• Title/Summary/Keyword: Multi-plasma

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A Novel Multi-Level Type Sustaining Driver for AC Plasma Display Panel (새로운 방식의 멀티레벨 AC PDP 구동장치)

  • Jung Woo-Chang;Kang Kyung-Woo;Yoo Jong-Gul;Ko Jong-Sun;Hong Soon-Chan
    • Proceedings of the KIPE Conference
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    • 2004.07a
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    • pp.425-429
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    • 2004
  • A new multi-level type energy recovery sustaining driver for AC PDP(Plasma Display Panel) is proposed in this paper. The multi-level driver has been developed to reduce the voltage stress on switching elements. Comparing the proposed driver with the conventional multi-level driver, 4 switching elements, 4 diodes, and two auxiliary capacitors are eliminated in the viewpoint of circuit structure. Moreover, the voltage stress on switching elements is more reduced and the sustain period is extended. To verify the validity of the proposed energy recovery circuit, computer simulations using PSpice program are carried out.

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Improvement of the Accuracy of Optical Simulation Using by the Multi-cube UV Source in PDP Cells (Multi-cube UV source 이용한 PDP에서 광학시뮬레이션의 정확성 개선에 관한 연구)

  • Kang, Jung-Won;Eom, Chul-Whan
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.2 s.19
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    • pp.41-44
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    • 2007
  • Optical simulation of the rear and front panel geometries were needed to improve the luminance and efficiency in PDP cells. The 3-dimensional optical code can be used to analyze the variation of geometries and changing of optical properties. In order to improve the accuracy of simulated results, a new UV source, called a multi-cubes UV source, was designed. To design the source, at first UV distribution was calculated with the plasma fluid code and then the UV distribution was transformed to the multi-cube structures in the optical code. Compared to the results from existing UV source, called a planar UV source, could be improved the accuracy of visible light distribution. Simulated results were also compared to the visible distribution measured with the ICCD in a real PDP cell.

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Research on parallelization mechanism of inductively coupled plasma for large area plasma source

  • Lee, Jang-Jae;Kim, Si-Jun;Kim, Gwang-Gi;Lee, Ba-Da;Lee, Yeong-Seok;Yeom, Hui-Jung;Kim, Dae-Ung;Yu, Sin-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.183-183
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    • 2016
  • Inductively coupled plasma having the high-density is often used for high productivity in the plasma processing. In large area processing, the plasma can be generated by using the multi-pole connected in parallel. However, in case of this, the power cannot transfer to plasma uniformly. To address the problem, we studied the mechanism of inductively coupled plasma connected in parallel by using transformer model. We also studied about the change of the plasma parameters over the time through the power balance equation and particle balance equation.

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Fabrication, Microstructure and Adhesive Properties of BCuP-5 Filler Metal/Ag Plate Composite by using Plasma Spray Process (Plasma spray 공정을 이용한 BCuP-5 filler 금속/Ag 기판 복합 소재의 제조, 미세조직 및 접합 특성)

  • Youn, Seong-June;Kim, Young-Kyun;Park, Jae-Sung;Park, Joo-Hyun;Lee, Kee-Ahn
    • Journal of Powder Materials
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    • v.27 no.4
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    • pp.333-338
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    • 2020
  • In this study, we fabricate a thin- and dense-BCuP-5 coating layer, one of the switching device multilayers, through a plasma spray process. In addition, the microstructure and macroscopic properties of the coating layer, such as hardness and bond strength, are investigated. Both the initial powder feedstock and plasma-sprayed BCuP-5 coating layer show the main Cu phase, Cu-Ag-Cu3P ternary phases, and Ag phase. This means that microstructural degradation does not occur during plasma spraying. The Vickers hardness of the coating layer was measured as 117.0 HV, indicating that the fine distribution of the three phases enables the excellent mechanical properties of the plasma-sprayed BCuP-5 coating layer. The pull-off strength of the plasma-sprayed BCuP-5 coating layer is measured as 16.5 kg/㎠. Based on the above findings, the applicability of plasma spray for the fabrication process of low-cost multi-layered electronic contact materials is discussed and suggested.

Improvement of a UV/Ozone Duplex Sterilizer (UV/Ozone 복합 살균기의 살균력 개선 연구)

  • Jee, Jung-Eun;Yang, Won-Kyun;Park, Eun-Chul;Kim, Kang-Suk;Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.41 no.2
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    • pp.76-82
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    • 2008
  • We investigated sterilization characteristics of UV lights by counting the number of bacteria units with varying sterilization time and distance from the light source. We focused on an idea that UV light of 184.9 nm could generate ozone and developed a new sterilizer. The UV-ozone duplex system sterilized bacteria faster than UV-only sterilizers. To reduce shadowing effects by target objects, we used UV transparent quartz plate as a support and put a reflecting plate. Distribution of UV irradiation intensity and ozone supply were analyzed by a 3D model and measured by a semiconductor UV sensor. But even with an Al reflector, multi-layered pens could not be treated properly from UV irradiation only. Ozone generating lamp could treat more uniformly multi-layered pens with a stirring fan by supplying ozone to shadowed surfaces.

