• 제목/요약/키워드: Native Oxide

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Effect of $BF_2$ Dopant on the Formation of Ti-Polycide ($BF_2$ Dopant가 Titanium Polycide 형성에 미치는 영향)

  • 최진성;백수현
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.11
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    • pp.887-893
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    • 1991
  • To take advantage of Ti-polycide, when it is contacted with both n+ and p+ active area of silicon, the effects of BF$_2$ on the formation of Ti-silicide were investigated with RTA temperature and dopant concentration. The intermediate phase C49 TiSi$_2$ appeared at $650^{\circ}C$ and the stable phase C54 TiSi2 was formed at $700^{\circ}C$. And the formation of Ti-silicide was hindered by BF$_2$ doping and this trend was decreased with increasing temperature. The out-diffusion phenomena of BF$_2$ into Ti silicide were not observed. And significantly, the native oxide was a chief factor preventing the formation of Ti-silicides.

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Design and Analysis of GAIVAE System and Application to the Growth of Semiconductor Thin Films -On the Growth of GaAs on Si-

  • Kang, Ey-Goo;Sung, Man-Young;Park, Sung-Hee
    • Journal of Electrical Engineering and information Science
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    • v.3 no.1
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    • pp.110-116
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    • 1998
  • A single-crystalline epitaxial film of GaAs has been grown on Si using a gs assisted-ionized vapour beam eptaxial technique. The native oxide layer on the silicon substrate was removed at 550$^{\circ}C$ by use of an accelerated arsenic ion beam, instead of a high-temperature desorption. During the growth the substrate temperature was maintained at 550$^{\circ}C$. Transmission electron microscopy and electron diffraction data suggest that the GaAs layer is an epitaxially grown single-crystalline layer. The possibility of growing device quality GaAs on Si is able demonstrated through fabrication of GaAs MODFET on Si substrates.

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Growth of Large Scale CdTe(400) Thin Films by MOCVD (MOCVD를 이용한 대면적 CdTe 단결정 박막성장)

  • Kim, Kwang-Chon;Jung, Kyoo-Ho;You, Hyun-Woo;Yim, Ju-Hyuk;Kim, Hyun-Jae;Kim, Jin-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.4
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    • pp.343-346
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    • 2010
  • We have investigated growth of CdTe thin films by using (As, GaAs) buffer layers for application of large scale IR focal plane arrays(IFPAs). Buffer layers were grown by molecular beam epitaxy(MBE), which reduced the lattice mismatch of CdTe/Si and prevented native oxide on Si substrates. CdTe thin films were grown by metal organic chemical deposition system(MOCVD). As a result, polycrystalline CdTe films were grown on Si(100) and arsenic coated-Si(100) substrate. In other case, single crystalline CdTe(400) thin film was grown on GaAs coated-Si(100) substrate. Moreover, we observed hillock structure and mirror like surface on the (400) orientated epitaxial CdTe thin film.

The Behavior of $BF_2$ Implanted Single Crystalline Si Substrates During the Formation of $TaSi_2$ ($TaSi_2$ 형성시 단결정 실리콘 기판에 이온주입된 $BF_2$의 거동)

  • 조현춘;양희준;최진석;백수현
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.10
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    • pp.814-820
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    • 1991
  • TaSi$_2$ was formed by rapid thermal annealing(RTA) on BF$_2$ doped single crystalline silicon substrates. The formation and various properties of TaSi$_2$ have been investigated by using 4-point probe, HP414, XRD, and SEM. And the redistribution of boron with RTA has been observed by SIMS. Implanted boron was diffused out into the TaSi$_2$ for RTA temperature but did not significantly affect the formation temperature of TaSi$_2$. Also, the contact resistance for TaSi$_2$/p$^{+}$ region had a low value 22$\Omega$, at contact size of 0.9$\mu$m, and the native oxide formed on Si-substrates by BF$_2$ implantation retarded the formation of TaSi$_2$.

