• 한국공작기계학회논문집
• /
• 제17권2호
• /
• pp.1-6
• /
• 2008

In recent years, developments in the semiconductor and electronic industries have brought a rapid increase in the use of large size silicon wafer. For further improvement of the ultra precision surface and flatness of Si wafer necessary to high density ULSI, it is known that polishing is very important. However, most of these investigation was experiment less than 300mm diameter. Polishing is one of the important methods in manufacturing of Si wafers and in thinning of completed device wafers. This study reports the machining variables that has major influence on the characteristic of wafer polishing. It was adapted to polishing pressure, machining speed, and the slurry mix ratio, the optimum condition is selected by ultra precision wafer polishing using load cell and infrared temperature sensor. The optimum machining condition is selected a result data that use a pressure and table speed data. By using optimum condition, it achieves a ultra precision mirror like surface.

• 한국소음진동공학회:학술대회논문집
• /
• 한국소음진동공학회 2005년도 추계학술대회논문집
• /
• pp.205-208
• /
• 2005

Fabrication of large scaled mirror for the telescope application is the most challenging technology in recent year. Sophisticate technologies and know-how in fabrication and measurement are required to overcome the technological obstacles. KRISS(Korea Research Institute for Standards and Science) is now developing a large scaled mirror fabrication facility and KARI(Korea Aerospace Research Institute) is supporting the development. High precision interferometric test is required during the grinding and polishing of mirror to identify the surface profile precisely. The required fabrication accuracy of the mirror surface profile is $\lambda$/50 ms($\sim$10 nm for visible wave length). Thus the measurement accuracy should be far less than 10 m. To get this requirement, it is necessary to provide vibration free environment for the interferometer system and mirror under test. Thus the vibration responses on the mirror supporting table due to external vibration should be minimized by using a special isolation system. And the responses on the top of the tower, which hold the interferometer during test, should be minimized simultaneously. In this paper, we propose the concept design of vibration suppression system for the KRISS mirror fabrication facility.

• 한국정밀공학회지
• /
• 제21권1호
• /
• pp.109-115
• /
• 2004

Polishing process has been applied to get extremely fine surfaces, e.g., mirror surfaces such as optical mirrors, lens, molds and etc. Nowadays not only fine surface quality but also submicron order of dimensional accuracy is required for many applications. To meet the requirements polishing process should be provided with an active control of polishing pressure especially for automation of polishing process. In this paper a study on development of an active polishing pressure control system has been presented. A new type of tool assembly has been developed to facilitate the control. The tool is attached to an axis of a polishing machine with a coil spring and control of the polishing pressure is done by the position control of the axis, which needs no additional actuator. The polishing pressure is successfully measured by the measurement of the spring deformation. Control specifications were quantitatively considered by weighting functions and a controller was designed by using loop-shaping technique based on the no synthesis. Some experiments have been executed on a polishing machine with a PC-NC controller. It is shown that the results were coincident well with the theoretical analyses and satisfied the design specifications.

• 한국정밀공학회지
• /
• 제21권1호
• /
• pp.40-45
• /
• 2004

Recently, aspheric optical lenses and mirrors, which are harder to manufacture and measure than the conventional spherical ones, are widely used, particularly in electronic fabrication process. Generally, interferometric optical method is used for the measurement of spherical optical surface. However, the interferometric method for aspheric surface measurement is difficult because it needs a precise null corrector and strict environmental conditions such as constant temperature, humidity and vibrations. We have been studied on the manufacturing of aspheric optics to improve the surface profile accuracy and productivity using a corrective polishing process. For the corrective polishing, a practical method of On-Machine Measurement (OMM) is required. For this purpose, an optical OMM system has been studied using the Shach-Hartmann test, which is very robust to the practical polishing environment. The wavefront has been reconstructed from the measured data using the primary aberration polynomial function by the least squares fitting. The measured result of the OMM system shows that the maximum deviation is less than 200 nm for the one of commercial Fizeau interferometer Wyko 6000.

