• Title/Summary/Keyword: Nano diffraction grating

Search Result 9, Processing Time 0.018 seconds

Fabrication of a Polymeric Planar Nano-diffraction Grating with Nonuniform Pitch for an Integrated Spectrometer Module (집적화된 분광모듈 구현을 위한 고분자 기반의 비등간격 평면나노회절격자 제작)

  • Kim, Hwan-Gi;Oh, Seung-Hun;Choi, Hyun-Yong;Park, Jun-Heon;Lee, Hyun-Yong
    • Korean Journal of Optics and Photonics
    • /
    • v.28 no.2
    • /
    • pp.53-58
    • /
    • 2017
  • This paper presents the design and fabrication of a planar nano-diffraction grating for an integrated miniature spectrometer module. The proposed planar nano-diffraction grating consists of nonuniform periods, to focus the reflected beams from the grating's surface, and an asymmetrical V-shaped groove profile, to provide uniform diffraction efficiency in the wavelength range from 400 to 650 nm. Also, to fabricate the nano-diffraction grating using low-cost UV-NIL technology, we analyzed the FT-IR spectrum of a uvcurable resin and optimized the conditions for the UV curing process. Then, we precisely fabricated the polymeric nano-diffraction grating within 5 nm in dimensional accuracy. The integrated spectrometer module using the fabricated polymeric planar nano-diffraction grating provides spectral resolution of 5 nm and spectral bandwidth of 250 nm. Our integrated spectrometer module using a polymeric planar nano-diffraction grating serves as a quick and easy solution for many spectrometric applications.

Fabrication of Monolithic Spectrometer Module Based on Planar Optical Waveguide Platform using UV Imprint Lithography (UV 임프린트 공정을 이용한 평판형 광도파로 기반의 집적형 분광 모듈 제작)

  • Oh, Seung hun;Jeong, Myung yung;Kim, Hwan gi;Choi, Hyun young
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.22 no.3
    • /
    • pp.73-77
    • /
    • 2015
  • This paper presents integrated polymeric spectrometer module which offers compact size, easily-fabricated structure and low cost. The proposed spectrometer module includes the nano diffraction grating with non-uniform pitch and planar optical waveguide with concave mirror to be fabricated by UV imprint lithography. To increase the reflection efficiency, we designed the nano diffraction grating with triangular profiles. The polymeric planar spectrometer includes a spectral bandwidth of 700 nm, resolution of 10 nm and precision below 5 nm. This polymeric planar spectrometer is well-suited for sensor system.

Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis (광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석)

  • Kim Jong-Ahn;Kim Jae-Wan;Park Byong-Chon;Kang Chu-Shik;Eom Tae-Bong
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.23 no.8 s.185
    • /
    • pp.72-79
    • /
    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

Optical diffraction gratings embedded in BK-7 glasses by tightly focused femtosecond laser

  • Yoon, Ji Wook;Choi, Won Suk;Kim, Hoon Young;Cho, Sung-Hak
    • Laser Solutions
    • /
    • v.17 no.2
    • /
    • pp.19-25
    • /
    • 2014
  • Optical embedded diffraction gratings with the bulk modification in BK-7 glass plates excited by tightly focused high-intensity femtosecond (130fs) Ti: sapphire laser (peak wavelength = 790nm) were demonstrated. The structural modifications with diameters ranging from 400nm to $4{\mu}m$ were photo-induced after plasma formation occurred upon irradiation with peak intensities of more than $1{\times}1013W/cm^2$. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred. The maximum refractive index change was estimated to be $1.5{\times}10^{-2}$. The two optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.

  • PDF

Polarization Selective Blazed Grating Employing Metal-slit Arrays (금속 슬릿 배열로 구성된 편광 선택 가능한 블레이즈드 회절 격자)

  • Jung, Young Jin
    • Korean Journal of Optics and Photonics
    • /
    • v.24 no.2
    • /
    • pp.53-57
    • /
    • 2013
  • A polarization selective blazed grating employing metal-slit arrays was proposed. Nano-scale metal-slits were applied to the micro-scale blazed grating to give the functionality of polarization selection. Case study was carried out for the proposed structure utilizing numerical FDTD (Finite Difference Time Domain method) simulation. Diffraction efficiency of 77.61% and polarization extinction ratio of 8.99 was achieved with arbitrary parameters and diffraction efficiency of 64.22% and polarization extinction ratio of 81.09 was achieved with other parameters to enhance extinction ratio.

