• Title/Summary/Keyword: N$_2$O

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Synthesis and characterization of noble metal coupled N-TiO2 nanoparticles

  • Lee, Kyusang;Moon, Jiyeon;Kim, Seonmin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.374.2-374.2
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    • 2016
  • Volatile organic compounds (VOCs) in the atmosphere are harmful materials which influence indoor air environment and human health. Titanium dioxide ($TiO_2$) is photocatalyst extensively used in degradation of organic compound. To improve the photocatalytic activity in the visible light region, doping with non-metals element or loading noble metals on the surface of $TiO_2$ is generally proposed. In this study, N- doped $TiO_2$ having photocatalytic activity in visible light region was attached noble metal such as Pt, Ag, Pd, Au by coupling method. Catalytic activities of Noble metal coupled $N-TiO_2$ powders were evaluated by the improvement of their photocatalytic activities and the degradation of VOC gas. A UV-Vis spectrophotometer was used to measure the diffuse reflectance spectra of coupled $N-TiO_2$ sample. The photocatlytic activities of as prepared samples were characterized by the decoloration of aqueous MB solution under Xenon light source (UV and visible light). To measure of decomposition VOCs, ethylbenzene was selected for target VOC material and the concentration was monitored under UVLED irradiation in a closed chamber system. Adjusting the initial concentration of 10~12 ppm, to evaluate the removal characteristics by using the coupled $N-TiO_2$.

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Synthesis and Characterization of Homo-, Hetero-Dinuclear Mo(Ⅲ) and V(Ⅲ) Complexes (Ⅳ) (몰리브덴(Ⅲ) 과 바나듐(Ⅲ) 호모 및 헤테로 이핵 착물의 합성과 특성 (제 4 보))

  • O, Sang O;Yu, Eun Yeong
    • Journal of the Korean Chemical Society
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    • v.38 no.11
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    • pp.808-818
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    • 1994
  • The neutral compounds [$MCl_3L_2$(MeCN)] (M = Mo, V: L = $PPh_3$, 1/2 phda) have been prepared from the reaction of starting material $MCl_z$ (M = Mo; z = 5, M = V; z = 3) with N,P-donating ligands in acetonitrile solution. Addition of $AgClO_4$ to these neutral monomeric compounds in acetone solution were produced [$MCl_3-_nL_2(MeCN)(S)_n$]$(ClO_4)_n$ (n = 1, 2 : s = solvent). Finally treatment of bivalent cationic compound and neutral compound was formed chloride bridged dinuclear complex $[(MeCN)(L)_2ClM({\mu}-Cl)_2M'Cl(L)_2(MeCN)](ClO_4)_2$ and treatment of univalent cationic compound with half equivalent pyrazine to pyrazine bridged complex $[(MeCN)(L)_2Cl_2M({\mu}-pyz)M'Cl_2(L)_2(MeCN)](ClO_4)_2$. These complexes are characterized by elemental analysis, $^1H$, $^{13}C$ NMR, IR, Far-IR and UV-Vis spectroscopy.

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Influence of N Fertilization Level, Rainfall and Temperature on the Emission of N2O in the Jeju Black Volcanic Ash Soil with Potato Cultivation (감자 재배 화산회토양에서 질소시비 수준, 강우 및 온도 환경 변화에 따른 아산화질소 배출 특성)

  • Yang, Sang-Ho;Kang, Ho-Jun;Lee, Shin-Chan;Oh, Han-Jun;Kim, Gun-Yeob
    • Korean Journal of Soil Science and Fertilizer
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    • v.45 no.4
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    • pp.544-550
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    • 2012
  • This study was conducted to investigate the characteristic factors which have been influenced on nitrous oxide ($N_2O$) emissions related to the environment change of nitrogen application level, rainfall and temperature during the potato cultivation at black volcanic ash soil from 2010 to 2011. During the potato cultivation, the more amount of nitrogen fertilizer applied, $N_2O$ emissions amounts were released much. $N_2O$ emissions with the cultivation time were released much at the first and middle of cultivation with heavy rainfall, but it was released very low until the end of cultivation and drought season. $N_2O$ emissions mainly were influenced by the rainfall and soil water content. The correlation (r) with $N_2O$ emissions, soil wate, soil temperature in 2010 were very significant at $0.6251^{**}$ and $0.6082^{**}$ respectively, but soil EC was not significant to 0.10824. In 2011, soil temperature was very significant at $0.4879^{**}$, but soil water and soil EC were not significant at 0.0468 and 0.0400 respectively. Also, $NH_4$-N was very significant at $0.7476^{**}$, but $NO_3$-N and soil nitrogen ($NO_3-N+NH_4-N$) were not significant at 0.0843 and 0.1797, respectively. During the potato cultivation period, the average emissions factor of 2 years released by the nitrogen fertilizer application was presumed to be 0.0040 ($N_2O-N\;kg\;N^{-1}\;kg^{-1}$). This factor was lower about 2.5 times than the IPCC guideline default value (0.0100 $N_2O-N\;kg\;N^{-1}\;kg^{-1}$).

