• 마이크로전자및패키징학회지
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• 제22권1호
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• pp.63-67
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• 2015

본 연구에서는 대면적 나노 금속 격자형 편광 필름 제작에서 증착 두께에 따른 광 특성 연구를 수행하였다. 나노 금속 격자형 편광필름은 PET(Polyethylene phthalate)기판 위에 알루미늄 선 격자 구조로 구성된다. 본 연구에서는 대면적 편광필름 제작을 위한 증착공정을 통한 금속 격자 형성을 목표로 하였으며, 금속 격자형 편광 필름 제작에 있어 최적의 투과율과 소광비를 가지는 금속 박막 형성 조건을 도출하였다. 최적화 공정에 의해 나노 금속 격자형 편광필름은 140 nm 주기, 70 nm 선폭, 70 nm의 금속층 높이를 가지는 금속 격자 구조로 제작 되었다. 분석결과 600 nm 파장에서 80% 이상의 최고 투과율 및 $10^6$ 이상의 소광비를 가지는 나노 금속 격자 편광필름의 높은 광 특성을 확인하였다.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 추계학술대회논문집
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• pp.333-338
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• 2003

Nano-imprint lithography(NIL) is a polymer embossing technique, capable of transferring nano-scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate(PMMA) using this parallel process. Feature size down 10 nm have been demonstrated. In NIL, the pattern is formed by displacing polymer material, which can be squeeze flow of a viscous liquid. Due to the size of the pattern, a thorough understood of the process through experiments may be very different. Therefore we nead to resort to numerical simulation on the embossing process. Generally, there are two ways of numerical simulation on nano-scale flow, namely top-down and bottom-up approach. Top-down approach is a way to simulate the flow assuming that polymer is a continuum. On the contrary, in the bottom-up approach, simulation is peformed using molecular dynamics(MD). However, as latter method is not feasible yet. we chose the top-down approach. For the numerical analysis, two dimensional moving grid was used since the moving grid can predict the flow front. Effects of surface tension as well as the slip at the boundary were also considered.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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• pp.104.2-104.2
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• 2011

세계적으로 환경오염이 심각해짐에 따라 친환경적으로 에너지를 생산하는 기술이 주목받고 있다. 그 중에서도 태양광을 이용하여 전력을 생산하는 태양광 태양전지의 경우 원리가 간단하고 에너지원의 수급이 용이하다는 장점으로 인하여 많은 연구가 진행되고 있다. 그러나 태양광 태양전지의 경우, 태양전지 기판에서의 반사로 인하여 발전 효율이 낮아는 문제점이 있다. 이를 해결하기 위해 텍스처링 공정을 통해 태양전지 기판에서의 반사를 줄이고 태양전지의 효율을 증가시키는 방법이 이용되고 있다. 본 연구에서는 나노 돌기를 가진 저반사 패턴을 이용하여 태양전지용 실리콘 기판을 제작함으로써, 태양전지 기판에서의 반사를 줄이고자 하였다. 나노 돌기를 가진 저반사 패턴이 형성 된 태양전지용 실리콘 기판을 제작하기 위해 ICP 장비를 이용한 $Cl_2$ 플라즈마 식각공정을 진행하였다. 먼저 Au agglomeration 기술을 이용하여 Au nano particle을 실리콘 기판 위에 형성 후, 이를 식각 마스크로 이용하여 ICP 식각을 진행하였다. 이어서 나노 돌기가 형성 된 실리콘 기판 위에 $Cl_2$ 플라즈마에 내식각성이 우수한 레지스트를 이용하여, 나노 임프린트 리소그래피 기술을 통해 저반사 패턴을 형성하였다. 이 방법으로 형성 된 저반사 패턴을 식각 마스크로 사용하여 앞의 공정과 동일한 조건으로 실리콘 기판을 식각하였다. 최종적으로 agglomerated Au particle과 $Cl_2$ 플라즈마에 내식각성이 우수한 레지스트를 이용하여 나노 돌기를 가진 저반사 패턴이 형성된 실리콘 기판을 제작하였다.

