• 제목/요약/키워드: Nano master

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A Study on the Fabrication of Nano Pattern using a Nickel Stamper Replicated from Anodic Aluminum Oxide (Anodic Aluminum Oxide 기반 니켈 스탬퍼를 이용한 나노패턴 성형에 관한 연구)

  • Kim, S.;Kim, J.S.;Hong, S.K.;Kim, H.J.;Yoon, K.H.;Kang, J.J.
    • Transactions of Materials Processing
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    • v.20 no.1
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    • pp.23-28
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    • 2011
  • For the fabrication of nano patterned products manufacturing a nano patterned mold is needed in advance. The nano patterned stamper was fabricated by electroforming the AAO master with nickel. The surface of nickel-plated stamper had nano-patterned holes with the diameter of 73 nm and the depth of 83 nm. Hot embossing was used for forming P3HT sheet and the process factors of hot embossing were closer as pressure, temperature and time. In the present paper hot embossing experiments were performed to find the main process conditions to affect the replication ratio of nano patterns on surface of P3HT sheet. As a result, main contributing factors for the replication ratio of hot embossed pattern could be sequentially enumerated as pressure, temperature and time.

Nano Molding Technology for Optical Storage Media with Large-area Nano-pattern (대면적 광 정보저장매체의 나노성형에 대한 기술 개발)

  • Shin Hong-Gue;Ban Jun-Ho;Cho Ki-Chul;Kim Heon-Yong;Kim Byeong-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.4 s.181
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    • pp.162-167
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    • 2006
  • Hot embossing lithography(HEL) has the production advantage of comparatively few process step, simple operation, a relatively low cost for embossing tools(Si), and high replication accuracy for small features. In this paper, we considered the nano-molding characteristic according to molding parameters(temperature, pressure, times, etc) and induced a optimal molding condition using HEL. High precision nano-patter master with various shapes were designed and manufactured using the DRIE(Deep Reactive ion Etching), LPCVD(Low Pressure Chemical Vapor Deposition) and thermal oxidation process, and we investigated the molding characteristic of DVD and Blu-ray nickel stamp. We induced flow behaviors of polymer, rheology by shapes and sizes of the pattern through various molding experiments. Finally, with achieving nano-structure molding with high aspect ratio, we will secure a basic technology about the molding of large-area nano-pattern media.

Realization of Visual Servoing Loop for Position Control of a Nano Manipulator (나노조작기의 수평측 위치제어를 위한 Visual Servoing Loop 구성)

  • Choi, Jin-Ho;Park, Byong-Chon;Ahn, Sang-Jung;Kim, Dal-Hyun;Lyou, Joon
    • Proceedings of the KIEE Conference
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    • 2007.10a
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    • pp.251-252
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    • 2007
  • Nano manipulator is used to manufacture Carbon NanoTube(CNT) tips. Using nano manipulator operator attaches a CNT at the end of Atomic Force Microscopy(AFM) tip, which requires a master mechanic and long manufacture time. Nano manipulator is installed inside Scanning Electron Microscopy (SEM) chamber to observe the operation. This paper presents a control of horizontal axis of nano manipulator via processing SEM image. Edges of AFM tip and CNT are first detected, the position information so obtained is fed to control horizontal axis of nano manipulator. To be specific, visual servoing loop was realized to control the axis more precisely.

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Fabrication of nano pattern using the injection molding (사출성형을 이용한 미세 패턴 성형)

  • Lee, Kwan-Hee;Yoo, Yeong-Eun;Kim, Sun-Kyoung;Kim, Tae-Hoon;Je, Tae-Jin;Choi, Doo-Sun
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.1532-1536
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    • 2007
  • A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

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Fabrication of nano-structured PMMA substrates for the improvement of the optical transmittance (반구형 나노 패턴의 크기에 따른 PMMA기판의 광특성 평가)

  • Park, Y.M.;Shin, H.G.;Kim, B.H.;Seo, Y.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.10a
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    • pp.217-220
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    • 2009
  • This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

