Soft-lithography for Preparing Patterned Liquid Crystal Orientations

  • Kim, Hak-Rim (Department of Electronics and Computer Engineering, Hanyang University, Student Member, KIDS) ;
  • Jung, Jong-Wook (Department of Electronics and Computer Engineering, Hanyang University) ;
  • Shin, Min-Soo (Department of Electronics and Computer Engineering, Hanyang University) ;
  • Kim, Myung-Eun (Department of Electronics and Computer Engineering, Hanyang University) ;
  • Lee, You-Jin (Department of Electronics and Computer Engineering, Hanyang University) ;
  • Kim, Jae-Hoon (Department of Electronics and Computer Engineering, Hanyang University)
  • Published : 2007.06.24

Abstract

We demonstrate novel soft-lithographic techniques for preparing patterned liquid crystal (LC) orientations at an alignment layer. By controlling patterning conditions such as wetting property and operating temperature depending on polymeric materials, multi-directional or modified LC alignment conditions can be simply achieved.

Keywords

References

  1. N. A. J. M. van Aerle, Jpn. J Appl. Phys. 34, L1472 (1995) https://doi.org/10.1143/JJAP.34.L1472
  2. B.-J. Liang, S.-H. Chen, and Y. F. Wang, Appl. Phys. Lett. 72, 1290 (1998) https://doi.org/10.1063/1.121053
  3. C.-J. Yu, D.-W. Kim, and S.-D. Lee, Appl. Phys. Lett. 85, 5146 (2004) https://doi.org/10.1063/1.1828223
  4. H. Choi, J. W. Wu, H. J. Chang, and B. Park, Appl. Phys. Lett. 88, 021905 (2006) https://doi.org/10.1063/1.2162672
  5. J.-H. Kim, M. Yoneya, and H. Yokoyama, Nature 420, 159 (2002)
  6. S. Varghese, G. P. Crawford, C. W. M. Bastiaansen, D. K. G. de Boer, and D. J. Broer, Appl. Phys. Lett. 86, 181914 (2005) https://doi.org/10.1063/1.1924896
  7. S. Varghese, S. Narayanankutty, C. W. M. Bastiaansen, G. P. Crawford, and D. J. Broer, Adv. Mater. 16, 1600 (2004) https://doi.org/10.1002/adma.200306536
  8. S.-T. Sun, W. M. Gibbons, and P. J. Shannon, Nature 368, 532 (1994)
  9. K. Ichimura, H. Akiyama, K. Kudo, N. Ishizuki, and S. Yamamura, Liq. Cryst. 20, 423 (1996) https://doi.org/10.1080/02678299608032056