• Journal of the Korea Academia-Industrial cooperation Society
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• v.17 no.2
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• pp.372-377
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• 2016

Communication flow is changing rapidly. Recently, a range of wearable devices such as wearable glasses and wearable watch, have been launched. These kinds of wearable devices help people to live a more comfortable life. Wearable devices most have an antenna for wireless communication. This paper reports a transparent antenna that is made of an optically transparent material for wearable glasses. Transparent antenna can be applied to smart windows and will not disturb the view of user. IZTO/Ag/IZTO multilayer electrode has higher electrical and optical properties. This antenna is available because of its good electrical properties. This study measured the performance of the proposed transparent antenna, which is made of a multilayer electrode, applied to a lens. The proposed antenna was simulated with several substrates. The antenna impedance was matched with length and width of the antenna. The antenna's conductivity and transparency was measured using a HMS-3000 and UV-spectrometer. A 40nm thick Ag single layer antenna was fabricated on a flexible polyimide substrate for comparing the antenna performances. The fabricated antenna is useable at a frequency of 2.4-2.5GHz, which is suitable for Wifi communications and has peak gain of 2.89dBi and an efficiency of 34%.

• Journal of the Korean Magnetics Society
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• v.5 no.1
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• pp.42-47
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• 1995

FeN thin films for inductive recording heads were sputter deposited using RF diode sputtering mehtod from a pure iron target onto 7059 glass substrates, and their magnetic properties were measured. The magnetic properties were greatly affected by film thickness, gas pressure, sputter power and flow ratio of $N_{2}$ to Ar. Single layer FeN films with their thickness varied from $1,000\;{\AA}$ to $6,000\;{\AA}$ were doposited. 800 W sputter power, 3 mT gas pressure, $N_{2}$ to Ar flow ratio of 6.6 : 100 were the sputtering conditions. Up to 7 layers of FeN films having total thickness of $6,000\;{\AA}$ were deposited using $SiO_{2}$ of $30\;{\AA}$ thickness as intermediate layers and their coercivity and saturation magnetization were measured. The sputtering conditions were the same as those in the single layer films. Easy axis coercivity of the single layer FeN films gradually decreased as their thickness was increased, but for the films with their thicknesses above $3,000\;{\AA}$, the coercivity changed very little. As the number of the FeN layers were increased, the coercivity decreased We estimated the grain size of FeN films from the FWHM (Full Width at Half Maximum) of X-ray diffraction peaks. The grain size steadily decreased from about $200\;{\AA}$ to $120\;{\AA}$ as the number of layers were increased. Minimum hard axis coercivity of 0.4 Oe was obtained when the number of layers was four. Maximum relative permeability was 2,900 when the number of layers was three. The cut off frequeocy of the multilayer films were above 100 MHz.

• Journal of Biosystems Engineering
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• v.39 no.4
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• pp.310-317
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• 2014

Purpose: This study was conducted to analyze the air flow characteristics in a plant factory with different inlet and outlet locations using computational fluid dynamics (CFD). Methods: In this study, the flow was assumed to be a steady-state, incompressible, and three-dimensional turbulent flow. A realizable k-${\varepsilon}$ turbulent model was applied to show more reasonable results than the standard model. A CFD software was used to perform the numerical simulation. For validation of the simulation model, a prototype plant factory ($5,900mm{\times}2,800mm{\times}2,400mm$) was constructed with two inlets (${\Phi}250mm$) and one outlet ($710mm{\times}290mm$), located on the top side wall. For the simulation model, the average air current speed at the inlet was $5.11m{\cdot}s^{-1}$. Five cases were simulated to predict the airflow pattern in the plant factory with different inlet and outlet locations. Results: The root mean square error of measured and simulated air current speeds was 13%. The error was attributed to the assumptions applied to mathematical modelling and to the magnitude of the air current speed measured at the inlet. However, the measured and predicted airflow distributions of the plant factory exhibited similar patterns. When the inlets were located at the center of the side wall, the average air current speed in the plant factory was increased but the spatial uniformity was lowered. In contrast, if the inlets were located on the ceiling, the average air current speed was lowered but the uniformity was improved. Conclusions: Based on the results of this study, it was concluded that the airflow pattern in the plant factory with multilayer cultivation shelves was greatly affected by the locations of the inlet and the outlet.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.27 no.8
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• pp.735-741
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• 2016

Increasing the total length of waveguide-below-cutoff array(WBCA) as it is used to the duct in order to enhance shielding effectiveness, the design could cause higher cost, higher levels of difficulties in construction and the interruption a flow velocity. The multi-layered WBCA can compensate for this problem, which can be designed by crossing each waveguide layer. By conducting simulations from 2-layer to 8-layer structure, it can be observed that the shielding effectiveness increases from 52 dB to 75 dB. Comparing with the original WBCA in a shape of mono layer rectangular, our proposed waveguide becomes similar with the original value as the number of crossing layer increases. In addition, the analysis with the flow of fluid in the duct installed multi-layered WBCA are required. We demonstrate this analysis by doing the flow of fluid simulation, and concluded that the multi-layered WBCA has loss of flow of fluid less than unit rectangular WBCA.

• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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• 2001.02a
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• pp.45-47
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• 2001

The function of the thermal shield(TS) is to eliminate the thermal radiation from the room temperature side to the coil temperature(4.5K) region so as to reduce the thermal load on the He refrigerator. The TS is composed of multilayer insulation(MLI) which is coated very thin aluminum on the insulating material, cryopanel which is cooled by cold gaseous He, and supports which stand the cryopanel and MLI on the room temperature part. The thermal shield for the TF coils and PF coils has been located between the coils and vacuum vessel. The thermal shielding cryopanel is cooled under 80 K by a forced flow of helium gas using cooling pipes on the cryopanel.

• Electrical & Electronic Materials
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• v.7 no.2
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• pp.145-151
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• 1994

The multi-dielectric layer SiOz/Si3N4/SiO2(ONO) is used to scale down the memory device. In this paper, the change of composition in ONO layer due to the process condition and the conduction mechanism are observed. The composition of the oxide film grown through the oxidation of nitride film is analyzed using auger electron spectroscopy(AES). AES results show that oxygen concentration increases at the interface between oxide and nitride layers as the thickness -of the top oxide layer increases. Results of I-V measurement show that the insulating properties improve as the thickness of the top oxide layer increases. But when the thickness of the nitride layer decreases below 63.angs, insulating peoperties of film 28.angs. of top oxide and film 35.angs. turn over showing that insulating property of film 28.angs. of top oxide is better than that of film 35.angs. of top oxide. This phenomenon of turn over is thought as the result of generation of surface state due to oxygen flow into nitride during oxidation process. As the thickness of the top oxide and nitride increases, the electrical breakdown field increases, but when the thickness of top oxide reaches 35.angs, the same phenomenon of turn over occurs. Optimum film thickness for scaled multi-layer dielectric of memory device SONOS is estimated to be 63.angs. of nitride layer and 28.angs. of top oxide layer. In this case, maximum electrical breakdown field and leakage current are 18.5[MV/cm] and $8{\times}{10^-12}$[A], respectively.

• 한국해양학회지
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• v.30 no.3
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• pp.227-236
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• 1995

A simple layer model based on isophcnal coordinate is applied to the East Sea to examine the dynamics of circulation. The results confirm the existing knowledge about role of inflow-outflow and wind in driving the circulation. It is found, however, that the buoyancy flux generates quite different circulation pattern; it enhances the inflow-outflow driven circulation and has a convective nature. The circulation considering all these effects resembles the schematic one presently known. In the circulation, the intermediate layer is outcropped in the north off the northern boundary, ventilated here and flows cyclonically in the northern part of basin. This water, however, does not flow southward directly because of the strong eastward (separating from the coast) current in the layer above. This water also loses its potential vorticity while traveling around the periphery of the outcropping region and is thus characterized by minimum potential vorticity in the interior of the basin.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.124-124
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• 2010

Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

• Clean Technology
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• v.29 no.2
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• pp.145-150
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• 2023

Tele-metering systems have been useful tools for managing domestic wastewater treatment plants (WWTP) over the last decade. They mostly generate water quality data for discharged water to ensure that it complies with mandatory regulations and they may be able to produce every operation parameter and additional measurements in the near future. A sub-big data group, comprised of about 150,000 data points from four domestic WWTPs, was ready to be classified and also analyzed to optimize the WWTP process. We used the Statistical Product and Service Solutions (SPSS) 25 package in order to statistically treat the data with linear regression and correlation analysis. The major independent variables for analysis were water temperature, sludge recycle rate, electricity used, and water quality of the influent while the dependent variables representing the water quality of the effluent included the total nitrogen, which is the most emphasized index for discharged flow in plants. The water temperature and consumed electricity showed a strong correlation with the total nitrogen but the other indices' mutual correlations with other variables were found to be fuzzy due to the large errors involved. In addition, a multilayer perceptron analysis method was applied to TMS data along with root mean square error (RMSE) analysis. This study showed that the RMSE in the SS, T-N, and TOC predictions were in the range of 10% to 20%.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.12 no.2
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• pp.103-110
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• 2012

The population growth along with the urbanization, has caused more problems in many public areas, such as subway airport terminals, hospital, etc. Many surveillance systems have been installed in the public areas, but not all of those can be monitored in real-time, because the operators that observe the monitors are very small compared with the number of the monitors. For example, the observer can miss some crucial accidents or detect after considerable delays. Thus, intelligent surveillance system for preventing the accidents are needed, such as Intelligent Surveillance Systems. in this paper, we propose a new crowd density estimation method which aims at estimating moving crowd using images from surveillance cameras situated in outdoor locations. The moving crowd is estimated from the area where using optical flow. The edge information is also used as feature to measure the crowd density, so we improve the accuracy of estimation of crowd density. A multilayer neural network is designed to classify crowd density into 5 classes. Finally the proposed method is experimented with PETS 2009 images.