• Title/Summary/Keyword: N2 addition

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A Study on the Catalytic Property of Pt/γ-Al2O3 on the Dehydrocyclization of Paraffins (포화탄화수소의 탈수소고리화 반응에 관한 촉매특성 연구)

  • Lee, Santg-Hwa;Lee, Ho-In
    • Applied Chemistry for Engineering
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    • v.4 no.3
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    • pp.569-575
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    • 1993
  • The addition of Sn to Pt/${\gamma}$-$A1_2O_3$ catalyst greatly enhanced the activity and decreased the deactivation rate for the dehydrocyclization of paraffins. For the dehydrocyclization of n-octane, there appeared to be an optimal ratio of Pt:Sn=1:4 for 0.75 wt% Pt/${\gamma}$-$A1_2O_3$ catalyst. The addition of K to Pt/${\gamma}$-$A1_2O_3$ also produced a similar effect on the dehydrocyclization of n-hexane. In the case of n-octane, the addition of K led to a less selective catalyst.

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Magnetized inductively coupled plasma etching of GaN in $Cl_2/BCl_3$ plasmas

  • Lee, Y.H.;Sung, Y.J.;Yeom, G.Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1999.10a
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    • pp.49-49
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    • 1999
  • In this study, $Cl_2/BCI_3$ magnetized inductively coupled plasmas (MICP) were used to etch GaN and the effects of magnetic confinements of inductively coupled plasmas on the GaN etch characteristics were investigated as a function of $Cl_2/BCI_3$. Also, the effects of Kr addition to the magnetized $Cl_2/BCI_3$ plasmas on the GaN etch rates were investigated. The characteristics of the plasmas were estimated using a Langmuir probe and quadrupole ma~s spectrometry (QMS). Etched GaN profiles were observed using scanning electron microscopy (SEM). The small addition of $Cl_2/BCI_3$ (10-20%) in $Cl_2$ increased GaN etch rates for both with and without the magnetic confinements. The application of magnetic confinements to the $Cl_2/BCI_3$ inductively coupled plasmas (ICP) increased GaN etch rates and changed the $Cl_2/BCI_3$ gas composition of the peak GaN etch rate from 10% $BCI_3$ to 20% $BCI_3$. It also increased the etch selectivity over photoresist, while slightly reducing the selectivity over $Si0_2$. The application of the magnetic field significantly increased positive $BCI_2{\;}^+$ measured by QMS and total ion saturation current measured by the Langmuir probe. Other species such as CI, BCI, and CI+ were increased while species such as $BCl_2$ and $BCI_3$ were decreased with the application of the magnetic field. Therefore, it appears that the increase of GaN etch rate in our experiment is related to the increased dissociative ionization of $BCI_3$ by the application of the magnetic field. The addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition (80% $Cl_2/$ 20% $BCI_3$) with the magnets increased the GaN etch rate about 60%. More anisotropic GaN etch profile was obtained with the application of the magnetic field and a vertical GaN etch profile could be obtained with the addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition with the magnets.

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Kinetic Studies on the Addition of Thiophenol to ${\alpha}$ N-Diphenylnitrone

  • Tae-Rin Kim;Kwang-Il Lee;Sang-Yong Pyun
    • Bulletin of the Korean Chemical Society
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    • v.12 no.3
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    • pp.301-303
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    • 1991
  • The rate constants for the nucleophilic addition of thiophenol to $\alpha$, N-diphenylnitrone and it's derivatives (p-$OCH_3$, p-Cl, p-$NO_2$) were determined from pH 3.0 to 13.0 by UV spectrophotometry and rate equations which can be applied over a wide pH range were obtained. On the basis of rate equation, general base and substituent effect a plausible addition mechanism of thiophenol to ${\alpha}$, N-diphenylnitrone was proposed: At high pH, the addition of sulfide ion to carbon-nitrogen double bond was rate controlling, however, in acidic solution, reaction was proceeded by the addition of thiophenol molecule to carbon-nitrogen double bond after protonation at oxygen of ${\alpha}$, N-diphenylnitrone.

