• Proceedings of the Optical Society of Korea Conference
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• 1991.07a
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• pp.109-114
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• 1991

좋은(sub=micron) 분해능을 갖는 Photoresist film의 방법에 의한 Micro-Lithography의 발달은 반도체, Electro-Optic 등의 첨단산업에 큰 기여를 하였다. 본 내용은 이러한 PR을 이용한 Lithography System의 광학적인 원리에 대해 소개하고자 한다.

• Proceedings of the Korean Vacuum Society Conference
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• 2003.08a
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• pp.162-162
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• 2003

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.251-252
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• 2008

• Polymer Science and Technology
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• v.8 no.5
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• pp.635-643
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• 1997

• Membrane Journal
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• v.8 no.1
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• pp.11-21
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• 1998

The study on penetrant transport in glassy polymers has been actively pursued for decades because of its growing significance in polymer processing and related applications such as not only membranes, but corrosion protective coatings, microlithography, microelectronic fabrication, etc. In membranes application of polymeric materials, successful utilization requires understanding of how solvents penetrate, swell, and sometimes dissolve polymeric materials under various environmental conditions, as their permselecdve performance is significantly affected by it. The expose of polymer membranes to solvents may result in the structural failure due to mechanical softening, embrittlement or crazing.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1535-1538
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• 2005

We present a mass productive and reproducible assembly technique of a single bundle of single-walled carbon nanotubes (sb-SWNTs) using dielectrophoresis (DEP). Gold electrodes with 10 gaps made via microlithography were used to align the carbon nanotubes (CNTs). The magnitude and type of applied electric field were investigated to verify their effects on CNT assembly. The optimum assembling conditions in which sb-SWNTs could be positioned at a desired site were experimentally identified, and the characteristics of the assembled sb-SWNTs were evaluated from AFM, Raman spectroscopy, and I-V curve. This assembly method has potential for applications such as gas sensors or electronic devices.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.2 s.95
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• pp.74-81
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• 1999

The integrated chip of optical micro-encoder was fabricated and the feasibility as displacement measurement device was confirmed. The geometry of micro-encoder was designed to utilize the optical interference effect on the second order of diffracted beams. The hybrid-type micro-encoder consisted with light emitting diode, photodiode, polyimide wave-guide and micro-lens provides stable micro-encoding results for high speed displacements. The measurement shows the resolution of displacement of 1.00 +/- 0.02 ${\mu}m$ for the grating with scale pitch of 2.0${\mu}m$.

• Korean Journal of Optics and Photonics
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• v.3 no.4
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• pp.273-279
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• 1992

Position reading devices such as optical encoders are most essential components in numerical control (NC) machines and robots. Fabrication process of optical NC-scales was developed for domestic production. The whole process using photo-lithographic techniques consists of about 10 steps. The process parameters were to be carefully determined through many trial experiments. The scale marks of metal film was printed on a glass substrate. The optimum values of various process parameters were extrilcted. The quality of scale marks was attributed to the each process parameters.

• Korean Journal of Optics and Photonics
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• v.16 no.3
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• pp.235-238
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• 2005

A Multiple electron beam lithography system with arrayed microcolumns has been developed for high throughput applications. The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. The arrayed microcolumns based on of Single Column Module (SCM) concept has been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 250 eV to 300 eV for the generation of nano patterns. Probe beam current at the sample was measured about >1 nA at a total beam current of $0.5\;{\mu}A$ and a working distance of $\~1\;mm$. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.