• Title/Summary/Keyword: NaOH-etching

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Two Step Texturing Using RIE and Wet Etching for Crystalline Silicon Solar Cell (알카리 식각과 반응성 이온 식각을 이용한 결정질 실리콘 2단계 표면 조직화 공정)

  • Yeo, In Hwan;Park, Ju Eok;Kim, Jun Hee;Cho, Hae Sung;Lim, Donggun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.2
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    • pp.140-143
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    • 2013
  • Lowering surface reflectance of silicon wafer by texturization is one of the most important processes to improve the efficiency of silicon solar cells. Generally, the texturing of crystalline silicon was carried out using alkaline solution. The average reflectance of this method was 11% at the wavelength between 400 and 1,000 nm. In this study, the wafers were first texturing by NaOH solution at $80^{\circ}C$ for 35 min. Then the wafers were texturing by $SF_6$ and $O_2$ plasma in RIE (Reactive Ion Etching). The average reflectance of two step texturing was reduced to below 5% at the wavelength between 400 and 1,000 nm.

Fabrication of Si Inverted Pyramid Structures by Cu-Assisted Chemical Etching for Solar Cell Application (결정질 실리콘 태양전지의 효율개선을 위한 실리콘 역 피라미드 구조체 최적화)

  • Park, Jin Hyeong;Nam, Yoon-Ho;Yoo, Bongyoung;Lee, Jung-Ho
    • Journal of the Korean institute of surface engineering
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    • v.50 no.5
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    • pp.315-321
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    • 2017
  • Antireflective pyramid arrays can be readily obtained via anisotropic etching in alkaline solution (KOH, NaOH), which is widely used in crystalline-Si (c-Si) solar cells. The periodic inverted pyramid arrays show even lower light reflectivity because of their superior light-trapping characteristics. Since this inverted pyramidal structures are mostly achieved using very complex techniques such as photolithograpy and laser processes requiring extra costs, here, we demonstrate the Cu-nanoparticle assisted chemical etching processes to make the inverted pyramidal arrays without the need of photolithography. We have mainly controlled the concentration of $Cu(NO_3)_2$, HF, $H_2O_2$ and temperature as well as time factors that affecting the reaction. Optimal inverted pyramid structure was obtained through reaction parameters control. The reflectance of inverted pyramid arrays showed < 10% over 400 to 1100 nm wavelength range while showing 15~20% in random pyramid arrays.

Etch Pit Growth on Aluminum of Cathode Film for Aluminum Electrolytic Capacitor (알루미늄 전해 커패시터용 음극박의 에칭 피트 성장)

  • Kim, Hong-Il;Choi, Ho-Gil;Kim, Sung-Han;Kim, Young-Sam;Shin, Jin-Sik;Park, Soo-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.407-408
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    • 2005
  • High surface area electrodes for aluminum electrolytic capacitors are produced by AC electrochemical processes. Optimization of crystallographic etch pit growth on aluminium during AC etching of cathode film for aluminium as electrolytic capacitor has been established. In this work, we present the observations of pit distributions by galvanostatic measurements. The effects of electrolyte concentration, current density, frequency, various pre-treatments and etching time have been studied. The specimen was pretreated in 0.5M NaOH and 1M HCl at $40\sim60^{\circ}C$, and transferred into a cell containing 1M HCl, then various mol $H_2SO_4$ etchant was added. Pit size distributions were determined with scanning electron microscopy (SEM).

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CONSTRUCTION OF AN ENVIRONMENTAL RADON MONITORING SYSTEM USING CR-39 NUCLEAR TRACK DETECTORS

  • AHN GIL HOON;LEE JAI-KI
    • Nuclear Engineering and Technology
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    • v.37 no.4
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    • pp.395-400
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    • 2005
  • An environmental radon monitoring system, comprising a radon-cup, an etching system, and a track counting system, was constructed. The radon cup is a cylindrical chamber with a radius of 2.2 cm and a height of 3.2 cm in combination with a CR-39 detector. Carbon is impregnated in the bodies of the detector chamber to avoid problem of an electrostatic charge. The optimized etching condition for the CR-39 exposed to a radon environment turned out to be a 6 N NaOH solution at 70^{\circ}$ over a 7hour period. The bulk etch rate under the optimized condition was $1.14{\pm}0.03\;{\mu}m\;h^{-1}$. The diameter of the tracks caused by radon and its progeny were found to be in the range of $10\~25\;{\mu}m$ under the optimized condition. The track images were observed with a track counting system, which consisted of an optical microscope, a color charged couple device (CCD) camera, and an image processor. The calibration factor of this system is obtained to be $0.105{\pm}0.006$ tracks $cm^2$ per Bq $m^{-3}$ d.

