• Design & Manufacturing
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• 제13권3호
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• pp.48-52
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• 2019

As the consumer market in the mold, automation and aerospace industries grows, the demand for chemical machining using on electrochemical polishing increases. To enhance the surface roughness and gloss of the micro-needle, we have studied for an electrochemical polishing. Electrochemical polishing requires the chemical reaction of solution and material according to the electrolyte and electrode. In this study, sulfuric acid(30%), phosphoric acid(50%), and DI-water(20%)were used as the electrolytic solution, and the electrolytic solution temperature used $58^{\circ}C$. Electrochemical polishing was carried out in experimental conditions, and the micro-needle experiment was carried out from the basic experiment to obtain the experimental conditions. Experimental results show that as the voltage and current increase, the surface roughness improved and the gloss is improved. So, the best result for this experiment was obtained in condition 6, which improved micro-needle.

• 한국정밀공학회지
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• 제19권8호
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• pp.134-140
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• 2002

Chemical mechanical polishing of aluminum and photoresist using colloidal silica-based slurry was experimented. The effects of slurry pH, silica concentration, and oxidizer ($H_2O_2$) concentration on surface roughness and removal rate were studied. The optimum slurry conditions for reduction of micro-scratch were investigated. The optimum chemical mechanical polishing with the colloidal silica-based slurry was compared with conventional chemical mechanical polishing with alumina-based slurry. Chemical mechanical polishing of the aluminum with the colloidal silica-based slurry showed improved result but chemical mechanical polishing of the photoresist did not. The improved result was comparative with that of chemical mechanical polishing with filtered alumina-based slurry which one of desirable methods to reduce the micro-scratch.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2003년도 추계학술대회
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• pp.324-328
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• 2003

The Magnetoeheological fluid has the properties that it's viscosity has dramastic changed under some magnetic fields therefore, Magnetorhlogical fluids has been used for micro polishing of the micro part( for example, a aspherical surface in a micro lens). The polishing process may appears as follows. A part rotating on the spindle is brought into contact with an Magnetorhological finshing(MRF) fluids which is set in motion by the moving wall. In the region where the part and the MRF fulid ate brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham flow in the contact zone. Resonable calculated and experimental magnitudes of the material removal rate f3r glass polishing lends support the validity of the approach.

• 한국정밀공학회지
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• 제21권7호
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• pp.46-52
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• 2004

The Magnetorheological fluid has the properties that its viscosity has drastic changed under some magnetic fields therefore, Magnetorheological fluids has been used fur micro polishing of the micro part(for example, a spherical surface in a micro lens). The polishing process may appears as follows. A part rotating on the spindle is brought into contact with an Magnetorheological finishing(MRF) fluids which is set in motion by the moving wall. In the region where the part and the MRF fluid are brought into contact, the applied magnetic field creates the conditions necessary for the material removal from the part surface. The material removal takes place in a certain region contacting the surface of the part which can be called the polishing spot or zone. The polishing mechanism of the material removal in the contact zone is considered as a process governed by the particularities of the Bingham flow in the contact zone. Resonable calculated and experimental magnitudes of the material removal rate for glass polishing lends support the validity of the approach.

• 한국생산제조학회지
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• 제20권3호
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• pp.316-321
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• 2011

Recently, it has been studied machining of micro parts with increasing demands for ultra precision parts. However, many engineering problems have already begun in polishing of optical parts or lens. As a method to overcome such problems, a new technology for the polishing of the target surface is being studied by controlling abrasives using MR fluids which are sensitive to magnetic fields. Since the current MR polishing system uses a big electromagnet, and is difficult to polish micro parts or spherical lens. Therefore, in this study, a round endmill type MR polishing system was developed to polish a three-dimensional structure which has spherical or inclined plane. And then, series of experiments were performed to verify the polishing performance of the developed round endmill type MR polishing system.

• 한국정밀공학회지
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• 제21권5호
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• pp.32-37
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• 2004

Polishing processes are widely used in the glass, optical, die and semiconductor industries. Chemical Mechanical Polishing (CMP) especially is becoming one of the most important ULSI processes for the 0.25m generation and beyond. CMP is conventionally carried out using abrasive slurry and a polishing pad. But the surface of the pad has irregular pores, so there is non-uniformity of slurry flow and of contact area between wafer and the pad, and glazing occurs on the surface of the pad. This paper introduces the basic concept and fabrication technique of the next generation CMP pad using micro-molding method to obtain uniform protrusions and pores on the pad surface.