Effect of Nano-sized Silicas in HPDLC Based on PUA

  • Kim, Eun-Hee;Woo, Ju-Yeon;Kim, Byung-Kyu
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2004.08a
    • /
    • pp.1212-1215
    • /
    • 2004
  • Diffraction modes of holographic grating were fabricated with polyurethane acrylates(PUA). Two types of silica (AEROSIL 200 and AEROSIL R812) were added to reduce the shrinkage of polymer matrix. It was founded that shrinkage of PUA composite film was reduced with the addition of silica. HPDLC based PUA/silica composite also showed high diffraction efficiency. The morphology of the resultant gratings was analyzed by using scanning electron microscopy(SEM) and Tg of the polymer matrix by dynamic mechanical thermal analysis(DMTA).

  • PDF

Broadband Phase-change Metagrating Design for Efficient Active Reflection Steering

  • Kim, Sun-Je
    • Current Optics and Photonics
    • /
    • v.5 no.2
    • /
    • pp.134-140
    • /
    • 2021
  • In this paper, I introduce a novel design method of a high performance nanophotonic beam deflector providing broadband operation, large active tunability, and signal efficiency, simultaneously. By combining thermo-optically tunable vanadium dioxide nano-ridges and a metallic mirror, reconfigurable local optical phase of reflected diffraction beams can be engineered in a desired manner over broad bandwidth. The active metagrating deflectors are systematically designed for tunable deflection of reflection beams according to the thermal phase-change of vanadium dioxide nano-ridges. Moreover, by multiplexing the phase-change supercells, a robust design of actively tunable beam splitter is also verified numerically. It is expected that the proposed intuitive and simple design method would contribute to development of next-generation optical interconnects and spatial light modulators with high performances. The author also envisions that this study would be fruitful for modern holographic displays and three-dimensional depth sensing technologies.

An Intelligent Nano-positioning Control System Driven by an Ultrasonic Motor

  • Fan, Kuang-Chao;Lai, Zi-Fa
    • International Journal of Precision Engineering and Manufacturing
    • /
    • v.9 no.3
    • /
    • pp.40-45
    • /
    • 2008
  • This paper presents a linear positioning system and its control algorithm design with nano accuracy/resolution. The basic linear stage structure is driven by an ultrasonic motor and its displacement feedback is detected by a LDGI (Laser Diffraction Grating Interferometer), which can achieve nanometer resolution. Due to the friction driving property of the ultrasonic motor, the driving situation differs in various ranges along the travel. Experiments have been carried out in order to observe and realize the phenomena of the three main driving modes: AC mode (for mm motion), Gate mode (for ${\mu}m$ motion), and DC mode (for nm motion). A proposed FCMAC (Fuzzy Cerebella Model Articulation Controller) control algorithm is implemented for manipulating and predicting the velocity variation during the motion of each mode respectively. The PCbased integral positioning system is built up with a NI DAQ Device by a BCB (Borland $C^{++}$ Builder) program to accomplish the purpose of an intelligent nanopositioning control.

Frequency Swept Laser at 1300 nm Using a Wavelength Scanning Filter Based on a Rotating Slit Disk

  • Jeon, Man-Sik;Jung, Un-Sang;Song, Jae-Won;Kim, Jee-Hyun;Oh, Jung-Hwan;Eom, Jin-Seob;Kim, Chang-Seok;Park, Young-Ho
    • Journal of the Optical Society of Korea
    • /
    • v.13 no.3
    • /
    • pp.330-334
    • /
    • 2009
  • A simple and compact frequency swept laser is demonstrated at $1.3{\mu}m$ using a wavelength scanning filter based on a rotating slit disk. The laser is comprised of a pigtailed semiconductor optical amplifier, a circulator, and a wavelength scanning filter in an extended cavity configuration. The wavelength scanning filter is composed of a collimator, a diffraction grating, a rotating slit disk, and a mirror. The instantaneous laser output power is more than 5 mW. The scanning range of the laser is extended to 80 nm at the maximum level, and 55 nm in the full width at half maximum at a scanning rate of 2 kHz.