• Title/Summary/Keyword: Nd:YAG UV 레이저

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An analysis of Cutting Characteristic of Multilayer FPCB using Nd:YAG UV Laser System (Nd:YAG UV 레이저를 이용한 연성회로 다층기판 절단특성에 대한 연구)

  • Choi, Kyung-Jin;Lee, Young-Hyun
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.3
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    • pp.9-17
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    • 2010
  • The FPCB is used for electronic products such as LCD display. The process of manufacturing FPCB includes a cutting process, in which each single FPCB is cut and separated from the panel where a series of FPCBs are arrayed. The most-widely used cutting method is the mechanical punching, which has the problem of creating burrs and cracks. In this paper, the cutting characteristics of the FPCB have been experimented using Nd:YAG DPSS UV laser as a way of solving this problem. To maximize the industrial application of this laser cutting process, test samples of the multilayered FPCB have been chosen as it is actually needed in industry. The cutting area of the FPCB has four different types of layer structure. First, to cut the test sample, the threshold laser cut-off fluence has been found. Various combinations of laser and process parameters have been made to supply the acquired laser cut-off fluence. The cutting characteristics in terms of the variation of the parameters are analyzed. The laser and process parameters are optimized, in order to maximize the cutting speed and to reach the best quality of the cutting area. The laser system for the process automation has been also developed.

Fourth and Fifth Harmonic Generations of an Nd:YAG Laser using Nonlinear Optical $LiB_{3}O_{5}$ and $CsLiB_{6}O_{10}$ Crystals (비선형 단결정 $LiB_{3}O_{5}$$CsLiB_{6}O_{10}$을 이용한 Nd:YAG 레이저의 4차 및 5차 조화파 발생)

  • Jang Jong Hun;Kim Ji Won;Yun Chun Seop
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.02a
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    • pp.234-235
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    • 2003
  • All solid-state UV lasers provide efficient, clean and semipermanent light sources for various applications, such as eye surgery, microchip lithography. $CsLiB_{6}O_{10}$ (CLBO) is one of the most suitable crystals for UV generation because of its small walk-off, large effective nonlinear susceptibility in UV region and high damage threshold. We produced fourth (266 nm) and fifth (213 nm) harmonic generation of an Nd:YAG laser (1064 nm) with $LiB_{3}O_{5}$ as a second harmonic generation medium and CLBO as a fourth harmonic and fifth harmonic mediums. (omitted)

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Sterilization Effect by the Nd:YAG Laser pulse (Nd:YAG 레이저 펄스에 따른 멸균효과)

  • Jeong, Kyeonghwan;Jung, Dongkyung;Park, Jeongkyu;Choi, Hyeonwoo;Seo, Jeongmin
    • Journal of the Korean Society of Radiology
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    • v.14 no.5
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    • pp.695-703
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    • 2020
  • The use of medical devices is increasing due to the development of medical technology. Among medical devices, it is often used in the human body for graft and treatment. Therefore, in medical institutions, various sterilization methods according to the type and material of medical devices are applied to prevent infection. Hydrophosphite (HA) materials are the most popular in bone grafts. We would like to present a sterilization method using Q-switch Nd:YAG laser with high output energy among non-ionizing radiation suitable for small medical devices. In this study, sterilization power was most ideally shown at UV wavelengths of 1.5 W, 266 nm, and 10 pulses. Different wavelength bands; infrared and visible light; showed passive sterilization, and ultraviolet A and C showed differences in sterilization according to the pulse. In laser sterilization were differences that found according to the wavelength bands and pulses.

UV Dye Laser pumped by HCP (HCP에 의해 펌핑된 자외선 색소레이저)

  • 박성진;석성수;임춘우;최대욱;오철한
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.08a
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    • pp.108-109
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    • 2000
  • 현재 많은 종류의 레이저가 학술적으로나 산업계에서 다양하게 사용되고 있다. 그리고 그 중에서도 자외선 레이저의 필요성이 한층 강조되고 있는 시점이다. 사용되고 있는 자외선 레이저는 Eximer 레이저, Nd:YAG의 제3고조파, 다른 레이저로 펌핑한 색소 레이저등이 그 주류를 이루고 있다. 하지만 이들 레이저들은 값이 아주 고가이거나 그 출력이 매우 낮아 새로운 방식의 레이저를 요구하고 있다. 그래서 본 실험실에서는 여러 용도로 사용 가능한 펄스형 고출력 색소 레이저를 개발하고 있다. (중략)

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Experimental Investigation for Ablation Characteristics of Polyimide Layer and Cu-metal Layer using High Power Nd:YAG UV Laser (고출력 Nd:YAG UV레이저를 이용한 polyimide층과 Cu-metal층의 가공상태에 대한 실험적 고찰)