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Fabrication of a 17inch Area Size Nano-Wire Grid using Roll-to-Roll UV Nano-Imprinting Lithography (Roll-to-Roll UV 나노 임프린팅 리소그래피에 의한 대면적 17인치의 나노 와이어 그리드의 제작)

  • Huh, Jong-Wook;Nam, Su-Yong
    • Journal of the Korean Graphic Arts Communication Society
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    • v.29 no.3
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    • pp.17-30
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    • 2011
  • The polarizer is an important optical element used in a variety of applications. Nano-wire grid polarizers in the form of sub-wavelength metallic gratings are an attractive alternative to conventional polarizers, because they provide high extinction ratio. This study has been carried out to fabrication of the 17inch area size nano-wire grid polarizer(NWGP) The master for NWGPs with a pitch of 200nm and the area size $730mm{\times}450mm$ were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the Roll to-Roll UV imprinting and was applied to flexible PET film. The results were a transmission of light (Tp) 46.7%, reflectance (Rs) 40.1% and Extinction ratio of above 16 for the visible light range.

TP53I11 suppresses epithelial-mesenchymal transition and metastasis of breast cancer cells

  • Xiao, Tongqian;Xu, Zhongjuan;Zhang, Hai;Geng, Junsa;Qiao, Yong;Liang, Yu;Yu, Yanzhen;Dong, Qun;Suo, Guangli
    • BMB Reports
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    • v.52 no.6
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    • pp.379-384
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    • 2019
  • Epithelial-mesenchymal transition (EMT) is widely-considered to be a modulating factor of anoikis and cancer metastasis. We found that, in MDA-MB-231 cells, TP53I11 (tumor protein P53 inducible protein 11) suppressed EMT and migration in vitro, and inhibited metastasis in vivo. Our findings showed that hypoxic treatment upregulated the expression of $HIF1{\alpha}$, but reduced TP53I11 protein levels and TP53I11 overexpression reduced $HIF1{\alpha}$ expression under normal culture and hypoxicconditions, and in xenografts of MDA-MB-231 cells. Considering $HIF1{\alpha}$ is a master regulator of the hypoxic response and that hypoxia is a crucial trigger of cancer metastasis, our study suggests that TP53I11 may suppress EMT and metastasis by reducing $HIF1{\alpha}$ protein levels in breast cancer cells.

Sub 150nm Soft-Lithography using the monomer based thermally curable resin (Monomer based thermally curable resin을 이용한 150nm 급 Soft-Lithography)

  • Yang K.Y.;Hong S.H.;Lee H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.676-679
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    • 2005
  • Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

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Injection Molding of Hydrophobic Plastic Plates (사출 성형에 의한 소수성 플라스틱 기판 제작)

  • Yoo, Y.E.;Lee, K.H.;Yoon, J.S.;Choi, D.S.;Kim, S.K.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1563-1565
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    • 2008
  • Hydrophobic plastic plates employing nano surface features are injection molded using thermoplastic materials. A variotherm molding process is devised for filling the nano pores and releasing the molded nano features from the master. The size of the molded nano surface features are about 100nm in diameter and 200nm in height. The size of the molded plate is about 30mm x 30mm and the thickness is 1mm. As molding materials, Polypropylene, PMMA, COC and PC are employed, which are all typical commodity thermoplastic materials. The mold temperature(stamper temperature) is investigated as a major processing parameter for molding high aspect ratio nano surface features. Almost fully molded nano features are fabricated above a certain level of mold temperature depends on the employing material. The contact angles on the injection molded plates are measured to estimate the hydrophobicity and found to have higher contact angle up to 180% compared to the blank plate with no surface features.

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Fabrication of Metallic Nano-Filter Using UV-Imprinting Process (UV 임프린팅 공정을 이용한 금속막 필터제작)

  • Noh Cheol Yong;Lee Namseok;Lim Jiseok;Kim Seok-min;Kang Shinill
    • Transactions of Materials Processing
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    • v.14 no.5 s.77
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    • pp.473-476
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    • 2005
  • The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.