• 제목/요약/키워드: Nano-patterning

검색결과 212건 처리시간 0.026초

잉크젯에 의한 은나노 잉크의 패턴닝 및 소결 (Patterning and Sintering of Silver Nano Ink by the Ink-Jet Printing Technology)

  • 전명표;박명성;명성재;남중희;김병익
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.329-329
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    • 2008
  • Silver nanoparticles were synthesized by polyol process and its particle size observed with TEM is about 20nm. Silver nanoparticle ink with metal content of 30wt% was prepared using solvent of ethanol and has low viscosity of 5cps (10rpm). This ink was printed by as ink-jet printer on Al2O3 and Silicone substrate. The resistivity and morphology of the printed film was investigated as a function of sintering termperature.

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잉크젯 프린팅 기술을 이용한 기판 표면처리와 금속 패턴 형성에 관한 연구 (A Study of Substrate Surface Treatment and Metal Pattern Formation using Inkjet Printing Technology)

  • 조용민;박성준
    • 한국분무공학회지
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    • 제17권1호
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    • pp.20-26
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    • 2012
  • Inkjet printing is one of the direct writing technologies and is able to form a pattern onto substrate by dispensing droplets in desired position. Also, by inkjet technology manufacturing time and production costs can be reduced, and procedures can be more efficient. To form a metal pattern, it must be harmonized with conductive nano ink, printing process, sintering, and surface treatment. In this study, micro patterning of conductive line has been investigated using the piezoelectric printhead driven by a bipolar voltage signal is used to dispense $20-40{\mu}m$ diameter droplets and silver nano ink which consists of 50 nm silver particles. In addition, hydrophobic treatment of surface, overlap printing techniques, and sintering conditions with changing temperature and times to achieve higher conductivity.

Transparent Conducting Nanodomes for Efficient Light Management

  • Hong, Seung-Hyouk;Yun, Ju-Hyung;Park, Hyeong-Ho;Kim, Joondong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.314.1-314.1
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    • 2013
  • Transparent conducting nanoscale-domes were periodically patterned on a Si substrate by nanoimprint method. Transparent conductor of indium-tin-oxide (ITO) was shaped as a nanodome, which effectively drives the incident light effectively into a light-absorber and therefore induces a substantially enhanced photo-response. An ITO nanodome is electrically isolated from the neighboring nanodomes. This structure benefits to provide a low contact between a Si substrate and a front metal electrode giving an efficient electrical path. The ITO nanodome device showed a significantly enhanced photo-response of 6010 from the value of 72.9 of a planar ITO film. The electrical and optical advantage of an ITO nanodome is suitable for various photoelectric applications.

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나노 패터닝을 위한 이온빔-고체 상호작용 분석 (Analysis of Ion Beam-Solid Interactions for Nano Fabrication)

  • 김흥배
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.581-584
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    • 2005
  • Ion beam processing is one of the key technologies to realize mastless and resistless sub 50nm nano fabrication. Unwanted effects, however, may occur since an energetic ion can interact with a target surface in various ways. Depending on the ion energy, the interaction can be swelling, deposition, sputtering, re-deposition, implantation, damage, backscattering and nuclear reaction. Sputtering is the fundamental mechanisms in ion beam induced direct patterning. Re-deposition and backscattering are unwanted mechanisms to avoid. Therefore understanding of ion beam-solid interaction should be advanced for further ion beam related research. In this paper we simulate some important interaction mechanisms between energetic incident ions and solid surfaces and the results are compared with experimental data. The simulation results are agreed well with experimental data.

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Fabrication of Nanopatterns by Using Diblock Copolymer

  • KANG GIL BUM;KIM SEONa-IL;KIM YONG TAE;KIM YOUNG HHAN;PARK MIN CHUL;KIM SANG JIN;LEE CHANG WOO
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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    • pp.183-187
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    • 2005
  • Thin films of diblock copolymers may be suitable for semiconductor device applications since they enable patterning of ordered domains with dimensions below photolithographic resolution over wafer-scale area. We obtained nanometer-scale cylindrical structure of dibock copolymer of polystyrene-block-poly(methylmethacrylate), PS-b-PMMA, also demonstrate pattern transfer of the nanoporous polymer using both reactive ion etching. The size of fabricated naonoholes were about 10 nm. Fabricated nanopattern surface was observed by field emission scanning electron microscope (FESEM).