Quantitative Analysis of Grafted Methacrylate Groups by Michael Addition Reaction between Primary and Secondary Amino Groups on the Silica Nanoparticle Surface with 3-(Acryloyloxy)-2-Hydroxypropyl Methacrylate (실리카 나노 입자 표면에 결합된 1차 및 2차 아미노기와 3-(Acryloyloxy)-2-hydroxypropyl Methacrylate의 마이클 부가 반응에 의해 도입되는 메타크릴레이트기의 정량적 분석)

  • Lee, Sangmi;Ha, KiRyong
    • Polymer(Korea)
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    • v.39 no.2
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    • pp.300-310
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    • 2015
  • In this study, we modified silica nanoparticles with N-[3-(trimethoxysilyl)propyl]ethylenediamine (TPED) silane coupling agent, which has one primary and one secondary amino groups in a molecule, to introduce amino groups on the silica surface. After modification of silica, we used 3-(acryloyloxy)-2-hydroxypropyl methacrylate (AHM) to introduce methacrylate groups by Michael addition reaction. We found about 30% of N-H groups on the TPED modified silica surface reacted with acrylate groups of AHM compared to about 85% of reaction between N-H groups of pure TPED with acrylate groups of pure AHM. This lower degree of Michael addition reaction for heterogeneous reaction between N-H groups on the solid TPED modified silica and liquid AHM compared to homogeneous reaction between pure liquid TPED and pure liquid AHM may be caused by lower mobility of grafted amino groups of TPED moiety and higher steric hindrance caused by solid silica particles.

Effects of $N_2$ addition on chemical etching of silicon nitride layers in $F_2/Ar/N_2$ remote plasma processing

  • Park, S.M.;Kim, H.W.;Kim, S.I.;Yun, Y.B.;Lee, N.E.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.78-79
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    • 2007
  • In this study, chemical dry characteristics of silicon nitride layers were investigated in the $F_2/N_2/Ar$ remote plasma. A toroidal-type remote plasma source was used for the generation of remote plasmas. The effects of additive $N_2$ gas on the etch rates of various silicon nitride layers deposited using different deposition techniques and precursors were investigated by varying the various process parameters, such as the $F_2$ flow rate, the addition $N_2$ flow rate and the substrate temperature. The etch rates of the various silicon nitride layers at the room temperature were initially increased and then decreased with the $N_2$ flow increased, which indicates an existence of the maximum etch rates. The etch rates of the silicon oxide layers were also significantly increased with the substrate temperature increased. In the present experiments the $F_2$ gas flow, addition $N_2$ flow rate and the substrate temperature were found to be the critical parameters in determining the etch rate of the silicon nitride layers

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Effects of $Y_2O_3$ addition and sintering time on denazification and thermal conductivity of AlN ceramics during hot-press sintering ($Y_2O_3$ 첨가와 소결 시간이 AlN 세라믹스의 일축 가압 소결 거동 및 열전도도에 미치는 영향)

  • Chae, Jae-Hong;Park, Joo-Seok;Ahn, Jong-Pil;Kim, Kyoung-Hun;Lee, Byung-Ha
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.18 no.6
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    • pp.237-241
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    • 2008
  • Hot-press sintering of AlN ceramics were carried out with $Y_2O_3$ as sintering additive at a sintering temperature $1,750{\sim}1,850^{\circ}C$. The effect of $Y_2O_3$ addition and sintering time on sintering behavior and thermal conductivity of AlN ceramics was investigated. $Y_2O_3$ added AlN showed noticeably higher denazification rate than pure AlN. The thermal conductivity of AlN specimens was promoted by the addition of $Y_2O_3$ in spite of the formation of YAG secondary phase in AlN grain boundaries and grain boundary triple junction because $Y_2O_3$ addition could reduced the oxygen contents in AlN lattice which is primary factor of thermal conductivity. Typically, the thermal conductivity of 5 wt% $Y_2O_3$ added specimen was dramatically improved by the increase of sintering time because the elimination of YAG secondary phases from the grain boundary due to the evaporation, as well as the grain-growth of AlN grains.

The experimental study for high ammonia nitrogen removal using Bardenpho process with Methanol addition (메탄올주입에 의한 Bardenpho공법에서의 고농도 암모니아성 질소 제거에 관한 실험적 연구)

  • Lee, Byonghi
    • Journal of Korean Society of Water and Wastewater
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    • v.13 no.2
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    • pp.34-40
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    • 1999
  • Aerobic night-soil treatment effluent containing high concentration of ammonia nitrogen was treated to remove nitrogen using Bardenpho process with Methanol addition. The objective of this study was to investigate the feasibility of complete nitrogen removal at three different HRTs such as 6.25d, 5d, and 3.75d, respectively. At each HRT, the nitrogen removal efficiencies are 92%, 99% and 97% and the required amount of methanol are 3.05gMeOH/gN, 2.75gMeOH/gN, and 3.38gMeOH/gN, respectively. Specific nitrification rates are decreased proportional to HRT and are $0.022gNH_4^+-N/g\;MLVSS{\cdot}day$, $0.0332gNH_4^+-N/g\;MLVSS{\cdot}day$ and $0.051gNH_4^+-N/g\;MLVSS{\cdot}day$ and specific denitification rate are decreased proportional to HRT and are $0.0210g\;N/gMLVSS{\cdot}day$, $0.0330g\;N/gMLVSS{\cdot}day$ and $0.0525g\;N/gMLVSS{\cdot}day$, respectively.

