• 전력전자학회:학술대회논문집
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• 전력전자학회 2004년도 전력전자학술대회 논문집(1)
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• pp.425-429
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• 2004

A new multi-level type energy recovery sustaining driver for AC PDP(Plasma Display Panel) is proposed in this paper. The multi-level driver has been developed to reduce the voltage stress on switching elements. Comparing the proposed driver with the conventional multi-level driver, 4 switching elements, 4 diodes, and two auxiliary capacitors are eliminated in the viewpoint of circuit structure. Moreover, the voltage stress on switching elements is more reduced and the sustain period is extended. To verify the validity of the proposed energy recovery circuit, computer simulations using PSpice program are carried out.

• 반도체디스플레이기술학회지
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• 제6권2호
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• pp.41-44
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• 2007

Optical simulation of the rear and front panel geometries were needed to improve the luminance and efficiency in PDP cells. The 3-dimensional optical code can be used to analyze the variation of geometries and changing of optical properties. In order to improve the accuracy of simulated results, a new UV source, called a multi-cubes UV source, was designed. To design the source, at first UV distribution was calculated with the plasma fluid code and then the UV distribution was transformed to the multi-cube structures in the optical code. Compared to the results from existing UV source, called a planar UV source, could be improved the accuracy of visible light distribution. Simulated results were also compared to the visible distribution measured with the ICCD in a real PDP cell.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.183-183
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• 2016

Inductively coupled plasma having the high-density is often used for high productivity in the plasma processing. In large area processing, the plasma can be generated by using the multi-pole connected in parallel. However, in case of this, the power cannot transfer to plasma uniformly. To address the problem, we studied the mechanism of inductively coupled plasma connected in parallel by using transformer model. We also studied about the change of the plasma parameters over the time through the power balance equation and particle balance equation.

• 한국분말재료학회지
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• 제27권4호
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• pp.333-338
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• 2020

In this study, we fabricate a thin- and dense-BCuP-5 coating layer, one of the switching device multilayers, through a plasma spray process. In addition, the microstructure and macroscopic properties of the coating layer, such as hardness and bond strength, are investigated. Both the initial powder feedstock and plasma-sprayed BCuP-5 coating layer show the main Cu phase, Cu-Ag-Cu₃P ternary phases, and Ag phase. This means that microstructural degradation does not occur during plasma spraying. The Vickers hardness of the coating layer was measured as 117.0 HV, indicating that the fine distribution of the three phases enables the excellent mechanical properties of the plasma-sprayed BCuP-5 coating layer. The pull-off strength of the plasma-sprayed BCuP-5 coating layer is measured as 16.5 kg/㎠. Based on the above findings, the applicability of plasma spray for the fabrication process of low-cost multi-layered electronic contact materials is discussed and suggested.

• 한국표면공학회지
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• 제41권2호
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• pp.76-82
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• 2008

We investigated sterilization characteristics of UV lights by counting the number of bacteria units with varying sterilization time and distance from the light source. We focused on an idea that UV light of 184.9 nm could generate ozone and developed a new sterilizer. The UV-ozone duplex system sterilized bacteria faster than UV-only sterilizers. To reduce shadowing effects by target objects, we used UV transparent quartz plate as a support and put a reflecting plate. Distribution of UV irradiation intensity and ozone supply were analyzed by a 3D model and measured by a semiconductor UV sensor. But even with an Al reflector, multi-layered pens could not be treated properly from UV irradiation only. Ozone generating lamp could treat more uniformly multi-layered pens with a stirring fan by supplying ozone to shadowed surfaces.

• 접착 및 계면
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• 제6권4호
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• pp.7-11
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• 2005

Multi-walled carbon nanotubes (CNTs), which were purified by etching in 25% $H_2SO_4/HNO_3$ solution at $60^{\circ}C$ for 2 h, were modified via plasma polymerization coating of acrylic acid, allylamine or acetylene, and then utilized to prepare PEI/CNT composites. First, plasma polymerization conditions were optimized by measuring the solvent resistance of coatings in THF, chloroform and NMP, and the tensile strength of PEI/CNT (0.5%) composites as a function of plasma power (20~50 W) and monomer pressure (20~50 mTorr). The tensile strength of PEI/CNT composites was further evaluated as a function of CNT loading (0.2, 0.5 and 1%). Finally, FT-IR was utilized to provide a better understanding of the improved tensile properties of PEI/CNT composites via plasma polymerization coating of CNTs. Plasma polymerization of acrylic acid greatly enhanced the tensile strength of PEI/CNT composites, as did allylamine but to a lesser degree, while acetylene plasma polymerization coating decreased tensile strength.

• 전력전자학회논문지
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• 제10권2호
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• pp.194-202
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• 2005

본 연구는 새로운 AC PDP(Plasma Display Panel)용 멀티레벨 에너지 회수회로에 관한 연구로서, 기존 멀티레벨 구동회로의 장점을 그대로 유지하면서 문제점을 해결한 새로운 멀티레벨 구동회로를 제안한다. 기존의 멀티레벨 구동회로는 Weber회로의 하드스위칭 문제를 개선하였지만 공진 인덕터에 기생공진전류가 존재하고 Vs/2유지구간이 존재한다. 제안한 회로는 기존 회로에 비해 인덕터의 수를 반으로 줄여 회로를 간단히 하고 공진 인덕터의 기생 공진전류와 Vs/2유지구간을 제거하였으며 CIM(Current Injection Method)을 사용하여 하드스위칭 문제를 해결하였다. 또한 풀브리지 구동회로에 직렬 연결된 스위칭 소자에 NPC(Neutral Point Clamping)기법을 적용하여 각 스위칭 소자에 전압이 균등하게 분배되도록 하였다. 그리고 제안회로의 동작을 모드별로 해석하였으며, PSpice 프로그램으로 시뮬레이션하고 회로를 구성하여 실험함으로써 제안한 회로의 유용성을 입증하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.478-478
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• 2012

Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

• 반도체디스플레이기술학회지
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• 제2권3호
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• pp.7-11
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• 2003

In this research, the etching characteristics of via contact and deep contact hole have been studied using multi-pole inductively coupled plasma(MICP) etching system. We investigated Plasma density of MICP source using the Langmuir probe and etching characteristics with RF frequency, wall temperature, chamber gap, and gas chemistry containing Carbon and Fluorine. As the etching time increases, formation of the polymer increases. To improve the polymer formation, we controlled the temperature of the reacting chamber, and we found that temperature of the chamber was very effective to decrease the polymer thickness. The deep contact etch profile and high selectivity(oxide to photoresist) have been achieved with the optimum mixed gas ratio containing C and F and the temperature control of the etching chamber.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.692-693
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• 2002

Well-aligned multi-wall carbon nanotubes (MWNTs) were fabricated by utilizing a radio frequency plasma-enhanced chemical vapor deposition (rf-PECVD) system from Ni particles at the bottom of anodic alumina nanoholes (AAN). To remove the amorphous graphite layers on the AAN surface and to eliminate the protrusion of MWNT tips, the AAN surface with MWNTs were treated by external rf plasma source. As a result, the AAN surface almost became flat without having any protrusion of MWNT tips. The diameter, length of MWNTs and AAN were investigated by using a scanning electron microscopy (SEM). Raman spectroscopy was also used to characterize wall structure of the carbon nanotube. And the emission properties of the MWNTs were measured for the application of field emission display (FED) in near future.