The Comparison of Property and Visible Light Activity between Bulk and Surface Doped N-TiO2 Prepared by Sol-gel and N2-plasma Treatment

  • Hu, Shaozheng;Li, Fayun;Fan, Zhiping
    • Bulletin of the Korean Chemical Society
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    • v.33 no.1
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    • pp.199-203
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    • 2012
  • A modified sol-gel method and $N_2$-plasma treatment were used to prepare bulk and surface doped N-$TiO_2$, respectively. XRD, TEM, UV-vis spectroscopy, $N_2$ adsorption, Elemental Analyzer, Photoluminescence, and XP spectra were used to characterize the prepared $TiO_2$ samples. The N doping did not change the phase composition and particle sizes of $TiO_2$ samples, but increased the visible light absorption. The photocatalytic activities were tested in the degradation of an aqueous solution of a reactive dyestuff, methylene blue, under visible light. The photocatalytic activity of surface doped N-$TiO_2$ prepared by $N_2$-plasma was much higher than that of bulk doped N-$TiO_2$ prepared by sol-gel method. The possible mechanism for the photocatalysis was proposed.

Characteristics of Oxynitride Dielectics Prepared in $N_2O$ Ambient by Furnace (Furnace로 $N_2O$ 분위기에서 성장시킨 Oxynitride 절연막 특성)

  • 이은구;박인길;박진성
    • Journal of the Korean Ceramic Society
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    • v.32 no.1
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    • pp.31-36
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    • 1995
  • (100) Si was oxidized in N2O ambient, and the film properties of oxynitride dielectrics were compared with pure SiO2. The growth rate, after pre-oxidation in O2/N2 ambient with raising temperature, is faster than that of O2/N2O treatment during the same condition. Nitrogen piles up at the interface of SiO2 and Si substrate and the content is about 2atom%. Comparing with pure SiO2, oxynitride dielectrics shows less dielectric breakdown failures and flat-band voltage shift, and good diffusion barrier property to dopant(BF2) is also observed.

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Study on the Characteristics of Thermal-resistance Catalyst for $N_2O$ Propellant Decomposition ($N_2O$ 추진제 분해 촉매의 고온 내열 특성 연구)

  • Baek, Jin-Oh;Kim, Tae-Gu
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2010.05a
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    • pp.373-376
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    • 2010
  • The characteristics of thermal-resistance catalyst for $N_2O$ propellant decomposition were studied in the present study. Si was added to the $Al_2O_3$ support to stabilize its surface area at high temperature (> $1000^{\circ}C$). Ru was used as a catalyst for $N_2O$ decomposition. The prepared catalysts were characterized using SEM, EDS and XRD analysis, and $N_2O$ conversion was measured as reaction temperatures. The Ru/$Al_2O_3$-Si catalyst showed better performance than Ru/$Al_2O_3$ catalyst.

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Studies on Photocatalytic Thin Films($TiO_2$, TiO-N) Manufactured by DC Magnetron Sputtering Method and it's Characteristics for Removal of Pollutants (DC 마그네트론 스퍼터링법을 이용한 광촉매박막($TiO_2$, TiO-N)제조 및 오염물질 제거에 관한 연구)

  • Jeong, Weon-Sang;Park, Sang-Weon
    • Journal of Korean Society of Environmental Engineers
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    • v.27 no.1
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    • pp.59-66
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    • 2005
  • [ $TiO_2$ ] was deposited by DC magnetron sputtering on glass surface under various sputtering parameters such as discharge power($0.6{\sim}5.2\;kW$, substrate temperature($R.T{\sim}350^{\circ}C$), Ar and $O_2$ flow ratio with $0{\sim}50\;sccm$($Ar+O_2$ 90 sccm) and about 1 mtorr of pressure. TiO-N thin film was prepared under same sputtering conditions for $TiO_2$ thin film except flow ratio($Ar+O_2+N_2$ 90 sccm). The sheet resistance of thin films deposited under these parameters was measured to analyze electronic characteristic and thin film's thickness(${\alpha}$-step), surface roughness(AFM) and formation construction(FE-SEM, XRD) were also measured to draw optimal sputtering parameters. In order to evaluate photo-activity of thin film($TiO_2$, TiO-N) made in optimal parameters for removal of pollutants, toluene among VOCs and Suncion Yellow among reactive dyes were chosen to probe organic compounds for photo-degradation. It was shown that the photo-catalytic thin films had a significant photo-activation for the chosen contaminants and especially TiO-N thin film showed maximum efficiency of 33% for toluene(5 ppm) removal in visible-light range.

