Fabrication of Microwave PECVD with Linear Antenna for large-scale deposition processing, and Analysis of Ar plasma characteristics using Electrostatic Probe and Temperature Characteristics |
Han, Moon-Ki
(Dept. of Electrical and Computer Engineering, Pusan National University)
Seo, Kwon-Sang (Dept. of Electrical and Computer Engineering, Pusan National University) Kim, Dong-Hyun (Dept. of Electrical and Computer Engineering, Pusan National University) Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University) |
1 | M. Moisan, J. Pelletier, Microwave Excited Plasmas, Plasma Technology, vol. 4, Elsevier, Amsterdam, 1992. |
2 | C. C. Motta et al., Complex Permittivity Measurement in Dielectric Waveguide Filled with Argon Plasma, SBM0/IEEE MIT-5 IMOC Proceedings |
3 | Journal of the Korean Vacuum Society Vol.17 No.5, September 2008, pp.408~418 DOI ScienceOn |
4 | J Krupka et al., Meas. Sci. Technol. 10 (1999) 387.392. Printed in the UK |
5 | Journal of Welding and Joining, Vol.32 No.3(2014) pp34-42 DOI |
6 | Chin-Wook Chung, “Plasma Electronics”, Cheongmoongak (2013) |
7 |
Wolfgang Petasch, Günter Peer, et al., “Microwave Plasma for Superior Substrate Pre-treatment in Chip-packaging Technologies”, PVA TePla AG(2003) ( |
8 | H. Schlemm et al. / Surface and Coatings Technology 174 –175 (2003) 208–211 |
9 | L. Wartski, C. Schwebel, J. Aubert, Rev. Sci. Instrum. 67 (3) (1996) 895 DOI |