• Journal of the Korean Society for Precision Engineering
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• v.17 no.6
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• pp.46-52
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• 2000

산업사회가 발전하면서 초정밀 분야의 측정기술 또한 시대적 요구에 걸맞게 발전을 거듭하고 있다. 광을 이용한 측정기술에 있어서 보다 작은광 스팟의 구현은 높은 분해능을 위해서 필수 불가결한 조건이며, 광 기록분야에 있어서는 높은 기록밀도를 위해 핵심적인 기술이다. 하지만 스팟의 직경은 광의 회절한계(diffraction limit)에 의한 최소치를 갖는다. 예로서, 측정을 위한 광학 현미경 중 현재 일반적으로 널리 쓰이는 고배율 광학 현미경(high resolution optical microscope)은 측정 대상 표면에 물리적 손상을 주지 않으며, 측정 범위가 크고, 값이 싼 장점이 있다.(중략)

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.24 no.12
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• pp.1198-1204
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• 2013

As a microwave near field probe for near field scanning optical microscope(NSOM) system, H-shaped(ridge type) small aperture is proposed and its performances from the viewpoints of the transmission efficiency(transmission cross section) and spatial confinement(beam spot size) are compared with those of the previous narrow rectangular aperture type. While the transmission efficiencies are comparable to each other for the two structures, the transmitted beam spot size for the proposed H-shaped aperture is much smaller than that for the previous rectangular aperture. This strong point of the H-shaped aperture is expected to significantly improve near-field optical applications such as optical data storage, nanolithography and nanomicroscopy. It is also observed that the transmission efficiency can be improved if the coupling aperture is implemented in the type of the transmission cavity.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.28 no.9
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• pp.1270-1275
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• 2004

Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.76.1-76.1
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• 2015

Optical resonances of metallic or dielectric nanoantennas enable to effectively convert free-propagating electromagnetic waves to localized electromagnetic fields and vice versa. Plasmonic resonances of metal nanoantennas extremely modify the local density of optical states beyond the optical diffraction limit and thus facilitate highly-efficient light-emitting, nonlinear signal conversion, photovoltaics, and optical trapping. The leaky-mode resonances, or termed Mie resonances, allow dielectric nanoantennas to have a compact size even less than the wavelength scale. The dielectric nanoantennas exhibiting low optical losses and supporting both electric and magnetic resonances provide an alternative to their metallic counterparts. To extend the utility of metal and dielectric nanoantennas in further applications, e.g. metasurfaces and metamaterials, it is required to understand and engineer their scattering characteristics. At first, we characterize resonant plasmonic antenna radiations of a single-crystalline Ag nanowire over a wide spectral range from visible to near infrared regions. Dark-field optical microscope and direct far-field scanning measurements successfully identify the FP resonances and mode matching conditions of the antenna radiation, and reveal the mutual relation between the SPP dispersion and the far-field antenna radiation. Secondly, we perform a systematical study on resonant scattering properties of high-refractive-index dielectric nanoantennas. In this research, we examined Si nanoblock and electron-beam induced deposition (EBID) carbonaceous nanorod structures. Scattering spectra of the transverse-electric (TE) and transverse-magnetic (TM) leaky-mode resonances are measured by dark-field microscope spectroscopy. The leaky-mode resonances result a large scattering cross section approaching the theoretical single-channel scattering limit, and their wide tuning ranges enable vivid structural color generation over the full visible spectrum range from blue to green, yellow, and red. In particular, the lowest-order TM01 mode overcomes the diffraction limit. The finite-difference time-domain method and modal dispersion model successfully reproduce the experimental results.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.1
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• pp.30-35
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• 2004

We have carried out a basic experiment in order to develope a super high-resolution optical microscope which transcend the limitation of diffraction and the wavelength of lightwave. The image of this scope is composed by measuring the evanescent wave which is localized on the surface of the testing materials. A detecting probe was fabricated with a single mode optical fiber to be sharpened by the chemical etching, and drived by PZT. The standing wave of $0.33\mu\textrm{m}$ wavelength evanescent wave which was generated from the $0.78\mu\textrm{m}$-wavelength semiconductor laser was detected by the $0.5\mu\textrm{m}$-thickness optical fiber probe.

• Journal of the Optical Society of Korea
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• v.9 no.1
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• pp.16-21
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• 2005

Using a cantilever type nanoprobe having a 100㎚m aperture at the apex of the pyramidal tip of a near-field scanning optical microscope (NSOM), nanopatterning of polymer films are conducted. Two different types of polymer, namely a positive photoresist (DPR-i5500) and an azopolymer (Poly disperse orange-3), spincoated on a silicon wafer are used as the substrate. A He-Cd laser with a wavelength of 442㎚ is employed as the illumination source. The optical near-field produced at the tip of the nanoprobe induces a photochemical reaction on the irradiated region, leading to the fabrication of nanostructures below the diffraction limit of the laser light. By controlling the process parameters properly, nanopatterns as small as 100㎚ are produced on both the photoresist and azopolymer samples. The shape and size variations of the nanopatterns are examined with respect to the key process parameters such as laser beam power, irradiation time or scanning speed of the probe, operation modes of the NSOM (DC and AC modes), etc. The characteristic features during the fabrication of ordered structures such as dot or line arrays using NSOM lithography are investigated. Not only the direct writing of nano array structures on the polymer films but also the fabrication of NSOM-written patterns on the silicon substrate were investigated by introducing a passivation layer over the silicon surface. Possible application of thereby developed NSOM lithography technology to the fabrication of data storage is discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.207-207
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• 2013

