• Journal of Institute of Control, Robotics and Systems
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• v.14 no.4
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• pp.332-335
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• 2008

PMMA light guiding plate with nano pattern was fabricated by nano imprint lithography method. A silicon mold for electroplating of nickel was fabricated by conventional photolithography process. A nickel stamp for nano imprint lithography was fabricated by electroplating process using silicon mold. The nano imprint lithography was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM. It is shown that the patterns were well transferred for several steps and the nano imprint lithography method could be applied for fabricating patterns of light guiding plate.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1489-1492
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• 2005

Compared to other nano-patterning techniques, Nano imprint Lithography (NIL) has some advantages of high throughput and low process cost. To imprint low temperature and pressure, UV Nano imprint Lithography, which using the monomer based UV curable resin is suggested. Because fabrication of high fidelity pattern on topographical substrate is difficult, bi-layer Nano imprint lithography, which are consist of easily removable under-layer and imprinted pattern, is being used. If residual layer is not remained after imprinting, and under-layer is removed by oxygen RIE etching, we might be able to fabricate the bi-layer pattern for easy lift-off process.

• Journal of Institute of Control, Robotics and Systems
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• v.14 no.5
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• pp.420-425
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• 2008

PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

• Proceedings of the Materials Research Society of Korea Conference
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• 2008.11a
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• pp.18.1-18.1
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• 2008

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.1921-1926
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• 2003

Nano-imprint technology has been vigorously studied by many researchers for it is one of the most promising technologies for manufacturing the pattern with its critical dimension below 100nm. In the nano-imprint technology, nano patterns are transferred on a polymer film and the transferred patterns are used as an etch mask to define the designed patterns on a substrate or a metal layer. To this end, it is important to keep the residual thickness of the imprinted polymer film uniform. In this study, a novel measurement technique to measure the residual thickness of films is proposed based on nanoindentation theory. This technique has advantages of saving time and measuring the residual thickness of highly-localized portions in comparison with other techniques, but has limitation of requiring calibration process.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.6
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• pp.7-13
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.430.2-430.2
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• 2014

Previous studies to enhance optical properties of opto-electronic devices involve patterning of inorganic materials. Patterning of inorganic material usually encompasses vacuum process that hinders productivity and increases cost. In this research, we successfully formed nano patterns with polymer matrix and fabricated photonic crystals. This process is anticipated to increase the performance of opto-electronic devices without any vacuum process. Moreover, nano imprint technology reduces cost and bolsters productivity.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.297-298
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• 2010

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.895-896
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• 2009

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.05a
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• pp.39.1-39.1
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• 2006