  • Choi, Kyung-Jin;Lee, Young-Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.31-36
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    • 2009
  • In this paper, the laser cutting characteristics of the flexible PCB using high power Nd:YAG UV laser were investigated. A specific FPCB model was selected for the experiment. Test sheets were made, which had equal materials and layer structure to those of the outline (OL) region and the contact pad (CP) region in the FPCB. The experiment is made up of two stages. In the first stage of the experiment, the laser cutting fluence was found, which is the threshold fluence to cut the test sheets completely. The laser cutting fluence of the OL sheet is $1781.26{\sim}1970.16\;J/cm^2$ and that of the CP sheet is $2109.34{\sim}2134.34\;J/cm^2$. In the second stage, cutting performance and its qualities were analyzed by the experiment. The laser cutting performance remained almost unchanged for all laser and process parameter sets. The average cutting width (top side/bottom side) of the OL sheet was $40.45\;{\mu}m/11.52\;{\mu}m$ and that of the CP sheet was $22.14\;{\mu}m/10.93\;{\mu}m$. However, the laser cutting qualities were different according to the parameters. The adjacent region of the cutting line on the OL sheet was carbonized as the beam speed was low and the overlap coefficient was high. The surface quality around the cutting line of the CP sheet was about the same. Carbonization and debris occurred on the surface of the cutting line. As a result of the experiment, the cutting qualities were better as the overlap coefficient was made low and beam speed high. Therefore, the overlap coefficient 2 or 3 is proper for the FPCB laser cutting.

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The transparent and conducting tin oxide thin films by the pulse laser deposition (펄스레이저증착에 의한 투명전도성 산화주석 박막)

  • 윤천호;박성진;이규왕
    • Journal of the Korean Vacuum Society
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    • v.6 no.2
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    • pp.114-121
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    • 1997
  • The transparent conductiong thin films of tin oxides were prepared on pyrex glass substrates by the pulse laser deposition. In the atmospheres of vacuum, O2, and $Sn(CH_3)_4$ a polycrystalline $SnO_2$ target was ablated by Nd-YAG laser beam to deposit thin films on the substrates at room temperature, and as-deposited films were subsequently heat-treated in the air for 2 h at 230, 420 and $610^{\circ}C$, respectively. The characteristics of the thin films were examined by UV-VIS-NIR spectrometry and X-ray diffractometry, and the electrical properties were measured by four-point probe method along with film thickness monitored by the stylus method. It was observed that in the presence of $Sn(CH_3)_4$, $SnO_2$ phases were grown even at room temperature. This suggests that the microplasma producted during the laser ablation plays an important role in the dissociaation of precursor molecules.

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The study of UV emission in ZnO thin films fabricated by Pulsed Laser Deposition (레이저 증착법에 의해 제작된 ZnO 박막의 UV 발광특성연구)

  • 배상혁;이상렬;진범준;우현수;임성일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.95-98
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    • 1999
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. In order to investigate the effect of the deposition conditions on the properties of ZnO thin films at an oxygen pressure of 350 mTorr, the experiment has been Performed at various substrate temperatures in the range of 20$0^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained and the intensity of UV emission was the highest at 40$0^{\circ}C$ substrate temperature.

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A Study on UV Laser Ablation for Micromachining of PCB Type Substrate (다층 PCB 기판의 미세 가공을 위한 UV레이저 어블레이션에 관한 연구)

  • 장원석;김재구;윤경구;신보성;최두선
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.887-890
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    • 1997
  • Recently micromachining using DPSSL(Diode Pumped Solid State Laser) with 3rd harmonic wavelength is actively studied in laser machining area. Micromachining using DPSSL have outstanding advantages as UV source comparing with excimer laser in various aspect such a maintenance cost, maskless machining, high repetition rate and so on. In this study micro-drilling of PCB type substrate which consists of Cu-PI-Cu layer was performed using DPSS Nd:YAG laser(355nm, wavelength) in vector scanning method. Experimental and numerical method(Matlab simulation, FEM) are used to optimize process parameter and control machining depth. The man mechanism of this process is laser ablation. It is known that there is large gap between energy threshold of copper and that of PI. Matlab simulation considering energy threshold of material is performed to effect of duplication of pulse and FEM thermal analysis is used to predict the ablation depth of copper. This study could be widely used in various laser micromachining including via hole microdrilling of PCB, and micromachining of semiconductor components, medical parts and printer nozzle and so on.

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Analysis of thermal properties of the photo polymer hologram for practical applications (포토폴리머 홀로그램의 실용적 응용을 위한 그 열적 특성 분석)

  • Kim, Jung-Hoi;Lee, Hang-Su;Kim, Nam;Jeon, Seok-Hee
    • Korean Journal of Optics and Photonics
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    • v.16 no.2
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    • pp.121-127
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    • 2005
  • This paper presents the thermal characteristics of a Bragg grating recorded in photopolymer. We record hologram gratings using a 532 nm Nd : YAG laser in DuPont HRF 150-38 photopolymer films and analyze the diffraction efficiency versus thermal exposure conditions. For the case of recording after heating, the diffraction efficiency of the hologram is more than $70\%$ at $100^{\circ}C$ but is decreased exponentially at temperatures over $100^{\circ}C$. It is observed in the recording before heating that the diffraction efficiency of the hologram fixed by a UV light is increased to approximately $10\%$ at $100^{\circ}C$, but the holograms are erased at temperatures over $120^{\circ}C$.

Effect of post-annealing treatment on the properties of ZnO thin films grown by PLD (PLD로 증착한 ZnO 박막의 후열처리 효과 연구)

  • Bae, Sang-Hyuck;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04a
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    • pp.125-128
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    • 2000
  • ZnO thin films on silicon substrates have been deposited by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the effect of oxygen post-annealing treatment on the property of ZnO thin films, deposited film has been annealed at the substrate temperature of $440^{\circ}C$. After post-annealing treatment in the oxygen ambient, the stoichiometry of ZnO film has been characterized be improved which results in higher UV emission intensity of photoluminescence.

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