• Title/Summary/Keyword: N-current

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A CMOS Rail-to-Rail Current Conveyer and Its Applications to Current-Mode Filters

  • Kurashina, Takashi;Ogawa, Satomi;Watanabe, Kenzo
    • Proceedings of the IEEK Conference
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    • 2002.07b
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    • pp.755-758
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    • 2002
  • This paper presents a second-generation CMOS current conveyor (CCII) consisting of a rail-to-rail complementary N- and P-channel differential input stage for the voltage input, a class AB push-pull stage for the current input, and current mirrors far the current outputs. The CCII was implemented using a double-poly triple-metal 0.6 ${\mu}$m n-well CMOS process, to confirm its operation experimentally. A prototype chip achieves a rail-to-rail swing ${\pm}$2.4 V under ${\pm}$2.5 V power supplies and shows the exact voltage and current following performances up to 100 MHz. Because of its high performances, the CCII proposed herein is quite useful for a building block of current-mode circuits. The applications of the proposed CCII to current-mode filters are also described.

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Fatigue performance of deepwater SCR under short-term VIV considering various S-N curves

  • Kim, D.K.;Choi, H.S.;Shin, C.S.;Liew, M.S.;Yu, S.Y.;Park, K.S.
    • Structural Engineering and Mechanics
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    • v.53 no.5
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    • pp.881-896
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    • 2015
  • In this study, a method for fatigue performance estimation of deepwater steel catenary riser (SCR) under short-term vortex-induced vibration was investigated for selected S-N curves. General tendency between S-N curve capacity and fatigue performance was analysed. SCRs are generally used to transport produced oil and gas or to export separated oil and gas, and are exposed to various environmental loads in terms of current, wave, wind and others. Current is closely related with VIV and it affects fatigue life of riser structures significantly. In this regards, the process of appropriate S-N curve selection was performed in the initial design stage based on the scale of fabrication-related initial imperfections such as welding, hot spot, crack, stress concentration factor, and others. To draw the general tendency, the effects of stress concentration factor (SCF), S-N curve type, current profile, and three different sizes of SCRs were considered, and the relationship between S-N curve capacity and short-term VIV fatigue performance of SCR was derived. In case of S-N curve selection, DNV (2012) guideline was adopted and four different current profiles of the Gulf of Mexico (normal condition and Hurricane condition) and Brazil (Amazon basin and Campos basin) were considered. The obtained results will be useful to select the S-N curve for deepwater SCRs and also to understand the relationship between S-N curve capacity and short-term VIV fatigue performance of deepwater SCRs.

Fabrication and characterization of n-IZO / p-Si and p-ZnO:(In, N) / n-Si thin film hetero-junctions by dc magnetron sputtering

  • Dao, Anh Tuan;Phan, Thi Kieu Loan;Nguyen, Van Hieu;Le, Vu Tuan Hung
    • Journal of IKEEE
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    • v.17 no.2
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    • pp.182-188
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    • 2013
  • Using a ceramic target ZnO:In with In doping concentration of 2%, hetero-junctions of n-ZnO:In/p-Si and p-ZnO:(In, N)/n-Si were fabricated by depositing Indium doped n - type ZnO (ZnO:In or IZO) and Indium-nitrogen co-doped p - type ZnO (ZnO:(In, N)) films on wafers of p-Si (100) and n-Si (100) by DC magnetron sputtering, respectively. These films with the best electrical and optical properties were then obtained. The micro-structural, optical and electrical properties of the n-type and p-type semiconductor thinfilms were characterized by X-ray diffraction (XRD), RBS, UV-vis; four-point probe resistance and room-temperature Hall effect measurements, respectively. Typical rectifying behaviors of p-n junction were observed by the current-voltage (I-V) measurement. It shows fairly good rectifying behavior with the fact that the ideality factor and the saturation current of diode are n=11.5, Is=1.5108.10-7 (A) for n-ZnO:In/p-Si hetero-jucntion; n=10.14, Is=3.2689.10-5 (A) for p-ZnO:(In, N)/n-Si, respectively. These results demonstrated the formation of a diode between n-type thin film and p-Si, as well as between p-type thin film and n-Si..

