• Polymer(Korea)
• /
• v.35 no.1
• /
• pp.66-71
• /
• 2011

With the synthesis of hyper crosslinked polymer particle (HCPP), having microporous structure with hydroxyl functional group, synthesized via polymerization reaction consists of three stepssuspension polymerization, hyper crosslinking by Friedel-Craft catalysis and hydrolysis reaction, the effects of the ratio of each monomer, hyper crosslinking conditions and $CO_2$ supercritical drying on the variations of surface morphology, pore size & distribution and BET surface area of HCPP have been investigated. It was observed that the formation of surface crack or fracture of HCPP was intimately related with the degree of hyper crosslinking reaction between microphase separated domains. And the value of BET surface area of HCPP increased with the increase of reaction temperature, time and the amounts of solvent used in hyper crosslinking step. Moreover, $CO_2$ supercritical drying was proven to be a very effective method for removing stabilizer, unreacted monomers and oligomers from HCPP but needed to add methanol as a co-solvent for efficient removing of residual catalyst.

• Journal of Surface Science and Engineering
• /
• v.46 no.2
• /
• pp.68-74
• /
• 2013

For the coating of diamond films on WC-Co tools, a buffer interlayer is needed because Co catalyzes diamond into graphite. W and Ti were chosen as candidate interlayer materials to prevent the diffusion of Co during diamond deposition. W or Ti interlayer of $1{\mu}m$ thickness was deposited on WC-Co substrate under Ar in a DC magnetron sputter. After seeding treatment of the interlayer-deposited specimens in an ultrasonic bath containing nanometer diamond powders, $2{\mu}m$ thick nanocrystalline diamond (NCD) films were deposited at $600^{\circ}C$ over the metal layers in a 2.45 GHz microwave plasma CVD system. The cross-sectional morphology of films was observed by FESEM. X-ray diffraction and visual Raman spectroscopy were used to confirm the NCD crystal structure. Micro hardness was measured by nano-indenter. The coefficient of friction (COF) was measured by tribology test using ball on disk method. After tribology test, wear tracks were examined by optical microscope and alpha step profiler. Rockwell C indentation test was performed to characterize the adhesion between films and substrate. Ti and W were found good interlayer materials to act as Co diffusion barriers and diamond nucleation layers. The COFs on NCD films with W or Ti interlayer were measured as less than 0.1 whereas that on bare WC-Co was 0.6~1.0. However, W interlayer exhibited better results than Ti in terms of the adhesion to WC-Co substrate and to NCD film. This result is believed to be due to smaller difference in the coefficients of thermal expansion of the related films in the case of W interlayer than Ti one. By varying the thickness of W interlayer as 1, 2, and $4{\mu}m$ with a fixed $2{\mu}m$ thick NCD film, no difference in COF and wear behavior but a significant change in adhesion was observed. It was shown that the thicker the interlayer, the stronger the adhesion. It is suggested that thicker W interlayer is more effective in relieving the residual stress of NCD film during cooling after deposition and results in stronger adhesion.