• Title/Summary/Keyword: Micro deposition

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Nano-bending method for the measurement of the Poisson's ratio of MEMS thin films (MEMS 박막의 푸와송 비 측정을 위한 미소굽힘기법)

  • 김종훈;김정길;연순창;전윤광;한준희;이호영;김용협
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.31 no.2
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    • pp.57-62
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    • 2003
  • Nano-bending method is presented to measure the Poisson's ratio of thinfilms for MEMS (Micro-Electro-Mechanical Systems) applicaiton. The douvle-ring specimen is designed and fabricated based on the surface micromachining process to facilitate the measurement of the Poisson's ratio. The Poisson's ratio can be obtained through analyzing the linear load-displacement relationship of the double ring specimen subjected to nano-indenter loading. The Present nano-bending mehod is an in-situ measurement approach due to the compatibility to the surface micromachining process. The Poisson's ratio is locally obtained at the location of the double ring specimen with micro dimension. To validate the nano-bending method, the Poisson's ratio of LPCVD (Low Pressure Chemical Vapor Deposition) poly-silicon with thickness of 2.3㎛ is investigated. Experimental results reveal that the Poisson's ratio of the poly-silicon film is 0.2569. The standard deviation of the nano-bending measurement for the stiffness of double ring specimens is 2.66%.

Experimental Investigation of CHF Enhancement on the Modified Surface Under Pool Boiling (개질된 표면을 이용한 풀비등 임계열유속 증진에 관련한 실험적 연구)

  • Kang, Soon-Ho;Ahn, Ho-Seon;Jo, Hang-Jin;Kim, Moo-Hwan;Kim, Hyung-Mo;Kim, Joon-Won
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.33 no.11
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    • pp.840-848
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    • 2009
  • In the boiling heat transfer mechanism, CHF(critical heat flux) is the significantly important parameter of the system. So, many researchers have been struggling to enhance the CHF of the system in enormous methods. Recently, there were lots of researches about enormous CHF enhancement with the nanofluids. In that, the pool boiling CHF in nanofluids has the significantly increased value compared to that in pure water because of the deposition of the nanoparticle on the heater surface in the nanofluids. The aim of this study is the comparison of the effect of the nanoparticle deposited surface and the modified surface which has the similar morphology and made by MEMS fabrication. The nanoparticle deposited surface has the complex structures in nano-micro scale. Therefore, we fabricated the surfaces which has the similar wettability and coated with the micro size post and nano structure. The experiment is performed in 3 cases : the bare surface with 0.002% water-ZnO nanofluids, the nanoparticle deposited surface with pure water and the new fabricated surface with pure water. The contact angle, a representative parameter of the wettability, of the all 3 cases has the similar value about 0 and the SEM(scanning electron microscope) images of the surfaces show the complex nano-micro structure. From the pool boiling experiment of the each case, the nanoparticle deposited surface with pure water and the fabricated surface with pure water has the almost same CHF value. In other words, the CHF enhancement of the nanoparticle deposited surface is the surface effect. It also shows that the new fabricated surface follows the nanoparticle deposited surface well.

Fabrication of Nickel Oxide Film Microbolometer Using Amorphous Silicon Sacrificial Layer (비정질 실리콘 희생층을 이용한 니켈산화막 볼로미터 제작)

  • Kim, Ji-Hyun;Bang, Jin-Bae;Lee, Jung-Hee;Lee, Yong Soo
    • Journal of Sensor Science and Technology
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    • v.24 no.6
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    • pp.379-384
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    • 2015
  • An infrared image sensor is a core device in a thermal imaging system. The fabrication method of a focal plane array (FPA) is a key technology for a high resolution infrared image sensor. Each pixels in the FPA have $Si_3N_4/SiO_2$ membranes including legs to deposit bolometric materials and electrodes on Si readout circuits (ROIC). Instead of polyimide used to form a sacrificial layer, the feasibility of an amorphous silicon (${\alpha}-Si$) was verified experimentally in a $8{\times}8$ micro-bolometer array with a $50{\mu}m$ pitch. The elimination of the polyimide sacrificial layer hardened by a following plasma assisted deposition process is sometimes far from perfect, and thus requires longer plasma ashing times leading to the deformation of the membrane and leg. Since the amorphous Si could be removed in $XeF_2$ gas at room temperature, however, the fabricated micro-bolomertic structure was not damaged seriously. A radio frequency (RF) sputtered nickel oxide film was grown on a $Si_3N_4/SiO_2$ membrane fabricated using a low stress silicon nitride (LSSiN) technology with a LPCVD system. The deformation of the membrane was effectively reduced by a combining the ${\alpha}-Si$ and LSSiN process for a nickel oxide micro-bolometer.

A Study on the Thermal Shock Resistance of Sintered Zirconia for Electron Beam Deposition (전자빔 증착을 위한 소결체 지르코니아의 열충격 저항성 연구)

  • Oh, Yoonsuk;Han, Yoonsoo;Chae, Jungmin;Kim, Seongwon;Lee, Sungmin;Kim, Hyungtae;Ahn, Jongkee;Kim, Taehyung;Kim, Donghoon
    • Journal of the Korean Society of Propulsion Engineers
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    • v.19 no.3
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    • pp.83-88
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    • 2015
  • Coating materials used in the electron beam (EB) deposition method, which is being studied as one of the fabrication methods of thermal barrier coating, are exposed to high power electron beam at focused area during the EB deposition. Therefore the coating source for EB process is needed to form as ingot with appropriate density and microstructure to sustain their shape and stable melts status during EB deposition. In this study, we tried to find the optimum powder condition for fabrication of ingot of 8 wt% yttria stabilized zirconia which can be used for EB irradiation. It seems that the ingot, which is fabricated through bi-modal type initial powder mixture which consists of tens of micro and nano size particles, was shown better performance than the ingot which is fabricated using monolithic nanoscale powder when exposed to high power EB.

