• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.304-304
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• 2012

CIGS(CuInGaSe2) 태양전지의 후면전극(Back contact)으로 널리 사용되는 Mo 박막은 낮은 면저항, 높은 반사율, 광흡수층 Na-path 제공 등의 조건이 요구된다. 일반적으로 Mo 박막 제작은 DC 마그네트론 스퍼터링 방법이 가장 널리 사용되며, 제작조건에 따라 태양전지 효율에 강한 영향을 미치는 것으로 보고되고 있다. 본 연구에서는 DC 마그네트론 스퍼터링 시 기판에 이온빔(Ion-beam)을 동시 조사하는 이온 빔 스퍼터링 증착(Ion-beam sputter deposition)법으로 Mo 박막을 제작하였다. 제작된 박막의 전기적 및 광학적 특성은 4-point probe, UV-Vis-NIR spectrometer로 각각 조사하였으며 Na-path 제어를 위한 구조적 특성은 XRD, FE-SEM으로 분석하였다. 분석결과에 따르면 기존 DC 마그네트론 스퍼터링 방법보다 상대적으로 더 치밀한 구조와 높은 반사율을 가지는 박막이 제작됨을 알 수 있었다. Mo 박막의 최적조건은 DC power 300 W, Ion-gun power 50 W, Ar flow rate 20 sccm 였다.

• Korean Journal of Materials Research
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• v.20 no.12
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• pp.661-668
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• 2010

Cu(In,Ga)$Se_2$(CIGS) photovoltaic thin films were electrodeposited on Mo/glass substrates with an aqueous solution containing 2 mM $CuCl_2$, 8 mM $InCl_3$, 20 mM $GaCl_3$ and 8mM $H_2SeO_3$ at the electrodeposition potential of -0.6 to -1.0 V(SCE) and pH of 1.8. The best chemical composition of $Cu_{1.05}In_{0.8}Ga_{0.13}Se_2$ was found to be achieved at -0.7 V(SCE). The precursor Cu-In-Ga-Se films were annealed for crystallization to chalcopyrite structure at temperatures of 100-$500^{\circ}C$ under Ar gas atmosphere. The chemical compositions, microstructures, surface morphologies, and crystallographic structures of the annealed films were analyzed by EPMA, FE-SEM, AFM, and XRD, respectively. The precursor Cu-In-Ga-Se grains were grown sparsely on the Mo-back contact and also had very rough surfaces. However, after annealing treatment beginning at $200^{\circ}C$, the empty spaces between grains were removed and the grains showed well developed columnar shapes with smooth surfaces. The precursor Cu-In-Ga-Se films were also annealed at the temperature of $500^{\circ}C$ for 60 min under Se gas atmosphere to suppress the Se volatilization. The Se amount on the CIGS film after selenization annealing increased above the Se amount of the electrodeposited state and the $MoSe_2$ phase occurred, resulting from the diffusion of Se through the CIGS film and interaction with Mo back electrode. However, the selenization-annealed films showed higher crystallinity values than did the films annealed under Ar atmosphere with a chemical composition closer to that of the electrodeposited state.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1437-1439
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• 1996

In this paper, investigations on a three stage processing technique involving the co-evaporation of In-Se, Cu-Se and In-Se in this order at different deposition condition was undertaken. At first stage, we obtained good $In_{2}Se_{3}$ films by In-Se coevaporation. $In_{2}Se_{3}$ films show smooth and dense structure. And ration of In:Se was 2:3 $CulnSe_2$ thin films deposited by three stage process have shown strong adhesion on Mo coated glass substrates and good morphological properties suitable device fabrication. XWD spectra show single phase chalcopyrite $CulnSe_2$ films with strong orientation in the 112 plane. Resistivity of $CulnSe_2$ thin films was about $5{\times}10^{5}\;{\Omega}{\cdot}cm$. Surface morphology of CdS/$CulnSe_2$/Mo films was very good because of no pin holes.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.37.1-37.1
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• 2009

