• Title/Summary/Keyword: Multilayer structure

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Characteristics of a-Si:H Multilayer for Contact-type Linear Image Sensor (밀착형 1차원 영상감지소자를 위한 a-Si:H 다층막의 특성)

  • Oh, Sang-Kwang;Kim, Ki-Wan;Choi, Kyu-Man
    • Journal of Sensor Science and Technology
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    • v.1 no.1
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    • pp.5-12
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    • 1992
  • We have fabricated a-Si:H multilayer for contact-type linear image sensor by means of RF glow discharge decomposition method. The ITO/i-a-Si:H/Al structure has relatively high dark current due to indium diffusion and carrier injection from both electrodes, resulting in low photocurrent to dark current. To suppress the dark current and to enhance interface electric field between ITO and i-a-Si:H film we have fabricated ITO/insulator/i-a-S:H/p-a-S:H/Al multilayer film with blocking structure. The photocurrent of ITO/$SiO_{2}(300{\AA})$/i-a-Si:H/p-a-Si:H($1500{\AA}$)/Al multilayer sensor with 5V bias voltage became saturated at about 20nA under $20{\mu}W/cm^{2}$ light intensity, while the dark current was less than 0.1nA. To increase the light generation efficiency we have adopted ITO/$SiO_{x}N_{y}(300{\AA})$/i-a-Si:H/p-a-Si:H($1500{\AA}$)/Al structure, showing photocurrent of 30nA and dark current of 0.08nA with 5V bias voltage. Also the spectral photosensitivity of the multilayer was enhanced for short wavelength visible region of 560nm, compared with that of the a-Si:H monolayer of 630nm. And its photoresponse time was about 0.3msec with the film homogeneity of 5% deviation.

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Design of a Compact Lowpass Filter having Wide Bandstop Characteristics for Microwave and Millimeter-Wave Circuit Applications (마이크로파 및 밀리미터파 회로 응용을 위한 넓은 저지대역 특성을 지닌 소형의 저역 통과 여파기 설계)

  • 서재옥;박성대;김진양;강남기;이해영
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.14 no.3
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    • pp.283-289
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    • 2003
  • In this paper, we proposed novel multilayer photonic bandgap(PBG) structure using DSL(Descended Signal Line). From measurement result, the proposed PBG structure using DSL is reduced 72 % at size and increased 13 % at bandwidth compared to typical multilayer DGS(Defected Ground Structure). It is also reduced 42 % at size and increased 23 % at bandwidth compared to PBG structure using EGP(Elevated Ground Plane). In case of measurement for manufactured six PBG patterns, all patterns have the same cutoff frequency and bandstop characteristics. So it can be used for bandstop filter having very precise tolerance of below 300 MHz at 20 ㎓ if it is applied to real product and this filter will be useful for small microwave integrated circuit and module development.

Inverse active wind load inputs estimation of the multilayer shearing stress structure

  • Chen, Tsung-Chien;Lee, Ming-Hui
    • Wind and Structures
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    • v.11 no.1
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    • pp.19-33
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    • 2008
  • This research investigates the adaptive input estimation method applied to the multilayer shearing stress structure. This method is to estimate the values of wind load inputs by analyzing the active reaction of the system. The Kalman filter without the input term and the adaptive weighted recursive least square estimator are two main portions of this method. The innovation vector can be produced by the Kalman filter, and be applied to the adaptive weighted recursive least square estimator to estimate the wind load input over time. This combined method can effectively estimate the wind loads to the structure system to enhance the reliability of the system active performance analysis. The forms of the simulated inputs (loads) in this paper include the periodic sinusoidal wave, the decaying exponent, the random combination of the sinusoidal wave and the decaying exponent, etc. The active reaction computed plus the simulation error is regard as the simulated measurement and is applied to the input estimation algorithm to implement the numerical simulation of the inverse input estimation process. The availability and the precision of the input estimation method proposed in this research can be verified by comparing the actual value and the one obtained by numerical simulation.

Acquisition of Monochromatic X-ray Using Multilayer Mirror (다층박막 거울을 이용한 단색 엑스선 획득)

  • Chon, Kwon-Su
    • Journal of radiological science and technology
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    • v.33 no.3
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    • pp.179-184
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    • 2010
  • A hard X-ray microscope system for obtaining images of nano-spatial resolution has been widely studied and requires monochromatic X-ray. A multilayer mirror of 84% reflectivity was designed to acquire tungsten characteristic X-ray of 8.4 keV from the white beam generated from an X-ray tube, and the C/W multilayer mirror of $50{\times}50\;mm$ size and 5.65 nm d-spacing was fabricated by the ion-beam sputtering system. The C/W multilayer had a uniformity of 99.5%, and the structure of the multilayer mirror was verified by a TEM image. The obtainable x-ray reflectivity for the C/W multilayer mirror at 8.4 keV was estimated from measuring the X-ray reflectivity using the copper characteristic X-ray of 8.05 keV. Monochromatic X-ray of 8.4 keV was generated by combining a X-ray tube, and the reflectivity and monochromaticity were 77.1% and 0.21 keV, respectively. Monochromatic X-ray generated from the combination of an X-ray tube and an C/W multilayer mirror has enough potential to use X-ray source for hard X-ray microscope system of laboratory size. If the C/W multilayer mirror of d-spacing of a few nanometers can be fabricated, monochromatic X-ray corresponded to 17.5 keV, molybdenum characteristic X-ray, can be obtained and applied to mammography in the medical application.