Retinopathy Induced by Zinc Oxide Nanoparticles in Rats Assessed by Micro-computed Tomography and Histopathology

  • Kim, Young Hee;Kwak, Kyung A;Kim, Tae Sung;Seok, Ji Hyeon;Roh, Hang Sik;Lee, Jong-Kwon;Jeong, Jayoung;Meang, Eun Ho;Hong, Jeong-sup;Lee, Yun Seok;Kang, Jin Seok
    • Toxicological Research
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    • v.31 no.2
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    • pp.157-163
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    • 2015
  • Nanotechnology has advanced at an extremely rapid pace over the past several years in numerous fields of research. However, the uptake of nanoparticles (NPs) into the body after administration through various routes may pose a risk to human health. In this study, we investigated the potential ocular toxicity of 20-nm, negatively- charged zinc oxide (ZnO) NPs in rats using micro-computed tomography (micro-CT) and histopathological assessment. Animals were divided into four groups as control group, ZnO NPs treatment group (500 mg/kg/day), control recovery group, and ZnO NPs treatment and recovery group. Ocular samples were prepared from animals treated for 90 days (10 males and 10 females, respectively) and from recovery animals (5 males and 5 females, respectively) sacrificed at 14 days after final treatment and were compared to age-matched control animals. Micro-CT analyses represented the deposition and distribution of foreign materials in the eyes of rats treated with ZnO NPs, whereas control animals showed no such findings. X-ray fluorescence spectrometry and energy dispersive spectrometry showed the intraocular foreign materials as zinc in treated rats, whereas control animals showed no zinc signal. Histopathological examination revealed the retinopathy in the eyes of rats treated with ZnO NPs. Neuronal nuclei expression was decreased in neurons of the ganglion cell layer of animals treated with ZnO NPs compared to the control group. Taken together, treatment with 20-nm, negatively-charged ZnO NPs increased retinopathy, associated with local distribution of them in ocular lesions.

Light-Induced Degradation of Hydrogenated Amorphous Silicon (광조사에 따른 비정질 실리콘의 열화)

  • 박진석;한민구;이정한
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.5
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    • pp.501-508
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    • 1988
  • This paper presents the light-induced effects on the elelctrical and optical properties of undoped and doped hydrogenated amorphous silicon films. The changes in the conductivities and the activation energies of various types of a-Si:H films due to the prolonged exposure to light have been characterized as a function of deposition conditions and illumination periods. The dark conductivity changes may be quenched for heavier doped a-Si:H films. We have also analyzed the variations of micro-structure of a-Si:H film such as silicon-hydrogen bondings in the rocking and stretching modes utilizing infrared spectroscopy. From the experimental results, it is elucidated that doping effects must be crucial to the degradations of the fundamental properties of a-Si:H due to light-induced effects.

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Characteristics of Silicon Carbide Nanowires Synthesized on Porous Body by Carbothermal Reduction

  • Kim, Jung-Hun;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.55 no.3
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    • pp.285-289
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    • 2018
  • We synthesized silicon carbide (${\beta}-SiC$) nanowires with nano-scale diameter (30 - 400 nm) and micro-scale length ($50-200{\mu}m$) on a porous body using low-grade silica and carbon black powder by carbothermal reduction at $1300-1600^{\circ}C$. The SiC nanowires were formed by vapor-liquid-solid deposition with self-evaporated Fe catalysts in low-grade silica. We investigated the characteristics of the SiC nanowires, which were grown on a porous body with Ar flowing in a vacuum furnace. Their structural, optical, and electrical properties were analyzed with X-ray diffraction (XRD), transmission electron microscopy (TEM), and selective area electron diffraction (SAED). We obtained high-quality SiC single crystalline nanowire without stacking faults that may have uses in industrial applications.

A study on the synthesis and mechanical properties of WC/C multilayered films (WC/C 다층박막의 합성 및 기계적 특성에 관한 연구)

  • 명현식;한전건
    • Journal of the Korean institute of surface engineering
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    • v.35 no.3
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    • pp.121-126
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    • 2002
  • WC/C multilayered films were deposited by arc ion plating and magnetron sputter hybrid system with various $C_2$H$_2$ flow rates and bias voltages. The coatings have been characterized with respect to their chemical composition (Glow Discharge Optical Emission Spectroscopy), hardness(Knoop micro-hardness), residual stress(Laser beam bending) and friction coefficient(Ball on disc type wear test). Deposition rate, microhardness and residual stress of WC/C films were observed to increase with increasing the $C_2$$H_2$ flow rates. The highest hardness and residual stress were measured to be 26.5 GPa and 1.1GPa for, WC/C film deposited at substrate bias of -100V. WC/C multilayered film was obtained very low friction coefficient(~0.1).

Fabrication of Miniaturized Shadow-mask for Local Deposition (국부증착용 마이크로 샤도우 마스크 제작)

  • 김규만;유르겐부르거
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.8
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    • pp.152-156
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    • 2004
  • A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

Fabrication of nanostencil using FIB milling for nanopatterning (FIB 밀링을 이용한 나노스텐실 제작 및 나노패터닝)

  • Chung Sung-Ill;Oh Hyeon-Seok;Kim Gyu-Man
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.3 s.180
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    • pp.56-60
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    • 2006
  • A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.