• 제목/요약/키워드: Mg-doped GaN

검색결과 38건 처리시간 0.041초

Characteristic in Mg-doped p-type GaN changing activation temperature in $N_2$ gas ambient

  • Lee, Sung-Ho;Kim, Chul-Joo;Seo, Yong-Gon;Seo, Mun-Suek;Hwang, Sung-Min
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.113-114
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    • 2008
  • Conventional furnace annealing (CFA) for activating Mg-doped p-type GaN films had been performed in pure $N_2$ ambient. All sample activated the same gas ambient. The annealing process change temperature: the first process is performed at $550^{\circ}C$ for 10 min. but, the first process is the same bulk. From second to five process increase activation temperature to change $50^{\circ}C$ and annealing time keeping for 10 min. It is found that the samples characteristic measure hall measurement. Similar results were also evidenced by photoluminescence (PL) measurement.

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HVPE 방법에 의해 r-plane 사파이어 기판 위의 선택 성장된 GaN/AlGaN 이종 접합구조의 특성 (Characteristics of selective area growth of GaN/AlGaN double heterostructure grown by hydride vapor phase epitaxy on r-plane sapphire substrate)

  • 홍상현;전헌수;한영훈;김은주;이아름;김경화;황선령;하홍주;안형수;양민
    • 한국결정성장학회지
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    • 제19권1호
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    • pp.6-10
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    • 2009
  • 본 논문에서는 혼합소스(mixed-source) HVPE(hydride vapor phase epitaxy)방법으로 선택성장(SAC: selective area growth) GaN/AlGaN 이종접합구조의 발광다이오드를 r-plane 사파이어 기판 위에 제작하였다. SAG-GaN/AlGaN DH(double heterostructure)는 고온 GaN 버퍼층, Te 도핑된 AlGaN n-클래딩층. Gan 활성층. Mg 도핑된 AlGaN p-클래딩층. Mg 도핑된 GaN p-캡층으로 구성되어있다. GaN/AlGaN 이종접합구조의 발광다이오드의 특성을 알아보기 위해 SEM을 통한 구조적 분석과 전류-전압 측정(I-V: current-voltage measurement), 전류-광출력(EL: electroluminescence) 측정을 통하여 전기적, 광학적 특성을 평가하였다.

O2 분위기에서 p-GaN 층의 Mg 활성화가 GaN계 녹색 발광소자에 미치는 전류-전압특성 (The Influence of the Mg-doped p-GaN Layer Activated in the O2 Ambient on the Current-Voltage Characteristics of the GaN-Based Green LEDs)

  • 윤창주;배성준
    • 한국전기전자재료학회논문지
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    • 제15권5호
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    • pp.441-448
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    • 2002
  • The electrical properties of the GaN-based green light emitting diodes(LEDs) with the Mg-doped p-GaN layer activated in $N_2$ or $O_2$ ambient have been compared. For the $N_2$ -ambient activation the current-voltage behavior of LEDs has been found to be improved when the Mg dopants activation was performed in the higher temperature. However, for the $O_2$-ambient activation the current-voltage characteristic has been observed to be enhanced when the Mg dopants activation was carried out in the lower temperature. The minimum forward voltage at 20mA was obtained to be 4.8 V for LEDs with the p-GaN layer activated at $900^{\circ}C$ in the $N_2$ ambient and 4.5V for LEDs with the p-GaN layer treated at $700^{\circ}C$ in the $O_2$ambient, repectively. The forward voltage reduction of the LEDs treated in the $O_2$-ambient may be related to the oxygen co-doping of the p-GaN layer during the activation process. The $O_2$ -ambient activation process is useful for the enhancement of the LED performance as well as the fabrication process since this process can activate the Mg dopants in the low temperature.

The critical Mg doping on the blue light emission in p-type GaN thin films grown by metal-organic chemical vapor deposition

  • Kim, Keun-Joo
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 기술교육위원회 창립총회 및 학술대회 의료기기전시회
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    • pp.52-59
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    • 2001
  • The photoluminescence and the photo-current from p-type GaN films were investigated on both room- and low-temperatures for various Mg doping concentrations. At a low Mg doping level, there exists a photoluminescence center of the donor and the acceptor pair transition of the 3.28-eV band. This center is correlated with the defects for a shallow donor of the VGa and for an acceptor of MgGa. The acceptor level shows the binding energy of 0.2-0.25 eV, which was observed by the photon energy of the photo-current signal of 3.02-3.31 eV. At a high Mg doping level, there is a photoluminescence center of a deep donor and an acceptor pair transition of the 2.76-eV blue band. This center is attributed to the defect structures of MgGa-VN for the deep donor and MgGa for the acceptor. For low. doped samples, thermal annealing provides an additional photo-current signal for an unoccupied deep acceptor levels of 0.87-1.35 eV above valence band, indicating the p-type activation.

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Mg가 첨가된 GaN 박막에서 캐리어 전이의 열적도움과 전계유도된 터러링 현상 (Thermally Assisted Carrier Transfer and Field-induced Tunneling in a Mg-doped GaN Thin Film)

  • 정상근;김윤겸;신현길
    • 한국재료학회지
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    • 제12권6호
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    • pp.431-435
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    • 2002
  • The dark current and photocurrent(PC) spectrum of Mg-doped GaN thin film were investigated with various bias voltages and temperatures. At high temperature and small bias, the dark current is dominated by holes thermally activated from an acceptor level Al located at about 0.16 eV above the valence band maximum $(E_v)$, The PC peak originates from the electron transition from deep level A2 located at about 0.34 eV above the $E_v$ to the conduction band minimum $(E_ C)$. However, at a large bias voltage, holes thermally activated from A2 to Al experience the field-in-duces tunneling to form one-dimensional defect band at Al, which determines the dark current. The PC peak associated with the transition from Al to $E_ C$ is also observed at large bias voltages owing to the extended recombination lifetime of holes by the tunneling. In the near infrared region, a strong PC peak at 1.20 eV appears due to the hole transition from deep donor/acceptor level to the valence band.

