• Proceedings of the Materials Research Society of Korea Conference
• /
• 2009.05a
• /
• pp.58.1-58.1
• /
• 2009

나노 임프린트 리소그래피 기술은 기존의 노광 장비를 이용하는 기존의 리소그래피 공정에 비해 저렴한 공정으로 대면적 패터닝이 가능한 차세대 리소그래피 기술이다. 나노 임프린트 리소그래피는 기존의 나노 리소그래피 기술과는 다르게 기능성 무기물 물질을 직접 패터닝 할 수 있는 기술이다. 본 연구에서는 $TiO_2$ 나노 패턴을 를 기존의 증착, 리소그래피, 식각 등의 공정을 거치지 않고, sol-gel법과 나노 임프린트 리소그래피를 이용하여 직접 전사하는 기술에 대해 연구 하였다. 본 연구에서는 Tetrabutylorthotitanate를 precusor로 하는 ethanol 기반의 $TiO_2$ sol을 제작하여 이용하였다. PDMS mold를 임프린팅용 몰드로 사용하였으며, 이러한 PDMS mold는 노광 기술과 반응성 이온 식각을 이용하여 제작된 master mold로 부터 복제되었다. 제작된 sol을 Si wafer에 spin coating하여 넓게 도포한 후, wafer위에 PDMS mold를 밀착 시킨다. 이후, 5 bar의 압력과 $200^{\circ}C$의 온도에서 나노 임프린트 리소그래피 공정을 진행하여 $TiO_2$ gel 패턴을 형성한다. gel 상태의 $TiO_2$ 패턴을 anealing 공정을 통해 다결정질 TiO2 나노 패턴으로 제작하였다. 제작된 패턴을 scanning electron microscope(SEM)를 이용하여 확인하고, XRD 및 EDX를 이용하여 분석하였다.

• Transactions of Materials Processing
• /
• v.12 no.7
• /
• pp.640-646
• /
• 2003

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

• Journal of the Korean Society of Industry Convergence
• /
• v.22 no.5
• /
• pp.467-473
• /
• 2019

In this study, approached to improve durability of the multi-functional nano-pattern fabricated on the curved lens surface using nanoimprint lithography (NIL) was proposed, and the effects of the proposed methods on functionality after wear test were examined. To improve the mechanical property of ultraviolet(UV)-curable resin, UV-NIL was conducted at the elevated temperature around $60^{\circ}C$. In addition, micro/nano hierarchical structures was fabricated on the lens surface with a durable film mold. Analysis on the worn surfaces of nano-hole pattern and hierarchical structures and measurements on the static water contact angle and critical water volume for roll-off indicated that the UV curing process with elevated temperature is effective to maintain wettability by increasing hardness of resin. Also, it was found that the micro-scale pattern is effective to protect nano-pattern from damage during wear test.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.19 no.1
• /
• pp.596-602
• /
• 2018

Nanoimprint lithography (NIL) is an emerging technology that enables cost-effective and high-throughput nanofabrication. In ultraviolet (UV) NIL, low-cost and high-speed production can be achieved using a non-vacuum environment at room temperature and low pressure. However, there are problems with the formation of bubble defects in such an environment. This paper investigates the shape of the mold cavity and the bubble defect formation in UV NIL in a non-vacuum environment. The bubble defect formation was simulated using two-dimensional flow analysis and the VOF method for commonly used cavity mold shapes (rectangular, elliptical, and triangular). The characteristics of the resist flow front and various contact angles were also analyzed. The shape of the mold cavity had a very significant effect on the bubble defect formation. For all cavity shapes, a smaller contact angle with the mold and larger contact angle with the substrate decreased the possibility of bubble defect formation. The elliptical shape was the most effective for preventing bubble defect formation.

• Korean Journal of Optics and Photonics
• /
• v.28 no.2
• /
• pp.53-58
• /
• 2017

This paper presents the design and fabrication of a planar nano-diffraction grating for an integrated miniature spectrometer module. The proposed planar nano-diffraction grating consists of nonuniform periods, to focus the reflected beams from the grating's surface, and an asymmetrical V-shaped groove profile, to provide uniform diffraction efficiency in the wavelength range from 400 to 650 nm. Also, to fabricate the nano-diffraction grating using low-cost UV-NIL technology, we analyzed the FT-IR spectrum of a uvcurable resin and optimized the conditions for the UV curing process. Then, we precisely fabricated the polymeric nano-diffraction grating within 5 nm in dimensional accuracy. The integrated spectrometer module using the fabricated polymeric planar nano-diffraction grating provides spectral resolution of 5 nm and spectral bandwidth of 250 nm. Our integrated spectrometer module using a polymeric planar nano-diffraction grating serves as a quick and easy solution for many spectrometric applications.