Microstructure and plasma resistance of Y2O3 ceramics (Y2O3 세라믹스의 미세구조 및 플라즈마 저항성)

  • Lee, Hyun-Kyu;Lee, Seokshin;Kim, Bi-Ryong;Park, Tae-Eon;Yun, Young-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.6
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    • pp.268-273
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    • 2014
  • $Y_2O_3$ ceramic specimens were fabricated from the granular powder, obtained by spray drying process from the slurry. The slurry was prepared by mixing PVA binder, NaOH for Ph control, PEG and $Y_2O_3$ powder. The $Y_2O_3$ specimen was shaped in size of ${\phi}14mm$ and then sintered at $1650^{\circ}C$. The characteristics, microstructure, densities and plasma resistance of the $Y_2O_3$ specimens were investigated with the function of forming pressure and sintering time. $Y_2O_3$ specimens were exposed under the $CHF_3/O_2/Ar$ plasma, the dry etching treatment of specimens was carried out by the physical reaction etching of $Ar^+$ ion beam and the chemical reaction etching of $F^-$ ion decomposed from $CHF_3$. With increasing sintering time, $Y_2O_3$ specimens showed relatively high density and strong resistance in plasma etching test.

A Study on the Leaching and Recovery of Lithium by Reaction between Ferric Chloride Etching Solution and Waste Lithium Iron Phosphate Cathode Powder (폐리튬인산철 양극재 분말과 염화철 에칭액과의 반응에 의한 리튬의 침출 및 회수에 대한 연구)

  • Hee-Seon Kim;Dae-Weon Kim;Byung-Man Chae;Sang-Woo Lee
    • Resources Recycling
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    • v.32 no.3
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    • pp.9-17
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    • 2023
  • Efforts are currently underway to develop a method for efficiently recovering lithium from the cathode material of waste lithium iron phosphate batteries (LFP). The successful application of lithium battery recycling can address the regional ubiquity and price volatility of lithium resources, while also mitigating the environmental impact associated with both waste battery material and lithium production processes. The isomorphic substitution leaching process was used to recover lithium from spent lithium iron phosphate batteries. Lithium was leached by the isomorphic substitution of Fe2+ in LFP using a relatively inexpensive ferric chloride etching solution as a leaching agent. In the study, the leaching rate of lithium was compared using the ferric chloride etching solution at various multiples of the LFP molar ratio: 0.7, 1.0, 1.3, and 1.6 times. The highest lithium leaching rate was shown at about 98% when using 1.3 times the LFP molar ratio. Subsequently, to eliminate Fe, the leachate was treated with NaOH. The Fe-free solution was then used to synthesize lithium carbonate, and the harvested powder was characterized and validated. The surface shape and crystal phase were analyzed using SEM and XRD analysis, and impurities and purity were confirmed using ICP analysis.

A study on the preparation of high purity nickel carbonate powders in solvent extraction processing solution from waste iron-nickel alloy etchant (철-니켈 합금 에칭구액 용매추출 공정 용액으로부터 고순도 탄산니켈 제조에 관한 연구)

  • Chae, Byung-man;Hwang, Sung-ok;Lee, Seok-Hwan;Kim, Deuk-Hyeon;Lee, Sang-Woo;Kim, Dae-Weon;Choi, Hee-Lack
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.27 no.6
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    • pp.303-308
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    • 2017
  • The $FeCl_3$ waste solution used to etch various metals contains valuable metal such as nickel. In this study, we recovered as high purity nickel carbonate crystalline powders from nickel-containing etching waste solution after regeneration of iron chloride. Firstly we eliminated about of the iron impurities under the condition of pH 4 using 5 % NaOH aqueous solution and then removed the remaining impurities such as Ca, Mn and Zn etc. by using solvent extractant D2EHPA (Di-(2-ethylhexyl) phosphoric acid). Thereafter, nickel carbonate powder having a purity of 99.9 % or more was obtained through reaction with sodium carbonate in a nickel chloride solution.

