• Transactions on Electrical and Electronic Materials
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• 제3권3호
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• pp.8-13
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• 2002

Controlled precipitation of quasi-binary semiconductor system is newly proposed as an effective and reliable technique for the formation of well-defined and crystallographically aligned semiconductor nanostructures. Using HgTe-PbTe quasi-binary semiconductor system, self-aligned HgTe nanocrystallites distributed three dimensionally within PbTe matrix were successfully formed by the simple three step heat treatment process routinely found in age hardening process of metallic alloys. Examination of the resulting nano precipitates using conventional transmission electron microscopy (CTEM) and high resolution TEM (HRTEM) reveals that the coherent HgTe precipitates form as thin discs along the (100) habit planes making a crystallographic relation of {100}$\_$HgTe///{100}$\_$PbTe/ and [100]$\_$HgTe///[100]$\_$PbTe/. It is also found that the precipitate undergoes a gradual thickening and a faceting under isothermal aging up to 500 hours without any noticeable coarsening. These results, combined with the extreme dimension of the precipitates (4-5 nm in length and sub-nanometer in thickness) and the simplicity of the formation process, leads to the conclusion that controlled precipitation is an effective method for preparing desirable quantum-dot nanostructures.

• 마이크로전자및패키징학회지
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• 제30권2호
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• pp.65-70
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• 2023

나노임프린트 리소그래피(Nanoimprint lithography, NIL) 공정은 패턴 형성을 위한 공정 단순성, 우수한 패턴 형성, 공정의 확장성, 높은 생산성 및 저렴한 공정 비용이라는 이유들로 인해 많은 관심을 받고 있다. 그러나, 기존의 NIL 기술들을 통해 금속 소재 상 구현할 수 있는 패턴의 크기는 일반적으로 마이크로 수준으로 제한적이다. 본 연구에서는, 다양한 두께의 금속 기판 표면에 마이크로/나노 스케일 패턴을 직접적으로 형성하기 위한 극압 임프린트 리소그래피(extremepressure imprint lithography, EPIL) 방법을 소개하고자 한다. EPIL 공정은 자외선, 레이저, 임프린트 레지스트 또는 전기적 펄스 등의 외부 요인을 사용하지 않고 고분자, 금속, 세라믹과 같은 다양한 재료의 표면에 신뢰성 있는 나노 수준의 패터닝을 가능하게 한다. 레이저 미세가공 및 포토리소그래피로 제작된 마이크로/나노 몰드는 상온에서 높은 하중 혹은 압력을 가해 정밀한 소성변형 기반 Al 기판의 나노 패터닝에 활용된다. 20 ㎛ 부터 100 ㎛까지 다양한 두께를 갖는 Al 기판 상 마이크로/나노 스케일의 패턴 형성을 보여주고자 한다. 또한, 다목적 EPIL 기술을 통해 금속 재료 표면에서 그 형상을 제어하는 방법 역시 실험적으로 증명된다. 임프린트 리소그래피 기반 본 접근법은 복잡한 형상이 포함된 금속 재료의 표면을 요구하는 다양한 소자 응용을 위한 나노 제조 방법에 적용될 수 있을 것으로 기대한다.

• Journal of Electrochemical Science and Technology
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• 제9권3호
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• pp.202-211
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• 2018

In this work, Fe-Pd alloy films have been electrodeposited on different substrates using an electrolyte containing $[Pd(NH_3)_4]^{2+}$ (0.02 M) and $[Fe-Citrate]^{2+}$ (0.2 M). The influences of substrate and overpotential on chemical composition, nucleation and growth kinetics as well as the electrodeposited films morphology have been investigated using energy dispersive X-ray spectroscopy (EDS), current-time transients, scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD) patterns. In all substrates - brass, copper and sputtered fluorine doped tin oxide on glass (FTO/glass) - Fe content of the electrodeposited alloys increases by increasing the overpotential. Also the cathodic current efficiency is low due to high rate of $H_2$ co-reduction. Regarding the chronoamperometry current-time transients, it has been demonstrated that the nucleation mechanism is instantaneous with a typical three dimensional (3D) diffusion-controlled growth in the case of brass and copper substrates; while for FTO, the growth mode changes to 3D progressive. At a constant overpotential, the calculated number of active nucleation sites for metallic substrates is much higher than that of FTO/glass; however by increasing the overpotential, the number of active nucleation sites increases. The SEM micrographs as well as the XRD patterns reveal the formation of Fe-Pd alloy thin films with nanostructure arrangement and ultra-fine grains.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.76-76
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• 2011

