Holosymmetric 4-Mirror Optical System(Unit Maginification) for Deep Ultraviolet Lithography Obtained from the Exact Solution of All Zero Third Order Aberrations (모든 3차 수차를 제거하여 얻은 극자외선 Lithography용 4-반사경 Holosymmetric System(배율=1))
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- Korean Journal of Optics and Photonics
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- v.4 no.3
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- pp.252-259
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- 1993