• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.105-108
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• 2006

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.414-415
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• 2007

PMMA light guiding plate with nano pattern was fabricated by nano imprinting technology. Silicon mold was fabricated by conventional photolithography. A nickel stamper was fabricated by electroplating process using silicon mold. Nano imprinting was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM.

• Journal of the Microelectronics and Packaging Society
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• v.21 no.2
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• pp.85-89
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• 2014

We propose the new fabrication method of a 70 nm half-pitch wire grid polarizer with high performance using magnetic soft mold. The device is a form of aluminium gratings on a PET(Polyethylene phthalate) substrate whose size of $3cm{\times}3cm$ is compatible with a TFT_LCD(Tin Flat Transistor Liquid Crystal Display) panel. A magnetic soft mold with a pitch of 70 nm is fabricated using two-step replication method. As a result, we get a NWGP pattern which has 70.39 nm line width, 64.76 nm depth, 140.78 nm pitch, on substrate. The maximum and minimum transmittances of the NWGP at 800 nm are 75% and 10%, respectively. This work demonstrates a unique cost-effective solution for nanopatterning requirements in consumer electronics components.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.8
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• pp.966-974
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• 2011

The use of ion beams in the micro/nano scale is greatly increased by technology development. Especially, focused ion beams (FIBs) have a great potential to fabricate the device in sub micro scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the redeposition effect due to the sputtered atoms. In this research, we demonstrate a way which can be used to fabricate mold structures on a silicon substrate using FIBs. For the purpose of the demonstration, two essential subjects are necessary. One is that focused ion beam diameter as well as shape has to be measured and verified. The other one is that the accurate rotational symmetric model of ion-solid interaction has to be mathematically developed. We apply those two, measured beam diameter and mathematical model, to fabricate optical lenses mold on silicon. The characteristics of silicon mold fabrication will be discussed as well as simulation results.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.05a
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• pp.910-913
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• 2002

Recently, the sensor and actuator are developed with EAP(Electro Active Polymer). Common used of they is close at hand, the bio chip and Lab on a chip are researched. For developed bio and micro system, a researcher applies semiconductor fabrication or make it by his hand. But, this method takes long time and a tolerance is large So they are problem of common used. So In this paper we propose the new inject ion molder and micro mold. The micro mold is different from exist ing mold. In this paper, the fabration of micro mold is introduced to inject.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.2
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• pp.186-190
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• 2004

By this time, a mold with nano size pattern was produced using a fabrication of X-ray lithography method and in a m icro size's case it was produced using fabrication of Deep UV lithography. In this paper, we produced mold with 400 $\mu{m}$depth pattern using a new technology of SLS(Selective Laser Sintering) Rapid Prototyping method. In addition to enhance strength and thermal stability, we produced Ni structure with a thickness of 300 $\mu{m}$ on a surface of mold using electro forming method.

• Journal of Surface Science and Engineering
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• v.54 no.5
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• pp.285-293
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• 2021

High-entropy TiAlCrSiN nano-composite coating was designed to improve mold life for high temperature liquid molding. Alloy design, powder fabrication and single alloying target fabrication for the high-entropy nano-composite coating were carried out. Using the single alloying target, an arc ion plating method was applied to prepare a TiAlCrSiN nano-composite coating had a 30 nm TiAlCrSiN layers are deposited layer by layer, and form about 4 ㎛-thickness of multi-layered coating. TiAlCrSiN nano-composite coating had a high hardness of about 39.9 GPa and a low coefficient of friction of less than about 0.47 in a dry environment. In addition, there was no change in the structure of the coating after the dissolution loss test in the molten metal at a temperature of about 1100 degrees.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.471-472
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• 2006

High aspect ratio of nano hairs on a plastic substrate is molded using thermoplstic materials including COC, PP, PC and PMMA. As a template for molding nano hairs, AAO membrane is adopted, which is 60um thick and 13mm in diameter. This membrane has about 109 of through-holes of which diameter is around 200nm. This AAO membrane and the pellet of materials are stacked in the mold and pressed to mold after heating up to be melted. The AAO membrane is removed using KOH to obtain the molded nano hairs. As a result, the diameter of the molded hairs is around 200nm and the length is $2um{\sim}60um$ depending on the molding conditions and materials.

• Journal of the Korean Society of Visualization
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• v.5 no.1
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• pp.3-8
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• 2007

We present simple methods for fabricating high aspect-ratio polymer nanostructures on a solid substrate by rigiflex lithography with tailored capillarity and adhesive force. In the first method, a thin, thermoplastic polymer film was prepared by spin coating on a substrate and the temperature was raised above the polymer's glass transition temperature ($T_g$) while in conformal contact with a poly(urethane acrylate) (PUA) mold having nano-cavities. Consequently, capillarity forces the polymer film to rise into the void space of the mold, resulting in nanostructures with an aspect ratio of ${\sim}4$. In the second method, very high aspect-ratio (>20) nanohairs were fabricated by elongating the pre-formed nanostructures upon removal of the mold with the aid of tailored capillarity and adhesive force at the mold/polymer interface. Finally, these two methods were further used to fabricate micro/nano hierarchical structures by sequential application of the molding process for mimicking nature's functional surfaces such as a lotus leaf and gecko foot hairs.

• Design & Manufacturing
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• v.2 no.4
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• pp.48-53
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• 2008

We injection molded a thin type of plate and wedge type of plate with micro prizm patterns on its surface and investigated the fidelity of replication of the micro pattern depending on the process parameter such as mold temperature, melt temperature, injection rate or packing pressure. The size of the $90^{\circ}$ prizm pattern is $50{\mu}m$ and the size of the plate is about $335mm{\times}213mm$ and $400mm{\times}400mm$. The thicknesses are 2.6mm and 0.7mm at each edge of the wedge type of plate and 1mm at each edge of the thin type of plate. The fidelity of the replication turned out quite different according to the process parameters and location of the patterns on the plate. We measured the cavity pressure and temperature in real-time during the molding to analyze the effect of the local melt pressure and temperature on the micro pattern replication.