• 제목/요약/키워드: Microwave Plasma

검색결과 398건 처리시간 0.023초

Growth of nickel-catalyzed carbon nanofibers using MPCVD method and their electrical properties

  • Kim, Sung-Hoon
    • 한국결정성장학회지
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    • 제14권1호
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    • pp.1-5
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    • 2004
  • Carbon nanofilaments were formed on silicon substrate via microwave plasma-enhanced chemical vapor deposition method. The structure of carbon nanofilaments was identified as the carbon nanofibers. The extent of carbon nanofibers growth and the diameters of carbon nanofibers increased with increasing the total pressure. The growth direction of carbon nanofibers was horizontal to the substrate. Laterally grown carbon nanofibers showed the semiconductor electrical characteristics.

Treatment of Refractory Melasma with Microwave-generated, Atmospheric-pressure, Non-thermal Nitrogen Plasma

  • Kim, Hyun-Jo;Kim, Heesu;Kim, Young Koo;Cho, Sung Bin
    • Medical Lasers
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    • 제8권2호
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    • pp.74-79
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    • 2019
  • Periorbital melasma is often refractory to treatment and highly associated with rebound hyperpigmentation or mottled hypopigmentation after laser treatment in Asian patients. In this report, we describe 2 patients with cluster-1 periorbital melasma and 1 patient with cluster-2 periorbital melasma who experienced remarkable clinical improvements after microwave-generated, atmospheric-pressure, non-thermal nitrogen plasma treatments. All patients exhibited limited clinical responses after combination treatments with topical bleaching agents, systemic oral tranexamic acid, and low-fluenced Q-switched neodymium (Nd):yttrium-aluminum-garnet (YAG) lasers. Low-energy nitrogen plasma treatment at 0.75 J elicited remarkable clinical improvement in the periorbital melasma lesions without post-laser therapy rebound hyperpigmentation and mottled hypopigmentation. We deemed that a single pass of nitrogen plasma treatment at 0.75 J induces mild microscopic thermal tissue coagulation and modification within the epidermis while preserving the integrity of the basement membrane in patients with periorbital melasma. Accordingly, nitrogen plasma-induced dermal tissue regeneration could play a role in the treatment of melasma lesions.

Beneficial Effects of Microwave-Induced Argon Plasma Treatment on Cellular Behaviors of Articular Chondrocytes Onto Nanofibrous Silk Fibroin Mesh

  • Jin, Soo-Chang;Baek, Hyun-Sook;Woo, Yeon-I;Lee, Mi-Hee;Kim, Jung-Sung;Park, Jong-Chul;Park, Young-Hwan;Rah, Dong-Kyun;Chung, Kie-Hyung;Lee, Seung-Jin;Han, In-Ho
    • Macromolecular Research
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    • 제17권9호
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    • pp.703-708
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    • 2009
  • Silk fibroin scaffolds were examined as a biomaterial option for tissue-engineered cartilage-like tissue. In tissue engineering for cartilage repair using a scaffold, initial chondrocyte-material interactions are important for the following cell behaviors. In this study, the surface of nanofibrous silk fibroin (NSF) meshes was modified by a microwave-induced argon plasma treatment in order to improve the cytocompatibility of the meshes used as cartilaginous grafts. In addition, the effects of a plasma treatment on the cellular behavior of chondrocytes on NSF were examined. The plasma treatment resulted in an increase in the hydrophilicity of NSF meshes suggesting that the cytocompatibility of the mesh might be improved. Furthermore, the human articular chondrocytes showed higher viability on the surface-modified NSF meshes. These results suggest that the surface modification of NSF meshes by plasma can enhance the cellular behavior of chondrocytes and may be used in tissue engineering.

