• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.188-188
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• 1999

The embedded atom method (EAM) of Daw and Baskes as a semiempirical method, has been successfully applied to the fcc or nearly filled d-band transition metals due to its computational feasibility and its methodological simplicity. Then Baskes modified the EAM (MEAM) to include directional bonding and applied it to metals, semiconductors, and diatomic gases, all of which have different types of bondings. Here, we present a detailed study of the energetics of adsorption on the fcc(111) surfaces and binary system within the framework of MEAM. In adsorption on fcc(111) surfaces, there are two energetically favored sites, so called, fcc site and hcp site, which may trigger stacking fault in the growth of films and might switch growth mode between 3D growth and layer by layer growth. We scrutinized the role of the hcp sites, which would offer dynamic growth pathways although the dynamics are not yet clear within the limited experimental resolution. Featuring these transient motions in the atomic level should contribute to the understanding the growth mechanisms on fcc(111) surface. And we also applied MEAM for initial stage energetics at the Cr coverage of sub- monolayer on W(110). We hope that recently observed extraordinary growth behavior at the Cr coverage of 0.7 monolayer, self- organized nano-scale lines, can be resolved in this MEAM binary system calculation.

• Structural Engineering and Mechanics
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• v.63 no.2
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• pp.171-180
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• 2017

Static and dynamic instability of a viscoelastic carbon nanotube (CNT) embedded on a thermo-elastic foundation are investigated, in this research. The CNT is modeled based on Euler-Bernoulli beam (EBB) and nonlocal small scale elasticity theory is utilized to analyze the structure. Governing equations of the system are derived using Hamilton's principle and differential quadrature (DQ) method is applied to solve the partial differential equations. The effects of variable axial load and diverse boundary conditions on static/vibration instability are studied. To verify the result of the DQ method, the Galerkin weighted residual approach is used for the instability analysis. It is observed appropriate agreement for results of two different solution methods and satisfactory accuracy with those obtained in prior studies. The results of this work could be useful for engineers and designers in order to produce and design nano/micro structures in thermo-elastic medium.

• Fashion & Textile Research Journal
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• v.11 no.2
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• pp.231-241
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• 2009

Embroidery is one of the oldest methods of textiles surface decoration. The masterpiece "Tapisserie de Bayeux," is one of the earliest Medieval embroideries. Embroidery was popular on a broad scale with introduction of what was called Opus Anglicanum("English work") in the 13th century. France had been producing sophisticated embroideries since the 16th century. England was the country producing the greatest quantity of embroideries of the best quality in the 17th century. Until the 17th century, the Church was the most important patron of needlework. Then a shift in emphasis occurred towards the domestic embroidery. English 17th century domestic embroidery reached a high point of technical brilliance and charm. In France, embroidery was produced on hangings as well as costume. 18th century interest in embellishing the domestic environment, embroideries became much more finely detailed than those of the 17th century with the use of finer wool and silk threads. French silk were the finest in the world, and their embroidery was arguably equally fine both in furnishing textiles and on costumes. "Art Needlework" was the major movement in embroidery in the late 19th century. The Royal School of Needlework was founded in 1872, followed by similar institutions around Britan. Splendid fashion embroidery of French haut-couture that was represented to Lesage atelier in 20th century.

• Proceedings of the Korean Society For Composite Materials Conference
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• 2003.04a
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• pp.117-120
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• 2003

Electro-micromechanical techniques were applied using four-probe method for carbon nanotube (CNT) or nanofiber (CNF)/epoxy composites with their content. Carbon black (CB) was used to compare with CNT and CNF. The fracture of carbon fiber was detected by nondestructive acoustic emission (AE) relating to electrical resistivity for double-matrix composites test. Sensing for fiber tension was performed by electro-pullout test under uniform cyclic strain. The sensitivity for fiber damage such as fiber fracture and fiber tension was the highest for CNT/epoxy composites, and in CB case they were the lowest compared with CNT and CNF. Reinforcing effect of CNT obtained from apparent modulus measurement was the highest in the same content. The results obtained from sensing fiber damage were correlated with the morphological observation of nano-scale structure using FE-SEM. The information on fiber damage and matrix deformation and reinforcing effect of carbon nanocomposites could be obtained from electrical resistivity measurement as a new concept of nondestructive evaluation.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.24 no.1
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• pp.38-42
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• 2015

Polydimethylsiloxane (PDMS) is a widely used material for replicating micro-structures because of its transparency, deformability, and easy fabrication. At the nanoscale, however, it is hard to fill a nanohole template with uncured PDMS. This paper introduces several simple methods by changing the surface energy of a nanohole template and PDMS elastomer for replicating 100nm-scale structures. In the case of template, pristine anodic aluminum oxide (AAO), hydrophobically treated AAO, and hydrophillically treated AAO are used. For the surface energy change of the PDMS elastomer, a hydrophilic additive and dilution solvent are added in the PDMS prepolymer. During the molding process, a simple casting method is used for all combinations of the treated template and modified PDMS. The nanostructured PDMS surface was investigated with a scanning electron microscope after the molding process for verification.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.124-124
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• 2010

Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.211.2-211.2
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• 2014

Epitaxial complex oxide thin film heterostructures have attracted a great attention for their multifunctional properties, such as ferroelectricity, and ferromagnetism. Two dimensional electron gas (2DEG) confined at the interface between two insulating perovskite oxides such as LaAlO3/SrTiO3 interface, provides opportunities to expand various electronic and memory devices in nano-scale. Recently, it was reported that the conductivity of 2DEG could be controlled by external electric field. However, the switched conductivity of 2DEG was not stable with time, resulting in relaxation due to the reaction between charged surface on LaAlO3 layer and atmospheric conditions. In this report, we demonstrated a way to control the conductivity of 2DEG in non-volatile way integrating ferroelectric materials into LAO/STO heterostructure. We fabricated epitaxial Pb(Zr0.2Ti0.8)O3 films on LAO/STO heterostructure by pulsed laser deposition. The conductivity of 2DEG was reproducibly controlled with 3-order magnitude by switching the spontaneous polarization of PZT layer. The controlled conductivity was stable with time without relaxation over 60 hours. This is also consistent with robust polarization state of PZT layer confirmed by piezoresponse force microscopy. This work demonstrates a model system to combine ferroelectric material and 2DEG, which guides a way to realize novel multifunctional electronic devices.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.430.1-430.1
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• 2014

According to advanced nanotechnology in the field of biomedical engineering, many studies of the interaction between topography of surfaces and cellular responses have been focused on nanostructure. In order to investigate this interaction, it is essential to make well-controlled nanostructures. Electron beam lithography (EBL) have been considered the most typical processes to fabricate and control nano-scale patterns. In this work, $TiO_2$ nanowire array was fabricated with hybrid process (top-down and bottom-up processes). Nanodot arrays were patterned on the substrate by EBL process (top-down). In order to control the spacing between nanodots, we optimized the EBL process using Poly(methyl methacrylate) (PMMA) as an electron beam resist. Metal lift-off was used to transfer the spacing-controlled nanodots as a seed pattern of $TiO_2$ nanowire array. Au or Sn nanodots which play an important role for catalyst using Vapor-Liquid-Solid (VLS) method were patterned on the substrate through the lift-off process. Then, the sample was placed in the tube furnace and heated at the synthesis temperature. After heat treatment, $TiO_2$ nanowire array was fabricated from the nanodots through VLS method (bottom-up). These results of spacing-controlled nanowire arrays will be used to study the interaction between nanostructures and cellular responses in our next steps.

• Current Photovoltaic Research
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• v.1 no.2
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• pp.73-81
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• 2013

Heterojunction with Intrinsic Thin-layer (HIT) solar cells are currently an important subject in industrial trends for thinner solar cell wafers due to the low-temperature of production processes, which is around $200^{\circ}C$, and due to their high-efficiency of 24.7%, as reported by the Panasonic (Sanyo) group. The use of thinner wafers and the enhancement of cell performance with fabrication at low temperature have been special interests of the researchers. The fundamental understanding of the band bending structures, choice of materials, fabrication process, and nano-scale characterization methods to provide necessary understanding of the interface passivation mechanisms, emitter properties, and requirements for transparent oxide conductive layers is presented in this review. This information should be used for the performance characterization of the developing technologies for HIT solar cells.

• Transactions of Materials Processing
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• v.18 no.3
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• pp.268-273
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• 2009

Ultraviolet nanoimprint lithography (UV-NIL), which is performed at a low pressure and at room temperature, is known as a low cost method for the fabrication of nano-scale patterns. In the patterning process, maintaining the uniformity of the residual layer is critical as the pattern transfer of features to the substrate must include the timed etch of the residual layer prior to the etching of the transfer layer. In pursuit of a thin and uniform residual layer thickness, the initial volume and the position of each droplet both need to be optimized. However, the monomer mixtures of resin had a tendency to evaporate. The evaporation rate depends on not only time, but also the initial volume of the monomer droplet. In order to decide the initial volume of each droplet, the accurate prediction of evaporation behavior is required. In this study, the theoretical model of the evaporation behavior of resin droplets was developed and compared with the available experimental data in the literature. It is confirmed that the evaporation rate of a droplet is not proportional to the area of its free surface, but to the length of its contact line. Finally, the parameter of the developed theoretical model was calculated by curve fitting to decide the initial volume of resin droplets.