• 제목/요약/키워드: Nano Pattern

검색결과 478건 처리시간 0.031초

Anodic Aluminum Oxide 기반 니켈 스탬퍼를 이용한 나노패턴 성형에 관한 연구 (A Study on the Fabrication of Nano Pattern using a Nickel Stamper Replicated from Anodic Aluminum Oxide)

  • 김신;김종선;홍석관;김현종;윤경환;강정진
    • 소성∙가공
    • /
    • 제20권1호
    • /
    • pp.23-28
    • /
    • 2011
  • For the fabrication of nano patterned products manufacturing a nano patterned mold is needed in advance. The nano patterned stamper was fabricated by electroforming the AAO master with nickel. The surface of nickel-plated stamper had nano-patterned holes with the diameter of 73 nm and the depth of 83 nm. Hot embossing was used for forming P3HT sheet and the process factors of hot embossing were closer as pressure, temperature and time. In the present paper hot embossing experiments were performed to find the main process conditions to affect the replication ratio of nano patterns on surface of P3HT sheet. As a result, main contributing factors for the replication ratio of hot embossed pattern could be sequentially enumerated as pressure, temperature and time.

사출성형시 미세패턴 전사성 차이에 관한 연구 (A study on the micro pattern replication difference in injection molding)

  • 김태훈;유영은;제태진;박영우;노승환;최두선
    • Design & Manufacturing
    • /
    • 제2권4호
    • /
    • pp.48-53
    • /
    • 2008
  • We injection molded a thin type of plate and wedge type of plate with micro prizm patterns on its surface and investigated the fidelity of replication of the micro pattern depending on the process parameter such as mold temperature, melt temperature, injection rate or packing pressure. The size of the $90^{\circ}$ prizm pattern is $50{\mu}m$ and the size of the plate is about $335mm{\times}213mm$ and $400mm{\times}400mm$. The thicknesses are 2.6mm and 0.7mm at each edge of the wedge type of plate and 1mm at each edge of the thin type of plate. The fidelity of the replication turned out quite different according to the process parameters and location of the patterns on the plate. We measured the cavity pressure and temperature in real-time during the molding to analyze the effect of the local melt pressure and temperature on the micro pattern replication.

  • PDF

누름가공과 AAO 공정을 이용한 나노-마이크로 복합패턴 제작방법 연구 (A Study on Manufacturing Method of Nano-Micro Hybrid Pattern Using Indentation Machining Method and AAO Process)

  • 김한희;전은채;최대희;장웅기;박용민;제태진;최두선;김병희;서영호
    • 한국정밀공학회지
    • /
    • 제32권1호
    • /
    • pp.63-68
    • /
    • 2015
  • Micro/nano patterns for optical concentration and diffusion have been studied in the various fields such as displays, optics, and sensors. Conventional micro patterns were continuous and linear shapes due to using linear-type light sources, however, recently non-continuous patterns have been applied as point sources are used for dot-type light sources such as LEDs and OLEDs. In this study, a hybrid machining technology combining an indentation machining method and an AAO process was developed for manufacturing the non-continuous micro patterns having nano patterns. First, mirror-like surfaces ($R_a<20nm$) of pure Aluminum substrates were obtained by optimizing cutting conditions. Then, The letter of 'K' consisting of the arrays of the micro patterns was manufactured by the indentation machining method which has a similar principle to indentation hardness testing. Finally, nano patterns were machined by AAO process on the micro patterns. Conclusively, a specific letter having nano-micro hybrid patterns was manufactured in this study.

AAO를 이용한 나노 마스터 제작에 관한 연구 (Study on Fabrication of Highly Ordered Nano Master by Using Anodic Aluminum Oxidation)

  • 권종태;신홍규;서영호;김병희
    • 한국소성가공학회:학술대회논문집
    • /
    • 한국소성가공학회 2007년도 추계학술대회 논문집
    • /
    • pp.162-165
    • /
    • 2007
  • AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. In order to replicate nano patterned master, the resulting good filled uniform nano molded structure through electro-forming process shows the validity of the fabricated nano pattern masters.

