• The Journal of the Institute of Internet, Broadcasting and Communication
• /
• v.23 no.4
• /
• pp.35-40
• /
• 2023

For the EMC test, the radiation characteristics and immunity characteristics of the EUT are measured under the condition that the EUT maintains its normal operation. For normal operation of the EUT, it is necessary to operate the EUT and monitor its status through separate equipment outside the anechoic chamber. External equipment operates and monitors the EUT through various communications such as 1553B communication, RS-485 communication, and Ethernet communication. At this time, external equipment can transmit noise through the communication line. This noise is transmitted to the LISN through the connected power cable and measured. It is also radiated through the connection terminal to the LISN. In this case, the communication line is the power line It should be designed so that noise is not transmitted through electromagnetic isolation as much as possible. In addition, noise from external equipment must be suppressed as much as possible from entering the chamber through the communication line. In this paper, external EUT test equipment applied for EMC test It explains the considerations in the design and manufacture of the design and explains the satisfaction of the design through tests including CE and RE.

• The Journal of Korean Society for Radiation Therapy
• /
• v.17 no.2
• /
• pp.155-160
• /
• 2005

Purpose : Many authors have been introduced field in field technique and 3-D conformal radiotherapy that increased the tumor dose as well as decreased the dose of abutting critical organ. These technique have multiple beam direction and small beam segments even below 10 MU(monitor unit)for each field. we have confirmed the influence of low MU on dose output and beam stability. Materials and Methods : To study the dose output, the dose for each field was always 90MU, but it divided into different segment size: 1, 2, 3, 5, 10, 15 segments, 90, 45, 30, 18, 9, 6 MU the measurements were carried out for X-ray energy 4 MV, 6 MV, 10 MV of three LINAC(Varian 600C, 2100C, 2100C, 2100C/D), in addition each measurement was randomly repeated three times for each energy. To study the field symmetry and flatness, X-omat V films were irradiated. After being developed, films were scanned and analyzed using densitometer. Results : Influence of low MU on dose is slightly more increase output about $1.2{\sim}2.9%$ in cGy/mu than 90MU, but may not changed beam quality(flatness or symmetry), Output stability depends on dose rate(PRF)rather than beam energy, field size. Conclusion : Presented result are under the limits(out put<3%, flatness<${\pm}3%$, symmetry<2%). The 3 accelerators are safe to use and to perform conformal radiotherapy treatments in small segments, small MU around 10MU. but Even if the result presented here under the limits, continuous adjustments and periodic QA should be done for use of small MU

• Journal of Wetlands Research
• /
• v.16 no.2
• /
• pp.281-291
• /
• 2014

In March to August 2013, the emission of gases ($CH_4$, VOC, $CO_2$, $O_2$, and LEL) was measured three times from the intertidal flat sediments at Sogeun-ri, Taean-gun, in the Mid-western seashore of Korea by using chamber method. After analyzing gas emission concentrations inside of flux enclosure chamber by using a GC equipped with Agilent 6890. The gas emission fluxes were calculated from a linear regression of the changes in the concentrations with time. The ranges of gas flux during the experimental period were $+0.06{\sim}+0.60mg/m^2/hr$ for $CH_4$, $+58.45{\sim}+95.58mg/m^2/hr$ for $CO_2$, $-0.02{\sim}-0.20mg/m^2/hr$ for $O_2$, and $-0.60{\sim}+0.65mg/m^2/hr$ for VOC, respectively. The flux measurement results revealed that $CH_4$ fluxes during March in the relatively low sediment temperature ($14.5^{\circ}C$) were significantly higher ($+0.60mg/m^2/hr$) than during June and August ($+0.06{\sim}+0.18mg/m^2/hr$) in high sediment temperature ($32.0{\sim}36.8^{\circ}C$). $CH_4$ flux to mean size of sediments and temperature of inner chamber exhibited strong positive correlation ($R^2=-0.97$ and $R^2=-0.89$, respectively).

• International Journal of Fluid Machinery and Systems
• /
• v.10 no.2
• /
• pp.146-153
• /
• 2017

Sediment flow through hydropower components causes hydro-abrasive erosion resulting in loss of efficiency, interruptions in power production and downtime for repair/maintenance. Online instruments are required to measure/capture the variations in sediment parameters along with collecting samples manually to analyse in laboratory for verification. In this paper, various sediment parameters viz. size, concentration (TSS), shape and mineral composition relevant to hydro-abrasive erosion were measured and discussed with respect to a hydropower plant in Himalayan region, India. A multi-frequency acoustic instrument was installed at a desilting chamber to continuously monitor particle size distribution (PSD) and TSS entering the turbine during 27 May to 6 August 2015. The sediment parameters viz. TSS, size distribution, mineral composition and shape entering the turbine were also measured and analysed, using manual samples collected twice daily from hydropower plant, in laboratory with instruments based on laser diffraction, dynamic digital image processing, gravimetric method, conductivity, scanning electron microscope, X-ray diffraction and turbidity. The acoustic instrument was able to capture the variation in TSS; however, significant deviations were found between measured mean sediment sizes compared to values found in the laboratory. A good relation was found for turbidity ($R^2=0.86$) and laser diffraction ($R^2=0.93$) with TSS, which indicated that turbidimeter and laser diffraction instrument can be used for continuous monitoring of TSS at the plant. Total sediment load passed through penstock during study period was estimated to be 15,500 ton. This study shall be useful for researchers and hydropower managers in measuring/monitoring sediment for hydro-abrasive erosion study in hydropower plants.

