• Title/Summary/Keyword: Micro or Nano Machining

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Development of Nano Machining Technology using Focused ion Beam (FIB를 이용한 나노가공공정 기술 개발)

  • 최헌종;강은구;이석우;홍원표
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2004.04a
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    • pp.482-486
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper presents that the recent development and our research goals in FIB nano machining technology are given. The emphasis will be on direct milling, or chemical vapor deposition techniques (CVD), and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling or deposition techniques for making various high-quality devices and high-precision components at the micro/nano meter scale are examined and discussed. Finally, conclusions are presented to summarize the recent work and to suggest the areas for improving the FIB milling technology and for studying our future research.

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Development of Micro Plasma Electrode using Focused Ion Beam (FIB를 이용한 마이크로 플라즈마 전극 개발)

  • Choi Hon-Zong;Kang Eun-Goo;Lee Seok-Woo;Hong Won-Pyo
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.5 s.170
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    • pp.175-180
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    • 2005
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. In this research, fabrication of micro plasma electrode was carried out using FIB. The one of problems of FIB-sputtering is the redeposition of material including Ga+ ion source during sputtering process. Therefore the effect of the redeposition was verified by EDX. And the micro plasma electrode of copper was fabricated by FIB.

The Development of Micro Milling Machine for Micro Machining (미소가공을 위한 마이크로 밀링머신 개발)

  • Hwang Joon
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.278-281
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    • 2005
  • Today, manufacturing capability at the micro or nano scale production field is requested strongly in view of parts and product miniaturization. Miniaturized parts and products will introduce lots of benefits in terms of high precision functionality and low energy consumption. This paper presents the results of micro milling machine tool development for micro machining process. Finite element analysis has been performed to know the relationship between design dimensional variables and structural stiffness in terms of static, dynamic, thermal aspects. Performance evaluation through machining has been tested and discussed for achievable machining characteristics.

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The Development of Micro Milling Machine (초소형 밀링머신 개발)

  • Hwang J.;Chung E.S.;Cox Danel;Liang StevenY.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1171-1174
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    • 2005
  • Manufacturing capability at the micro or nano scale production field is requested strongly in view of parts and product miniaturization. Miniaturized parts and products will introduce lots of benefits in terms of high precision functionality and low energy consumption. This paper presents the results of micro milling machine tool development for micro machining process. Finite element analysis has been performed to know the relationship between design dimensional variables and structural stiffness in terms of static, dynamic, thermal aspects. Performance evaluation through machining has been tested and discussed for achievable machining characteristics.

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Micro Mold Machining Using EDM/ECM (방전/전해 가공을 이용한 미세금형가공)

  • Chung, D.K.;Shin, H.S.;Choi, S.H.;Kim, B.H.;Chu, C.N.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.05a
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    • pp.75-78
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    • 2007
  • Recently, the need for micro mold or micro mechanical parts has been rapidly increased. As feature size decreases, conventional machining processes show their limitation. Micro electrical discharging machining (EDM) and electrochemical machining (ECM) have many advantages in micro machining. They can be used to make structures of micro scale, or even nano scale size. In this paper, the application of micro EDM and ECM has been investigated.

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Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

Manufacturing Mechanism of FIB-CVD using Focused Ion Beam (집속이온빔의 가공 공정 메카니즘 연구)

  • 강은구;최병열;이석우;홍원표;최헌종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.925-928
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05$\mu\textrm{m}$ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.

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Analysis on FIB-Sputtering Process using Taguchi Method (다구찌 기법을 이용한 FIB-Sputtering 가공 특성 분석)

  • Lee, Seok-Woo;Choi, Byoung-Yeol;Kang, Eun-Goo;Hong, Won-Pyo;Choi, Hon-Zong
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.15 no.6
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    • pp.71-75
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    • 2006
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its usage in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. The target of this paper is the analysis of FIB sputtering process according to tilt angle, dwell time and overlap for application of 3D micro and pattern fabrication and to find the effective beam scanning conditions using Taguchi method. Therefore we make the conclusions that tilt angle is dominant parameter for sputtering yield. Burr size is reduced as tilt angle is higher.

마이크로 플라즈마 전극가공을 위한 FIB 연구

  • 최헌종;강은구;이석우;홍원표
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2004.05a
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    • pp.229-233
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments of the micro plasma electrode fabrications using FIB. The sputtering of FIB has one major problem that is redeposited by sputtered material including $Ga^+$ ion source. Therefore we have verified the effect of the reposition by EDX. And the optimal condition is suggested to machine the micro plasma electrode.

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Hot Imprinted Hierarchical Micro/Nano Structures on Aluminum Alloy Surfaces (고온 임프린팅을 통한 알루미늄합금 표면의 마이크로/나노 구조 성형 기술)

  • Moon, I.Y.;Lee, H.W.;Oh, Y.S.;Kim, S.J.;Kim, J.H.;Kang, S.H.
    • Transactions of Materials Processing
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    • v.28 no.5
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    • pp.239-246
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    • 2019
  • Various surface texturing techniques have been studied because of the effective applicability of micro or nano scale surface patterns. Particularly, the most promising types of patterns include the hierarchical patterns, which consists of micro/nano structures. Different processes such as MEMS, laser machining, micro cutting and micro grinding have been applied in the production of hierarchical patterns on various material surfaces. This study demonstrates the process of hot imprinting to induce the hierarchical patterns on the Al alloy surfaces. Wire electrical discharge machining (WEDM) process was used to imprint molds with micro scale sinusoidal pattern. In addition, the sinusoidal pattern with rough surface morphology was obtained as a result of the discharge craters. Consequently, the hierarchical patterns consisting of the sinusoidal pattern and the discharge craters were prepared on the imprinting mold surface. Hot imprinting process for the Al plates was conducted on the prepared mold, and the replication performance was analyzed. As a result, it was confirmed that the hierarchical patterns of the mold were effectively duplicated on the surface of Al plate.