Study of n-ZnO/InGaN/p-GaN Lihgt Emitting Diodes

  • Gang, Chang-Mo;Nam, Seung-Yong;Gong, Deuk-Jo;Choe, Sang-Bae;Seong, Won-Seok;Lee, Dong-Seon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.322.2-322.2
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    • 2014
  • Lighting emitting diodes of n-ZnO/MQW/p-GaN structure are fabricated and investigated. To realize this LED structure, n-ZnO/MQW/p-GaN are grown by MOCVD. At several bias voltages, blue-green light is emitted from the ZnO mesa edge. However, the emission is restricted near the mesa edge. It is seen that the hole current does not spread well. It is because conductivity of p-GaN is extremely small. The break down voltage of the device is small compared to conventional InGaN/GaN LEDs. It is seen that ZnO columnar grain boundaries act as leakage current paths and non-radiative recombination center.

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Estimation of Mean Surface Current and Current Variability in the East Sea using Surface Drifter Data from 1991 to 2017 (1991년부터 2017년까지 표층 뜰개 자료를 이용하여 계산한 동해의 평균 표층 해류와 해류 변동성)

  • PARK, JU-EUN;KIM, SOO-YUN;CHOI, BYOUNG-JU;BYUN, DO-SEONG
    • The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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    • v.24 no.2
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    • pp.208-225
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    • 2019
  • To understand the mean surface circulation and surface currents in the East Sea, trajectories of surface drifters passed through the East Sea from 1991 to 2017 were analyzed. By analyzing the surface drifter trajectory data, the main paths of surface ocean currents were grouped and the variation in each main current path was investigated. The East Korea Warm Current (EKWC) heading northward separates from the coast at $36{\sim}38^{\circ}N$ and flows to the northeast until $131^{\circ}E$. In the middle (from $131^{\circ}E$ to $137^{\circ}E$) of the East Sea, the average latitude of the currents flowing eastward ranges from 36 to $40^{\circ}N$ and the currents meander with large amplitude. When the average latitude of the surface drifter paths was in the north (south) of $37.5^{\circ}N$, the meandering amplitude was about 50 (100) km. The most frequent route of surface drifters in the middle of the East Sea was the path along $37.5-38.5^{\circ}N$. The surface drifters, which were deployed off the coast of Vladivostok in the north of the East Sea, moved to the southwest along the coast and were separated from the coast to flow southeastward along the cyclonic circulation around the Japan Basin. And, then, the drifters moved to the east along $39-40^{\circ}N$. The mean surface current vector and mean speed were calculated in each lattice with $0.25^{\circ}$ grid spacing using the velocity data of surface drifters which passed through each lattice. The current variance ellipses were calculated with $0.5^{\circ}$ grid spacing. Because the path of the EKWC changes every year in the western part of the Ulleung Basin and the current paths in the Yamato Basin keep changing with many eddies, the current variance ellipses are relatively large in these region. We present a schematic map of the East Sea surface current based on the surface drifter data. The significance of this study is that the surface ocean circulation of the East Sea, which has been mainly studied by numerical model simulations and the sea surface height data obtained from satellite altimeters, was analyzed based on in-situ Lagrangian observational current data.

$Ta/TaN_x$ Metal Gate Electrodes for Advanced CMOS Devices

  • Lee, S. J.;D. L. Kwong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.3
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    • pp.180-184
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    • 2002
  • In this paper, the electrical properties of PVD Ta and $TaN_x$ gate electrodes on $SiO_2$ and their thermal stabilities are investigated. The results show that the work functions of $TaN_x$ gate electrode are modified by the amount of N, which is controlled by the flow rate of $N_2$during reactive sputtering process. The thermal stability of Ta and $TaN_x$ with RTO-grown $SiO_2$ gate dielectrics is examined by changes in equivalent oxide thickness (EOT), flat-band voltage ($V_{FB}$), and leakage current after post-metallization anneal at high temperature in $N_2$ambient. For a Ta gate electrode, the observed decrease in EOT and leakage current is due to the formation of a Ta-incorporated high-K layer during the high temperature annealing. Less change in EOT and leakage current is observed for $TaN_x$ gate electrode. It is also shown that the frequency dispersion and hysteresis of high frequency CV curves are improved significantly by a post-metallization anneal.