• Korean Journal of Materials Research
• /
• v.26 no.4
• /
• pp.207-211
• /
• 2016

Ti films were deposited on glass substrates under various preparation conditions in a chamber of two-facing-target type dc sputtering; after deposition, the electric resistivity values were measured using a conventional four-probe method. Crystallographic orientations and microstructures, including the texture and columnar structure, were also investigated for the Ti films. The morphological features, including the columnar structures and surface roughness, are well explained on the basis of Thornton's zone model. The electric resistivity and the thermal coefficient of the resistivity vary with the sputtering gas pressure. The minimum value of resistivity was around 0.4 Pa for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films; the apparent tendencies are almost the same for the two films, with a small difference in resistivity because of the different film thicknesses. The films deposited at high gas pressures show higher resistivities. The maximum of TCR is also around 0.4 Pa, which is the same as that obtained from the relationship between the resistivity and the gas pressure. The lattice spacing also decreases with increasing sputtering gas pressure for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films. Because they are strongly related to the sputtering gas pressures for Ti films that have a crystallographic anisotropy that is different from cubic symmetry, these changes are well explained on the basis of the film microstructures. It is shown that resistivity measurement can serve as a promising monitor for microstructures in sputtered Ti films.

• The Journal of Korean Society for Radiation Therapy
• /
• v.11 no.1
• /
• pp.6-10
• /
• 1999

The field size can be beam output, therefore MonitorUnit can be varied due to field size dependence The purpose of this study is to evaluate and compare the dose variation according to exchange of collimator The measurements were perfomed with Wellhofer dosimetry system(water phantom. ion chamber. electrometer. system controller. build up cap. etc)and two types of linear accerlerator (Mevatron KD, MevatronMX) Scatter can be affected to field size dependence and scatter correction is separated into collimator and phantom components, scatter components can affect by exchanging of collimator Measurements of collimator scatter factor(Sc) was done in air with build up cap. 1)Square field (5cm2 to 40cm2) was measured 2)and then keeping the upper jaw constant at loom and varing lower jaw from 5cm to 40cm, 3)keeping the lower jaw constant at 10cm and varing upper jaw from 5cm to 40cm Measurements of total scatter factor(Scp) was done in water at Dmax as the procedure of collimator scatter factor measurements in water Dmax The total scatter factors were obtained to the following equation(Sp=Scp/Sc) The measured data is normalized to the data of reference field size($10{\times}10$), rectangular field is inverted to equivalent field to compare three field size data As the collimator setting is varied, the output was changed In conclusion, the error was obtained small but it must be eliminated if we intend to reach the common stated goal of $5\%$ overall uncertainty in dose determination

• Journal of the Korean Magnetics Society
• /
• v.3 no.3
• /
• pp.229-233
• /
• 1993

The effects of differential partial pressures of oxygen during sputtering on the magnetic and recording characteristics of magneto-optical disks were investigated. Different flows of oxygen were deliberately introduced into the sputtering chamber to have a variety of partial pressures of oxygen during sputtering. A residual gas analyzer was employed to monitor the oxygen peak before, during, and after sputtering and to estimate the reacted oxygen amount. Most of the oxygen introduced into the chamaber was reacted during sputtering. As the partial pressure of oxygen increased, the oxygen content of the TbFeCoCr film increased also. The oxygen appeared to be bound as Tb-O, effectively decreasing the magnetically active Tb content of the film The coercivity decreased but the squareness of the Kerr hysteresis loops was still excellent. The perpendicular anisotropy was not significantly affected by oxygen amount. The carrier-to-noise ratio, includi!1g the write power sensitivity and bias field sensitivity did not change too much with oxygen content in the film The disks sputtered with oxygen showed better bias field sensitivity with lower write power threshold than the disk sputtered without oxygen, due to high demagnetization during domain formation. No significant degradation of coercivity for the disk sputtered oxygen was observed during an accelerated aging test.

• The Plant Pathology Journal
• /
• v.34 no.3
• /
• pp.236-240
• /
• 2018

Crop yield is critically related to the physiological responses and disease resistance of the crop, which could be strongly affected by high temperature conditions. We observed the changes in the growth of barley under higher than ambient air-temperature conditions using a temperature gradient field chamber (TGFC) during winter and spring. Before the stem extension stage of barley growth, Cladosporium sp. spontaneously appeared in the TGFC. The severity of disease became serious under warmer temperature conditions. Further, the stomata closed as the severity of the disease increased; however, stomatal conductance at the initial stage of disease was higher than that of the normal leaves. This was likely due to the Iwanov effect, which explains that stressed plants rapidly and transiently open their stomata before longer-term closure. In this study, we tested three optical methods: soil-plant analysis development (SPAD) chlorophyll index, photochemical reflectance index (PRI), and maximum quantum yield (Fv/Fm). These rapid evaluation methods have not been used in studies focusing on disease stress, although some studies have used these methods to monitor other stresses. These three indicative parameters revealed that diseased barley exhibited lower values of these parameters than normal, and with the increase in disease severity, these values declined further. Our results will be useful in efficient monitoring and evaluation of crop diseases under future warming conditions.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.523-523
• /
• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.22 no.5
• /
• pp.448-454
• /
• 2009

Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameters such as ICP power, $H_{2}O$ flow-rate and process pressure, Water dissociation percent in ICP reactor decrease with increase of chamber pressure, while increase with increase of ICP power and $H_{2}O$ flow rate. The effect of $CH_4$ gas addition to a water plasma on the hydrogen production has been studied in a HF ICP tubular reactor. The main roles of $CH_4$ additive gas in $H_{2}O$ plasma are to react with 0 radical for forming $CO_x$ and CHO and resulting additional $H_2$ production. Furthermore, $CH_4$ additives in $H_{2}O$ plasma is to suppress reverse-reaction by scavenging 0 radical. But, process optimization is needed because $CH_4$ addition has some negative effects such as cost increase and $CO_x$ emission.