Spot marking of the multilayer thin films by Nd:YAG laser (Nd:YAG 레이저에 의한 다층 박막의 미소 점 마킹)

  • Kim, Hyun-Jin;Shin, Yong-Jin
    • Korean Journal of Optics and Photonics
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    • v.15 no.4
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    • pp.361-368
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    • 2004
  • We separated the multilayer structure of CD-R(compact disk-recordable) and investigated optimal spot marking conditions and physical and chemical transitions in response to various laser beam energh levels. Spot marking(80 ${\mu}{\textrm}{m}$ spot size) was produced on the surface of each layer using a Q-switched Nd:YAG laser between 27 mJ and 373mJ. By investigating resulting pit formation with Optical Microscopy(OM) and Optical Coherence Tomography(OCT), we analyzed the formation process of spot marking in the multilayer structure of different chemical composition. The localized heating of the substrate in the multilayer thin film caused the short temporal thermal expansion, and absorbed optical energy between reflective and dye interfaces melted dye and increased the volume. During the cooling phase, formation of pit and surrounding rim can be explained by three distinct processes; effect of surface tension, evaporation by spontaneous temperature increase due to laser energy, and mass flow from the recoil pressure. Our results shows that the spot marking formation process in the multilayer thin film is closely related to the layers' physical, chemical, and optical properties, such as surface tension, melt viscosity, layer thickness, and chemical composition.

Mechanical Properties and Thermal Stability of Ti0.5Al0.5N/CrN Nano-multilayered Coatings (Ti0.5Al0.5N/CrN 나노 다층 박막의 기계적 성질과 열적 안정성)

  • Ahn, Seung-Su;Park, Jong-Keuk;Oh, Kyung-Sik;Chung, Tai-Joo
    • Journal of Powder Materials
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    • v.27 no.5
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    • pp.406-413
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    • 2020
  • Ti0.5Al0.5N/CrN nano-multilayers, which are known to exhibit excellent wear resistances, were prepared using the unbalanced magnetron sputter for various periods of 2-7 nm. Ti0.5Al0.5N and CrN comprised a cubic structure in a single layer with different lattice parameters; however, Ti0.5Al0.5N/CrN exhibited a cubic structure with the same lattice parameters that formed the superlattice in the nano-multilayers. The Ti0.5Al0.5/CrN multilayer with a period of 5.0 nm exceeded the hardness of the Ti0.5Al0.5N/CrN single layer, attaining a value of 36 GPa. According to the low-angle X-ray diffraction, the Ti0.5Al0.5N/CrN multilayer maintained its as-coated structure up to 700℃ and exhibited a hardness of 32 GPa. The thickness of the oxidation layer of the Ti0.5Al0.5N/CrN multilayered coating was less than 25% of that of the single layers. Thus, the Ti0.5Al0.5N/CrN multilayered coating was superior in terms of hardness and oxidation resistance as compared to its constituent single layers.

An Acoustic Reception Ability Analysis of SONAR Multilayer Structures by Using Elastic Theory (탄성이론을 이용한 소나 다층구조물의 음향 수신 성능해석)

  • Kwon, Hyun-Wung;Hong, Suk-Yoon;Song, Jee-Hun;Kim, Sung-Hee;Jeon, Jae-Jin;Seo, Young-Soo
    • The Journal of the Acoustical Society of Korea
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    • v.32 no.4
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    • pp.301-307
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    • 2013
  • SONAR detection performance is one of the key survivability factors in underwater weapon systems. In order to catch the acoustic ability of SONAR, multilayer SONAR structures are analyzed using the elastic theory. The applied results for the simple models are compared with those from commercial program, ANSYS, and the reliable results are obtained. The analysis of sound pressure level (SPL) and echo reduction (ER) by the thickness change of multilayer SONAR structures are performed using the verified elastic theory. As the thickness of anechoic layer is increased, SPL is distributed evenly and ER is increased slightly with the frequency. In decoupling layers and steel layers, SPL are hardly changed and ER is slightly decreased with the thickness increase of those layers. SPL and ER are not affected by the thickness change of the carbon reinforced plastic (CRP) layer. Therefore, to improve the acoustic ability of multilayer SONAR structures, the thickness increase of the anechoic layer and minimization of the decoupling layer, steel layer and CRP layer are desirable.

Electrical and Optical Properties of Asymmetric Dielectric/Metal/Dielectric (D/M/D) Multilayer Electrode Prepared by Radio-Frequency Sputtering for Solar Cells

  • Pandey, Rina;Lim, Ju Won;Lim, Keun Yong;Hwang, Do Kyung;Choi, Won Kook
    • Journal of Sensor Science and Technology
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    • v.24 no.1
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    • pp.15-21
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    • 2015
  • Transparent and conductive multilayer thin films consisting of three alternating layers FZTO/Ag/$WO_3$ have been fabricated by radio-frequency (RF) sputtering for the applications as transparent conducting oxides and the structural and optical properties of the resulting films were carefully studied. The single layer fluorine doped zinc tin oxide (FZTO) and tungsten oxide ($WO_3$) films grown at room temperature are found to have an amorphous structure. Multilayer structured electrode with a few nm Ag layer embedded in FZTO/Ag/$WO_3$ (FAW) was fabricated and showed the optical transmittance of 87.60 % in the visible range (${\lambda}=380{\sim}770nm$), quite low electrical resistivity of ${\sim}10^{-5}{\Omega}cm$ and the corresponding figure of merit ($T^{10}/R_s$) is equivalent to $3.0{\times}10^{-2}{\Omega}^{-1}$. The resultant power conversion efficiency of 2.50% of the multilayer based OPV is lower than that of the reference commercial ITO. Asymmetric D/M/D multilayer is a promising transparent conducting electrode material due to its low resistivity, high transmittance, low temperature deposition and low cost components.