혼합소스 HVPE 방법에 의한 전력 반도체 소자용 p형 AlN 에피층 성장 (p-Type AlN epilayer growth for power semiconductor device by mixed-source HVPE method)

  • 이강석;김경화;김상우;전인준;안형수;양민;이삼녕;조채용;김석환
    • 한국결정성장학회지
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    • 제29권3호
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    • pp.83-90
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    • 2019
  • 본 논문에서는 전력 반도체 소자용 Mg-doped AlN 에피층을 혼합 소스 수소화물 기상 에피택시 방법에 의해 성장하였다. p형 재료로는 Mg을 사용하였다. 소자응용을 위한 기초 기판으로서 역할을 하기 위하여 GaN 에피층이 성장된 기판과 GaN 에피층이 성장되어 패턴이 형성된 사파이어 기판 위에 Mg-doped AlN 에피층을 선택 성장하였다. Mg-doped AlN 에피층의 표면과 결정 구조는 FE-SEM 및 HR-XRD에 의해 조사하였다. XPS 스펙트럼과 라만 스펙트럼 결과로부터 혼합소스 HVPE 방법에 의해 성장된 Mg-doped AlN 에피층은 전력소자 등에 응용이 가능할 것으로 판단된다.

$MgAl_{2}O_{4}$ 기판위에 GaN의 HVPE 성장조건에 따른 광루미네센스 특성 (Photoluminescence Properties of GaN on $MgAl_{2}O_{4}$ Substrate with HVPE Growth Conditions)

  • 김선태;이영주
    • 한국재료학회지
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    • 제8권8호
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    • pp.667-671
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    • 1998
  • 이 연구에서는 HVPE법으로 $MgAl_{2}O_{4}$ 기판 위에 GaN를 서로 다른 조건에서 성장시키고, 성장된 GaN의 PL특성을 조사하였다. $MgAl_{2}O_{4}$ 기판위에 성장된 GaN는 $MgAl_{2}O_{4}$ 기판으로부터 Mg의 out-diffusion에 의한 auto-doping 효과에 의하여 불순물이 첨가된 GaN의 PL 성질을 나타내었다. Mg과 관련된 발광 강도는 GaN의 성장온도가 증가함에 따라 GaN의 표면에서 Mg의 재증발에 의하여 감소하였으며, GaN의 두께에 대하여 지수 함수적으로 감소하였다. 두 개의 무한 고체 사이에서 농도 차에 의한 확산현상을 고려하여 구한 GaN 내에서 Mg 원자의 확산계수는 D= 2$\times$$lO^{-10}\textrm{cm}^2/sec. 이었다.

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UV pumped two color phosphor blend White emitting LEDs

  • Choi, Kyoung-Jae;Park, Joung-Kyu;Kim, Kyung-Nam;Kim, Chang-Hae;Kim, Ho-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.636-639
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    • 2004
  • We have synthesized a $Eu^{2{\cdot}}$ -activated $Sr_3MgSi_2O_8$ blue phosphor and $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$ yellow phosphor investigated an attempt to develop white LEDs by combining it with a GaN blue LED chip. Three distinct emission bands from the GaN-based LED and the ($Sr_3MgSi_2O_8$:Eu + $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$:Eu) phosphor are clearly observed at 405nm, 455 nm and at around 540 nm, respectively. These three emission bands combine to give a spectrum that appears white to the naked eye. Our results show that GaN (405 nm chip)-based ($Sr_3MgSi_2O_8$:Eu + $Ba^{2{\cdot}}$ co-doped $Sr_2SiO_4$:Eu) exhibits a better luminous efficiency than that of the industrially available product InGaN (460 nm chip)-based YAG:Ce.

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UV pumped three color phosphor blend White emitting LEDs

  • Choi, Kyoung-Jae;Park, Joung-Kyu;Kim, Kyung-Nam;Kim, Chang-Hae;Kim, Ho-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1338-1342
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    • 2005
  • We have synthesized an $Eu^{2+}$-activated $Sr_3MgSi_2O_8$ blue phosphor and $Ba_2SiO_4$ green phosphor and $Ba^{2+}$ co-doped $Sr_3SiO_5$ red phosphor investigated an attempt to develop white LEDs by combining it with a GaN blue LED $chip(\lambda_{em}=405 nm)$. Three distinct emission bands from the GaN-based LED and the $(Sr_3MgSi_2O_8:Eu\; +\; Ba_2SiO_4:Eu\; +\; Ba^{2+}\; co-doped\; Sr_3SiO_5:Eu)$ phosphor are clearly observed at 460nm, 520 nm and at around 600 nm, respectively. These three emission bands combine to give a spectrum that appears white to the naked eye. Our results show that GaN (405 nm chip)-based $(Sr_3MgSi_2O_8:Eu\; +\; Ba_2SiO_4:Eu\; +\; Ba^{2+}\; co-doped\; Sr_3SiO_5:Eu) exhibits a better luminous efficiency than that of the industrially available product InGaN (460 nm chip)-based YAG:Ce.

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