기존의 그래핀 성장에 관한 연구는 열화학기상증착법(Chemical vapor deposition; CVD)을 이용한다. 그래핀 성장 제어 요소로는 촉매 기판인 전이 금속[Ru, Ir, Co, Re, Pt, Pd, Ni, Cu], 기판 전처리 과정, 수소/메탄 가스 혼합비, 작업 진공 상태, 기판온도[$800{\sim}1,000^{\circ}C$, 냉각 속도 등으로 보고 되고 있다. 그래핀 성장 원리는 Cu 촉매 기판에 메탄 가스를 $1,000^{\circ}C$ 온도에서 분해해서 탄소를 고용 시킨 후 급랭하는 도중에 석출되는 탄소에 의해 그래핀 시트가 형성되는 것으로 알려져 있다. 기존의 CVD를 열원을 이용할 경우 내부 챔버에 생기는 잠열에 의해 cooling profile의 제어가 용이하지 않다. 본 연구에서는 근적외선(Near Infrared; NIR) 열원을 이용한 CVD로 챔버 내부 잠열을 최소화하고, 냉각 공정을 Natural, Linear, Convex cooling type으로 디자인해서 cooling profile 제어가 그래핀 성장에 미치는 영향을 연구 하였다. 이렇게 성장된 그래핀을 임의의 기판(SiO2, Glass, PET film) 위에 습식방법으로 전이 시킨 후, 전기적 구조적 및 광학적 특성을 면저항(four-point probe), 전계방사 주사전자현미경(Field Emission Scanning Electron Microscope; FE-SEM), 마이크로 라만 분광법(Micro Raman spectroscopy) 및 광학현미경(optical microscope), 투과도(UV/Vis spectrometer)의 측정으로 잠열이 최소화된 NIR-CVD에서 cooling profile에 따른 그래핀 성장을 평가하였다.

• Journal of the Korean Society of Visualization
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• v.11 no.2
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• pp.41-45
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• 2013

Two-photon microscopy (TPM) is minimally-invasive 3D fluorescence microscopy based on nonlinear excitation, and TPM can visualize cellular structures based on auto-fluorescence. Line-scanning TPM is one of high-speed TPM methods without sacrificing the image resolution by using spatial and temporal focusing. In this paper, we developed line-scanning TPM based on spatial and temporal focusing for auto-fluorescence imaging by exciting the tryptophan. Laser source for this system was an optical parametric oscillator (OPO) and it made near 570 nm femtosecond pulse laser. It had 200fs pulse width and 1.72 nm bandwidth, so that the achievable depth resolution was 2.41um and field of view (FOV) is 10.8um. From the characterization, our system has 3.0 um depth resolution and 12.3 um FOV. We visualized fixed leukocyte cell sample and compared with point scanning system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.468-470
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• 2005

본 연구에서는 NSOM(Near-field Scanning Optical Microscope)에서 정밀도의 중요한 요소로 작용하는 100 ~ 200nm Scale의 Optical aperture를 제작하기 위해 Optical Fiber를 이용하여 $CO_2$ Laser Heating Pulling Method에 의하여 제작하고자 한다. Heating Pulling Method 에서 Fiber Tip의 정밀도 및 제작 재현성에 영향을 미치는 중요한 기존의 여러 Fiber Tip 구현방법 중 본 연구에서는 Pulse Width[$PW_{(SEC)}$] 와 Pulling Force 두 요소에 있어서 상호관계를 연구하였으며, 연구 결과 두 변수간의 최적화된 파라미터인 PW 0.07 ~ $0.10_{(SEC)}$ 와 Pulling force 0.2 ~ 0.81b의 구간에서 error율이 최소화되는 범위를 찾을 수 있었고, 그 결과 최적의 상태는 $0.08_{(SEC)}$와 0.21b에서 팁들은 첨예화 되었고 95% 이상의 재현성 및 신뢰성을 얻을 수 있었다.

• Journal of Korean Ophthalmic Optics Society
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• v.13 no.1
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• pp.71-76
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• 2008

Purpose: A simple and efficient method to prepare nanocrystalline ZnO thin film with pure strong UV emission on soda-lime-silica glass substrates by low-temperature annealing was improved. Methods: Crystal structural, surface morphological, and optical characteristics of nanocrystalline ZnO thin films deposited on soda-lime-silica glass substrates by prefiring final annealing process at 300$^{\circ}C$ were investigated by using X-ray diffraction analysis, field emission-scanning electron microscope, scanning probe microscope, ultraviolet-visible-near infrared spectrophotometer, and photoluminescence. Results: Highly c-axis-oriented ZnO films were obtained by prefiring at 300$^{\circ}C$. A high transmittance in the visible spectra range and clear absorption edge in the ultra violet range of the film was observed. The PL spectrum of ZnO thin film with a deep near band edge emission was observed while the defect-related broad green emission was nearly quenched. Conclusions: Our work will be possibly adopted to cheaply and easily fabricate ZnO-based optoelectronic devices at low temperature, below 300$^{\circ}C$, in the future.