• Title/Summary/Keyword: Multilayered structure

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Delamination analysis of multilayered beams with non-linear stress relaxation behavior

  • Victor I., Rizov
    • Coupled systems mechanics
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    • v.11 no.6
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    • pp.543-556
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    • 2022
  • Delamination of multilayered inhomogeneous beam that exhibits non-linear relaxation behavior is analyzed in the present paper. The layers are inhomogeneous in the thickness direction. The dealamination crack is located symmetrically with respect to the mid-span. The relaxation is treated by applying a non-linear stress-straintime constitutive relation. The material properties which are involved in the constitutive relation are distributed continuously along the thickness direction of the layer. The delamination is analyzed by applying the J-integral approach. A time-dependent solution to the J-integral that accounts for the non-linear relaxation behavior is derived. The delamination is studied also in terms of the time-dependent strain energy release rate. The balance of the energy is analyzed in order to obtain a non-linear time-dependent solution to the strain energy release rate. The fact that the strain energy release rate is identical with the J-integral value proves the correctness of the non-linear solutions derived in the present paper. The variation of the J-integral value with time due to the non-linear relaxation behavior is evaluated by applying the solution derived.

Hardness and Oxidation Resistance of Ti0.33Al0.67N/CrN Nano-multilayered Superlattice Coatings

  • Ahn, Seung-Su;Oh, Kyung-Sik;Chung, Tai-Joo;Park, Jong-Keuk
    • Journal of the Korean Ceramic Society
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    • v.56 no.1
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    • pp.49-55
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    • 2019
  • $Ti_{0.33}Al_{0.67}N/CrN$ nano-multilayers, which are known to have excellent wear resistance, were prepared using an unbalanced magnetron sputter to have various periods of 2-5 nm. $Ti_{0.33}Al_{0.67}N$ had a hexagonal structure in a single layer, but converted to a cubic structure by forming a multilayer with CrN, which has a cubic structure. Thus, $Ti_{0.33}Al_{0.67}N$ formed a superlattice in the multilayer. The $Ti_{0.33}Al_{0.67}/CrN$ multilayer with a period of 2.5 nm greatly exceeded the hardness of the $Ti_{0.33}Al_{0.67}N$ and the CrN single layer, reaching 39 GPa. According to the low angle X-ray diffraction results, the $Ti_{0.33}Al_{0.67}N/CrN$ multilayer maintained its as-coated structure to a temperature as high as $700^{\circ}C$ and exhibited hardness of 30 GPa. The thickness of the oxide layer of the $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating was less than one-tenth of those of the single layers. Thus, $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating had hardness and oxidation resistance far superior to those of its constituent single layers.

Enhancement of Mechanical Properties in Microlaminate Composite materials Produces by Physical Vapor Deposition

  • Kwon, Sik-Chol;Rha, Jong-Joo;Beck, Woon-Seung
    • Journal of the Korean Vacuum Society
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    • v.6 no.S1
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    • pp.80-88
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    • 1997
  • The attempt to enhance the strength of materials has been an important subject for materials engineering and scientists. The strength of materials is termed as the ability to support high load without excessive deformation and without breaking catastrophically. The control of dislocation densities and barriers to the movement of dislocations have been considered to be the important methods for the strengthening materials. One of the approaches is mechanical blocking of dislocations by alternately depositing material layers. The typical structure of materials is multilayered and laminated composites. The thickness of each layer is typically in the range of nanometer. Ton avoid confusion with other terminology they may be defined as microlaminate composite materials. The manufacturing process of multilayered laminate structure will be introduced. And the current theoretical theories will be reviewed in view of strengthening of microlaminte composite materials.

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Design of Optimal Finline Taper in Multilayered structure with Spectral Domain Immittance Approach

  • Song Seung-Hyun;Cheon Chang-Yul;Hahn Song-Yop;Kim Hyeong-Seok
    • 한국정보통신설비학회:학술대회논문집
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    • 2002.08a
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    • pp.21-23
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    • 2002
  • In millimeter wave applications, it is often necessary to use transitions between waveguide and planar circuits. Finline structures can be used effectively to this purpose. In multilayered case, it is necessary to analyze the structure with numerical method such as spectral domain immittance method. The design procedure uses tile cutoff frequency for each taper width. The dispersion data in a single layer are compared with those in literature. The performance of the designed finline taper is verified with the FEM simulation using HFSS.

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Activation Volumes of Wall-Motion and Nucleation Processes in Co/Pd Multilayers

  • Choe, Sug-Bong;Shin, Sung-Chul
    • Journal of Magnetics
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    • v.5 no.2
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    • pp.35-39
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    • 2000
  • The correlation between the activation volumes of wall-motion and nucleation processes in Co/Pd multilayers has been investigated. Each activation volume was estimated from the field dependence of the wall-motion speed and the nucleation rate, respectively, based on time-resolved domain patterns grabbed by a MOKE microscope system. Both the activation volumes are changed in the same manner around $0.2\sim1.1\times10^{-17}cm^3$ with changes in the multilayered structure. Interestingly, the correlation between the activation volumes is sensitive to the multilayered structure; the wall-motion activation volume is smaller than the nucleation activation volume for a sample having a smaller number of repeats and a thinner Co-layer thickness, and vice versa. The correlation is closely related with the contrasting reversal modes; the process having the smaller activation volume dominates.

