• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.785-786
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• 2010

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.31-32
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• 2006

A signal conditioning circuit for capacitive sensors was developed using a commercial single chip solution. Since capacitive displacement sensors can achieve high resolution and linearity, they have been widely used as precision sensors within the range of several hundred micrometers. However, they inherently have a limitation in low frequency range and some nonlinearity characteristics and so a specially designed signal conditioning circuit is needed to handle these properties. Up to now, several companies already have succeeded in the development of the capacitive sensors system and they are commercially available in the market. In this research, to construct the signal processing circuits more easily and simply, we used a universal LVDT signal conditioner (AD698). Since the AD698 provides one chip solution for a basic signal processing including modulation and demodulation using various internal components, we can build the processing circuits successfully with minimal additional circuits: a compensation circuits for the drift caused by the bias current of OP amplifiers and a fine adjustment circuit for the elimination of nonlinearity. The signal processing circuits shows nonlinearity less than 0.05% in the comparison with a laser interferometer.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.4
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• pp.84-91
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• 2005

We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.75-82
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• 2004

A metrological atomic force microscope (M-AFM) was developed fur the length measurements of nanometer range, through the modification of a commercial AFM. To eliminate nonlinearity and crosstalk of the PZT tube scanner of the commercial AFM, a two-axis flexure hinge scanner employing built-in capacitive sensors is used for X-Y motion instead of PZT tube scanner. Then two-dimensional displacement of the scanner is measured using two-axis heterodyne laser interferometer to ensure the meter-traceability. Through the measurements of several specimens, we could verify the elimination of nonlinearity and crosstalk. The uncertainty of length measurements was estimated according to the Guide to the Expression of Uncertainty in Measurement. Among several sources of uncertainty, the primary one is the drift of laser interferometer output, which occurs mainly from the variation of refractive index of air and the thermal stability. The Abbe error, which is proportional to the measured length, is another primary uncertainty source coming from the parasitic motion of the scanner. The expanded uncertainty (k =2) of length measurements using the M-AFM is √(4.26)$^2$+(2.84${\times}$10$^{-4}$ ${\times}$L)$^2$(nm), where f is the measured length in nm. We also measured the pitch of one-dimensional grating and compared the results with those obtained by optical diffractometry. The relative difference between these results is less than 0.01 %.