플라즈마 가시광 구동을 위한 초고주파 전계 집속형 도파관 시스템에 관한 연구 (A Study on the Microwave Electric-Field Focusing Waveguide Systems for Driving Plasma Visible Light)

  • 전후동;박의준
    • 한국전자파학회논문지
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    • 제20권3호
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    • pp.303-312
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    • 2009
  • 본 연구에서는 초고주파를 사용하여 플라즈마 가시광을 발생시키기 위한 전계 집속형 도파관 시스템을 제안하였다. 이 시스템은 초고주파 전력 공급기인 마그네트론, 전력 전송을 위한 도파관부 및 메쉬형 공동으로 이루어진 반응기로 구성된다. 소량의 황 분말과 버퍼 가스인 Ar이 봉입된 석영 벌브를 반응기 내에 위치시키고, 강한 전계를 집속시킴으로써 황 플라즈마가 생성 및 여기되도록 하였다. 즉, 도파관과 반응기의 내벽에 각각 도체팁을 장착시키고, 그 사이에 플라즈마 벌브를 위치시킴으로써 벌브에 강한 전계가 집중되도록 하였다. 또한 플라즈마 생성 과도기에서, 플라즈마의 전기적 도전성 변화에 따른 정합 특성의 열화를 최소화할 수 있는 도파관부를 설계하여 안정적으로 동작되도록 하였다. 최종적으로 2.45 GHz 알루미늄 도파관 시스템을 제작하고, 400W급 마그네트론을 사용한 가시광 방출 실험을 통해 설계된 시스템의 타당성을 검증하였다.

전형적인 열처리와 마이크로웨이브 열처리에 따른 PDP용 전극과 투명 유전체의 동시 소성 (Co-firing of Dielectric and Electrode with Conventional and Microwave Heating in Plasma Display Panel)

  • 황성진;;;김형순
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.463-463
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    • 2008
  • The glass frit has been used in transparent dielectric, barrier rib and electrode of PDP (Plasma display panel). In PDP fabrication, the firing temperature of glass frit is normally 550~$580^{\circ}C$ with conventional heating. However, there are a problem that silver in electrode is diffused throughout the transparent dielectric. For inhibiting the Ag diffusion we considered use of the microwave heating. We investigated firing of glass frit compared between conventional and microwave heating. After firing by two types of heating, the diffusion of silver is determined using a optical microscope and UV-spectrometer. Based on the our results, the microwave heating should be a candidate to heating source for high efficacy in PDP.

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ECR 산소 플라즈마를 이용한 저온 열산화 (Low Temperature Thermal Oxidation using ECR Oxygen Plasma)

  • 이정열;강석원;이진우;한철희;김충기
    • 전자공학회논문지A
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    • 제32A권3호
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    • pp.68-77
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    • 1995
  • Characteristics of electron cyclotron resonance (ECR) plasma thermal oxide grown at low-temperature have been investigated. The effects of several process parameters such as substrate temperature, microwave power, gas flow rate, and process pressure on the growth rate of the oxide have been also investigated. It was found that the plasma density, reactive ion species, is strongly related to the growth rate of ECR plasma oxied. It was also found that the plasma density increases with microwave power while it decreases with decreasing O2 flow rate. The oxidation time dependence of the oxide thichness showed parabolic characteristics. Considering ECR plasma thermal oxidation at low-temperature, the linear as well as parabolic rate constants calculated from fitting data by using the Deal-Grove model was very large in comparison with conventional thermal oxidation. The ECR plasma oxide grown on (100) crystalline-Si wafer exhibited good electrical characteristics which are comparable to those of thermal oxide: fixed oxide charge(N$_{ff}$)= 7${\times}10^{10}cm^{-2}$, interface state density(N$_{it}$)=4${\times}10^[10}cm^{-2}eV^{-1}$, and breakdown field > 8MV/cm.

