• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2003.05a
• /
• pp.66-67
• /
• 2003

• The Journal of Korean Institute of Electromagnetic Engineering and Science
• /
• v.19 no.5
• /
• pp.556-561
• /
• 2008

The characteristics of microwave reflectometry, which is based on the technologies of FM radar and is applied as a non-invasive method to examine the properties including density distribution of inhomogeneous media, is investigated. The microwave reflectometry system requires not only an optimized system hardware but as well as the understanding of system response from the media under test in order to provide the system solution describing the object under test quantitatively. The introduction of microwave reflectometry especially in the area of applied plasma physics has been relatively new and the number of usage is found to be increasing gradually. The experimental method to characterize the microwave system as a device to examine the properties of plasma is explained. The microwave reflectometry signals consist of the cutoff signals which originate from the region where most of the reflected power comes from and the scattered signals which result as an interaction of the microwave and the density perturbations. This paper describes the experimental results of the scattered signal from the microwave reflectometry, such as the wavenumber dependence and the sensitivity on density perturbation, and the comparison of the characteristics with those from the numerical simulations and those from the cutoff signals.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
• /
• v.25 no.4
• /
• pp.79-87
• /
• 2011

In this paper, the best conditions for the deposition of the high quality diamond thin-film from N-hexane as a carbon source in the microwave plasma process was carried out. Major parameters are the deposition time, flow rates of oxygen and hexane. The deposition time for the steady state thin-film was required more than 4[h], and the suitable flow rates of hexane and oxygen for the high-quality thin-film are 0.4[sccm] and 0.1~0.2[sccm], respectively. In addition, amorphous carbons such as DLC and graphite were grown by increasing the flow rate of hexane, and it decreased by increasing the flow rate of oxygen. Specifically, the growth rate is about 1.5[${\mu}mh-1$] under no addition of oxygen and it decreased about 60[%] as ca. 1.0[${\mu}mh-1$] with oxygen.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.64 no.4
• /
• pp.567-572
• /
• 2015

Discharge characteristics of linear microwave plasma were investigated by using fluid simulation of 2D axis-symmetry based on finite elements method. The microwave power was 2.45 GHz TEM mode and transmitted through linear antenna. Resistive power and pressure were considered simulation variables and argon was used for working gas. A decrease of electron density along the quartz tube was observed in low power condition but relatively uniform plasmas were generated in chamber by increasing the resistive power. The electron temperature was highly detected near the surface of quartz tube because the electron was heated only dielectric surface. The power transmission efficiency decreased and characteristics of surface plasma were observed in high electron density condition.

• Journal of Microbiology and Biotechnology
• /
• v.14 no.1
• /
• pp.188-192
• /
• 2004

The main aim of this study was to investigate the sterilization effects of microwave-induced argon plasma at atmospheric pressure on paper materials contaminated with fungi. Plasma-treated filter papers showed no evidence to an unaided eye of burning or paper discoloration due to the plasma treatment. All fungi were perfectly sterilized in less than 1 sec, regardless of strains. These results indicate that this sterilization method for paper materials is easy to use, requires significantly less time than other traditional methods and different plasma sterilization methods, and is also nontoxic.

• Journal of the Korean Chemical Society
• /
• v.40 no.4
• /
• pp.235-242
• /
• 1996

A surfatron-type microwave induced plasma (MIP) cavity has been constructed, which can be easily interfaced with a gas chromatograph. Various plasma gases such as He, Ar and N2 were used to generate the MIP and small amounts of CO2 gases were injected through the MIP to obtain characteristic spectrum of each plasma gas and to study feasibility of the MIP as a soft ionization source. Since He and Ar plasmas have high metastable state energy, it was not possible to detect sample gas in molecular state. With N2 plasma, however, a strong emission of molecular ions could be detected owing to its low metastable state energy.

• The Korean Journal of Ceramics
• /
• v.2 no.4
• /
• pp.197-202
• /
• 1996

The highly oriented diamond particles were deposited on the mirror-polished (100) silicon substrates in the bell-jar type microwave plasma deposition system using a three-step process consisting if carburization, bias-enhanced nucleation and growth. By adjusting the geometry of the substrate and substrate holder, very dense disc-shaped plasma was formed over the substrate when the bias voltage was below -200V. Almsot perfectly oriented diamond films were obtained only in this dense disc-shaped plasma. From the results of the optical emission spectra of the dense disc-shaped plasma, it was found that the concentrations of atomic hydrogen and hydrocarbon radical were increased with negative bias voltage. It was also found that the highly oriented diamonds were deposited in the region, where the intensity ratios of carbonaceous species to atomic hydrogen are saturated.

• Textile Coloration and Finishing
• /
• v.21 no.3
• /
• pp.19-25
• /
• 2009

Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 ${\mu}m$ 3 ${\mu}m$ were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.

• KIEE International Transactions on Electrophysics and Applications
• /
• v.4C no.5
• /
• pp.236-240
• /
• 2004

In this paper we examine the reflection characteristics of dielectric microstrip lines with open-ended termination containing an optically induced plasma region, which are analyzed by the assumption that the plasma is distributed homogeneously in laser illumination. The characteristics impedances resulting from the presence of plasma are evaluated by the transmission line model. To estimate theoretically the characteristic response of identical systems in the time domain, the Fourier transformation method is evaluated. The reflection characteristics of time and frequency response in microwave systems have been calculated using an equivalent circuit model.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.07b
• /
• pp.791-794
• /
• 2003

DLC thin films were prepared by microwave plasma-enhanced chemical vapor deposition method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas mixture. The negative DC bias ($-450V{\sim}-550V$) was applied to enhance the adhesion between the film and the substrate. The films were characterized by Raman spectrometer. The surface morphology was observed by an atomic force microscope (AFM). And also, the friction coefficients were investigated by AFM in friction force microscope (FFM) mode, which were compared with the pin-on-disc (POD) measurement.