Room Temperature Strength and Crack Healing Morphology of Si3N4 Composite Ceramics with SiO2 Colloidal (SiO2 콜로이달에 의한 Si3N4 복합 세라믹스의 상온굽힘강도 및 균열치유 현상)

  • Nam, K.W.;Kim, J.S.;Lee, H.B.
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.33 no.7
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    • pp.652-657
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    • 2009
  • Strength characteristics of $Si_3N_4$ composite ceramics has been studied as functions of heat-treatment temperature and additive $SiO_2$. $SiO_2$ colloidal could significantly increase the bending strength. Crack healing temperature decreased 300 K by additive $TiO_2$. Bending strength of specimen added $SiO_2$ is higher than that of non-added $SiO_2$. Moreover, bending strength of specimen with $SiO_2$ colloidal coating is much higher that of non-coated specimen. In in-situ observation, crack-healed specimen at 1,573 K shows phenomenon like a fog on the surface. By SPM, both crack-healed specimen, non-coating and coating of $SiO_2$ colloidal, at 1,273 K were healed completely but both of 1,573 K exist crack. This was made by evaporation of $SiO_2$ at high temperature. Crack-healing materials of $Si_3N_4$ composite ceramics is crystallized $Y_2Si_2O_7$, $Y_2Ti_2O_7$ and $SiO_2$. A large amount of Si and O, and little C were detected by EPMA. Si and O increase but C decreases according to heat treatment temperature. Specimens with additive $SiO_2$ were more detected Si and O than that of non-additive $SiO_2$. Specimen with $SiO_2$ colloidal coatings were much more detected O.

청색광 검출 Si Photodiode에서 $SiO_{2}/Si_{3}N_{4}$ 광반사 방지막의 최적두께 설계

  • 서동균;황용운;장지근
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2004.05a
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    • pp.67-71
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    • 2004
  • 400~450nm 파장 범위의 청색광을 검출하는 Si 포토다이오드에서 $SiO_2$, $Si_{3}N_{4}$, $SiO_{2}/Si_{3}N_{4}$를 광반사 방지막으로 사용하는 경우 광반사 방지막의 두께에 따른 표면 광반사 손실을 이론적으로 계산하였다. 400~450nm 청색 파장에서 $SiO_2$, $Si_{3}N_{4}$ 단일막에 대한 최소 광반사 손실은 각각 $d(SiO_2)=700~750{\AA}$$d(Si_{3}N_{4})=500${\AA}$에서 나타났으며, $SiO_{2}/Si_{3}N_{4}$ 이중막에 대한 최소 광반사 손실은 $d(SiO_{2}/Si_{3}N_{4})=750{\AA}/(180~200){\AA}$에서 나타났다.

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CrN/Al2O3/CrN multilayered coatings with excellent mechanical property and corrosion behavior synthesized by a hybrid HIPIMS/ALD process (HIPIMS와 ALD 하이브리드 공정에 의한 CrN/Al2O3/CrN 다층코팅의 기계적/화학적 특성 평가)

  • Man, Ji-Heum;Jang, Deung-Bi;Kim, Gwang-Ho;Gwon, Se-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.21-21
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    • 2014
  • $CrN/Al_2O_3/CrN$ 다층 코팅을 HIPIMS와 ALD간 하이브리드 코팅법을 통해 형성하였다. ALD를 통해 CrN 층에 도입한 $Al2O_3$층의 두께 및 위치가 $CrN/Al_2O_3/CrN$ 다층 코팅층의 미세구조, 표면 거칠기, 기계적 특성 및 화학적 특성에 미치는 영향에 대해 조사하였다. 전체 공정시간은 거의 변화시키지 않고도, ALD를 이용한 $Al2O_3$층의 삽입에 의하여 기계적/화학적 특성이 크게 개선될 수 있음을 확인하였으며, 개선된 특성에 대한 원인에 대해 조사하였다.

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