1 |
S.P. Gou, I.W. Sun, Electrochim. Acta, 2008, 53(5), 2538-2544.
DOI
|
2 |
E. Nouri, A. Dolati, Mater. Res. Bull., 2007, 42(9), 1769-1776.
DOI
|
3 |
A.N. Correia, M.X. Facanha, P. de Lima-Neto, Surf. Coat. Tech., 2007, 201(16-17), 7216-7221.
DOI
|
4 |
A. Dolati, M. Sababi, E. Nouri, M. Ghorbani, Mater. Chem. Phys., 2007, 102(2-3), 118-124.
DOI
|
5 |
S. Basavanna, Y.A. Naik, J. Appl. Electrochem., 2009, 39(120), 1975-1982.
DOI
|
6 |
I. Petersson, E. Ahlberg, J. Electroanal. Chem., 2000, 485(2), 166-177.
DOI
|
7 |
F.R. Bento, L.H. Mascaro, Surf. Coat. Tech., 2006, 201, 1752-1756.
DOI
|
8 |
A.N. Correia, R.C.B. de Oliveira. P. de Lima-Neto, J. Braz. Chem. Soc., 2006, 17(1), 90-97.
DOI
|
9 |
Z.N. Yang, Z. Zhang, J.Q. Zhang, Surf. Coat. Tech., 2006, 200(16-17), 4810-4815.
DOI
|
10 |
M. Jayakumar, K.A. Venkatesan, T.G. Srinivasan, P.R. Vasudeva Rao, Electrochim. Acta, 2009, 54(26), 6747-6755.
DOI
|
11 |
H.J. Yun, S.M.S.I. Dulal, C.B. Shin, C.K. Kim, Electrochim. Acta, 2008, 54(2), 370-375.
DOI
|
12 |
S.M.S.I. Dulal, H.J. Yun, C.B. Shin, C.K. Kim, Electrochim. Acta, 2007, 53(2), 934-943.
DOI
|
13 |
I. Tabakovic, J. Qiu, S. Riemer, M. Sun, V. Vas'ko, M. Kief, Electrochim. Acta, 2008, 53(5), 2483-2493.
DOI
|
14 |
M.R. Khelladi, L. Mentar, M. Boubatra, A. Azizi, A. Kahoul, Mater. Chem. Phys., 2010, 122(2-3), 449-453.
DOI
|
15 |
E. Gomez, E. Guaus, F. Sanz, E. Valles, J. Electroanal. Chem., 1999, 465(1), 63-71.
DOI
|
16 |
W. Plieth, Electrochemistry for Materials Science, Elsevier, Amsterdam, 2008.
|
17 |
F.M. Takata, P.T.A. Sumodjo, Electrochim. Acta, 2007, 52(20), 6089-6096.
DOI
|
18 |
B.D. Cullity, Elements of X-ray Diffraction, Second Ed., Addison-Wesley Pub. Co., Reading, MA, 1978.
|
19 |
J.R. Ares, A. Pascual, I.J. Ferrer, C. Sanchez, Thin Solid Films, 2005, 480, 477-481.
|
20 |
A. Afshar, A.G. Dolati, M. Ghorbani, Mater. Chem. Phys., 2003, 77(2), 352-358.
DOI
|
21 |
Y. Ito, A. Miyazaki, S. Valiyaveettil, T. Enoki, J. Phys. Chem. C, 2010, 114(27), 11699-11702.
DOI
|
22 |
H. Liu, F. Wang, Y. Zhao, J. Liu, K.C. Park, M. Endo, J. Electroanal. Chem., 2009, 633(1), 15-18.
DOI
|
23 |
B. Jeon, S. Yoon, B.Y. Yoo, Electrochim. Acta, 2010, 56(1), 401-405.
DOI
|
24 |
N. Tasaltin, S. Ozturk, N. Kilinc, H. Yuzer, Z.Z. Ozturk, J. Alloys Compd., 2011, 509(9), 3894-3898.
DOI
|
25 |
F. Wang, S. Doi, K. Hosoiri, H. Yoshida, T. Kuzushima, M. Sasadaira, T. Watanabe, Electrochim. Acta, 2006, 51(20), 4250-4254.
DOI
|
26 |
S.A. Wilson, et al., Mater. Sci. Eng. R, 2007, 56(1-6), 1-129.
DOI
|
27 |
T. Edler, S. Hamann, A. Ludwig, S.G. Mayr, Scr. Mater., 2011, 64(1), 89-92.
DOI
|
28 |
S. Hamann, M.E. Gruner, S. Irsen, J. Buschbeck, C. Bechtold, I. Kock, S.G. Mayr, A. Savan, S. Thienhaus, E. Quandt, S. Fahler, P. Entel, A. Ludwig, Acta Mater., 2010, 58(18), 5949-5961.
DOI
|
29 |
V. Haehnel, C. Mickel, S. Fahler, L. Schultz, H. Schlorb, J. Phys. Chem. C, 2010, 114(45), 19278-19283.
DOI
|
30 |
V. Haehnel, S. Fahler, L. Schultz, H. Schlorb, Electrochem. Commun., 2010, 12(8), 1116-1119.
DOI
|
31 |
S. Inoue, K. Inoue, K. Koterazawa, K. Mizuuchi, Mater. Sci. Eng. A, 2003, 339(120), 29-34.
DOI
|
32 |
J. Buschbeck I. Lindemann, L. Schultz, S. Fahler, Phys. Rev. B, 2007, 76(20), 205421.
DOI
|
33 |
H. Shima, K. Oikawa, A. Fujita, K. Fukamichi, K. Ishida, J. Magn. Magn. Mater., 2004, 272, 2173-2174.
|
34 |
M. Rezaei, M. Ghorbani, A. Dolati, Electrochim. Acta, 2010, 56(1), 483-490.
DOI
|
35 |
F.M. Takata, G. Pattanaik, W.A. Soffa, P.T.A. Sumodjo, G. Zangari, Electrochem. Commun., 2008, 10(4), 568-571.