• 한국기계가공학회지
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• 제17권5호
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• pp.8-15
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• 2018

Films with special properties (e.g., water-repellent films, optical films, anti-reflection films, and flexible films) are referred to as functional films. Recently, there has been interest in fine patterning methods for film fabrication. In particular there have been many studies that use a UV nanoimprint process involving a UV curing method. In this paper, a polymer film was fabricated by the UV nanoimprint process with a micro-pattern, and its durability was evaluated by a wear test and a nano-indentation test. The film mechanical properties (such as coefficient of friction, hardness, and modulus of elasticity) were measured. Moreover, the choice of PUA type resin used in the UV nanoimprint process was confirmed to impact the durability of the thin film. Despite making the polymer film samples using the same method and PUA type resin, different coefficient of friction, hardness, and modulus of elasticity values were obtained. PUA 4 resin had the most favorable coefficient of friction, hardness, and modulus of elasticity. This material is predicted to produce a high durability functional film.

• 소성∙가공
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• 제28권5호
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• pp.239-246
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• 2019

Various surface texturing techniques have been studied because of the effective applicability of micro or nano scale surface patterns. Particularly, the most promising types of patterns include the hierarchical patterns, which consists of micro/nano structures. Different processes such as MEMS, laser machining, micro cutting and micro grinding have been applied in the production of hierarchical patterns on various material surfaces. This study demonstrates the process of hot imprinting to induce the hierarchical patterns on the Al alloy surfaces. Wire electrical discharge machining (WEDM) process was used to imprint molds with micro scale sinusoidal pattern. In addition, the sinusoidal pattern with rough surface morphology was obtained as a result of the discharge craters. Consequently, the hierarchical patterns consisting of the sinusoidal pattern and the discharge craters were prepared on the imprinting mold surface. Hot imprinting process for the Al plates was conducted on the prepared mold, and the replication performance was analyzed. As a result, it was confirmed that the hierarchical patterns of the mold were effectively duplicated on the surface of Al plate.

• 한국소음진동공학회논문집
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• 제19권8호
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• pp.838-842
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• 2009

Vibrational analysis is presented for a visual alignment system of nano-imprint process in this study. For a nano-imprinting equipment, the visual alignment system is one of the essential parts in order to align the mold into the target panel. For the precision alignment, the vibration from inside and outside of the vision system should be avoided, and the elimination of the vibration should be considered in the design process of the visual alignment design. In this work, vibrational characteristics for the vision system frame is analyzed and topology optimization of a frame section area is carried out. With the results of the analysis, a new frame design are suggested. Design consideration for constructing a visual alignment system in view of optimal design is also discussed.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.1119-1122
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• 2004

In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 － 70 nm features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2007년도 춘계학술대회논문집
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• pp.677-682
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• 2007

Recently, a precision stage is widely used in the fields of the nano technology. In this paper, the precision stage which consists of linear motor, vision system, light source system and controller, is designed and developed for nano imprint machine. Stiffness design considering resonance frequency is important for the precision stage. A virtual machine simulation is useful for machine development the early design stage. Kinematic and dynamic simulations of XYZ stage are performed. To consider the resonance frequency and vibration effects flexible multibody dynamics are utilized with FE modeling of the structural components.

• 한국생산제조학회지
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• 제18권3호
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• pp.307-314
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• 2009

Large area micro pattern replication has promising application potential in many areas. Rolling imprint process has been demonstrated as one of the most competitive processes for such micro pattern replication, because it has advantages in low cost, high throughput and high efficiency. In this paper, we developed a prototype of roll-to-flat(R2F) thermal imprint system for large area micro pattern replication process, which is one of the key processes in the fabrication of flexible displays. Experimental tests were conducted to evaluate the feasibility of system and the parameters' effect on the process, such as flat mold temperature, loading pressure and rolling speed. 100mm $\times$ 100mm stainless steel flat mold and commercially available polycarbonate sheets were used for the tests. The experimental results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern over large area.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1939-1943
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• 2008

Deformation of a mold is measured and analyzed in alignment and curing processes of UV-Imprint Lithography. We are focused on mold deformation caused by a UV resin, which is laminated between a mold and a target glass-panel. The UV resin is viscous in case of liquid state, and the resin will be solidified when being exposed by the ultra-violet light. The viscosity of the resin causes shear force on the mold during the alignment process. Moreover, the shrinkage during phase change from liquid to solid may cause residual stress on the mold. The experiments for measuring temperature and strain are made during alignment and curing process. Strain-gages and thermocouples are used for measuring the strain and variation of temperature on several points of the mold, respectively. The deformation of mold is also simulated and analyzed. The simulation results are compared with the experiments. Finally, sources of alignment errors in large area UV-nanoimprint lithography are discussed.