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Synthesis of Zirconium Oxides on silicon by Radio-Frequency Magnetron Sputtering Deposition

  • Ma, Chunyu;Zhang, Qingyu
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.83-87
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    • 2003
  • Zirconium oxide films have been synthesized by radio-frequency magnetron sputtering deposition on n-Si(001) substrate with metal zirconium target at variant $O_2$ partial pressures. The influences of $O_2$ partial pressures of the morphology, deposition rate, microstructure, and the dielectric constant of $ZrO_2$ have been discussed. The results show that deposition rate of $ZrO_2$ films decreases, the roughness, and the thickness of the native $SiO_2$ interlayer increases with the increase of $O_2$ partial pressure. $ZrO_2$ films synthesized at low $O_2$ partial pressure are amorphous and monoclinic polycrystalline in nanometer scale at low $O_2$ partial pressure. The relative dielectrics of $ZrO_2$ films are in the range of 12 to 25.

Properties of InP native oxide films prepared by rapid thermal oxidation method (급속열산화방법으로 형성된 InP 자연산화막의 특성)

  • 김선태;문동찬
    • Electrical & Electronic Materials
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    • v.5 no.4
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    • pp.385-392
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    • 1992
  • 급속열산화방법으로 400-650.deg.C의 온도범위에서 10-600초 동안 n형 InP기판위에 InP자연산화막을 형성하고 산화막의 성장율, 성장기구와 화학적 구성성분 및 전기적 성질등을 조사하였다. InP자연산화막의 두께는 산화시간이 제곱근에 비례하였고 산화온도에 대하여 지수함수적으로 증가하였다. InP자연산화막은 320.deg.C의 온도에서 초기성장이 이루어지고 산소원자들이 InP내부로 확산되는 과정으로 형성되며 산화막 형성에 필요한 활성화에너지는 1.218eV이었다. InP 자연산화마그이 화학적성분은 In$_{2}$)$_{3}$, P$_{2}$O$_{5}$ 및 InPO$_{4}$의 산화물이 혼합하여 구성된다. Au/InP쇼트키다이오드와 InP자연산화막을 게이트절연물로 사용한 MOS 다이오드의 전기적 특성은 다이오드방정식에 따르는 전류-전압특성을 보였다.

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Surface Migration in Al and Cu Films (알루미늄 및 구리 박막에서의 표면전자이주)

  • 박종원;김윤태;이진호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.106-108
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    • 1994
  • Electromigration(EM) tests were carried out on Al and Cu films in HV systems to study surface migration. The Al films were made on oxidized silicon wafers by thermal evaporation, in-situ annealed at 300$^{\circ}C$, patterned, and EM tested at 260$^{\circ}C$ and 4.5MA/$\textrm{cm}^2$. SEM observation with back scattered electron mode on the EM tested Al films disclosed that thinning took place under the native Al oxide. In the case of Cu films, tested using in-situ TEM, thinning was also observed at the early stage of void formation even though the thinned areas were much less than those of the Al films.

Analysis and Growth of GaAs on Si (GaAs on Si결정(結晶)의 성장(成長)과 그 특성해석(特性解析))

  • Jeong, Se-Jin;Sung, Han-Young
    • Proceedings of the KIEE Conference
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    • 1990.07a
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    • pp.250-253
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    • 1990
  • A single-crystalline epitaxial film of GaAs has been grown on Si using an ionized cluster beam technique. The native oxide layer on the silicon substrate was removed at $550^{\circ}C$ by use of an accelerated arsonic ion beam, instead of a high-temperature desorption. During the growth the substrate temperature was maintained at $550^{\circ}C$. Transmission electron microscopy and electron diffraction data suggest that the eats layer is an epitaxially grown single-crystalline layer.