몰리브덴 금속박막(Metal Mo)은 우수한 전기전도도로 인해 $CuInSe_2$로 대표되는 I-III-$VI_2$족 화합물 반도체 박막태양전지에서 후면전극으로 널리 이용되고 있는 재료로서 일반적인 증착방법으로CVD, PVD, Thermal evaporation, Sol-gel 등이 있으며, 이중에서 Sputtering에 의한 증착법이 주로 사용되고 있다. 이에 본 연구에서는 $MoO_3$분말의 수소 환원 과정 중에 발생하는 기상인 $MoO_3(OH)_2$ 기상의 화학증기수송(CVT)를 이용하여 $MoO_x$ 박막을 증착하고 다시 수소분위기에서 수소 환원하는 증착법을 통해 균일하고 부착성이우수한 Mo 박막을 제조 하였다. $550^{\circ}C$, 60min의 유지시간에서 약 900nm의 균일한 $MoO_x$ 박막을 증착하였으며, $650^{\circ}C$, 15min 의 환원조건에서 모두 금속 몰리브덴 박막으로 상변화 함을 XRD와 SEM을 통해 확인하였다. 본 연구에서 사용된 화학증기수송에 의한 박막 증착은 기존의 공정에 비해 매우 저렴하며, 반응중에 유해하지 않은 부산물로 인해 환경 친화적이며 또한 대형화가 가능한 공정으로 많은 응용이 기대된다.

• Proceedings of the KSME Conference
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• 2008.11b
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• pp.2007-2010
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• 2008

Vanadium pentoxide ($V_2O_5$) powder was prepared and mixed with Molybdenum Oxides ($MoM_3$) to form Mo-doped and -undoped $VO_2$ films by a sol-gel method on graphite conductive substrates. X-Ray diffraction (XRD) and scanning electron microscopy (SEM) was used to investigate the chemical compositions and microstructures of the Mo-doped and -undoped $VO_2$ films. The variation of electrical resistance was measured as a function of temperature and stoichiometric composition between vanadium and molybdenum. In this study, it was found that Mo-doped and -undoped $VO_2$ shows the typical negative temperature coefficient (NTC) behavior. As the amount of the molybdenum increases, the electrical resistance of Modoped $VO_2$ film gets reduced under the transition temperature and a linear decrease in the transition temperature is observed. From these experimental results, we can conclude that the electrical resistance behavior with temperature change of $VO_2$ films can be utilized as a self-heating source with the electrical current flowing through the graphite substrate.

• Korean Journal of Metals and Materials
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• v.50 no.9
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• pp.653-657
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• 2012

In this study, a molybdenum disilicide ($MoSi_2$) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of $MoO_3$ powder at $750^{\circ}C$ for various holding times (1, 2, 3 h) in hydrogen atmosphere. A $4.3{\mu}m$ thick metallic molybdenum thin film was formed at 3 h. $MoSi_2$ was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using $Si:Al_2O_3:NH_4Cl=5:92:3$ (wt%) packs at $900^{\circ}C$ for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a $MoSi_2$ layer was coated successfully and a $15.4{\mu}m$ thickness was observed.

• Proceedings of the Korean Nuclear Society Conference
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• 1998.05b
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• pp.273-278
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• 1998

The phase stability of atomized U-10wt. ％Mo powder and the thermal compatibility of dispersed fuel meats at 40$0^{\circ}C$ and 50$0^{\circ}C$ have been characterized. Atomized U-10Mo powder has a good \ulcorner-U phase stability, and excellent thermal compatibility with aluminum matrix in a dispersion fuel. It is thought that the good phase stability is related to th large supersaturation of Mo atoms in the atomized particles. The reasons for the excellent thermal compatibility have been considered to be as follows. Before thermal decomposition of ${\gamma}$-U in particle, supersaturated Mo atoms at ${\gamma}$-U grain boundaries inhibit the diffusion of Al atoms. After thermal decomposition of ${\gamma}$-U into ${\gamma}$-U and U$_2$Mo, the intermetallic compound of U$_2$Mo seems to retard the penetration of Al atoms. The penetration mechanisms of aluminum atoms in the atomized particles are assumed be classified as (a) diffusion through the reacted layer between fuel particles and Al matrix leaving a kernel-like unreacted island and (b) diffusion along grain boundaries showing several unreacted islands and more reacted regions.