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Sintering of LTCC Tape on Alumina Substrates for Multilayered Structure

  • Kim, Hyo-Tae;Nam, Myung-Hwa;Chun, Byung-Joon;Kim, Jong-Hee
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09b
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    • pp.908-909
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    • 2006
  • The HTCC based multilayer structure plasma head unit have some difficulties in fabrication due to complicated post-processes, such as heat treatment at reduced atmosphere, re-bonding of each layer, and silver metallization. On the other hand, LTCC based technology provides relatively simple process for multilayer plasma unit except weak mechanical properties. To overcome this problem a combined scheme using both LTCC and HTCC technology has been developed in our group, recently. In this work, we report the structural design, materials selection, joining of LTCC with HTCC substrate, and co-firing process for the fabrication of multilayered atmospheric plasma head unit.

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A Design of Multi-layer Planar Type Microwave Filter (다층 평면형 초고주파 필터의 설계)

  • Lee Hong-Seop;Hwang Hee-Yong
    • Journal of The Institute of Information and Telecommunication Facilities Engineering
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    • v.4 no.1
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    • pp.31-36
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    • 2005
  • In this paper, a planar type bandpass filter in multilayered PCB is presented. The multilayered PCB structure has some advantages on fabricating microwave devices such as the size reduction and ability of tight coupling by folding or embedding. The proposed BPF has two transmission zeros at the both sides of the center frequency by using independent electric and magnetic coupling structure. The designed BPF with four layer teflon PCBs of dielectric constant 2.94 has dimensions of 24x20x1.524 in mm, center frequency of 2.47GHz and bandwidth of about l00MHz. A good agrement is achieved between the measured result and the simulated one. The influences of air gaps between the layers are also analyzed and presented.

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UV Light-assisted Photocatalytic Degradation of Simluated Methylene blue Dye by Multilayered ZnO Films (다층 ZnO 막에 의한 모의 메틸렌블루 염료의 자외선 광촉매분해)

  • Khan, Shenawar Ali;Zafar, Muhammad;Kim, Woo Young
    • Journal of the Korean Applied Science and Technology
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    • v.39 no.1
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    • pp.34-41
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    • 2022
  • As the use of chemical products increases in daily life, the removal of dye waste has also emerged as an important environmental issue. This dye waste can be decomposed using a photocatalyst, and the photocatalyst can be synthesized very cost-effectively by using the sol-gel technology. The sol-gel technology is not only very useful for nanoscale film formation, but also can simply form multilayer structures. Using a multiple spin coating method, in this study, a ZnO film with a multilayered structure (3 layers, 5 layers) was formed by using zinc oxide (ZnO), which is effective in decomposing various dyes. For performance comparison, a ZnO film having a single layer structure by a single spin coating method was prepared as a control. Structural and elemental analysis of ZnO film was performed using an X-ray diffraction analyzer and an energy dispersive X-ray spectrometer. A nanowire-like surface morphology could be observed through a scanning electron microscope. Additionally, UV-Vis spectrophotometer was used to measure the absorbance of UV light. The ZnO film with a five-layer structure degraded the simulated methylene blue by 49% more than the ZnO film with a single-layer structure. In conclusion, it was found that ZnO having a multilayered structure is useful as a photocatalyst that decomposes methylene blue dye more effectively.

High-Performance Amorphous Multilayered ZnO-SnO2 Heterostructure Thin-Film Transistors: Fabrication and Characteristics

  • Lee, Su-Jae;Hwang, Chi-Sun;Pi, Jae-Eun;Yang, Jong-Heon;Byun, Chun-Won;Chu, Hye Yong;Cho, Kyoung-Ik;Cho, Sung Haeng
    • ETRI Journal
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    • v.37 no.6
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    • pp.1135-1142
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    • 2015
  • Multilayered ZnO-$SnO_2$ heterostructure thin films consisting of ZnO and $SnO_2$ layers are produced by alternating the pulsed laser ablation of ZnO and $SnO_2$ targets, and their structural and field-effect electronic transport properties are investigated as a function of the thickness of the ZnO and $SnO_2$ layers. The performance parameters of amorphous multilayered ZnO-$SnO_2$ heterostructure thin-film transistors (TFTs) are highly dependent on the thickness of the ZnO and $SnO_2$ layers. A highest electron mobility of $43cm^2/V{\cdot}s$, a low subthreshold swing of a 0.22 V/dec, a threshold voltage of 1 V, and a high drain current on-to-off ratio of $10^{10}$ are obtained for the amorphous multilayered ZnO(1.5nm)-$SnO_2$(1.5 nm) heterostructure TFTs, which is adequate for the operation of next-generation microelectronic devices. These results are presumed to be due to the unique electronic structure of amorphous multilayered ZnO-$SnO_2$ heterostructure film consisting of ZnO, $SnO_2$, and ZnO-$SnO_2$ interface layers.