DOI
|
36 |
S. Doi, F. Wang, K. Hosoiri, T. Watanabe, Mater. Trans., 2003, 44(4), 649-652.
DOI
|
37 |
K.J. Bryden, J.Y. Ying, J. Electrochem. Soc, 1998, 145(10), 3339-3346.
DOI
|
38 |
S.C. Hernandez, B.Y. Yoo, E. Stefanescu, S. Khizroev, N.V. Myung, Electrochim. Acta, 2008, 53(18), 5621-5627.
DOI
|
39 |
D. Pecko, K.Z. Rozman, P.J. McGuiness, B. Pihlar, S. Kobe, J. Appl. Phys., 2010, 107(9), 09A712.
DOI
|
40 |
K.Z. Rozman, D. Pecko, L. Suhodolcan, P.J. McGuiness, S. Kobe, J. Alloys Compd., 2011, 509(2), 551-555.
DOI
|
41 |
M.A. Meyers, A. Mishra, D.J. Benson, Prog. Mater. Sci., 2006, 51(4), 427-556.
DOI
|
42 |
K. Sekiguchi, M. Shimizu, E. Saitoh, H. Miyajima, J. Magn. Magn. Mater., 2004, 282, 143-146.
DOI
|
43 |
I. Bakonyi, L. Peter, Prog. Mater. Sci., 2010, 55(3), 107-245.
DOI
|
44 |
M. Rezaei, Synthesis and characterization of Fe-Pd shape memory thin films by electrodeposition, Master Thesis, Department of Materials Science and Engineering, Sharif University of Technology, Iran, 2010.
|
45 |
M. Ghorbani, A. Iraji zad, A. Dolati, R. Ghasempour, J. Alloys Compd., 2005, 386(1-2), 43-46.
DOI
|
46 |
E. Gomez, A. Labarta, A. Llorente, E. Valles, J. Electroanal. Chem., 2001, 517(1-2), 63-68.
DOI
|
47 |
F. Xiao, C. Hangarter, B. Yoo, Y. Rheem, K. Lee, N.V. Myung, Electrochim. Acta, 2008, 53(28), 8103-8117.
DOI
|
48 |
A.J. Bard, R. Parsons, J. Jordan, Standard Potentials in Aqueous Solutions, Marcel Dekker, New York, 1985.
|
49 |
R.N. Goldberg, L.H. Hepler, Chem. Rev., 1968, 68(2), 229-252.
DOI
|
50 |
E.M. Martell, R.M. Smith, Critical Stabilities Constants, Plenum Press, New York, 1989.
|
51 |
M. Rezaei S.H. Tabaian, D.F. Haghshenas, Electrochim. Acta, 2012, 59, 360-366.
DOI
|
52 |
M. Rezaei S.H. Tabaian, D.F. Haghshenas, J. Electroanal. Chem., 2012, 687, 95-101.
DOI
|
53 |
M. Rezaei S.H. Tabaian, D.F. Haghshenas, Electrochim. Acta, 2013, 87, 381-387.
DOI
|
54 |
M. Rezaei S.H. Tabaian, D.F. Haghshenas, J. Mater. Chem. A, 2014, 2(13), 4588-4597.
DOI
|
55 |
A.E. Alvarez, D.R. Salinas, Electrochim. Acta, 2010, 55(11), 3714-3720.
DOI
|
56 |
A. Brenner, Electrodeposition of Alloys, Vol. 1 and 2, Academic Press, New York and Landon, 1963.
|
57 |
D. Landolt, Electrochim. Acta, 1994, 39(8-9), 1075-1090.
DOI
|
58 |
A.G. Dolati, M. Ghorbani, A. Afshar, Surf. Coat. Tech., 2003, 166, 105-110.
DOI
|
59 |
A.E. Alvarez, D.R. Salinas, J. Electroanal. Chem., 2004, 566(2), 393-400.
DOI
|
60 |
A. Milchev, Electrocrystallization: Fundamentals of Nucleation and Growth, Kluwer Academic Publishers, Boston, 2002.
|
61 |
A. Dolati, M. Ghorbani, M.R. Ahmadi, J. Electroanal. Chem., 2005, 577(1), 1-8.
DOI
|
62 |
L. Soleimany, A. Dolati, M. Ghorbani, J. Electroanal. Chem., 2010, 645(1), 28-34.
DOI
|
63 |
L. Heerman, A. Tarallo, J. Electroanal. Chem., 1999, 470(1), 70-76.
DOI
|
64 |
B. Scharifker, G. Hills, Electrochim. Acta, 1983, 28(7), 879-889.
DOI
|
65 |
B.R. Scharifker, J. Mostany, Electroanal. Chem., 1984, 177(1-2), 13-23.
DOI
|
66 |
L. Heerman, A. Tarallo, J. Electroanal. Chem., 1998, 451(1-2), 101-109.
DOI
|
67 |
Z. Zhang, D.P. Barkey, J. Electrochem. Soc., 2007, 154(10), D550-D556.
DOI
|
68 |
A. Sahari, A. Azizi, G. Schmerber, M. Abes, J.P. Bucher, A. Dinia, Catal. Today, 2006, 113(3-4), 257-262.
DOI
|
69 |
C. Han, Q. Liu, D.G. Ivey, Electrochim. Acta, 2009, 54(12), 3419-3427.
DOI
|
70 |
A.S. Taguchi, F.R. Bento, L.H. Mascaro, J. Braz. Chem. Soc., 2008, 19(4), 727-733.
DOI
|