• 제목/요약/키워드: Micro deposition

검색결과 465건 처리시간 0.029초

ESD 스프레이를 이용한 OPV 제작 기법 (Fabrication Method of OPV using ESD Spray Coating)

  • 김정수;조정대;김동수
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
    • /
    • pp.84.2-84.2
    • /
    • 2010
  • PEMS (printed electro-mechanical system) is fabricated by means of various printing technologies. Passive and active components in 2D or 3D such as conducting lines, resistors, capacitors, inductors and TFT, which are printed with functional materials, can be classified in this category. And the issue of PEMS is applied to a R2R process in the manufacturing process. In many electro-devices, the vacuum process is used as the manufacturing process. However, the vacuum process has a problem: it is difficult to apply toa continuous process as a R2R printing process. In this paper, we propose an ESD (electro static deposition) printing process has been used to apply an organic solar cell of thin film forming. ESD is a method of liquid atomization by electrical forces, anelectrostatic atomizer sprays micro-drops from the solution injected into the capillary, with electrostatic force generated by electric potential of about tens of kV. ESD method is usable in the thin film coating process of organic materials and continuous process as a R2R manufacturing process. Therefore, we experiment the thin films forming of PEDOT:PSS layer and Active layer which consist of the P3HT:PCBM. The result of experiment, organic solar cell using ESD thin film coated method is occurred efficiency of about 1.4%. Also, the case of only used to ESD method in the active layer coating is occurred efficiency of about 1.86% as the applying a spin coating in the PEDOT:PSS layer. We can expect that ESD method is possible for continuous process to manufacture in the organic solar cell or OLED device.

  • PDF

MOCVD의 성장 중단법을 이용한 저밀도 InAs/InP 양자점의 성장

  • 최장희;한원석;조병구;송정호;정혁;진병문;장유동;이동한
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
    • /
    • pp.363-364
    • /
    • 2012
  • 기존 양자점에 대한 연구는 레이저 다이오드와 광증폭기등과 같은 광소자의 활성층에 사용되던 양자우물을 대체하기 위하여 고밀도, 고균일 양자점 성장에 관한 연구가 활발히 진행되었지만, 최근에는 양자점을 이용한 Single-photon source의 관심이 높아짐에 따라 저밀도 양자점 성장에 관한 연구가 주목 받고 있다. 본 연구에서는 수직형 저압 Metal organic chemical vapor deposition (MOCVD)를 이용하여 InP 기판 위에 저밀도 InAs 양자점을 성장하였다. 저밀도의 양자점을 성장하기 위하여 양자점과 덮개 층($1.1 {\mu}m$ InGaAsP)사이에 V족 원료 가스인 As만 공급하는 성장 중단 시간 (GI:Growth interruption)을 삽입하였다. 시료의 구조는 InP (100)기판위에 50 nm InGaAsP barrier, 1.5ML GaAs를 성장 후 InAs 1.9 ML를 성장하였다. 그 후 0, 1, 2, 5 분의 GI을 삽입한 후 InGaAsP 와 InP 덮개층을 성장하였다. 양자점의 밀도와 형상을 측정하기 위하여 Atomic force microscopy (AFM)을, 광학적 특성 분석을 위하여 저온 Micro Photoluminescence (${\mu}$-PL)을 측정하였다. 성장 중단 시간의 증가에 따라 InAs/InP 양자점의 높이와 넓이는 증가하고 밀도는 감소하였다. 성장 중단 시간 3분 이후에는 밀도 감소가 둔화 되었으며, 5분일 때 $3.2{\times}10^7/cm^2$의 극저밀도 InAs/InP 양자점이 성장되었다. 또한 저밀도 양자점 시료의 저온 ${\mu}$-PL을 측정하여 단일 양자점의 exciton과 bi-exciton peak가 측정되었다.