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Screening of Inhibition Activity of LPS-induced NO Production by Ethanol Extracts from Jeju Island Native Plants and Algae

  • Go, Boram;Hyun, Ho Bong;Yoon, Seon-A;Oh, Dae-ju;Yoon, Weon-Jong;Ham, Young-Min
    • Proceedings of the Plant Resources Society of Korea Conference
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    • 2019.10a
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    • pp.77-77
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    • 2019
  • Herbal medicines have been used as a basic means of clinical trial throughout history, and traditional medicines are targeted to seek functional components. To discover new cosmetic or food ingredients among numerous natural resources from Jeju island, we screened for inhibition activity against nitric oxide (NO) production in lipopolysaccharide (LPS)-stimulated RAW 264.7 cells. Although NO formation plays an important role to relax vascular muscles or eliminate tumors, NO produced excessively in inflammatory condition can cause metabolic diseases or inflammatory dysfunctions. Among 52 natural resources ethanol extracts, 5 extracts inhibited NO production over 25% compared to only LPS-treated control at the concentration of $100{\mu}g/mL$. In further study, we try to investigate other bio-activities and the phytochemicals of 5 different extracts as useful ingredients for cosmetics or functional foods.

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The Effect of Hydrogen Peroxide on Inducible Nitric Oxide Synthase Expression in Murine Macrophage RA W264.7 Cells (Murine macrophage RAW264.7에서 과산화수소가 유발형 산화질소 합성효소의 발현에 미치는 영향)

  • Ahn, Joong-Hyun;Song, Jeong-Sup
    • Tuberculosis and Respiratory Diseases
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    • v.47 no.2
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    • pp.172-183
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    • 1999
  • Background: Nitric oxide is a short-lived effector molecule derived from L-arginine by the nitric oxide synthase(NOS). Nitric oxide plays a role in a number of physiologic and pathophysiologic functions including host defense, edema formation, and regulation of smooth muscle tone. Some kinds of cells including macrophage are known to produce large quantities of nitric oxide in response to inflammatory stimuli such as interleukin-$1\beta$(IL-$1\beta$), tumor necrosis factor-$\alpha$(TNF-$\alpha$), interferon-$\gamma$(IFN-$\gamma$) and lipopolysaccharide(LPS). Reactive oxygen species are also known to be important in the pathogenesis of acute cell and tissue injury such as acute lung injury model Methods: Using the RA W264.7 cells, we have examined the ability of oxidant hydrogen peroxide($H_2O_2$) to stimulate nitric oxide production and inducible NOS mRNA expression. Also, we have examined the effects of NOS inhibitors and antioxidants on $H_2O_2$ induced nitric oxide production. Results: Stimulation of RAW264.7 cells with combinations of 100 ng/ml IL-$1\beta$, 100 ng/ml TNF-$\alpha$, and 100 U/ml IFN-$\gamma$ or 100 U/ml IFN-$\gamma$ and $1{\mu}g/ml$ LPS induced the synthesis of nitric oxide as measured by the oxidation products nitrite($NO_2^-$) and nitrate($NO_3^-$). Addition of $250 {\mu}M-2$ mM $H_2O_2$ to the cytokines significantly augmented the synthesis of $NO_2^-$ and $NO_3^-$(p<0.05). When cells were incubated with increasing concentrations of $H_2O_2$ in the presence of IL-$1\beta$, TNF-$\alpha$ and IFN-$\gamma$ at constant level, the synthesis of $NO_2^-$ and $NO_3^-$ was dose-dependently increased(p<0.05). $N^G$-nitro-L-arginine methyl ester(L-NAME), dose dependently, significantly inhibited the formation of $NO_2^-$ and $NO_3^-$ in cells stimulated with LPS, IFN-$\gamma$ and $H_2O_2$ at constant level(p<0.05). Catalase significantly inhibited the $H_2O_2$-induced augmentation of cytokine-induced $NO_2^-$ and $NO_3^-$ formation(p<0.05). But, boiled catalase did not produce a significant inhibition in comparison with the native enzyme. Another antioxidant 2-mercaptoethanol and orthophenanthroline dose-dependently suppressed $NO_2^-$ and $NO_3^-$ synthesis(p<0.05). Northern blotting demonstrated that H:02 synergistically stimulated the cytokine-induced iNOS mRNA expression in RA W264.7. Conclusion: These results suggest that $H_2O_2$ contributes to inflammatory process by augmenting the iNOS expression and nitric oxide synthesis induced by cytokines.

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