• Title/Summary/Keyword: Micro-display

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Stability-Enhanced Liquid Crystal Mode for Flexible Display Applications

  • Jung, Jong-Wook;Jang, Se-Jin;Lee, You-Jin;Kim, Hak-Rin;Jin, Min-Young;Kim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.687-691
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    • 2005
  • We demonstrated stability-enhanced liquid crystal (LC) displays using pixel-iosolated LC mode in which LC molecules are isolated in pixel by horizontal polymer layer and vertical polymer wall. The device shows good electro-optic properties with external pressure and bending due to the polymer structures. The polymer wall acts as supporting structure from mechanical pressure and maintains the cell gap from bending. Moreover, the polymer layer acts as adhesive for tight attachment of two substrates. We presented various methods to produce the polymer structures by using anisotropic phase separation from LC and polymer composites or patterned micro-structures.

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Soft-lithography for Preparing Patterned Liquid Crystal Orientations

  • Kim, Hak-Rim;Jung, Jong-Wook;Shin, Min-Soo;Kim, Myung-Eun;Lee, You-Jin;Kim, Jae-Hoon
    • Journal of Information Display
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    • v.8 no.2
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    • pp.5-9
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    • 2007
  • We demonstrate novel soft-lithographic techniques for preparing patterned liquid crystal (LC) orientations at an alignment layer. By controlling patterning conditions such as wetting property and operating temperature depending on polymeric materials, multi-directional or modified LC alignment conditions can be simply achieved.

All in focus Camera vision system for Mobile Phone based on the Micro Diffractive Fresnel lens systems (곡률 변경 소자를 이용한 All In Focus)

  • Chi, Yong-Seok;Kim, Young-Seop
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.65-70
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    • 2007
  • A method to focus the object in camera system by applying the Hill climb algorithm from optical lens moving device (VCM; Voice coil motor) is proposed. The focusing algorithm from VCM is focus on the object but in these criteria is a well-known drawback; the focus is good only at same distance objects but the focus is bad (blur image) at different distance objects because of the DOF (Depth of focus) or DOF (Depth of field) at the optical characteristic. Here, the new camera system that describes the Reflector of free curvature systems (or Diffractive Fresnel lens) and the partition of focusing window area is proposed. The method to improve the focus in all areas (different distance objects) is proposed by new optical system (discrete auto in-focus) using the Reflector of free curvature systems (or Diffractive Fresnel lens) and by applying the partition of all areas. The proposal is able to obtain good focus in all areas.

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레이저를 이용한 LCD 유리 절단 기술

  • Jeong, Jae-Yong;O, Dae-Hyeon;Yu, Gi-Ryong;Lee, Cheon;Lee, U-Yeong
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2005.05a
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    • pp.219-223
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    • 2005
  • Nowadays laser cutting is the most promising method of cutting FPD(Flat Panel Display) glass in mass-production line. And this method can also be used to cut other brittle materials such as quartz, sapphire, ceramic and semiconductor The concept of this method is shown in picture 1. Laser beam heats glass up to strain point, not to melting point and cooling system chills glass to induce maximun thermal stress in glass surface and then the thermal stress generates micro thermal crack, in other words blind depth of crack, along laser beam and cooling line.

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Effects of Large Particles and Filter Size in Central Chemical Supplying(CCS) System for STI-CMP on Light Point Defects (LPDs) (STI-CMP용 세리아 슬러리 공급시스템에서 거대입자와 필터 크기가 Light Point Defects (LPDs)에 미치는 영향)

  • 이명윤;강현구;박진형;박재근;백운규
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.4
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    • pp.45-49
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    • 2004
  • We examined large particles and filter size effects of Central Chemical Supplying (CCS) system for STI-CMP on Light Point Defects (LPDs) after polishing. As manufacturing process recently gets thinner below 0.1 um line width, it is very important to keep down post-CMP micro-scratch and LPDs in case of STI-CMP. Therefore, we must control the size distribution of large particles in a slurry. With optimization of final filter size, CCS system is one of the solutions for this issue. The oxide and nitride CMP tests were accomplished using nano-ceria slurries made by ourselves. The number of large particles in a slurry and the number of LPDs on the wafer surface after CMP were reduced with decrease of the final filter size. Oxide removal rates slightly changed according to the final filter size, showing the good performance of self-made nano ceria slurries.