• 한국생산제조학회지
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• 제19권2호
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• pp.267-274
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• 2010

Recently, the magnetorheological (MR) polishing process has been examined as a new ultra-precision polishing technology for mirror surface generation in many applications, such as aspheric lenses, biochips, micro parts, etc. This method uses MR fluids which contains micro abrasives as a polishing media, and can. It is possible to obtain nano level surface roughness under suitable process conditions, however, required polishing time is highly dependent on the applied pre-polishing methods due to its very small material removal rate. Thus, in this study, a combined polishing method is presented to reduce total polishing time for SUS304. First, the electropolishing (EP) method was applied to obtain fine surface roughness, and the MR polishing was followed. Surface roughness variations were investigated according to the process conditions. As the results of this study, it was possible to reduce total polishing time for SUS304 using the proposed combined polishing method.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2009년도 춘계학술대회 논문집
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• pp.78-83
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• 2009

In general, Light-hardening polymer was used UV nanoimprint technology. A light-hardening polymer was had the problem of poor hardness, durability. In order to overcome the problem of polymer, inter change optical glass. However glass is very manufacture and a lowering of standars transmittance. In order to glass recover was necessary polishing process. The process is magnetorheological fluids polishing. MR polishing has been developed as a new precision finishing technique to obtain a fine surface. Hence, Magnetorheological fluids has been used for micro polishing to get micro parts. This polishing process guarantees high polishing quality by controlling the fluid density electrically. The applied material in experiments is fused silica glass. Fused silica glass is widely used in the optical field because of high degree of purity. For MR polishing experiments, MR fluid was composed with DI-water, carbonyl iron and nano slurry ceria. The wheel speed and electric current were chosen as the variables for analyzing the characteristics of MR polishing process. Outstanding surface roughness of Ra=1.58nm was obtained on the fused silica glass specimen. And originally glass transmittance was recover on the fused silica glass.

• Design & Manufacturing
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• 제16권1호
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• pp.50-54
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• 2022

Coverglass of electronic equipments is thinner and slimmer, so the glass must have good bending strength. In these days, the polishing edge of glass is used by solid tool like grinding wheel. But solid tool leave micro crack or edge chipping in edge of glass. MR polishing is an optimal method by polishing edge of glass. MR polishing is used MR fluid that is a liquid tool. MR polishing doesn't leave tool path or residual stress, micro crack and edge chipping unlike grinding wheel polishing. In this paper, the results of grinding and MR polishing were compared and analyzed to improve bending strength by minimizing edge chipping of cover glass. It was derived that the depth and size of cracks have a significant influence on the bending strength of the glass edge. The edges of the glass using MR grinding were analyzed to have a better surface and higher bending strength than the glass using abrasive wheel grinding. It was confirmed that MR polishing had an effect on strength improvement by effectively removing cracks in the specimen.

• 한국생산제조학회지
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• 제19권2호
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• pp.184-190
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• 2010

Recently, the polishing process using magnetorheological fluids(MR fluids) has been focused as a new ultra-precision polishing technology for micro and optical parts such as aspheric lenses, etc. This method uses MR fluid as a polishing media which contains required micro abrasives. In the MR polishing process, the surface roughness and material removal rate of a workpiece are affected by the process parameters, such as the properties of used nonmagnetic abrasives(particle material, size, aspect ratio and density, etc.), rotating wheel speed, imposed magnetic flux density and feed rate, etc. The objective of this research is to predict MRR according to the polishing conditions based on the multiple regression analysis. Three polishing parameters such as wheel speed, feed rates and current value were optimized. For experimental works, an orthogonal array L27(313) was used based on DOE(Design of Experiments), and ANOVA(Analysis of Variance) was carried out. Finally, it was possible to recognize that the sequence of the factors affecting MRR correspond to feed rate, current and wheel speed, and to determine a combination of optimal polishing conditions.