• 대한기계학회논문집A
• /
• 제35권12호
• /
• pp.1641-1646
• /
• 2011

자기연마공정은 유동성이 높은 연마입자를 활용하기 때문에 곡면 및 그루브 형상에도 적용이 가능한 장점을 지니고 있다. 본 연구에서는 제 2세대 자기연마법을 활용하여 그루브 형상에 대한 자기연마가공 특성을 평가하여, 이를 향후 연료전지 채널과 같은 3차원 형상의 자기연마에 활용하고자 한다. 실험은 최대 1.5mm 깊이의 그루브에 대해 자기연마가공 후 슬롯부 및 랜드부의 표면거칠기 변화를 관찰하였다. 그 결과 랜드부의 길이가 증가하고 그루브의 깊이가 깊어질수록 랜드부의 표면거칠기 향상정도는 높아졌다. 또한 슬롯부의 표면거칠기 향상정도는 랜드부와 슬롯부의 길이비가 증가하고 그루브의 깊이가 깊어질수록 감소하는 경향을 나타내었다. 마지막으로 자기연마가공을 통해서 그루브의 형상에는 큰 변화없이, 그루브의 모서리에 생성된 버를 효과적으로 제거할 수 있었다.

• 한국정밀공학회지
• /
• 제32권1호
• /
• pp.69-74
• /
• 2015

Cadmium telluride (CdTe) is being developed for thin film of the X-Ray detector recently. But a rough surface of the CdTe should be improved for resolution and signal speed. This paper shows the study on the improvement of surface roughness and removal rate by applying Chemical Mechanical Polishing. The conventional potassium hydroxide (KOH) based colloidal silica slurry could not realize a mirror surface without physical defects, resulting in low material removal rate and many scratches on surface. In order to enhance chemical reaction such as form oxidized layer on the surface of cadmium telluride, we used hydrogen peroxide ($H_2O_2$) as an oxidizer. Consequently, in case of 3 wt% concentration of hydrogen peroxide, the highest MRR (938 nm/min) and the lowest surface roughness ($R_{p-v}=10.69nm$, $R_a=0.8nm$) could be obtained. EDS was also used to confirm the generated oxide of cadmium telluride surface.

• 한국광학회:학술대회논문집
• /
• 한국광학회 2001년도 제12회 정기총회 및 01년도 동계학술발표회
• /
• pp.96-97
• /
• 2001

A 110 mm diameter aspheric metal secondary mirror for a test model of an earth observation satellite camera was fabricated by ultra-precision single point diamond turning (SPDT) . Without a conventional polishing process, the surface texture of R$\sub$a/=2.8 nm, and the form error of R$\sub$a/=0.05 λ has been stably achieved In a laboratory condition. (omitted)

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 1997년도 춘계학술대회 논문집
• /
• pp.1009-1014
• /
• 1997

The small material removal rate of elastic emission machinong (EEM) becomes a serious problem due to using fine powder particles for obtaining finished of high quality. If a cylindrical polyurethane-wheel is used as a tool for accelerating powder particles, the efficiency of machining may be increased through enlarging the machining regionand increasing the surface velocity of the wheel. If these analyicl results are compared with experimental ones, characteristics of EEM using polyurethan-wheel can be clarified. In this study, effects of EEM using cylindrical polyurethane-wheel on the surface roughness and the material removal rate were verified through polishing of the brittle material under various conditions. The high-efficient polishing of silicon wafer has been also carried out using this method.

• 한국기계가공학회지
• /
• 제6권3호
• /
• pp.65-70
• /
• 2007

Generally, the core component of small precise optical device demands high accuracy of manufacturing processes. Although, the geometry of it is simple, the manufacturing technique to materialize is categorized as the ultra-precision machining and it must be done with the specialized machines and by the trained operator. Typical examples of small precise optical device are laser printer and phone camera. As a core part of laser printer, polygon mirror is used in laser scanning unit(LSU). It couldn't be fabricated with conventional machine but specified machine for polygon mirror machining. In this study, Polygon mirror with 16 surfaces was manufactured in the process of ultra-precision fly-cutting with Al material and investigated optimum machining conditions in terms of feedrate, pitch per cycle and depth of cut. Owing to process of polishing has bad influence on reflection angle, surface roughness, $R_{max}$=10nm, and form error, $Ra={\lambda}/10({\lambda}=632nm)$, are prerequisites for polygon mirror.

• 한국정밀공학회지
• /
• 제25권8호
• /
• pp.21-28
• /
• 2008

Fizeau interferometer is used for inspecting the lens surface profile accurately. This study is focused on the design and optical measuring techniques for large optical components, such as a reflection mirror for large area lithography or astronomical purpose. A tower type Fizeau interferometer is designed and set up in horizontally with a 45$^{\circ}$ fold mirror which makes easy to align the optical path of heavy interferometer system. To align the optical path, a five-axes stage for the interferometer is required. This study shows a method of the 45$^{\circ}$ fold mirror alignment by using a three-axis stage instead of adjusting the interferometer itself or measuring object. This system will be installed on the large optics polishing machine during the manufacturing process as an on-machine inspection system.