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http://dx.doi.org/10.3365/KJMM.2012.50.9.653

Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation  

Jeon, In Mok (Department of Materials Science and Engineering, Hanyang University)
Byun, Jong Min (Department of Materials Science and Engineering, Hanyang University)
Kim, Se Hoon (Department of Materials Science and Engineering, Hanyang University)
Kim, Jin Woo (Department of Materials Science and Engineering, Hanyang University)
Kim, Young Do (Department of Materials Science and Engineering, Hanyang University)
Publication Information
Korean Journal of Metals and Materials / v.50, no.9, 2012 , pp. 653-657 More about this Journal
Abstract
In this study, a molybdenum disilicide ($MoSi_2$) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of $MoO_3$ powder at $750^{\circ}C$ for various holding times (1, 2, 3 h) in hydrogen atmosphere. A $4.3{\mu}m$ thick metallic molybdenum thin film was formed at 3 h. $MoSi_2$ was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using $Si:Al_2O_3:NH_4Cl=5:92:3$ (wt%) packs at $900^{\circ}C$ for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a $MoSi_2$ layer was coated successfully and a $15.4{\mu}m$ thickness was observed.
Keywords
thin films; coating; diffusion; scanning electron microscopy (SEM); hydrogen reduction;
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