• Title/Summary/Keyword: New facing targets sputtering

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Improvement of characteristics and dependence on underlayer substrate temperature of CoCrTa/Ti double layer (CoCrTa/Ti 이층막의 하지층기판온도의존성 및 특성개선)

  • 김용진;성하윤;금민종;손인환;김경환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.492-495
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    • 2000
  • In order to develop an ultra-thin CoCr perpendicular magnetic recording layer, we prepared CoCrTa/Ti double layer for perpendicular magnetic recording media by new facing targets sputtering system, Crystallgraphics and magnetic characteristics of CoCrTa on underlayer substrate temperature have been investigated. Crystallgraphic and magnetic characteristic of thin films were evaluated by X-ray diffractometry(XRD), vibrating sample magnetometer(VSM) and atomic force microscopy(AFM). The coercivity and anisotropy field was increased by increasing under layer substrate temperature, c-axis orientation of CoCrTa magnetic recording layer was improved 8$^{\circ}$ to 5.6$^{\circ}$when under layer substrate temperature was 250[$^{\circ}C$]. Also, through annealing effect for CoCrTa/Ti double layer, it was certain that crystallgraphics and magnetic characteristics was improved.

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Characteristic of Al-In-Sn-ZnO Thin Film Prepared by FTS System with Hetero Targets

  • Hong, Jeong-Soo;Kim, Kyung-Hwan
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.2
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    • pp.76-79
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    • 2011
  • In order to improve efficiency and make a new material thin film, we prepared the Al-In-Sn-ZnO thin film on a glass substrate at room temperature using a Facing Target Sputtering (FTS) system. The FTS system was designed to array two targets that face each other. Two different kinds of targets were installed on the FTS system. We used an ITO ($In_2O_3$ 90wt%, $SnO_2$ 10wt%) target and an AZO (ZnO 98wt%, $Al_2O_3$ 2wt%) target. The AIZTO films were deposited using different applied powers to the targets. The as-deposited AIZTO thin films were investigated using a UV/VIS spectrometer, an X-ray diffratometer (XRD), and Energy Dispersive X-ray spectroscopy (EDX).

Fabrication and Characterization of AlN films Containing Various Amounts of Co Content

  • Bae, Chang-Hwan;Han, Seung-Oh;Han, Cahng-Suk
    • Korean Journal of Metals and Materials
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    • v.48 no.3
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    • pp.268-275
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    • 2010
  • A new approach is described for preparing AlN thin films containing various amounts of Co content by using a two-facing targets type sputtering (TFTS) system. The deposited films were annealed isothermally at different temperatures and their microstructure, magnetic properties and resistivity were investigated. A small saturation magnetization ($4{\pi}Ms=0.52{\sim}0.85kG$) was observed irrespective of Co content in the asdeposited films. It was found that annealing conditions can control physical properties as well as the microstructure of the films. A high saturation magnetization (3.7 kG) and resistivity of $2200{\mu}{\Omega}-cm$ was obtained for AlN films containing 25 at.% Co.