통합 검색 | Korea Science

노재호;이택민;박상호;조정대;김동수
- 한국정밀공학회지
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- 제27권9호
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- pp.16-19
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- 2010
This paper presents how to design and fabricate the gravure offset printing system for enhancement of register precision. Factors of precision error are caused by imprecision of gravure plate, deformation of substrate, printing quality change due to the change of ink viscosity, Imprecision of printing machine, and so on. This study suggests concept design of gravure offset printing system which is able to minimize or remove these error factors.
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임태우;박상후;양동열;이신욱;공홍진
- 한국정밀공학회지
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- 제21권6호
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- pp.160-166
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- 2004
In this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy.
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박상후;임태우;양동열
- 한국정밀공학회지
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- 제23권3호
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- pp.156-162
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- 2006
Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.
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