• Transactions of Materials Processing
• /
• v.17 no.8
• /
• pp.633-642
• /
• 2008

It's important to measure quantitative properties about thermal-nano behavior of polymer for producing high quality components using Nanoimprint lithography process. Nanoscale indents can be used to make the cells for molecular electronics and drug delivery, slots for integration into nanodevices, and defects for tailoring the structure and properties. In this study, formability of polymethylmetacrylate(PMMA) and polycarbonate(PC) were characterized Polymer has extreme variation in thermo mechanical variation during forming high temperature. Because of heating the polymer, it becomes softer than at room temperature. In this case it is particularly important to study high temperature-induced mechanical properties of polymer. Nanoindenter XP(MTS) was used to measure thermo mechanical properties of PMMA and PC. Polymer was heated by using the heating stage on NanoXP. At CSM(Continuous Stiffness Method) mode test, heating temperature was $110^{\circ}C,120^{\circ}C,130^{\circ}C,140^{\circ}C$ and $150^{\circ}C$ for PMMA, $140^{\circ}C,150^{\circ}C,160^{\circ}C,170^{\circ}C$ and $180^{\circ}C$ for PC, respectively. Maximum indentation depth was 2000nm. At basic mode test, heating temperature was $90^{\circ}C$ and $110^{\circ}C$ for PMMA, $140^{\circ}C,160^{\circ}C$ for PC. Maximum load was 10mN, 20mN and 40mN. Also indented pattern was observed by using SEM and AFM. Mechanical properties of PMMA and PC decreased when temperature increased. Decrease of mechanical properties from PMMA went down rapidly than that of PC.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2012.11a
• /
• pp.171-171
• /
• 2012

In this study, we fabricated the high-brightness AlGaInP-based red light emitting diodes (LED)s using by direct printing technique and inductive coupled plasma (ICP) reactive ion etching (RIE). In general, surface roughening was fabricated by wet etching process to improve the light extraction efficiency of AlGaInP-based red LED. However, a structure of the surface roughening, which was fabricated by wet etching, was tiled cone-shape after wet etching process due to crystal structure of AlGaInP materials, which was used as top-layer of red LED. This tilted cone-shape of surface roughening can improve the light extraction of LED, but it caused a loss of the light extraction efficiency of LED. So, in this study, we fabricated perfectly cone shaped pattern using direct printing and dry etching process to maximize the light extraction efficiency of LED. Both submicron pattern and micron pattern was formed on the surface of red LED to compare the enhancement effect of light extraction efficiency of LEDs according to the diameter of sapphire patterns.After patterning process using direct printing and ICP-RIE proceeded on the red LED, light output was enhanced up to 10 % than that of red LED with wet etched structure. This enhancement of light extraction of red LED was maintained after packaging process. And as a result of analyze of current-voltage characteristic, there is no electrical degradation of LED.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.14 no.9
• /
• pp.4178-4184
• /
• 2013

Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently, the major trends of NIL are high throughput and large area patterning. UV curable type NIL (UV NIL) can be performed at room temperature and low pressure. And one advantage of UV NIL is that it does not need vacuum, which greatly simplifies tool construction, so that vacuum oprated high-precision stages and a large vacuum chamber are no longer needed. However, one key issue in non-vacuum environment is air bubble formation problem. Namely, can the air bubbles be completely removed from the resist. In this paper, the air bubbles formation by the method of droplet application in UV NIL with non-vacuum environment are experimentally studied. The effects of the volume of droplet and the number of dispensing points on air bubble formation are investigated.

• Korean Journal of Materials Research
• /
• v.15 no.11
• /
• pp.705-710
• /
• 2005

NIL (nanoimprint lithography) technique has demonstrated a high potential for wafer size definition of nanometer as well as micrometer size patterns. During the replication process by NIL, the stiction between the stamp and the polymer is one of major problems. This stiction problem is moi·e important in small sized patterns. An antistiction layer prevents this stiction ana insures a clean demolding process. In this paper, we were using a TCP (transfer coupled plasma) equipment and $C_4F_8$ as a precursor to make a Teflon-like antistiction layer. This antistiction layer was deposited on a 6 inch silicon wafer to have nanometer scale thicknesses. The thickness of deposited antistiction layer was measured by ellipsometry. To optimize the process factor such as table height (TH), substrate temperature (ST), working pressure (WP) and plasma power (PP), we were using a design of experimental (DOE) method. The table of full factorial arrays was set by the 4 factors and 2 levels. Using this table, experiments were organized to achieve 2 responses such as deposition rate and non-uniformity. It was investigated that the main effects and interaction effects between parameters. Deposition rate was in proportion to table height, working pressure and plasma power. Non-uniformity was in proportion to substrate temperature and working pressure. Using a response optimization, we were able to get the optimized deposition condition at desired deposition rate and an experimental deposition rate showed similar results.