Polymer-fullerene based bulk heterojunction (BHJ) solar cells can be fabricated in large area using low-cost roll-to-roll manufacturing methods. However, because of the low mobility of the BHJ materials, there is competition between the sweep-out of the photogenerated carriers by the built-in potential and recombination within the thin BHJ film [12-15]. Useful film thicknesses are limited by recombination. Thus, there is a need to increase the absorption by the BHJ film without increasing film thickness. Metal nanoparticles exhibit localized surface plasmon resonances (LSPR) which couple strongly to the incident light. In addition, relatively large metallic nanoparticles can reflect and scatter the light and thereby increase the optical path length within the BHJ film. Thus, the addition of metal nanoparticles into BHJ films offers the possibility of enhanced absorption and correspondingly enhanced photo-generation of mobile carriers. In this work, we have demonstrated several positive effects of shape controlled Au and Ag nanoparticles in organic P3HT/PC70BM, PCDTBT/PC70BM, Si-PCPDTBT/PC70BM BHJ-based PV devices. The use of an optimized concentration of Au and Ag nanomaterials in the BHJ film increases Jsc, FF, and the IPCE. These improvements result from a combination of enhanced light absorption caused by the light scattering of the nanomaterials in an active layer. Some of the metals induce the plasmon light concentration at specific wavelength. Moreover, improved charge transport results in low series resistance.

• 한국결정성장학회지
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• 제24권4호
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• pp.145-150
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• 2014

3차원적 선택적 결정 성장 방법에 의해 GaN stripe 구조의 꼭지점 부분에만 GaN 나노로드를 성장하였다. GaN stripe의 꼭지점 부분의 $SiO_2$ 만을 최적화된 포토리소그라피 공정을 이용하여 제거하고 이를 선택적 결정 성장을 위한 마스크로 사용하였다. $SiO_2$가 제거된 꼭지점 부근에만 Au 금속을 증착하고, metal organic vapor phase epitaxy(MOVPE) 방법에 의해 GaN stripe의 꼭지점 부분에만 GaN 나노로드의 선택적 성장을 실시하였다. GaN 나노로드의 형상과 크기는 결정 성장 온도와 III족 원료의 공급량에 의해 변화가 있음을 확인하였다. Stripe 꼭지점에 성장된 GaN 나노로드는 단면이 삼각형형태를 가지고 있으며 끝으로 갈수록 점점 폭이 좁아지는 테이퍼 형상을 가지며 성장되었다. TEM 관측 결과, 매우 좁은 영역에서만 선택적 결정 성장이 이루어졌기 때문에 GaN 나노로드에서 관통전위(threading dislocations)는 거의 관찰되지 않음을 확인하였다. 선택성장이 시작되는 부분의 결정면과 GaN 나노로드의 성장방향의 결정면 방향의 차이에 기인하는 적층결함(stacking faults)들이 GaN 나노로드의 중심영역에서 생성되는 것을 관찰할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.493-493
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• 2014

The manufacturing cost of thin-film photovoltics can potentially be lowered by minimizing the amount of a semiconductor material used to fabricate devices. Thin-film solar cells are typically only a few micrometers thick, whereas crystalline silicon (c-Si) wafer solar cells are $180{\sim}300\mu}m$ thick. As such, thin-film layers do not fully absorb incident light and their energy conversion efficiency is lower compared with that of c-Si wafer solar cells. Therefore, effective light trapping is required to realize commercially viable thin-film cells, particularly for indirect-band-gap semiconductors such as c-Si. An emerging method for light trapping in thin film solar cells is the use of metallic nanostructures that support surface plasmons. Plasmon-enhanced light absorption is shown to increase the cell photocurrent in many types of solar cells, specifically, in c-Si thin-film solar cells and in poly-Si thin film solar cell. By proper engineering of these structures, light can be concentrated and coupled into a thin semiconductor layer to increase light absorption. In many cases, silver (Ag) nanoparticles (NP) are formed either on the front surface or on the rear surface on the cells. In case of poly-Si thin film solar cells, Ag NPs are formed on the rear surface of the cells due to longer wavelengths are not perfectly absorbed in the active layer on the first path. In our cells, shorter wavelengths typically 300~500 nm are also not effectively absorbed. For this reason, a new concept of plasmonic nanostructure which is NPs formed both the front - and the rear - surface is worth testing. In this simulation Al NPs were located onto glass because Al has much lower parasitic absorption than other metal NPs. In case of Ag NP, it features parasitic absorption in the optical frequency range. On the other hand, Al NP, which is non-resonant metal NP, is characterized with a higher density of conduction electrons, resulting in highly negative dielectric permittivity. It makes them more suitable for the forward scattering configuration. In addition to this, Ag NP is located on the rear surface of the cell. Ag NPs showed good performance enhancement when they are located on the rear surface of our cells. In this simulation, Al NPs are located on glass and Ag NP is located on the rear Si surface. The structure for the simulation is shown in figure 1. Figure 2 shows FDTD-simulated absorption graphs of the proposed and reference structures. In the simulation, the front of the cell has Al NPs with 70 nm radius and 12.5% coverage; and the rear of the cell has Ag NPs with 157 nm in radius and 41.5% coverage. Such a structure shows better light absorption in 300~550 nm than that of the reference cell without any NPs and the structure with Ag NP on rear only. Therefore, it can be expected that enhanced light absorption of the structure with Al NP on front at 300~550 nm can contribute to the photocurrent enhancement.