  • PDF

Glass strengthening and coloring using PIIID technology

  • Han, Seung-Hee;An, Se-Hoon;Lee, Geun-Hyuk;Jang, Seong-Woo;Whang, Se-Hoon;Yoon, Jung-Hyeon
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
    • /
    • pp.178-178
    • /
    • 2016
  • Every display is equipped with a cover glass to protect the underneath displaying devices from mechanical and environmental impact during its use. The strengthened glass such as Gorilla glass.$^{TM}$ has been exclusively adopted as a cover glass in many displays. Conventionally, the strengthened glass has been manufactured via ion-exchange process in wet salt bath at high temperature of around $500^{\circ}C$ for hours of treatment time. During ion-exchange process, Na ions with smaller diameter are substituted with larger-diameter K ions, resulting in high compressive stress in near-surface region and making the treated glass very resistant to scratch or impact during its use. In this study, PIIID (plasma immersion ion implantation and deposition) technique was used to implant metal ions into the glass surface for strengthening. In addition, due to the plasmonic effect of the implanted metal ions, the metal-ion implanted glass samples got colored. To implant metal ions, plasma immersion ion implantation technique combined with HiPIMS method was adopted. The HiPIMS pulse voltage of up to 1.4 kV was applied to the 3" magnetron sputtering targets (Cu, Ag, Au, Al). At the same time, the sample stage with glass samples was synchronously pulse-biased via -50 kV high voltage pulse modulator. The frequency and pulse width of 100 Hz and 15 usec, respectively, were used during metal ion implantation. In addition, nitrogen ions were implanted to study the strengthening effect of gas ion implantation. The mechanical and optical properties of implanted glass samples were investigated using micro-hardness tester and UV-Vis spectrometer. The implanted ion distribution and the chemical states along depth was studied with XPS (X-ray photo-electron spectroscopy). A cross-sectional TEM study was also conducted to investigate the nature of implanted metal ions. The ion-implanted glass samples showed increased hardness of ~1.5 times at short implantation times. However, with increasing the implantation time, the surface hardness was decreased due to the accumulation of implantation damage.

  • PDF

Micromachinng and Fabrication of Thin Filmes for MEMS-infrarad Detectors

  • Hoang, Geun-Chang;Yom, Snag-Seop;Park, Heung-Woo;Park, Yun-Kwon;Ju, Byeong-Kwon;Oh, Young-Jei;Lee, Jong-Hoon;Moonkyo Chung;Suh, Sang-Hee
    • The Korean Journal of Ceramics
    • /
    • 제7권1호
    • /
    • pp.36-40
    • /
    • 2001
  • In order to fabricate uncooled IR sensors for pyroelectric applications, multilayered thin films of Pt/PbTiO$_3$/Pt/Ti/Si$_3$N$_4$/SiO$_2$/Si and thermally isolating membrane structures of square-shaped/cantilevers-shaped microstructures were prepared. Cavity was also fabricated via direct silicon wafer bonding and etching technique. Metallic Pt layer was deposited by ion beam sputtering while PbTiO$_3$ thin films were prepared by sol-gel technique. Micromachining technology was used to fabricate microstructured-membrane detectors. In order to avoid a difficulty of etching active layers, silicon-nitride membrane structure was fabricated through the direct bonding and etching of the silicon wafer. Although multilayered thin film deposition and device fabrications were processed independently, these could b integrated to make IR micro-sensor devices.

  • PDF

수송 연료용 부분산화 개질기의 운전특성 (Operation characteristics of partial oxidation reformer for transportation fuels)