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As 이온 주입된 비정질 탄소 박막의 마이크로플라즈마 화학기상증착법에 의한 자동 어닐링 효과에 관한 연구 (Self Annealing Effects of Arsenic Ion Implanted Amorphous Carbon Films during Microwave Plasma Chemical Vapor Deposition)

  • 조의식;권상직
    • 한국진공학회지
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    • 제22권1호
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    • pp.31-36
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    • 2013
  • 마이크로플라즈마 화학기상증착법(microwave plasma enhanced chemical vapor deposition, MPCVD)에 의하여 형성된 비정질 탄소 박막의 효율적인 도핑 공정을 위하여, 비정질 탄소 박막의 성장 직전 nucleated seed 상태의 기판 혹은 일부 성장된 박막 위에 비소(As) 이온을 이온 주입하였고 그 직후 다시 MPCVD에 의하여 박막을 성장시켰다. MPCVD에 의한 성장 자체가 약 $500{\sim}600^{\circ}C$ 온도에서의 어닐링 공정을 대체할 수 있으므로, 기존의 이온 주입 후 별도의 어닐링 공정과 비교 시 간략화된 공정으로도 어닐링 효과가 있다고 할 수 있다. 이온 주입 후 박막 성장으로 어닐링 효과를 얻은 비정질 탄소 박막의 경우, $2.5V/{\mu}m$의 전계에서 약 $0.1mA/cm^2$의 전계 방출 특성을 관찰할 수 있었고 또한 라만 스펙트럼 특성에서도 다이아몬드 특성 및 그래파이트 특성 모두 뚜렷이 관찰되었다. 전기적, 구조적 특성 관찰로부터 이온 주입된 As 이온이 자동 어닐링 효과에 의해 충분히 비정질 탄소 박막에 도핑되었다고 할 수 있다.

대면적 증착용 선형 초고주파 플라즈마 장치 제작 및 정전 탐침법을 이용한 Ar 플라즈마 특성 분석과 온도 특성 분석 (Fabrication of Microwave PECVD with Linear Antenna for large-scale deposition processing, and Analysis of Ar plasma characteristics using Electrostatic Probe and Temperature Characteristics)

  • 한문기;서권상;김동현;이호준
    • 전기학회논문지
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    • 제64권3호
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    • pp.422-428
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    • 2015
  • A 2.45GHz microwave plasma source with a linear antenna has been developed for low temperature large scale deposition processing. Microwave power is transmitted through WR340 waveguide and a copper rod, linear antenna, is located in a quartz tube. The power matching is effectively achieved by a linear antenna is located at ${\lambda}_g/4$ or $3{\lambda}_g/4$ from the end of WR340 waveguide. The Ar plasma was generated along the surface of quartz tube and a clear standing wave pattern with nearly 10cm wavelength was observed at Ar pressure of 200mTorr and 200W input power. The electron density and electron temperature were investigated by using the electrostatic probe. The electron density and electron temperature were highly measured near the surface of quartz tube. Ar plasma density along the quartz tube is mostly uniform despite standing wave set-up and antenna of long length. A uniform temperature was measured at 10~40cm distance from the end quartz tube and 5cm distance from the surface of quartz tube.

Ar-H2플라즈마 건식제련과 마이크로웨이브침출을 통한 지르콘샌드로부터 고순도 지르코니아 분리 (Separation Technology of Pure Zirconia from Zirconsand by the Ar-H2 Arc Plasma Fusion and Sulfuric Acid Leaching with Microwave Irradiation)

  • 이정한;홍성길
    • 자원리싸이클링
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    • 제25권3호
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    • pp.49-54
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    • 2016
  • 본 연구에서는, 아크 플라즈마 정련을 이용하여 지르콘샌드($ZrSiO_4$)를 지르코니아($ZrO_2$)와 실리카($SiO_2$)로 분리하였다. 실리카를 마이크로웨이브 침출을 통해 제거하고 고순도의 지르코니아를 얻었다. 플라즈마 퓨전은 두 가지 공정을 순차적으로 진행하였다. Ar 100% 분위기에서 환원 공정을 거친 후, Ar-$H_2$ 혼합 가스를 통해 정련과정을 거쳤다. 진공 챔버 내에서 냉각 후 지르코니아와 실리카로 이루어진 고상을 얻었다. 마이크로웨이브 침출을 위해 $240^{\circ}C$, 20% 황산용액을 사용하였다. 분석 결과 고순도(98.6%)의 지르코니아를 얻을 수 있었다.