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RFID Tag Protection using Face Feature

  • Park, Sung-Hyun;Rhee, Sang-Burm
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.2 s.19
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    • pp.59-63
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    • 2007
  • Radio Frequency Identification (RFID) is a common term for technologies using micro chips that are able to communicate over short-range radio and that can be used for identifying physical objects. RFID technology already has several application areas and more are being envisioned all the time. While it has the potential of becoming a really ubiquitous part of the information society over time, there are many security and privacy concerns related to RFID that need to be solved. This paper proposes a method which could protect private information and ensure RFID's identification effectively storing face feature information on RFID tag. This method improved linear discriminant analysis has reduced the dimension of feature information which has large size of data. Therefore, face feature information can be stored in small memory field of RFID tag. The proposed algorithm in comparison with other previous methods shows better stability and elevated detection rate and also can be applied to the entrance control management system, digital identification card and others.

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Development of The 3-channel Vision Aligner for Wafer Bonding Process (웨이퍼 본딩 공정을 위한 3채널 비전 얼라이너 개발)

  • Kim, JongWon;Ko, JinSeok
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.1
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    • pp.29-33
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    • 2017
  • This paper presents a development of vision aligner with three channels for the wafer and plate bonding machine in manufacturing of LED. The developed vision aligner consists of three cameras and performs wafer alignment of rotation and translation, flipped wafer detection, and UV Tape detection on the target wafer and plate. Normally the process step of wafer bonding is not defined by standards in semiconductor's manufacturing which steps are used depends on the wafer types so, a lot of processing steps has many unexpected problems by the workers and environment of manufacturing such as the above mentioned. For the mass production, the machine operation related to production time and worker's safety so the operation process should be operated at one time with considering of unexpected problem. The developed system solved the 4 kinds of unexpected problems and it will apply on the massproduction environment.

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Fabrication of High Aspect Ratio Micro Structure for fine pitch probe production (Fine pitch probe 제작을 위한 고세장비 마이크로 구조물 제작)

  • Lee, S.I.;Kim, W.K.;Pyo, C.R.;Kim, D.Y.;Yang, S.J.;Ko, K.H.;Kim, H.J.;Jeon, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.10a
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    • pp.356-359
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    • 2007
  • Continuing improvements in integrated circuit chip density and functionality have mostly contributed toward a very large-scale integrated circuit(VLSI) and display device. In order to test (pass or fail) all of the high integrated semiconductor chip and display device, fine pitch probes are used. Fine pitch probes are manufactured by electroforming process of a Ni alloy in an electrolytic bath. In this paper, we expect that the electric field in bath with the Finite Element Method and applying the FEM result. So, we can obtained the probes that have high aspect ratio of 10 : 1

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Optimal cell structure of a wall-cathode and wall auxiliary anode for high performance plasma display panel (벽형의 음극 전극과 보조 전극을 갖는 고효율 플라즈마 표시기의 최적 전극 구조에 관한연구)

  • 신범제;정희섭;서정현;황기웅
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.6
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    • pp.33-42
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    • 1997
  • In this paper, a new structure for a dC plasma display pane(PDP) with a wall-catode and a wall-auxilizry anode has been suggested. The wall-cathode with a sufficient discharge area maximizes the discharge volume. The auxiliary anode surrounding the discharge region makes the effective control of the charged particles possible. We have investigated the cahracteristics of the new cell structure with a 2-dimensional computer simulation and a micro gap discharge system, and compared experimentally with those of previous cell structure. The new cell structure with the wall-cathode and auxiliary wall-anode turned out to have improved luminance, discharge forming time and sustain voltage.

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A study on the Grindability of Fine Ceramics by Experimental Method (실험적 방법에 의한 파인세라믹스의 연삭성에 관한 연구)

  • Kim, Seong-Kyeum
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.3
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    • pp.35-42
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    • 2011
  • This paper describes the characteristics of high speed grinding and the influence of wheel surface speed V and a grindability of the grinding materials. The various fine ceramics pieces was ground by metal and vitrified bonded diamond wheel. The surface roughness of fine ceramics(Zirconia($ZrO_2$), Silicon Carbide(SiC), Silicon Nitride($Si_3N_4$), Alumina($Al_2O_3$)) decreases from $0.05{\mu}m(R_{max})$ to $0.025{\mu}m(R_{max})$ when the wheel speed at grinding point increases the wheel speed. Relation between the temperature at grinding point and surface roughness was linear. Abrasive jet machining(AJM), a specialized from of shot blasting, is considered one of the most helpful micro machining methods for hard and brittle materials such as glasses and ceramics by constant pressure grinding.