• 제목/요약/키워드: New ceramic processing

검색결과 73건 처리시간 0.028초

폐콘크리트 미분말을 사용한 저탄소형 시멘트의 조직 및 상분석 (Image and Phase Analysis of Low Carbon Type Recycled Cement Using Waste Concrete Powder)

  • 송훈;신현욱;이종규;추용식;박동천
    • 한국건설순환자원학회논문집
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    • 제2권4호
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    • pp.314-320
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    • 2014
  • 시멘트산업은 건설산업에의 기초소재를 공급하는 중추이지만 시멘트 제조시 고온의 소성이 필요하고 소성시의 원료 및 연료로부터 발생하는 $CO_2$와 구조물 해체시 발생하는 건설폐기물은 새로운 환경문제로 대두되고 있다. 본 연구는 폐콘크리트 미분말의 리사이클을 통해 시멘트로서 활용하기 위한 것이다. 기존의 불활성 충전재로서의 활용에서 벗어나 화학적 특성을 기반으로 배합조건을 조절하여 클링커 및 시멘트를 제조하고 미세조직 및 상분석을 실시하여 저탄소형 시멘트 개발 가능성을 타진하고자 한다. 연구결과 폐콘크리트 미분말을 활용한 저탄소형 시멘트 제조가 가능하며 유효활용을 위한 방안이 마련되어야 한다.

내플라즈마성 세라믹의 표면연마를 통한 플라즈마 열화방지 (Preventing Plasma Degradation of Plasma Resistant Ceramics via Surface Polishing)

  • 최재호;변영민;김형준
    • 반도체디스플레이기술학회지
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    • 제22권3호
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    • pp.130-135
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    • 2023
  • Plasma-resistant ceramic (PRC) is a material used to prevent internal damage in plasma processing equipment for semiconductors and displays. The challenge is to suppress particles falling off from damaged surfaces and increase retention time in order to improve productivity and introduce the latest miniaturization process. Here, we confirmed the effect of suppressing plasma deterioration and reducing the etch rate through surface treatment of existing PRC with an initial illumination level of 200 nm. In particular, quartz glass showed a decrease in etch rate of up to 10%. Furthermore, it is believed that micro-scale secondary particles formed on the microstructure of each material grow as crystals during the fluoridation process. This is a factor that can act as a killer defect when dropped, and is an essential consideration when analyzing plasma resistance. The plasma etching suppression effect of the initial illumination is thought to be due to partial over etching at the dihedral angle of the material due to the sputtering of re-emission of Ar+-based cations. This means that plasma damage due to densification can also be interpreted in existing PRC studies. The research results are significant in that they present surface treatment conditions that can be directly applied to existing PRC for mass production and a new perspective to analyze plasma resistance in addition to simple etching rates.

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고온선박엔진용 MoSi$_2$금속간화합물의 경도와 방전가공특성 (Hardness and EDM Processing of MoSi$_2$Intermetallics for High Temperature Ship Engine)

  • 윤한기;이상필
    • 한국해양공학회지
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    • 제16권6호
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    • pp.60-64
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    • 2002
  • This paper describes the machining characteristics of the MoSi$_2$--based composites through the process of electric discharge drilling with various tubular electrodes. In addition to hardness characteristics, microstructures of Nb/MoSi$_2$laminate composites were evaluated from the variation of fabricating conditions, such as preparation temperature, applied pressure, and pressure holding time. MoSi$_2$-based composites have been developed in new materials for jet engines of supersonic-speed airplanes and gas turbines for high-temperature generators. These high performance engines may require new hard materials with high strength and high temperature-resistance. Also, with the exception of grinding, traditional machining methods are not applicable to these new materials. Electric discharge machining (EDM) is a thermal process that utilizes a spark discharge to melt a conductive material. The tool electrode is almost -unloaded, because there is n direct contact between the tool electrode and the work piece. By combining a non-conducting ceramic with more conducting ceramic, it was possible to raise the electrical conductivity. From experimental results, it was found that the lamination from Nb sheet and MoSi$_2$ powder was an excellent strategy to improve hardness characteristics of monolithic MoSi$_2$. However, interfacial reaction products, like (Nb, Mo)SiO$_2$and Nb$_2$Si$_3$formed at the interface of Nb/MoSi$_2$, and increased with fabricating temperature. MoSi$_2$composites, with which a hole drilling was not possible through the conventional machining process, enhanced the capacity of ED-drilling by adding MbSi$_2$, relative to that of SiC or ZrO$_2$reinforcements.