  • PDF

Nano Patterning of Highly Ordered Pyrolysis Graphite by Ion Beam Sputtering

  • 윤선미;김재성
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
    • /
    • pp.385-385
    • /
    • 2011
  • Ion beam Sputtering (IBS)를 이용한 물질 표면의 pattern 형성은 물리적 변수 조절로 손쉽게 nano structure의 크기와 형태를 조절할 수 있어 관심을 받고 있다. 본 연구발표에서는 massless Dirac Fermion behavior로 인한 highly carrier mobility와 같은 특성으로 인해 차세대 device material로 각광받고 있는 Graphene의 layered compound (층상구조) 형태인 HOPG (Highly Ordered Pyrolysis Graphite)에 IBS (Ion beam Sputtering)를 이용해 nano structure가 형성 가능함을 보이고 그 특징에 대해 소개하려 한다. HOPG(0001)를 Sputter 했을 때, 표면에 잘 정렬된 nano ripple pattern이 형성 가능함을 확인하였으며 sputter하는 시간을 변화하면 약 10 nm에서 80 nm까지 wavelength를 조절할 수 있다. 또한 이전의 IBS를 이용한 연구들에서 확인할 수 있는 다른 물질의 곧게 뻗은 nano ripple과는 다르게 ripple의 끝에 nano swab이 생기는 것을 AFM (Atomic Force Microscope)으로 확인할 수 있었다. 이러한 Graphite에서만 나타나는 Sputter에 의한 표면의 변화의 원인을 규명하고자 Sputter가 지속됨에 따라 나타나는 mopology의 roughness와 wavelength의 시간에 따른 dynamic scaling behavior를 확인하였고 그 얼개를 알기 위해 simulation을 수행 하였다.

  • PDF

SC1 세척공정을 이용한 고품질 Poly(3,4-ethylenedioxythiophene) 전극 패턴 어레이의 개발 (Development of High-Quality Poly(3,4-ethylenedioxythiophene) Electrode Pattern Array Using SC1 Cleaning Process)

  • 최상일;김원대;김성수
    • 통합자연과학논문집
    • /
    • 제4권4호
    • /
    • pp.311-314
    • /
    • 2011
  • Application of self-assembled monolayers (SAMs) to the fabrication of organic thin film transistor has been recently reported very often since it can help to provide ohmic contact between films as well as to form simple and effective electrode pattern. Accordingly, quality of these ultra-thin films is becoming more imperative. In this study, in order to manufacture a high quality SAM pattern, a hydrophobic alkylsilane monolayer and a hydrophilic aminosilane monolayer were selectively coated on $SiO_2$ surface through the consecutive procedures of a micro-contact printing (${\mu}CP$) and dip-coating methods under extremely dry condition. On a SAM pattern cleaned with SC1 solution immediately after ${\mu}CP$, poly(3,4-ethylenedioxythiophene) (PEDOT) source and drain electrode array were very selectively and nicely vapour phase polymerized. On the other side, on a SC1-untreated SAM pattern, PEDOT array was very poorly polymerized. It strongly suggests that the SC1 cleaning process effectively removes unwanted contaminants on SAM pattern, thereby resulting in very selective growth of PEDOT electrode pattern.

나노패턴 세정을 위한 소형 메가소닉 모듈 개발 (Development of a Small-type Megasonic Module for Nano-scale Pattern Cleaning)

  • 김현세;이양래;임의수
    • 대한기계학회:학술대회논문집
    • /
    • 대한기계학회 2008년도 추계학술대회A
    • /
    • pp.1810-1814
    • /
    • 2008
  • A small L-type megasonic module for nano-pattern cleaning was designed and manufactured. The impedance graph of the quartz waveguide with a piezoelectric actuator was predicted using finite element method (FEM). The peak value of the piezoelectric actuator alone was 3.373 MHz, which was the same as the experimentally measured value of 3.373 MHz (0.0% error). In addition, the maximum impedance value of the quartz waveguide with the actuator was 3.373 MHz, which agreed well with the measured value of 3.362 MHz (0.3% error). The acoustic pressures of a conventional megasonic system (3 MHz) and the developed system under similar conditions were measured and compared. The results showed that the maximum values and standard deviations of the developed system decreased by 29% and 18%, respectively, compared with the conventional type. This suggests that the small L-type would have higher particle removal efficiency with lower possibilities of pattern damages.

  • PDF

나노스크래치 공정을 이용하여 극미세 패턴을 제작하기 위한 나노 변형의 유한요소해석 (Finite Element Analysis of Nano Deformation for Hyper-fine Pattern Fabrication by Application of Nano-scratch Process)

  • 이정우;강충길;윤성원
    • 한국정밀공학회지
    • /
    • 제21권3호
    • /
    • pp.139-146
    • /
    • 2004
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation scratch test was studied with numerical method by ABAQUS S/W. Brittle materials (Si, Pyrex glass 7740) were used as specimens, and forming conditions to reduce the elastic recovery and pile-up were proposed. The indenter was modeled as a rigid surface. Minimum mesh sizes of specimens are 1-l0nm. Variables of the nanoindentation scratch test analysis are scratching speed, scratching load, tip radius and tip geometry. The nano-indentation scratch tests were performed by using the Berkovich pyramidal diamond indenter. Comparison between the experimental data and numerical result demonstrated that the FEM approach can be a good model of the nanoindentation scratch test. The result of the investigation will be applied to the fabrication of the hyper-fine pattern.