The Structure and Electrical Properties of Si-ZnO n-n Heterojunctions (Si-ZnO n-n 이종접합의 구조 및 전기적 특성)

  • 이춘호;박순자
    • Journal of the Korean Ceramic Society
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    • v.23 no.1
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    • pp.44-50
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    • 1986
  • Si-ZnO n-n heterojunction diodes were prespared by r.f diode sputtering of the sintered ZnO target on n-type Si single crystal wafers and their structures and electrical properties were studied. The films were grown orientedly with the c-axis of crystallites perpendicular to the substrate surface at low r.f. powder and grown to polycrystalline films with random orientation at high r. f. powder. The crystallite size increased with the increasing substrate temperture The oriented texture films only were used to prepare the photovoltaic diodes and these didoes showed the photovoltaic effect veing positive of the ZnO side for the photons in the wavelength range of 380-1450nm. The sign reversal of phootovoltage which is the property os isotype heterojunction was not observed because of the degeneration of the ZnO films. The diode showed the forward rectification when it was biased with the ZnO side positive. The current-voltage characteristics exhibited the thermal-current type relationship J∝exp(qV/nkT) with n=1.23 at the low forward bias voltage and the tunnelling-current type relationship J∝exp($\alpha$V) where $\alpha$ was constant independent of temperature at the high forward bias voltage. The crystallite size of ZnO films were influenced largely on the photovoltaic properties of diodes ; The diodes with the films of the larger crystallites showed the poor photovoltaic properties. This reason may be cosidered that the ZnO films with the large crystallites could not grow to the electrically continuous films because the thickness of films was so thin in this experiment.

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A study on the effect of process parameters on the corrosion resistance of ion plated Tin films with Ti and Ni interlayers. (이온플레팅시 공정조건이 Ti 및 Ni 중간층을 갖는층을 갖는 TiN 박막의 내식성에 미치는 영향에 관한 연구)

  • 하희성;이종민;이인행;이정중
    • Journal of the Korean institute of surface engineering
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    • v.30 no.1
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    • pp.33-43
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    • 1997
  • The effects of process parameters substrate such as substrate current and substrate temperature on the corrosion resistance of ion plated TiN film were investigated. TiN fims were deposited on speed steel on which Ti or Ni hed been previously evaporated. Dense TiN films could be obtained under higher substrate current(1A) and substrate temperature($500^{\circ}C$), whereas TiN films deposited with lower substances current(0.5A) and substrate temperature($300^{\circ}C$) showed porous structure. The corrosion resistances of high speed steel was considerably increased when dense TiN films had been formed on it. The effect of Ti and Ni interlayer on the increase of the corrosion resistance was also significant with dense TiN films, while there was little effect of interlayer on the corrosion resistance when TiN films were porous. the effect of interlayer on the corrosion resistance was more outstanding with Ti then with Ni, because Ti reacts more easily with oxygen to form an oxide layer, and it also shows higher resistance against chlorine containing corrosion media.

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Electrochemical Behaviors of Biliverdin in N,N-Dimethylformamide (N,N-Dimethylformamide 용매 중에서 Biliverdin의 전기화학적 거동)

  • Zun Ung Bae;Heung Lark Lee;Tae Myeong Park
    • Journal of the Korean Chemical Society
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    • v.37 no.8
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    • pp.730-734
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    • 1993
  • The electrochemical reduction behavior or Biliverdin (BV) in N,N-dimethylformamide solvent was studied by DC polarography, cyclic voltammetry and the controlled potential coulometry. The reduced product was indentified by UV-Vis spectroscopy. In DC polarogram, two reduction waves of BV were founded. The half wave potentials of two reduction waves were -0.71 and -0.91 V vs. Ag/Ag$^+$ respectively. The current type of the 1st reduction wave was diffusion-controlled and the 2nd was diffusion current containing a little kinetic current. The 1st electrochemical reduction process was irreversible and BV reduced to Bilirubin.

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Properties of p-n junction threshold voltage of Silicon diode by transport current in cryogenic temperature (인입 전류에 따른 실리콘(Silicon) 다이오드의 극저온 p-n 접합의 문턱 전압 특성)

  • Lee, An-Su;Lee, Seung-Je;Lee, Eung-Ro;Ko, Tea-Kuk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.864-867
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    • 2003
  • Since the development of semiconductors, various related research has been conducted. During research, silicon diodes have been commonly used because of their simplicity and low cost in the manufacturing process. This research deals with p-n junction threshold voltages from silicon diodes due to transport current at a cryogenic temperature. At a cryogenic temperature(77K) we could get minimum current which junction threshold voltage becomes constant. This is experimented on GPIB communication and it consist of programmable current source, multimeter which gauge the threshold voltage in a very low temperature caused by transport current from 5nA to 1mA and $LN_2$(77K) for coolant. This experiment is programmed all process using Measurement studio(Lab window) tool.

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