자종공무마모계측시스템개발 (System Development for Automatic Tool Wear Measurement)

  • Kim, Y.I.
    • 한국정밀공학회지
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    • 제11권6호
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    • pp.185-199
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    • 1994
  • This study has been performed to present a new automatic tool wear measurement by digital image processing. The purpose of this paper is to develop an automatic tool wear measuring system based on the image processing which can be applied to the quasi-real time measurement of the characteristics of insert tip in turning. Tool wear monitoring is one of the key-problems, for the development of control systems of modern unmanned factory which are not completely solved now. In oredr words at present complete qualitative and quantitative information on tool wear morphology is required, at least on the following aspects : flank wear, its dimensions and distribution on the maximum and mean values on VB pqrqmeter in the various zones of the wearland. crater wear, its main dimensions and values of KT parameters. This research has been performed to this technique made possible by designing a proper lighting system to the worn tool with following features : The flank wear is measured by observing the active cutting part from a proper direction and by lighting the wearland by a diffuser optic system. The crater wear is visualized by lighting the tool by a He-Ne gas laser system developed in this study. By means of this system it is research to evaluate classical parameters of tool wear and to have complete information about tool wear morphology.

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반도성 $BaTiO_3$ 세라믹스의 Sol-gel법에 의한 $SiO_2$ 첨가 및 냉각속도 효과 (The Effects of SiO2 Addition and Cooling Rate Change by Sol-gel Processing in Semiconducting BaTiO3 Ceramics)

  • 권오성;정용선;윤영호;이병하
    • 한국세라믹학회지
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    • 제33권12호
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    • pp.1301-1310
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    • 1996
  • Generally it requires high sintering temperatures more than 135$0^{\circ}C$ to make semiconductive BaTiO3 ceramics. Also it is very difficult to achieve a homogeneous mixing in solid-state reaction method. Therefore the liquid phase distributed to non-uniform dilute the characteristics of PTCR. In order to improve the uniformity this study is used the sol-gel coating method. Using this method we studied the new manufacturing process that had a high reproducibility and mass production capability. Tetraethyl orthosilicate (TEOS) was used as a source of Si. The semiconductive BaTiO3 ceramics which was produced by sol-gel method for the SiO2 addition and sintered between 124$0^{\circ}C$ and 130$0^{\circ}C$ showed almost same resistivity at room temperature among 125$0^{\circ}C$ and 130$0^{\circ}C$. As the results We could be sintered the semiconducting BaTiO3 ceramics at lower temperature even at 125$0^{\circ}C$ maintaining the same specific resistivity ratio ($\rho$max/$\rho$min) at 130$0^{\circ}C$. The specific resistivity both below and above the Curie temperature were increased by slow cooling and the steepness of the plots in the reasion of transition from low to high resistance increased as the cooling rate decreased.

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Zn 타겟을 이용한 ZnO 박막트랜지스터의 스퍼터링 성장 (Sputtering Growth of ZnO Thin-Film Transistor Using Zn Target)

  • 우맹;조중열
    • 반도체디스플레이기술학회지
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    • 제13권3호
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    • pp.35-38
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    • 2014
  • Flat panel displays fabricated on glass substrate use amorphous Si for data processing circuit. Recent progress in display technology requires a new material to replace the amorphous Si, and ZnO is a good candidate. ZnO is a wide bandgap (3.3 eV) semiconductor with high mobility and good optical transparency. ZnO is usually grown by sputtering using ZnO ceramic target. However, ceramic target is more expensive than metal target, and making large area target is very difficult. In this work we studied characteristics of ZnO thin-film transistor grown by rf sputtering using Zn metal target and $CO_2$. ZnO film was grown at $450^{\circ}C$ substrate temperature, with -70 V substrate bias voltage applied. By using these methods, our ZnO TFT showed $5.2cm^2/Vsec$ mobility, $3{\times}10^6$ on-off ratio, and -7 V threshold voltage.

수산화알루미늄으로부터 수열법을 이용한 활성 알루미나 제조에 관한 연구 (Fabrication of Activated Alumina Using Aluminum Hydroxide by a Hydrothermal Process)

  • 배현철;이상진
    • 한국세라믹학회지
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    • 제50권6호
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    • pp.384-389
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    • 2013
  • Activated alumina was fabricated with aluminum hydroxide in this study. High-purity alumina gel and boehmite were prepared from aluminum hydroxide by a hydrothermal process and fired to activate alumina having a surface area of 380 ~ 480 $m^2/g$ with less loss of ignition. The aging and drying condition during the fabrication process affected the loss of ignition, the sedimentation time of the alumina suspension, as well as the surface area of the activated alumina. For pellet-type activated alumina, the pre-fired alumina gel and boehmite were press-formed and fired at $400^{\circ}C$ and $550^{\circ}C$ for 6 h, respectively. The fired pellets showed a low density of 2.0 ~ 2.2 $g/cm^3$ with 20% firing shrinkage and sufficient handling strength. In this study, a new fabrication process for high-quality activated alumina with aluminum hydroxide is introduced. The effects of the processing parameters on the activated alumina properties are also examined.