  • 이상호;배중면
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 한국신재생에너지학회 2011년도 춘계학술대회 초록집
    • /
    • pp.159.1-159.1
    • /
    • 2011
  • Partial oxidation reformer was fabricated and operated using commercial transportation fuels. Fuel injector and heating coil were used for fuel atomization and startup, respectively. The reformer was designed to produce syngas for $150{\sim}200W_e$ class solid oxide fuel cell. The reformer was operated in the $O_2$/C range between 0.6 and 0.8 while the capacity was fixed at $150W_e$. The temperature range in catalyst bed was between $500^{\circ}C$ and $900^{\circ}C$. Only 83% fuel was converted to $H_2$, CO, $CO_2$ and $CH_4$ at the operating conditions. The lowest temperature increase to $700^{\circ}C$ when the reformer was operated at $200W_e$, Although the temperature profiles was improved, fuel conversion was 88%. On the other hand, fuel was completely converted when micro-reactor operated at the same condition. This difference maybe due to aromatic compounds formation at homogeneous region. In addition, a significant amount of coke deposition was observed at vent line. Homogeneous reaction depends on the degree of mixing. For this purpose, two fluid nozzle and Ultra sonic injector were compared to investigate the effect of atomization. Sauter mean diameter(SMD) of Ultra sonic injector was lower than two-fluid nozzle at test condition. However, conversion efficiency and fuel conversion were not improved by using two-fluid nozzle. these results imply that the temperature of homogeneous reaction region should be controlled to prevent coke formation.

  • PDF

전자-빔 조사를 이용한 TiN 박막의 물성변화에 관한 연구 (A Study on the Properties of TiN Films by Using Electron Beam Irradiation)

  • 신창호;성영종;임성열;신기욱;정철우;김선광;김준호;유용주;김대일
    • 열처리공학회지
    • /
    • 제23권1호
    • /
    • pp.29-33
    • /
    • 2010
  • Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

$Co_{89}Nb{8.5}Zr{2.5}$ 비정질 박막의 이방성에 미치는 열처리 효과 (Effect of Annealing on the Magnetic Anisotropy of Amorphous $Co_{89}Nb{8.5}Zr{2.5}$Thin Films)

  • 김현식;민복기;송재성;오영우
    • 한국전기전자재료학회논문지
    • /
    • 제11권6호
    • /
    • pp.486-492
    • /
    • 1998
  • The amorphous Co-based magnetic films have a large saturation flux density, a low coercive force, and a zero magnetostriction constant. Therefore, they have been studied for application to magnetic recoding heads and micro magnetic devices. However, it was found that the magnetic anisotropy was changed for each film fabrication processes. In this study, we investigated how to control the anisotropy of sputtered amorphous $Co_{89}Nb{8.5}Zr{2.5}$ films. After deposition, the rotational field annealing ant the uniaxial field annealing were performed under the magnetic field of 1.5 kOe. the annealing was done at the temperature range from 400 to $600^{\circ}C$ for one hour. As-deposited amorphous $Co_{89}Nb{8.5}Zr{2.5}$ thin film had saturation magnetization ($4\piM_5$) of 0.8 T, coercive force($_IH_C$) of 1.5 Oe, and anisotropy field($H_k$) of 11 Oe. The amorphous $Co_{89}Nb{8.5}Zr{2.5}$ thin films annealed by rotational field annealing at $500^{\circ}C$ for one hour was found to be isotropy, and $4\piM_5$ of 0.9 T was obtained from these films, Also, the magnetic anisotropy of as-deposited films could be controlled by uniaxial field annealing at $400^{\circ}C$ for one hour. Anisotropy field($H_k$) of 17 Oe and $4\piM_5$ of 1.0 T were obtained by this method.

  • PDF

Nucleation and growth mechanism of nitride films deposited on glass by unbalanced magnetron sputtering

  • Jung, Min J.;Nam, Kyung H.;Han, Jeon G.
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2001년도 춘계학술발표회 초록집
    • /
    • pp.14-14
    • /
    • 2001
  • Nitride films such as TiN, CrN etc. deposited on glass by PVD processes have been developed for many industrial applications. These nitride films deposited on glass were widely used for not only decorative and optical coatings but also wear and corrosion resistance coatings employed as dies and molds made of glass for the example of lens forming molds. However, the major problem of nitride coatings on glass by PVD process is non-uniform film owing to pin-hole and micro crack. It is estimated that nonuniform coating is influenced by a different surface energy between metal nitrides and glass due to binding states. In this work, therefore, for the evaluation of nucleation and growth mechanism of nitride films on glass TiN and CrN film were synthesized on glass with various nitrogen partial pressure by unbalanced magnetron sputtering. Prior to deposition, for the examination of relationship between surface energy and film microstructure plasma pre-treatment process was carried out with various argon to hydrogen flow rate and substrate bias voltage, duty cycle and frequency by using pulsed DC power supply. Surface energy owing to the different plasma pre-treatment was calculated by the measurement of wetting angle and surface conditions of glass were investigated by X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscope(AFM). The microstructure change of nitride films on glass with increase of film thickness were analyzed by X-Ray Diffraction(XRD) and Scanning Electron Microscopy(SEM).