Effect of Plasma Polymerization Coating of CNTs on the Tensile Strength of Pei/Cnt Composites

  • Song, K.C.;Yoon, T.H.
    • Journal of Adhesion and Interface
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    • v.6 no.4
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    • pp.7-11
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    • 2005
  • Multi-walled carbon nanotubes (CNTs), which were purified by etching in 25% $H_2SO_4/HNO_3$ solution at $60^{\circ}C$ for 2 h, were modified via plasma polymerization coating of acrylic acid, allylamine or acetylene, and then utilized to prepare PEI/CNT composites. First, plasma polymerization conditions were optimized by measuring the solvent resistance of coatings in THF, chloroform and NMP, and the tensile strength of PEI/CNT (0.5%) composites as a function of plasma power (20~50 W) and monomer pressure (20~50 mTorr). The tensile strength of PEI/CNT composites was further evaluated as a function of CNT loading (0.2, 0.5 and 1%). Finally, FT-IR was utilized to provide a better understanding of the improved tensile properties of PEI/CNT composites via plasma polymerization coating of CNTs. Plasma polymerization of acrylic acid greatly enhanced the tensile strength of PEI/CNT composites, as did allylamine but to a lesser degree, while acetylene plasma polymerization coating decreased tensile strength.

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A Study on the NPC Type Multi-Level Energy Recovery Sustaining Driver for AC Plasma Display Panel (AC PDP용 NPC 타입 멀티레벨 에너지 회수회로에 관한 연구)

  • Yoo Jong-Gul;Hong Soon-Chan
    • The Transactions of the Korean Institute of Power Electronics
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    • v.10 no.2
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    • pp.194-202
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    • 2005
  • This paper proposes a new multi-level energy recovery sustaining driver for AC PDP(Plasma Display Panel), which solves the problems and maintains the merits of the conventional multi-level sustaining driver. While the conventional circuit improves the hard switching in the Weber circuit, there exist parasitic resonant currents in resonant inductors and Vs/2 sustaining period. Comparing the proposed circuit with the conventional circuit, the number of inductors are reduced by half, the parasitic resonant currents in resonant inductors are eliminated, and the hard switching problem is solved by CIM(Current Injection Method). Moreover the voltages across series-connected switching elements in the full bridge circuit are distributed equally by adopting NPC(Neutral Point Clamping) techniques. And circuit operations of the proposed circuit are analyzed for each mode and the validity is verified by the simulations using PSpice program and experimentation with a prototype drive circuit.

Research on the Multi-electrode Plasma Discharge for the Large Area PECVD Processing

  • Lee, Yun-Seong;You, Dae-Ho;Seol, You-Bin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.478-478
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    • 2012
  • Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

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Via Contact and Deep Contact Hole Etch Process Using MICP Etching System (Multi-pole Inductively Coupled Plasma(MICP)를 이용한 Via Contact 및 Deep Contact Etch 특성 연구)

  • 설여송;김종천
    • Journal of the Semiconductor & Display Technology
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    • v.2 no.3
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    • pp.7-11
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    • 2003
  • In this research, the etching characteristics of via contact and deep contact hole have been studied using multi-pole inductively coupled plasma(MICP) etching system. We investigated Plasma density of MICP source using the Langmuir probe and etching characteristics with RF frequency, wall temperature, chamber gap, and gas chemistry containing Carbon and Fluorine. As the etching time increases, formation of the polymer increases. To improve the polymer formation, we controlled the temperature of the reacting chamber, and we found that temperature of the chamber was very effective to decrease the polymer thickness. The deep contact etch profile and high selectivity(oxide to photoresist) have been achieved with the optimum mixed gas ratio containing C and F and the temperature control of the etching chamber.

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External rf plasma treatment effect on multi-wall carbon nanotubes grown inside anodic alumina nanoholes at low deposition temperatures

  • Ahn, Kyoung-Soo;Kim, Jun-Sik;Kim, Eun-Kyu;Kim, Chae-Ok;Hong, Jin-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.692-693
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    • 2002
  • Well-aligned multi-wall carbon nanotubes (MWNTs) were fabricated by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system from Ni particles at the bottom of anodic alumina nanoholes (AAN). To remove the amorphous graphite layers on the AAN surface and to eliminate the protrusion of MWNT tips, the AAN surface with MWNTs were treated by external rf plasma source. As a result, the AAN surface almost became flat without having any protrusion of MWNT tips. The diameter, length of MWNTs and AAN were investigated by using a scanning electron microscopy (SEM). Raman spectroscopy was also used to characterize wall structure of the carbon nanotube. And the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future.

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