A Review of Graphene Plasmons and its Combination with Metasurface

  • Liu, Chuanbao;Bai, Yang;Zhou, Ji;Zhao, Qian;Qiao, Lijie
    • 한국세라믹학회지
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    • 제54권5호
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    • pp.349-365
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    • 2017
  • Graphene has attracted a lot of attentions due to the unique electrical and optical properties. Compared with the noble metal plasmons in the visible and near-infrared frequencies, graphene can support surface plasmons in the lower frequencies of terahertz and mid-infrared and it demonstrates an extremely large confinement at the surface because of the particular electronic band structures. Especially, the surface conductivity of graphene can be tuned by either chemical doping or electrostatic gating. These features make graphene a promising candidate for plasmonics, biosensing and transformation optics. Furthermore, the combination of graphene and metasurfaces presents a powerful tunability for exotic electromagnetic properties, where the metasurfaces with the highly-localized fields offer a platform to enhance the interaction between the incident light and graphene and facilitate a deep modulation. In this paper, we provide an overview of the key properties of graphene, such as the surface conductivity, the propagating surface plasmon polaritons, and the localized surface plasmons, and the hybrid graphene/metasurfaces, either metallic and dielectric metasurfaces, from terahertz to near-infrared frequencies. Finally, there is a discussion for the current challenges and future goals.

겔 캐스팅 공정을 위한 알루미나 슬러리에서의 첨가제 함량 변화에 따른 겔화특성 평가 (Evaluation of Gelation Characteristics with The Variation of Additive Contents in The Alumina Slurry for Gel Casting Process)

  • 정준기;오창용;하태권
    • 소성∙가공
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    • 제31권5호
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    • pp.290-295
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    • 2022
  • Recently, the use of high-tech ceramic parts in functional electronic parts, automobile parts and semiconductor equipment parts is increasing. These ceramics materials are required to have high reproducibility, reliability, large size and complex shapes. The researchers initiated the work to develop a new shaping method called gel casting, which allows high performance ceramic materials with a complex shape to be produced. The manufacturing process parameters of gel casting include uniform mixing of the initiator, bubble removal, and slip injection. In this study, we analyzed the dispersion and gelation characteristics according to the change in the additive content of the alumina slurry in the gel casting process. The alumina slurry for gel casting was prepared by mixing a solvent, a monomer and a dispersant through a ball mill. Alumina powder and a gelation initiator were added to the mixed solution, and ball milling was performed for 24 hours. A viscosity of 6,435 cps and a stable zeta potential value were obtained under the conditions of alumina powder content of 55 vol% and dispersant 2.0 wt%. After curing for 12 hours by adding aps 0.1wt%, TEMED 0.2wt%, and Monomer 3, 5wt%, it was possible to separate from the molding cup, confirming that the gelation was completed.

Direct Microwave Sintering of Poorly Coupled Ceramics in Electrochemical Devices

  • Amiri, Taghi;Etsell, Thomas H.;Sarkar, Partha
    • Journal of Electrochemical Science and Technology
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    • 제13권3호
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    • pp.390-397
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    • 2022
  • The use of microwaves as the energy source for synthesis and sintering of ceramics offers substantial advantages compared to conventional gas-fired and electric resistance furnaces. Benefits include much shorter processing times and reaching the sintering temperature more quickly, resulting in superior final product quality. Most oxide ceramics poorly interact with microwave irradiation at low temperatures; thus, a more complex setup including a susceptor is needed, which makes the whole process very complicated. This investigation pursued a new approach, which enabled us to use microwave irradiation directly in poorly coupled oxides. In many solid-state electrochemical devices, the support is either metal or can be reduced to metal. Metal powders in the support can act as an internal susceptor and heat the entire cell. Then sufficient interaction of microwave irradiation and ceramic material can occur as the sample temperature increases. This microwave heating and exothermic reaction of oxidation of the support can sinter the ceramic very efficiently without any external susceptor. In this study, yttria stabilized zirconia (YSZ) and a Ni-YSZ cermet support were used as an example. The cermet was used as the support, and a YSZ electrolyte was coated and sintered directly using microwave irradiation without the use of any susceptor. The results were compared to a similar cell prepared using a conventional electric furnace. The leakage test and full cell power measurement results revealed a fully leak-free electrolyte. Scanning electron microscopy and density measurements show that microwave sintered samples have lower open porosity in the electrode support than conventional heat treatment. This technique offers an efficient way to directly use microwave irradiation to sinter thin film ceramics without a susceptor.