• Journal of the Korean Ceramic Society
• /
• v.34 no.6
• /
• pp.629-635
• /
• 1997

The effects of the annealing atmospheres(O2, N2) and sintering additives that Bi2O3 is a major composition on the microwave dielectric and sintering propertie of (1-x)CaTiO3-xLaAlO3 system were investigated. The annealing atmospheres and the increase of annealing time after sintering did not affect the relative dielectric constant($\varepsilon$r) and temperature coefficient of resonant frequency($\tau$f) of (1-x)CaTiO3-xLaAlO3 system. However, the Q.f0 values of (1-x)CaTiO3-xLaAlO3 were very sensitive to annealing atmospheres. As the annealing time increased under O2 atmosphere the Q.f0 values of (1-x)CaTiO3-xLaAlO3 enhanced untill 10 hrs in 0.3$\leq$x$\leq$0.6 region, but degraded over that time. The increasing rate of Q.f0 value increased wth increasing x. On the other hand, as the annealing time increased under N2 atmosphere the Q.f0 values were constant in x$\leq$0.6 region, increased gradually in x$\geq$0.7 region. When 0.97Bi2O3-0.03Al2O3 and 0.76Bi2O3-0.24NiO of 3wt% as sintering additives were added to (Ca0.5La0.5) (Ti0.5Al0.5)O3 (x=0.5) the sintering temperature of 1$600^{\circ}C$ was lowered to 140$0^{\circ}C$, and the relative dielectric constant($\varepsilon$r) and temperature coefficient of resonant frequency($\tau$f) were not nearly changed. The addition of 0.97Bi2O3-0.03Al2O3 and 0.76Bi2O3-0.24NiO of 3wt% to (Ca0.5La0.5)(Ti0.5Al0.5)O3 made the Q.f0 values to be lower about 15% and 34%, respectively.

• Journal of information and communication convergence engineering
• /
• v.2 no.3
• /
• pp.149-152
• /
• 2004

In this paper, we present the film bulk acoustic resonator (FBAR) devices fabricated by considering the effects of annealing temperature on zinc oxide (ZnO) film growth characteristics. In order to determine the annealing temperature and annealing time at which the ZnO film can have good material properties, the several resonators containing ZnO layers were fabricated and annealed at various temperatures from $27^{\circ}C\;to\;300^{\circ}C$ in Ar gas ambient. The effects of the annealing temperature and annealing time on the ZnO film properties were comprehensively studied in order to further improve the resonance characteristics of FBAR resonators.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1993.05a
• /
• pp.11-14
• /
• 1993

$BaO-TiO_2$ ceramics ($BaO:TiO_2$=18.2:81.8[mol.%]) were fabricated by mixed-oxide method. Microwave dielectric properties were investigated with sintering temperature and annealing time. Increasing the sintering temperature, the sintered density was decreased. At the sintering temperature of 1400$[^{\circ}C]$, dielectric constant, quality factor and temperature coefficient of resonant frequency had a good values of 35.03, 5690, -4.433$[ppm/^{\circ}C]$, respectively. Increasing the annealing time, dielectric constant and quality factor were increased and temperature coefficient of resonant frequency was decreased.

• Proceedings of the KIEE Conference
• /
• 1993.11a
• /
• pp.185-187
• /
• 1993

0.15BaO-$0.15Sm_2O_3-0.7TiO_2$, ceramics were fabricated by mixed-oxide method. Microwave dielectric properties were investigated with sintering temperature and annealing time. In the specimen sintered at 1350[$^{\circ}C$], dielectric constant, quality factor and temperature coefficient of resonant frequency had a good values of 80.19, 2006 (at 4.6851[GHz]), -27.54[ppm/$^{\circ}C$], respectively. Increasing the annealing time, dielectric constant was almost constant and quality factor was increased. Temperature coefficient of resonant frequency was minimum value (-1.28[ppm/$^{\circ}C$]) at 4 [hr] annealed.

