• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.351-354
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• 2004

This work presents a simple and cost-effective approach for maskless fabrication of positive-tone silicon master for the replica molding of hyperfine elastomeric channel. Positive-tone silicon masters were fabricated by a maskless fabrication technique using the combination of nanoscratch by Nanoindenter ⓡ XP and XOH wet etching. Grooves were machined on a silicon surface coated with native oxide by ductile-regime nanoscratch, and they were etched in a 20 wt％ KOH solution. After the KOH etching process, positive-tone structures resulted because of the etch-mask effect of the amorphous oxide layer generated by nanoscratch. The size and shape of the positive-tone structures were controlled by varying the etching time (5, 15, 18, 20, 25, 30 min) and the normal loads (1, 5 mN) during nanoscratch. Moreover, the effects of the Berkovich tip alignment (0, 45$^{\circ}$) on the deformation behavior and etching characteristic of silicon material were investigated.

• Transactions of Materials Processing
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• v.18 no.8
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• pp.616-624
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• 2009

In this work we demonstrate the hot-embossing process under different forming conditions such as forming temperature, load, and holding time in pressing, in order to determine the suitable conditions required for linear patterning on polymer plates (PC). Results showed that the replicated pattern depth increased in proportion to an increase in the forming temperature, load, and time. The reduction of the workpiece thickness increased according to the holding time in the pressing process. In the process of time, the reduction ratio of the workpiece thickness decreased due to the surface area increment of the workpiece, while the pressure on the workpiece declined. In order to reduce the bulging ratio we introduced a temperature difference between the upper and the lower punch.

• Proceedings of the KIEE Conference
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• summer
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• pp.1034-1036
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• 2004

The most basic form of a direct-drive linear motor is the voice coil motor(VCM). The voice coil motor employs a stationary permanent magnet field assembly in conjunction with a moving coil winding assembly to produce a force proportional to the current applied to the coil. Voice coil motor provide motion capable of extremely fine position sensitivity, limited only by the feedback sensor used to close the control loop. This paper presents dual-servo voice coil motor for improvement of driving range and position resolution. The voice coil motor is a cylindrical shape to improve reliability of a nanoindenter.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.45-46
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• 2008

Hard coatings of TiN which exhibit a large variation in their electrical resistivities, have been prepared in magnetron sputtering system using bipolar pulsed DC generator. TiN coatings have also been prepared using a DC generator in the same sputtering system under identical deposition conditions. Microstructural, Mechanical, Crystallographic properties of TiN films using continuous and bipolar pulsed DC generators were examined. Field emission scanning microscope and Nanoindenter have been used to characterize the coatings.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.83-87
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• 2003

Thin films of amorphous carbon (a-C) generally combine high wear resistance with low friction coefficients and a-C films have widespread applications as protective coatings and passivation of electrical circuit and insulating layer. In this work we deposited the amorphous carbon (a-C) films on silicon substrate with a high rate DC magnetron sputtering system. It is obtained parameters on the deposition rate and physical properties of a-C films using a wide range of Ar gas pressure and DC power. The physical properties of the films were analyzed by Nanoindenter and AFM (Atomic Force Microscopy), The electrical properties were investigated by electrical conductivity measurement.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.5
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• pp.24-31
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• 2004

Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

• Journal of the Korean Society for Nondestructive Testing
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• v.33 no.2
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• pp.129-137
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• 2013

A force calibration of a nanoindenter and a 3D morphology observation of indenters were carried out in this study. A microbalance calibrated with standard weights was used for measuring the loads generated by a nanoindenter. The indentation load could be calibrated from the ratio of measured and generated loads and the first contact load also could be detected from the microbalance data. By analyzing atomic force microscopy images of two indenters, curvature radii of apexes were determined by $19.71{\pm}3.03$ and $1043.94{\pm}50.91$ nm, respectively, for the nearly new indenter A and the severly worn indenter B. Corresponding bluntness depths were estimated by 1.22 and 64.56 nm for the both indenters by overlapping their profiles on the perfect pyramidal shape. In addition, nanoindentation curves obtained from a fused silica reference material with the both indenters showed a depth difference corresponding to the bluntness depth difference along the indentation depth axis. By shifting amounts of the bluntness depths along the horizontal axis, whole nanoindentation curves overlapped on themselves and resulted in nanohardness values consistent within 1.11 % without considering the complex indenter area function of each indenter.

