-26
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    • 2010
  • In this paper, we adopt Storage Class Memory, which is next-generation non-volatile RAM technology, as part of main memory parallel to DRAM, and exploit the SCM+DRAM main memory system from the dependability perspective. Our system provides instant system on/off without bootstrapping, dynamic selection of process persistence or non-persistence, and fast recovery from power and/or software failure. The advantages of our system are that it does not cause the problems of checkpointing, i.e., heavy overhead and recovery delay. Furthermore, as the system enables full application transparency, our system is easily applicable to real-world environments. As proof of the concept, we implemented a system based on a commodity Linux kernel 2.6.21 operating system. We verify that the persistence enabled processes continue to execute instantly at system off-on without any state and/or data loss. Therefore, we conclude that our system can improve availability and reliability.

Fully Room Temperature fabricated $TaO_x$ Thin Film for Non-volatile Memory

  • Choi, Sun-Young;Kim, Sang-Sig;Lee, Jeon-Kook
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.28.2-28.2
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    • 2011
  • Resistance random access memory (ReRAM) is a promising candidate for next-generation nonvolatile memory because of its advantageous qualities such as simple structure, superior scalability, fast switching speed, low-power operation, and nondestructive readout. We investigated the resistive switching behavior of tantalum oxide that has been widely used in dynamic random access memories (DRAM) in the present semiconductor industry. As a result, it possesses full compatibility with the entrenched complementary metal-oxide-semiconductor processes. According to previous studies, TiN is a good oxygen reservoir. The TiN top electrode possesses the specific properties to control and modulate oxygen ion reproductively, which results in excellent resistive switching characteristics. This study presents fully room temperature fabricated the TiN/$TaO_x$/Pt devices and their electrical properties for nonvolatile memory application. In addition, we investigated the TiN electrode dependence of the electrical properties in $TaO_x$ memory devices. The devices exhibited a low operation voltage of 0.6 V as well as good endurance up to $10^5$ cycles. Moreover, the benefits of high devise yield multilevel storage possibility make them promising in the next generation nonvolatile memory applications.

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