• Korean Journal of Materials Research
• /
• v.17 no.7
• /
• pp.386-389
• /
• 2007

The dielectric properties of $(Ba_{0.5}Sr_{0.5})TiO_3$ ferroelectric thin films have been investigated according to the substrates in order to optimize the their properties. MgO, r-plane sapphire, and poly-crystalline sapphire (Alumina) substrates have been used to deposite $(Ba_{0.5}Sr_{0.5})TiO_3$ ferroelectric thin films by RF magnetron sputtering. The BST thin films deposited on the single crystal (100)MgO substrates have high tunability and low dielectric loss. These results are caused by a low misfit between the lattice parameters of the BST films and the substrate. The BST films deposited on r-plane sapphire have relatively high misfit, and the tunability of 17% and dielectric loss of 0.0007. To improve the dielectric properties of the BST films, the post-annealing methods has been introduced. The BST films deposited on (100)MgO, (1102)r-plane sapphire, and poly-crystalline sapphire substrates have best properties in post-annealing conditions of $1050^{\circ}C$, $1100^{\circ}C$, and $1150^{\circ}C$, respectively. The different optimal post-annealing conditions have been found according to the different misfits between the films and substrates, and thermal expansion coefficients. Moreover, the films deposited on alumina substrate which is relatively cheap have a good tunability properties of 23% by the post-annealing.

• Korean Journal of Materials Research
• /
• v.28 no.6
• /
• pp.324-329
• /
• 2018

Needle-like NiO protecting layers on NiCrAl alloy foam, used as support for hydrogen production, are introduced through electroplated Ni and subsequent microwave annealing. To improve the stability of the NiCrAl alloy foam, oxygen concentration of microwave annealing to form a needle-like NiO layer with good chemical stability and corrosion resistance is controlled in a range of 20 and 50 %. As the oxygen concentration increases to 50 %, needle-like NiO forms a dense coating layer on the NiCrAl alloy foam; this layer formation can be attributed to accelerated growth of the (200) plane. In addition, the increased oxygen concentration causes increased NiO/Ni ratio of the resultant coating layer on NiCrAl alloy foam due to improved rate of the oxidation reaction. As a result, the introduction of dense needle-like NiO layers formed at 50 % oxygen concentration improves the chemical stability of the NiCrAl alloy foam by protecting the direct electrochemical reaction between the electrolyte and the foam. Thus, needle-like NiO can be proposed as a superb protecting layer to improve the chemical stability of NiCrAl alloy form.

• Journal of the Microelectronics and Packaging Society
• /
• v.11 no.1
• /
• pp.37-42
• /
• 2004

In the electronic components and devices fabrication, thin film resistors with low TCR (temperature coefficient of resistance) and high precision have been used over 3 ㎓ microwave in recent years. Ni-Cr alloys thin films resistors is one of the most commonly used resistive materials because they have low TCR and highly stable resistance. In this work, we fabricated thin film resistors using Evanohm alloys target(72Ni-20Cr-3Al-4Mn-Si) of S-type with excellent resistors properties by RF-sputtering. Also we reported the best annealing condition of thin film resistors for microwave to observe microstructure and electronic properties of thin film according to annealing conditions($200^{\circ}C$, $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$)

• Korean Journal of Materials Research
• /
• v.14 no.3
• /
• pp.191-195
• /
• 2004

Tunnel junctions with AI-N barriers fabricated by microwave-excited plasma were studied. When the Al thickness, nitridation time, and annealing temperature were 1 nm (0.8 nm), 50 s (35 s), and $280^{\circ}C$ ($300^{\circ}C$), TMR ratio and resistance-area product (RA) were 49% (34%) and $3 ${\times}$ 10^4$ $\Omega$$\mu\m^2$ ($1.5 ${\times}$ 10^4$ $\Omega$$\mu\m^2$), respectively. In order to clarify the annealing temperature dependence of TMR ratio, the local transport properties were measured for Ta 5 nm/Cu 20 nm/Ta 5 nm$29_{76}$ $Fe_{24}$ 2 nm/Cu 5 nm/M $n_{75}$$Ir_{25}$ 10 nm/ $Co_{71}$ $Co_{29}$ 4nm/Al-N junction with Al thickness of 0.8 nm and nitridation time of 35s at various temperatures. The increase of TMR ratio after annealing at $300^{\circ}C$, where the TMR ratio of the corresponding MTJ had the maximum value of 34%, can be well explained by the enhancement of the average barrier height ($\Phi_{ave}$) and the reduction of its fluctuation. After further annealing at $340^{\circ}C$, the leakage current was observed and the TMR ratio decreaseded