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수분수집을 위한 초발수/초친수 복합 표면 제작: 그라비아 옵셋 프린팅과 콜로이달 리소그래피 공정 (Fabrication of a Hybrid Superhydrophobic/superhydrophilic Surface for Water Collection: Gravure Offset Printing & Colloidal Lithography)

  • 지승묵;김인영;김은희;정지은;김완두;임현의
    • 한국정밀공학회지
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    • 제29권1호
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    • pp.19-24
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    • 2012
  • We demonstrate the desert beetle back mimicking hybrid superhydrophilic/superhydrophobic patterned surface by using the combination method of colloidal lithography and gravure offset printing for nano and micro patterning, respectively. The two methods are cost-effective and industrially available techniques compared to the other nano/micro patterning methods. To verify the water collecting function of the hybrid surface, the water condensation behavior is investigated on the chilled surface in ambient temperature and high humidity. Due to the synergetic effect of drop and film wise condensation, the hybrid superhydrophobic/superhydrophilic surface shows the higher efficiency than one of single wettability surfaces. The work is underway to get the good patterns of hybrid surfaces for water collecting from the dew or fog.

나노/마이크로 패턴 PDMS를 이용한 유방암 세포의 부착에 관한 연구 (Study on the Cell Adhesion of Breast Cancer Cells using Nano/Micro Patterning PDMS)

  • 곽도훈;김우철;진희원;윤완수;박상효;기재홍
    • 대한의용생체공학회:의공학회지
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    • 제40권5호
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    • pp.165-170
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    • 2019
  • Cancer cells are different from normal cells in terms of life cycle, behavior, and growth patterns. Cancer cells can migrate freely in the body through blood vessels and lymph nodes. The cancer cells easily interact with various substrates including extracellular matrix and vessels and they can differentiate in the new environment. However, it is not well known about the adhesion preference of cancer cells on the substrate and the mechanism of their interaction. In this study, we prepared the nano-, micro-patterned substrates using E-beam lithography techniques. MCF-7 cells were tested on the substrates to find out their adhesion preference. The substrates were made by polydimethylsiloxane (PDMS) with specific patterns including pillars with a diameter of 500 nm, 700 nm, $3{\mu}m$ and $5{\mu}m$. MCF-7 cells were seeded on the substrates and incubated for 24 hours. As a result, this study clearly demonstrated that the MCF-7 cells preferred 700 nm patterning.

모세관 리소그라피를 이용한 고종횡비 나노구조 형성법 (Capillary-driven Rigiflex Lithography for Fabricating High Aspect-Ratio Polymer Nanostructures)

  • 정훈의;이성훈;김필남;서갑양
    • 한국가시화정보학회지
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    • 제5권1호
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    • pp.3-8
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    • 2007
  • We present simple methods for fabricating high aspect-ratio polymer nanostructures on a solid substrate by rigiflex lithography with tailored capillarity and adhesive force. In the first method, a thin, thermoplastic polymer film was prepared by spin coating on a substrate and the temperature was raised above the polymer's glass transition temperature ($T_g$) while in conformal contact with a poly(urethane acrylate) (PUA) mold having nano-cavities. Consequently, capillarity forces the polymer film to rise into the void space of the mold, resulting in nanostructures with an aspect ratio of ${\sim}4$. In the second method, very high aspect-ratio (>20) nanohairs were fabricated by elongating the pre-formed nanostructures upon removal of the mold with the aid of tailored capillarity and adhesive force at the mold/polymer interface. Finally, these two methods were further used to fabricate micro/nano hierarchical structures by sequential application of the molding process for mimicking nature's functional surfaces such as a lotus leaf and gecko foot hairs.

Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces

  • Kobayashi, Hayato;Moronuki, Nobuyuki;Kaneko, Arata
    • International Journal of Precision Engineering and Manufacturing
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    • 제9권1호
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    • pp.25-29
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    • 2008
  • We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

극대면적 UV-NIL 공정에서의 균일 가압 시스템 개발 (The Development of Uniform Pressurizing System for Extremely Large Area UV-NIL)

  • 최원호;신윤혁;여민구;임홍재;신동훈;장시열;정재일;이기성;임시형
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1917-1921
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    • 2008
  • Ultraviolet-nanoimprint lithography (UV-NIL) is promising technology for cost effectively defining micro/nano scale structure at room temperature and low pressure. In addition, this technology is fascinating because of it's possibility for high-throughput patterning without complex processes. However, to acquire good micro/nano patterns using this technology, there are some challenges such as uniformity and fidelity of patterns, etc. In this paper, we have focused on uniform contact mechanism and performed contact mechanics analysis. The dimension of the flexible sheet to get adequate uniform contact area has been obtained from contact mechanics simulation. Based on this analysis, we have made a uniform pressurizing device and confirmed its uniform pressurized zone using a pressure sensing paper.

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