• 한국분말재료학회지
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• 제12권6호
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• pp.433-440
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• 2005

The hydrogen sorption speed of $Zr_{57}V_{36}Fe_7$ nanocrystalline and amorphous alloys was evaluated at room temperature. Nanocrystalline alloys of $Zr_{57}V_{36}Fe_7$ were prepared by planetary ball milling. The hydrogen sorption speed of nanocrystalline alloys was higher than that of the amorphous alloy. The enhanced sorption speed of nanocrystalline alloys was explained in terms of surface oxygen stability which has been known to retard the activation of amorphous alloys. The retardation can be reduced by formation of nanocrystals, which results in the observed increase in sorption properties.

• 한국분말재료학회지
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• 제10권3호
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• pp.164-167
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• 2003

The mechanical alloying effect has been studied on the three Cu-based alloy systems with a positive heat of mixing. The extended bcc solid solution has been formed in the Cu-V system and an amorphous phase in the Cu-Ta system. However, it is round that a mixture of nanocrystalline Cu and Mo Is formed in the Cu-Mo system. The neutron diffraction has been employed at a main tool to characterize the detailed amorphization process. The formation of an amorphous phase in Cu-Ta system can be understood by assuming that the smaller Cu atoms preferentially enter into the bcc Ta lattice during ball milling.

• 한국분말재료학회지
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• 제14권1호
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• pp.50-55
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• 2007

The hydrogen sorption speeds of $Zr_{57}V_{36}Ti_7$ amorphous alloy and its crystallized alloys were evaluated at room temperature. $Zr_{57}V_{36}Ti_7$ amorphous alloy was prepared by ball milling. The hydrogen sorption rate of the partially crystallized alloy was higher than that of amorphous. The enhanced sorption rate of partially crystallized alloy was explained in terms of grain refinement that has been known to promote the diffusion into metallic bulk of the gases. The grain refinement could be obtained by crystallization of amorphous phase resulting in the observed increase in sorption property.

• 한국표면공학회지
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• 제36권4호
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• pp.296-300
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• 2003

Extended cylindrical magnetron sputtering system with rotating 600-mm long and 90-mm diameter graphite cathode and pulsed power supply voltage generator were developed and fabricated. Time-dependent Langmuir probe characteristics as well as carbon films thickness were measured. It was shown that ratio of ions flux to carbon atoms flux for pulsed magnetron discharge mode was equal to $\Phi_{i}$ $\Phi$sub C/ = 0.2. It did not depend on the discharge current in the range of $I_{d}$ / = 10∼60 A since both the plasma density and the film deposition rate were found approximately proportional to the discharge current. In spite of this fact carbon film structure was found to be strongly dependent on the discharge current. Grain size increased from 100 nm at $I_{d}$ = 10∼20 A to 500 nm at $I_{d}$ = 40∼60 A. To deposit fine-grained hard nanocrystalline or amorphous carbon coating current regime with $I_{d}$ = 20 A was chosen. Pulsed negative bias voltage ($\tau$= 40 ${\mu}\textrm{s}$, $U_{b}$ = 0∼10 ㎸) synchronized with magnetron discharge pulses was applied to a substrate and voltage of $U_{b}$ = 3.4 ㎸ was shown to be optimum for a hard carbon film deposition. Lower voltages were not sufficient for amorphization of a growing graphite film, while higher voltages led to excessive ion bombardment and effects of recrystalization and graphitization.