• Current Photovoltaic Research
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• v.7 no.1
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• pp.1-8
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• 2019

The $Cu(In,Ga)Se_2$ (CIGS) thin film obtained by two-step process (metal deposition and Se annealing) has a rough surface morphology and many voids at the CIGS/Mo interface. To solve the problem a precursor that contains Se was employer by depositing a (In,Se)/(Cu,Ga) stacked layer. We devised a two-step annealing (vacuum pre-annealing and Se annealing) for the precursor because direct annealing of the precursor in Se environment resulted in the small grains with unwanted demarcation between stacked layers. After vacuum pre-annealing up to $500^{\circ}C$ the CIGS film consisted of CIGS phase and secondary phases including $In_4Se_3$, InSe, and $Cu_9(In,Ga)_4$. The secondary phases were completely converted to CIGS phase by a subsequent Se annealing. A void-free CIGS/Mo interface was obtained by the two-step annealing process. Especially, the CIGS film prepared by vacuum annealing $450^{\circ}C$ and subsequent Se annealing $550^{\circ}C$ showed a densely-packed grains with smooth surface, well-aligned bamboo grains on the top of the film, little voids in the film, and also little voids at the CIGS/Mo interface. The smooth surface enhanced the cell performance due to the increase of shunt resistance.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.399.2-399.2
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• 2016

Cu(In,Ga)Se2 (CIGS) 박막 태양전지는 높은 효율과 낮은 제조비용, 높은 신뢰성으로 인해 박막 태양전지 중 가장 각광받고 있다. 특히 유리기판 대신 가볍고 유연한 철강소재나 플라스틱 소재를 이용하여 발전분야 외에 건물일체형, 수송용, 휴대용등 다양한 분야에 적용이 가능하다. 이러한 유연 기판을 이용한 CIGS 태양전지의 개발을 위해서는 기판의 특성에 따른 다양한 공정개발이 선행되어야 한다. Poly-imide와 같은 유연기판은 공정온도가 $400^{\circ}C$이하로 낮고 기판이 매우 얇아 기존 Mo 공정을 개선하여야한다. 이러한 유연기판의 특성을 고려하여 본 연구에서는 기존 bi-layer Mo의 bottom layer의 두께를 조절하여 박막의 strain을 조절하였다. 유연기판으로는 SKC KOLON에서 제조된 GL type의 기판을 사용하였다. 기판의 두께는 50um이다. 먼저 Mo의 bottom layer 두께 비율을 기존 12.5%에서 50%로 증가 시켰으며 전체 박막의 두께 역시 900nm에서 500nm로 두께를 감소시키며 실험을 실시하였다. 그 후 흡수층은 Co-Evaporation 방법을 이용하여 제조하였으며 이때 공정온도는 기존 공정온도에서 450, $400^{\circ}C$로 낮추어 흡수층을 제조하였다. 소자 제조 후 초기 Mo의 strain 개선과 저온공정이 적용되지 않은 경우 4.4%에서 공정 최적화 후 13%로 효율이 증가하였다. 제조된 흡수층은 SEM, XRF, XRD등을 이용하여 분석하였으며 그 외 일반적인 방법을 이용하여 Mo, CdS, TCO, Al grid를 제조하였다. AR 코팅은 제외 하였으며 제조된 소자는 솔라 시뮬레이터를 이용하여 효율 특성 분석을 실시하였으며 Q.E. 분석을 실시하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.361.2-361.2
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• 2014

Transition metal dichalcogenides (MoS2, WS2, WSe2, MoSe2, NbS2, NbSe2, etc.) are layered materials that can exhibit semiconducting, metallic and even superconducting behavior. In the bulk form, the semiconducting phases (MoS2, WS2, WSe2, MoSe2) have an indirect band gap. Recently, these layered systems have attracted a great deal of attention mainly due to their complementary electronic properties when compared to other two-dimensional materials, such as graphene (a semimetal) and boron nitride (an insulator). However, these bulk properties could be significantly modified when the system becomes mono-layered; the indirect band gap becomes direct. Such changes in the band structure when reducing the thickness of a WS2 film have important implications for the development of novel applications, such as valleytronics. In this work, we report for the controlled synthesis of large-area (~cm2) single-, bi-, and few-layer WS2 using a two-step process. WOx thin films were deposited onto a Si/SiO2 substrate, and these films were then sulfurized under vacuum in a second step occurring at high temperatures ($750^{\circ}C$). Furthermore, we have developed an efficient route to transfer these WS2 films onto different substrates, using concentrated HF. WS2 films of different thicknesses have been analyzed by optical microscopy, Raman spectroscopy, and high-resolution transmission electron microscopy.