• Journal of Electrical Engineering and Technology
• /
• v.2 no.3
• /
• pp.391-395
• /
• 2007

MgO enhanced $(Ba_{0.6}Sr_{0.4})$ $TiO_3$ thick films have been fabricated by a tape casting and firing method for tunable devices on the microwave frequency band. In order to improve ferroelectric properties, the composite thick films enhanced with MgO on BST have been asymmetrically annealed by a focused halogen beam method. Dielectric constants of composite thick films are changed from 1050 to 1300 at 100 kHz after 60 s and 150 s annealing by the focused halogen beam. Even though no prominent changes were previously observed from the thick films before and after annealing in terms of chemical composition and surface morphology, it is clear that the average particle size of the thick films calculated by Scherrer's formula were increased by annealing. Furthermore, a strong correlation between particle size and dielectric constant of the composite thick films has been observed; dielectric constant increases with increased particle size. This has been attributed to the increased volume of ferroelectric domain due to increased particle sizes. As a result, the tuning range was improved by halogen beam annealing.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.206.1-206.1
• /
• 2015

최근에 금속산화물을 증착하는 방법으로 용액공정이 주목 받고 있다. 용액 공정은 대기압에서 매우 간단한 방법으로 복잡한 공정과정을 요구하지 않기 때문에 박막을 경제적으로 간단하게 형성할 수 있다. 하지만 용액공정을 통해 형성한 박막에는 소자의 특성을 열화 시키는 solvent와 탄소계열의 불순물을 많이 포함하고 있어 고온의 열처리가 필수적이다. 박막의 품질을 향상시키기 위해서 다양한 열처리 방법들이 이용되고 있으며, 일반적인 열처리 방법으로는 furnace를 이용한 conventional thermal annealing (CTA)이 많이 이용되고 있다. 하지만, 최근에는 microwave를 이용한 공정이 주목 받고 있다. Microwave energy는 CTA보다 효과적으로 비교적 낮은 온도에서 높은 열처리 효과를 나타낸다. 본 실험은 n-type Silicon 기판에 solution-ZrO2 산화막을 형성 후, oven baking을 한 뒤, CTA와 microwave를 이용하여 solvent와 불순물을 제거 하였다. 전기적 특성을 확인하기 위해 solution ZrO2 산화막 위에 E-beam evaporator를 이용해 Ti 금속 전극을 증착하여 Metal-Oxide-Semiconductor (MOS) capacitor를 제작하였다. 다음으로, PRECISION SEMICONDUCTOR PARAMETER ANALYZER (4156B)를 이용하여, capacitance-voltage (C-V) 특성 및 current-voltage (I-V) 특성을 비교하였다. 다음으로, CTA를 통하여 제작한 소자와 전기적 특성을 비교하였다. 그 결과, Microwave irradiation으로 열처리한 MOS capacitor 소자에서 capacitance 값과 flat band voltage, hysteresis 등이 개선되는 효과를 확인하였다. Microwave irradiation 열처리는 100oC 미만의 온도에서 공정이 이루어짐에도 불구하고 시료 내에서의 microwave 에너지의 흡수가 CTA 공정에서의 열에너지 흡수보다 훨씬 효율적으로 이루어지며, 결과적으로 ZrO2 용액의 불순물과 solvent를 낮은 온도에서 제거하여 고품질 박막 형성에 매우 효과적이라는 것을 나타낸다. 따라서, microwave irradiation 열처리 방법은 비정질 산화막이 포함되는 박막 transistor 소자 제작에 대하여 결정적인 열처리 방법이 될 것으로 기대한다.