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Nickel Complexes Having (N-C-N) Tridentate Ligands ((N-C-N) 세자리 리간드를 가지는 니켈 착물)

  • Lee, Dong-Hwan;Park, Soon-Heum
    • Journal of the Korean Chemical Society
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    • v.51 no.6
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    • pp.499-505
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    • 2007
  • Monomeric complexes of nickel(II) having terdentate bis(imino)aryl ligands (N,C,N-pincer) are reported. New complexes (2,6-(ArN=CH)2C6H3)NiBr (Ar=2,6-dimethylphenyl (1), 2,6-diisopropylphenyl (2)) have been synthesized through oxidative addition of 1,3-(ArN=CH)2C6H3Br (bis(N-Ar)-2-bromoisophthalaldimine: Ar=Ph-2,6-Me2, Ph-2,6-iPr2) to Ni(COD)2 (COD=1,5-cyclooctadiene), in high yields. The development of a synthetic route to ligands and nickel complexes is outlined. The complexes were characterized by IR, 1H-NMR and elemental analysis. Full characterization of complexes 1 and 2 is discussed. An investigation into the catalytic activity of the complexes in ethylene polymerization was performed, resulting in no formation of polyethylenes but producing a small amount of oily oligomers. Preliminary results indicate that the pincer complexes were found to be inactive as catalysts in ethylene polymerization.

The Effect of Nb2O5 Addition on Properties of PZT Ceramics Prepared by Partial Oxalate Method (부분수산법으로 제조한 PZT세라믹스의 특성에 미치는Nb2O5 첨가효과)

  • 김태주;남효덕;이준형
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.33-38
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    • 2003
  • Highly homogeneous PZT powder was prepared by a partial oxalate method using chemicals of (Z $r_{0.53}$ $Ti_{0.47}$) $O_2$, Pb(N $o_3$)$_2$and (COOH)$_2$ㆍ2$H_2O$. N $b_2$ $O_{5}$ addition effect on microstructure and electrical properties of PZT ceramics was investigated. When the precursors were calcined at 71$0^{\circ}C$, a single perovskite phase was obtained. After sintering at 110$0^{\circ}C$, X-ray diffraction Patterns showed coexistence of rhombohedral and tetragonal phases regardless of the N $b_2$ $O_{5}$ content. As the content of N $b_2$ $O_{5}$ increased, grain size decreased but sintered density increased. The electromechanical coupling factor of kp and the piezoelectric constant of $d_{31}$ increased linearly with the content of N $b_2$ $O_{5}$, and those values reached 0.7 and -200, respectively, when 1.2 mol% of N $b_2$ $O_{5}$ is added. is added.ded.

The Effect of Al2O3 addition on the Characteristics of Sintering Behavior, Phase Transformation and Mechanical Properties of Spark Plasma Sintered Si3N4 Ceramics (알루미나 첨가에 의한 질화규소의 방전 플라즈마 소결 거동과 상전이 특성 및 기게적 특성에 미치는 영향)

  • Chae, Jae-Hong;Kim, Dae-Gean;Kim, Kyoung-Hun;Park, Joo-Seok;Ahn, Jong-Pil;Sim, Kwang-Bo
    • Journal of the Korean Ceramic Society
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    • v.45 no.2
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    • pp.94-98
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    • 2008
  • Silicon nitride($Si_3N_4)$ is one of the most widely used structural ceramic materials. However silicon nitride is difficult to sinter because of its strong covalent bonding characteristics. In this study, $Si_3N_4$ ceramics were fabricated by spark plasma sintering process with $Y_2O_3$ and $Al_2O_3$ addition to improve the sinterability and the mechanical properties and their phase transformation behavior, microstructure and mechanical properties were evaluated. Fully densified $Si_3N_4$ ceramics could be obtained by spark plasma sintering process at a lower temperature than conventional sintering method. The formation of network microstructure was affected by the addition of $Al_2O_3$ because it could accelerate a to ${\alpha}$ to ${\beta}$ phase transformation of $Si_3N_4$. As a result, the mechanical properties depended on amounts of $Al_2O_3$ addition. The hardness value increased with increasing ${\alpha}$-phase fraction, but fracture toughness value increase with increasing ${\beta}$-phase fraction.