• Korean Journal of Materials Research
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• v.15 no.10
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• pp.621-625
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• 2005

Effects of rf power, pressure, sputtering gas composition, and substrate temperature on the deposition rate of the $WC_x$ coatings were investigated. The effects of rf power and sputtering gas composition on the hardness and corrosion resistance of the $WC_x$ coatings deposited by reactive sputtering were also investigated. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) analyses were performed to determine the structures and compositions of the films, respectively. The hardnesses of the films were investigated using a nanoindenter, scanning electron microscopy, ana a salt-spray test, respectively. The deposition rate of the films was proportional to rf power and inversely proportional to the $CH_4$ content of $Ar/CH_4$ sputtering gas. The deposition rate linearly increased with increasing chamber pressure. The hardness of the $WC_x$ coatings Increased as rf power increased. The highest hardness was obtained at a $Ar/CH_4$ concentration of $10 vol.\%$ in the sputtering gas. The hardness of the $WC_x$ film deposited under optimal conditions was found to be much higher than that of the electroplated chromium film, although the corrosion resistance of the former was slightly lower than that of the latter.

• Korean Journal of Materials Research
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• v.26 no.5
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• pp.271-280
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• 2016

When a single inorganic precursor is used for the synthesis of a sol-gel coating, there is a problem of cracking on the surface of coating layer. In order to solve this problem of surface cracking, we synthesized inorganic-organic coatings that have hybrid properties of inorganic and organic materials. Sols of various ratios (1:0.07, 0.2, 0.41, 0.82, 1.64, 3.26, 6.54, 13.2) of an inorganic precursor of Tetrabutylorthotitanate ($Ti(OBu)_4$, TBOT) and an organic precursor of ${\gamma}$-Methacryloxy propyltrimethoxysilane (MAPTS) were prepared and coated on stainless steels (SUS316L) by dip coating method. The binding structure and the physical properties of the synthesized coatings were analyzed by FT-IR, FE-SEM, FIB (Focused Ion Beam), and a nano-indenter. Dynamic polarization testing and EIS (electrical impedance spectroscopy) were carried out to evaluate the micro-defects and the corrosion properties of the coatings. The prepared coatings show hybrid properties of inorganic oxides and organic materials. Crack free coatings were prepared when the MAPTS ratio was above a critical value. As the MAPTS ratio increased, the thickness and the corrosion resistance increased, and the hardness decreased.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.104-104
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• 2003

다양한 구조를 갖는 polysilsesquioxane은 열적, 전기적, 기계적 성질이 우수하여 차세대 고집적 반도체용 저 유전율 층간 절연막 재료로 부각되고 있으며, 유/무기 하이브리드 재료로 많은 연구 대상이 되고 있다. 그러나 PMSSQ(polymethylsilsesquioxane)는 취성으로 인한 반도체 제조의 CMP 공정에서 미세 크렉 발생의 위험이 있으므로 막의 인성 강화가 요구되고 있다. 이를 위하여 PMSSQ의 취성을 보완하기 위한 목적으로 선형 분자인 dimethylsiloxane을 10-20mo1% 도입하고자 하였다. 이때 도입된 dimethylsiloxane기가 PMSSQ에 균일하게 분포하지 않으면 실리콘 기판에 코팅 후 약 43$0^{\circ}C$의 열처리 공정 중에 열분해 되는 위험이 있다. 이에 따라 본 연구에서는 dimethylsiloxane기의 열분해에 의한 문제를 최소화하기 위하여 출발 물질인 MTMS(methyltrimethoxysilane)와 DMDMS(dimethyldimethoxysilane)과의 가수분해 속도차이를 고려한 단계(step) 반응법과 MTMS 와 DMDES(dimethyldiethoxysilane)를 사용한 리간드 교환법(ligand exchange)으로 dimethylsiloxane이 PMSSQ에 도입된 공중합체를 합성하였다. 각 합성 방법에 따라 합성된 공중합 PMSSQ의 특성을 TGA, TG-IR, $^1$H-NMR, $^{29}$ Si-NMR과 in-situ IR을 통하여 분석하였다. 또한 dimethylsiloxane 도입 양 및 상기 제조 방법에 따라 합성한 공중합체를 Si 기판위에 코팅하여 43$0^{\circ}C$에서 열처리한 후 코팅막의 강도, 두께 및 굴절율 변화를 ellipsometry 와 nanoindenter로 분석하였다.