Reactive Ion Etching with High Density Plasma for Two-Step Texturing

  • Yeo, In-Hwan;Park, Ju-Eok;Kim, Jun-Hui;Jo, Hae-Seong;Im, Dong-Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.701-701
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    • 2013
  • 표면조직화는 입사되는 빛의 반사를 줄이고 태양전지 내부에서 빛의 이동거리를 길게하여 효율을 향상시키는 중요한 요소가 된다. 결정질 실리콘 표면 조직화에서 일반적으로 알카리 습식 식각이 많이 사용되며 이 식각 방법으로 반사도를 400~1000 nm의 파장에서 평균 11%까지 줄일 수 있다. 본 논문에서는 빛의 반사를 더 줄여 단락전류를 향상 시키기 위해 기존 NaOH를 이용한 표면 조직화를 수행한 후에 반응성 이온 식각 공정을 적용하는 2단계 표면 조직화 공정을 최적화 하였다. 먼저 NaOH 2%, IPA 7.5%용액에서 $80^{\circ}C$ 유지하면서 35분간 식각을 한 후에 ICP 장치에서 SF6/O2 비율 1:1, 공정 압력 25 mTorr, 시간 200 s로 고정하고 RF 파워를 25~200 W로 변화를 주면서 실험 하였다. 그 결과 마이크로 크기의 피라미드 위에 나노 크기의 피라미드를 형성할 수 있었으며 400~1,000 nm 파장에서 평균 4.96%까지 반사도를 낮출 수 있었다. 기존 알카리 식각 공정에 비해 반사도가 많이 낮아지게 되어 입사되는 빛의 양이 증가함으로서 단락전류가 증가하고 효율이 향상될 것으로 기대된다.

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Characterization of Titanium Implant Anodized in Various Electrolytes

  • Kim, Hyung-Sun;Cho, Won-Il;Cho, Byung-Won;Park, Joon-Bong;Hur, Yin-Sik
    • Journal of the Korean Electrochemical Society
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    • v.5 no.2
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    • pp.43-46
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    • 2002
  • Commercial titanium rod was anodized in three types of electrolytes such as 0.06 mol/L $\beta-glycerophosphate+0.3mol/L$ calcium acetate, 0.06mol/L $\beta-glycerophosphate+0.3mol/L$ sodium acetate and 0.06 mol/L $\beta-glycerophosphate+5mol/L$ calcium phosphate. The titanium oxide layer $(TiO_2)$ was characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and electron spectroscopy chemical analysis (ESCA). Numerous micropores were observed on the titanium oxide layer by SEM. The diameter of micropores increased with the increase of electrolytic voltage. The titanium oxide layer was composed of anatase structure. The phosphorous element was detected at 130 eV binding energy, but calcium was not found in the oxide layer because of lower contents. After anodizing the oxide layer was etched in the 30g/L NaOH solution at $80^{\circ}C$ for 1hr. The surroundings of micropores were much more smoothed and rounded than before alkaline etching.

2-Dimensional Holographic Grating Formation in Chalcogenide Thin Films

  • Lee, Jung-Tae;Yeo, Choel-Ho;Chung, Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.34-37
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    • 2004
  • Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photo-induced phenomena. In this study, we make the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag thin film and then we measure the holographic diffraction efficiency according to thickness of Ag. And we form the two-dimensional holographic grating. At first, we formed one-dimensional grating and then we form two-dimensional grating by rotate the sample. We found out the most suitable thickness of Ag and in case of As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag(600${\AA}$), the diffraction efficiency was more higher than other samples. The holographic grating was formed by He-Ne laser(λ=632.8nm). The intensity of incident beam was 2.5mW and incident angle was 20$^{\circ}$. We confirm. the two-dimensional holographic grating by the pattern of diffracted beam and AFM(Atomic Force Microscope) image. We perform the etching process using by 0.26N NaOH in order to confirm clearly two-dimensional grating.