  • PDF

MiR-183-5p induced by saturated fatty acids regulates the myogenic differentiation by directly targeting FHL1 in C2C12 myoblasts

  • Nguyen, Mai Thi;Min, Kyung-Ho;Lee, Wan
    • BMB Reports
    • /
    • 제53권11호
    • /
    • pp.605-610
    • /
    • 2020
  • Skeletal myogenesis is a complex process that is finely regulated by myogenic transcription factors. Recent studies have shown that saturated fatty acids (SFA) can suppress the activation of myogenic transcription factors and impair the myogenic differentiation of progenitor cells. Despite the increasing evidence of the roles of miRNAs in myogenesis, the targets and myogenic regulatory mechanisms of miRNAs are largely unknown, particularly when myogenesis is dysregulated by SFA deposition. This study examined the implications of SFA-induced miR-183-5p on the myogenic differentiation in C2C12 myoblasts. Long-chain SFA palmitic acid (PA) drastically reduced myogenic transcription factors, such as myoblast determination protein (MyoD), myogenin (MyoG), and myocyte enhancer factor 2C (MEF2C), and inhibited FHL1 expression and myogenic differentiation of C2C12 myoblasts, accompanied by the induction of miR-183-5p. The knockdown of FHL1 by siRNA inhibited myogenic differentiation of myoblasts. Interestingly, miR-183-5p inversely regulated the expression of FHL1, a crucial regulator of skeletal myogenesis, by targeting the 3'UTR of FHL1 mRNA. Furthermore, the transfection of miR-183-5p mimic suppressed the expression of MyoD, MyoG, MEF2C, and MyHC, and impaired the differentiation and myotube formation of myoblasts. Overall, this study highlights the role of miR-183-5p in myogenic differentiation through FHL1 repression and suggests a novel miRNA-mediated mechanism for myogenesis in a background of obesity.

질화탄소 표면층 및 열처리가 탄소 나노튜브 미세팁의 전계방출 및 장시간 안정성에 미치는 영향 (Effects of Carbon Nitride Surface Layers and Thermal Treatment on Field-Emission and Long-Term Stability of Carbon Nanotube Micro-Tips)

  • 노영록;김종필;박진석
    • 반도체디스플레이기술학회지
    • /
    • 제9권1호
    • /
    • pp.41-47
    • /
    • 2010
  • The effects of thermal treatment on CNTs, which were coated with a-$CN_x$ thin film, were investigated and related to variations of chemical bonding and morphologies of CNTs and also properties of field emission induced by thermal treatment. CNTs were directly grown on nano-sized conical-type tungsten tips via the inductively coupled plasma-chemical vapor deposition (ICP-CVD) system, and a-$CN_x$ films were coated on the CNTs using an RF magnetron sputtering system. Thermal treatment on a-$CN_x$ coated CNT-emitters was performed using a rapid thermal annealing (RTA) system by varying temperature ($300-700^{\circ}C$). Morphologies and microstructures of a-$CN_x$/CNTs hetero-structured emitters were analyzed by FESEM and HRTEM. Chemical composition and atomic bonding structures were analyzed by EDX, Raman spectroscopy, and XPS. The field emission properties of the a-$CN_x$/CNTs hetero-structured emitters were measured using a high vacuum (below $10^{-7}$ Torr) field-emission measurement system. For characterization of emission stability, the fluctuation and degradation of the emission current were monitored in terms of operation time. The results were compared with a-$CN_x$ coated CNT-emitters that were not thermally heated as well as with the conventional non-coated CNT-emitters.